JP5525873B2 - 平版印刷版の作製方法 - Google Patents

平版印刷版の作製方法 Download PDF

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Publication number
JP5525873B2
JP5525873B2 JP2010058390A JP2010058390A JP5525873B2 JP 5525873 B2 JP5525873 B2 JP 5525873B2 JP 2010058390 A JP2010058390 A JP 2010058390A JP 2010058390 A JP2010058390 A JP 2010058390A JP 5525873 B2 JP5525873 B2 JP 5525873B2
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JP
Japan
Prior art keywords
group
printing plate
lithographic printing
ethylenically unsaturated
compound
Prior art date
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Active
Application number
JP2010058390A
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English (en)
Japanese (ja)
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JP2011191558A5 (OSRAM
JP2011191558A (ja
Inventor
貴規 田口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2010058390A priority Critical patent/JP5525873B2/ja
Priority to EP11158236A priority patent/EP2367056A3/en
Publication of JP2011191558A publication Critical patent/JP2011191558A/ja
Publication of JP2011191558A5 publication Critical patent/JP2011191558A5/ja
Application granted granted Critical
Publication of JP5525873B2 publication Critical patent/JP5525873B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP2010058390A 2010-03-15 2010-03-15 平版印刷版の作製方法 Active JP5525873B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2010058390A JP5525873B2 (ja) 2010-03-15 2010-03-15 平版印刷版の作製方法
EP11158236A EP2367056A3 (en) 2010-03-15 2011-03-15 Method of preparing lithographic printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010058390A JP5525873B2 (ja) 2010-03-15 2010-03-15 平版印刷版の作製方法

Publications (3)

Publication Number Publication Date
JP2011191558A JP2011191558A (ja) 2011-09-29
JP2011191558A5 JP2011191558A5 (OSRAM) 2012-08-23
JP5525873B2 true JP5525873B2 (ja) 2014-06-18

Family

ID=44246442

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010058390A Active JP5525873B2 (ja) 2010-03-15 2010-03-15 平版印刷版の作製方法

Country Status (2)

Country Link
EP (1) EP2367056A3 (OSRAM)
JP (1) JP5525873B2 (OSRAM)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5604398B2 (ja) * 2011-09-30 2014-10-08 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5711168B2 (ja) * 2012-02-27 2015-04-30 富士フイルム株式会社 平版印刷版原版および平版印刷版の作製方法
KR20180057719A (ko) * 2015-10-16 2018-05-30 바스프 에스이 에너지 경화성의 고 반응성 다중 비닐에테르 또는 아크릴레이트 작용성 수지
EP3429848B1 (en) * 2016-03-16 2021-08-18 Agfa Nv Method for processing a lithographic printing plate

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EP2339401B1 (en) * 2009-12-28 2016-02-17 Fujifilm Corporation Method of preparing lithographic printing plate
JP5624880B2 (ja) * 2009-12-28 2014-11-12 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法

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Publication number Publication date
EP2367056A2 (en) 2011-09-21
JP2011191558A (ja) 2011-09-29
EP2367056A3 (en) 2012-11-28

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