JP5507938B2 - カラーフィルター用感光性樹脂組成物、カラーフィルター、及び液晶表示ディスプレイ - Google Patents

カラーフィルター用感光性樹脂組成物、カラーフィルター、及び液晶表示ディスプレイ Download PDF

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Publication number
JP5507938B2
JP5507938B2 JP2009215141A JP2009215141A JP5507938B2 JP 5507938 B2 JP5507938 B2 JP 5507938B2 JP 2009215141 A JP2009215141 A JP 2009215141A JP 2009215141 A JP2009215141 A JP 2009215141A JP 5507938 B2 JP5507938 B2 JP 5507938B2
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Japan
Prior art keywords
photosensitive resin
meth
resin composition
acrylate
color filter
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JP2009215141A
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English (en)
Japanese (ja)
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JP2010107957A (ja
Inventor
明生 阿部
康秀 大内
功 舘野
健治 丸山
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Tokyo Ohka Kogyo Co Ltd
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Tokyo Ohka Kogyo Co Ltd
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Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP2009215141A priority Critical patent/JP5507938B2/ja
Priority to KR1020090090915A priority patent/KR20100037547A/ko
Publication of JP2010107957A publication Critical patent/JP2010107957A/ja
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Publication of JP5507938B2 publication Critical patent/JP5507938B2/ja
Priority to KR1020170010004A priority patent/KR20170012526A/ko
Priority to KR1020180003420A priority patent/KR20180009049A/ko
Priority to KR1020190004633A priority patent/KR102050684B1/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
JP2009215141A 2008-10-01 2009-09-17 カラーフィルター用感光性樹脂組成物、カラーフィルター、及び液晶表示ディスプレイ Active JP5507938B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2009215141A JP5507938B2 (ja) 2008-10-01 2009-09-17 カラーフィルター用感光性樹脂組成物、カラーフィルター、及び液晶表示ディスプレイ
KR1020090090915A KR20100037547A (ko) 2008-10-01 2009-09-25 감광성 수지 조성물, 칼라 필터 및 액정 표시 디스플레이
KR1020170010004A KR20170012526A (ko) 2008-10-01 2017-01-20 감광성 수지 조성물, 칼라 필터 및 액정 표시 디스플레이
KR1020180003420A KR20180009049A (ko) 2008-10-01 2018-01-10 감광성 수지 조성물, 칼라 필터 및 액정 표시 디스플레이
KR1020190004633A KR102050684B1 (ko) 2008-10-01 2019-01-14 감광성 수지 조성물, 칼라 필터 및 액정 표시 디스플레이

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008256232 2008-10-01
JP2008256232 2008-10-01
JP2009215141A JP5507938B2 (ja) 2008-10-01 2009-09-17 カラーフィルター用感光性樹脂組成物、カラーフィルター、及び液晶表示ディスプレイ

Publications (2)

Publication Number Publication Date
JP2010107957A JP2010107957A (ja) 2010-05-13
JP5507938B2 true JP5507938B2 (ja) 2014-05-28

Family

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Family Applications (1)

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JP2009215141A Active JP5507938B2 (ja) 2008-10-01 2009-09-17 カラーフィルター用感光性樹脂組成物、カラーフィルター、及び液晶表示ディスプレイ

Country Status (2)

Country Link
JP (1) JP5507938B2 (ko)
KR (3) KR20170012526A (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5531495B2 (ja) * 2009-08-07 2014-06-25 Ｄｉｃ株式会社 カラーレジスト組成物、カラーフィルター及び液晶表示装置
JP2012068374A (ja) * 2010-09-22 2012-04-05 Dic Corp カラーレジスト組成物、カラーフィルター及び液晶表示装置
CN103376650B (zh) * 2012-04-25 2016-03-02 东京应化工业株式会社 遮光层形成用感光性基材组合物的制造方法
JP6305058B2 (ja) * 2013-03-05 2018-04-04 キヤノン株式会社 感光性ガス発生剤、光硬化性組成物
WO2015122296A1 (ja) * 2014-02-12 2015-08-20 日産化学工業株式会社 フッ素含有界面活性剤を含む膜形成組成物
WO2016208518A1 (ja) * 2015-06-22 2016-12-29 Jsr株式会社 レジスト下層膜形成用組成物、レジスト下層膜及びパターニングされた基板の製造方法
JP7390189B2 (ja) * 2017-09-29 2023-12-01 富士フイルム株式会社 着色感光性組成物および光学フィルタの製造方法
JP7402034B2 (ja) * 2019-12-16 2023-12-20 東京応化工業株式会社 着色感光性組成物、着色膜、着色膜の製造方法及びパターン化された着色膜の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3856298B2 (ja) * 2001-02-08 2006-12-13 富士フイルムホールディングス株式会社 平版印刷版原版
JP2005105045A (ja) 2003-09-29 2005-04-21 Dainippon Ink & Chem Inc 界面活性剤組成物
JP4121925B2 (ja) 2003-09-30 2008-07-23 東京応化工業株式会社 ポジ型ホトレジスト組成物
JP4633582B2 (ja) * 2005-09-06 2011-02-16 東京応化工業株式会社 感光性組成物
JP4759483B2 (ja) * 2006-09-25 2011-08-31 Ａｚエレクトロニックマテリアルズ株式会社 フォトレジスト組成物、フォトレジスト組成物の塗布方法およびレジストパターンの形成方法
KR20090123848A (ko) * 2007-02-27 2009-12-02 후지필름 가부시키가이샤 감광성 수지 조성물, 감광성 전사 재료, 화소 분리벽 및 그형성방법, 화소 분리벽을 가진 기판, 컬러필터 및 그 제조방법, 그리고 표시장치
JP2008242273A (ja) * 2007-03-28 2008-10-09 Fujifilm Corp 着色硬化性樹脂組成物、着色パターン形成方法、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示素子
JP5111299B2 (ja) * 2007-09-20 2013-01-09 富士フイルム株式会社 着色硬化性組成物、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示装置
JP5340623B2 (ja) * 2008-03-31 2013-11-13 富士フイルム株式会社 感光性樹脂組成物、遮光性カラーフィルター及びその製造方法、並びに、固体撮像素子
JP5371313B2 (ja) * 2008-07-28 2013-12-18 富士フイルム株式会社 カラーフィルタ用着色硬化性組成物、カラーフィルタ、カラーフィルタの製造方法、及び液晶表示素子

Also Published As

Publication number Publication date
KR20170012526A (ko) 2017-02-02
KR20180009049A (ko) 2018-01-25
KR102050684B1 (ko) 2019-11-29
KR20190007512A (ko) 2019-01-22
JP2010107957A (ja) 2010-05-13

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