JP5486735B2 - 半導体装置 - Google Patents

半導体装置 Download PDF

Info

Publication number
JP5486735B2
JP5486735B2 JP2013518033A JP2013518033A JP5486735B2 JP 5486735 B2 JP5486735 B2 JP 5486735B2 JP 2013518033 A JP2013518033 A JP 2013518033A JP 2013518033 A JP2013518033 A JP 2013518033A JP 5486735 B2 JP5486735 B2 JP 5486735B2
Authority
JP
Japan
Prior art keywords
semiconductor layer
island
conductivity type
type high
concentration semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2013518033A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2013057785A1 (ja
Inventor
富士雄 舛岡
広記 中村
紳太郎 新井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unisantis Electronics Singapore Pte Ltd
Original Assignee
Unisantis Electronics Singapore Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unisantis Electronics Singapore Pte Ltd filed Critical Unisantis Electronics Singapore Pte Ltd
Application granted granted Critical
Publication of JP5486735B2 publication Critical patent/JP5486735B2/ja
Publication of JPWO2013057785A1 publication Critical patent/JPWO2013057785A1/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/41Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger
    • G11C11/412Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger using field-effect transistors only
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B10/00Static random access memory [SRAM] devices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/41Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming static cells with positive feedback, i.e. cells not needing refreshing or charge regeneration, e.g. bistable multivibrator or Schmitt trigger
    • G11C11/413Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing, timing or power reduction
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B10/00Static random access memory [SRAM] devices
    • H10B10/12Static random access memory [SRAM] devices comprising a MOSFET load element
    • H10B10/125Static random access memory [SRAM] devices comprising a MOSFET load element the MOSFET being a thin film transistor [TFT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B99/00Subject matter not provided for in other groups of this subclass

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Semiconductor Memories (AREA)
  • Thin Film Transistor (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Static Random-Access Memory (AREA)
JP2013518033A 2011-10-18 2011-10-18 半導体装置 Active JP5486735B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2011/073885 WO2013057785A1 (ja) 2011-10-18 2011-10-18 半導体装置

Publications (2)

Publication Number Publication Date
JP5486735B2 true JP5486735B2 (ja) 2014-05-07
JPWO2013057785A1 JPWO2013057785A1 (ja) 2015-04-02

Family

ID=48140463

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013518033A Active JP5486735B2 (ja) 2011-10-18 2011-10-18 半導体装置

Country Status (5)

Country Link
JP (1) JP5486735B2 (ko)
KR (1) KR20130099108A (ko)
CN (1) CN103250239A (ko)
TW (1) TW201318110A (ko)
WO (1) WO2013057785A1 (ko)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0289293A (ja) * 1987-09-07 1990-03-29 Mitsubishi Electric Corp 半導体記憶装置
JPH0951042A (ja) * 1995-06-02 1997-02-18 Hitachi Ltd 半導体装置
JP2005038557A (ja) * 2003-07-18 2005-02-10 Semiconductor Energy Lab Co Ltd メモリ回路およびメモリ回路を有する表示装置
JP2007066493A (ja) * 2005-08-02 2007-03-15 Renesas Technology Corp 半導体記憶装置
JP2008065968A (ja) * 2006-08-10 2008-03-21 Renesas Technology Corp 半導体記憶装置
JP2008205168A (ja) * 2007-02-20 2008-09-04 Fujitsu Ltd 半導体装置及びその製造方法
WO2009060934A1 (ja) * 2007-11-07 2009-05-14 Nec Corporation 半導体装置及びその製造方法
WO2009096465A1 (ja) * 2008-01-29 2009-08-06 Unisantis Electronics (Japan) Ltd. 半導体記憶装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8692317B2 (en) * 2008-04-16 2014-04-08 Nec Corporation Semiconductor storage device

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0289293A (ja) * 1987-09-07 1990-03-29 Mitsubishi Electric Corp 半導体記憶装置
JPH0951042A (ja) * 1995-06-02 1997-02-18 Hitachi Ltd 半導体装置
JP2005038557A (ja) * 2003-07-18 2005-02-10 Semiconductor Energy Lab Co Ltd メモリ回路およびメモリ回路を有する表示装置
JP2007066493A (ja) * 2005-08-02 2007-03-15 Renesas Technology Corp 半導体記憶装置
JP2008065968A (ja) * 2006-08-10 2008-03-21 Renesas Technology Corp 半導体記憶装置
JP2008205168A (ja) * 2007-02-20 2008-09-04 Fujitsu Ltd 半導体装置及びその製造方法
WO2009060934A1 (ja) * 2007-11-07 2009-05-14 Nec Corporation 半導体装置及びその製造方法
WO2009096465A1 (ja) * 2008-01-29 2009-08-06 Unisantis Electronics (Japan) Ltd. 半導体記憶装置

Also Published As

Publication number Publication date
TW201318110A (zh) 2013-05-01
CN103250239A (zh) 2013-08-14
KR20130099108A (ko) 2013-09-05
JPWO2013057785A1 (ja) 2015-04-02
WO2013057785A1 (ja) 2013-04-25

Similar Documents

Publication Publication Date Title
US8754481B2 (en) Semiconductor device
US10522554B2 (en) SRAM cells with vertical gate-all-around MOSFETs
JP4800700B2 (ja) 半導体装置およびそれを用いた半導体集積回路
JP5701831B2 (ja) パスゲートを備えた半導体記憶装置
US8264863B2 (en) Green transistor for nano-Si ferro-electric RAM and method of operating the same
US10756095B2 (en) SRAM cell with T-shaped contact
JP2005293759A5 (ko)
JP5364125B2 (ja) 半導体装置
US20120074467A1 (en) Switch array
US11062739B2 (en) Semiconductor chip having memory and logic cells
US7651905B2 (en) Apparatus and method for reducing gate leakage in deep sub-micron MOS transistors using semi-rectifying contacts
US9455273B2 (en) Semiconductor device
JP5486735B2 (ja) 半導体装置
JP2013171895A (ja) 半導体メモリ装置およびその駆動方法
JP2006210736A (ja) 半導体記憶装置
US20160049187A1 (en) Semiconductor device
JP2004265549A (ja) 半導体記憶装置
US10163925B2 (en) Integrated circuit device
JP2010097059A (ja) 表示装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140123

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20140217

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20140221

R150 Certificate of patent or registration of utility model

Ref document number: 5486735

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250