JP5489844B2 - 電子装置 - Google Patents
電子装置 Download PDFInfo
- Publication number
- JP5489844B2 JP5489844B2 JP2010102597A JP2010102597A JP5489844B2 JP 5489844 B2 JP5489844 B2 JP 5489844B2 JP 2010102597 A JP2010102597 A JP 2010102597A JP 2010102597 A JP2010102597 A JP 2010102597A JP 5489844 B2 JP5489844 B2 JP 5489844B2
- Authority
- JP
- Japan
- Prior art keywords
- electronic device
- resistance value
- specific resistance
- common wiring
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000463 material Substances 0.000 claims description 58
- 238000000034 method Methods 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 24
- 239000004065 semiconductor Substances 0.000 claims description 23
- 238000004519 manufacturing process Methods 0.000 claims description 22
- 230000005669 field effect Effects 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 229910052733 gallium Inorganic materials 0.000 claims description 9
- 229910052738 indium Inorganic materials 0.000 claims description 9
- 229910052725 zinc Inorganic materials 0.000 claims description 9
- 230000001678 irradiating effect Effects 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 238000001514 detection method Methods 0.000 claims description 3
- 239000012528 membrane Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 47
- 239000010408 film Substances 0.000 description 32
- 238000003860 storage Methods 0.000 description 26
- 239000003990 capacitor Substances 0.000 description 24
- 239000010409 thin film Substances 0.000 description 21
- 230000001681 protective effect Effects 0.000 description 18
- 230000003287 optical effect Effects 0.000 description 15
- 230000002093 peripheral effect Effects 0.000 description 11
- 230000005611 electricity Effects 0.000 description 7
- 230000003068 static effect Effects 0.000 description 7
- 239000011229 interlayer Substances 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
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- 239000011521 glass Substances 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 230000002829 reductive effect Effects 0.000 description 4
- 238000005401 electroluminescence Methods 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136204—Arrangements to prevent high voltage or static electricity failures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
- H01L27/1244—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits for preventing breakage, peeling or short circuiting
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Liquid Crystal (AREA)
- Computer Hardware Design (AREA)
- Nonlinear Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Thin Film Transistor (AREA)
- Electroluminescent Light Sources (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010102597A JP5489844B2 (ja) | 2010-04-27 | 2010-04-27 | 電子装置 |
TW100114427A TWI468824B (zh) | 2010-04-27 | 2011-04-26 | 矩陣狀配置複數個開關元件的電子裝置及其製造方法 |
KR1020110038966A KR101446829B1 (ko) | 2010-04-27 | 2011-04-26 | 전자 장치 및 그 제조 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010102597A JP5489844B2 (ja) | 2010-04-27 | 2010-04-27 | 電子装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011232539A JP2011232539A (ja) | 2011-11-17 |
JP5489844B2 true JP5489844B2 (ja) | 2014-05-14 |
Family
ID=45321902
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010102597A Active JP5489844B2 (ja) | 2010-04-27 | 2010-04-27 | 電子装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5489844B2 (ko) |
KR (1) | KR101446829B1 (ko) |
TW (1) | TWI468824B (ko) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102000738B1 (ko) * | 2013-01-28 | 2019-07-23 | 삼성디스플레이 주식회사 | 정전기 방지 회로 및 이를 포함하는 표시 장치 |
US9964799B2 (en) * | 2015-03-17 | 2018-05-08 | Semiconductor Energy Laboratory Co., Ltd. | Display device, display module, and electronic device |
WO2017150617A1 (ja) * | 2016-03-02 | 2017-09-08 | 国立研究開発法人産業技術総合研究所 | 半導体-絶縁体可逆変化薄膜及びその製造方法 |
CN106094272B (zh) * | 2016-06-22 | 2019-06-07 | 京东方科技集团股份有限公司 | 一种显示基板、其制作方法及显示装置 |
CN107490890B (zh) * | 2017-09-26 | 2019-09-20 | 武汉华星光电技术有限公司 | 显示基板、显示面板以及显示设备 |
KR102181003B1 (ko) * | 2020-02-07 | 2020-11-20 | 삼성디스플레이 주식회사 | 정전기 방지 회로 및 이를 포함하는 표시 장치 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2766442B2 (ja) * | 1992-06-03 | 1998-06-18 | 株式会社フロンテック | マトリクス配線基板 |
JPH08220557A (ja) * | 1995-02-09 | 1996-08-30 | Mitsubishi Electric Corp | 液晶表示装置、その検査方法及び静電気防止方法 |
JP3640224B2 (ja) * | 1996-06-25 | 2005-04-20 | 株式会社半導体エネルギー研究所 | 液晶表示パネル |
JP3628125B2 (ja) * | 1996-09-24 | 2005-03-09 | 株式会社東芝 | アクティブマトリクス基板及びアクティブマトリクス型液晶表示装置 |
JP2006003552A (ja) * | 2004-06-16 | 2006-01-05 | Mitsubishi Chemicals Corp | 発光装置 |
JP2009099847A (ja) * | 2007-10-18 | 2009-05-07 | Canon Inc | 薄膜トランジスタとその製造方法及び表示装置 |
JP5268132B2 (ja) * | 2007-10-30 | 2013-08-21 | 富士フイルム株式会社 | 酸化物半導体素子とその製造方法、薄膜センサおよび電気光学装置 |
CN102160183B (zh) * | 2008-09-17 | 2014-08-06 | 夏普株式会社 | 半导体装置 |
-
2010
- 2010-04-27 JP JP2010102597A patent/JP5489844B2/ja active Active
-
2011
- 2011-04-26 KR KR1020110038966A patent/KR101446829B1/ko active IP Right Grant
- 2011-04-26 TW TW100114427A patent/TWI468824B/zh active
Also Published As
Publication number | Publication date |
---|---|
TW201229639A (en) | 2012-07-16 |
JP2011232539A (ja) | 2011-11-17 |
TWI468824B (zh) | 2015-01-11 |
KR20110119573A (ko) | 2011-11-02 |
KR101446829B1 (ko) | 2014-10-01 |
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