JP5468104B2 - 配線板の製造法および配線板 - Google Patents
配線板の製造法および配線板 Download PDFInfo
- Publication number
- JP5468104B2 JP5468104B2 JP2012099355A JP2012099355A JP5468104B2 JP 5468104 B2 JP5468104 B2 JP 5468104B2 JP 2012099355 A JP2012099355 A JP 2012099355A JP 2012099355 A JP2012099355 A JP 2012099355A JP 5468104 B2 JP5468104 B2 JP 5468104B2
- Authority
- JP
- Japan
- Prior art keywords
- wiring board
- cured
- inorganic particles
- atoms
- board according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 229910052751 metal Inorganic materials 0.000 claims description 56
- 239000002184 metal Substances 0.000 claims description 56
- 239000000126 substance Substances 0.000 claims description 43
- 239000010954 inorganic particle Substances 0.000 claims description 33
- 230000017525 heat dissipation Effects 0.000 claims description 29
- -1 polysiloxane structure Polymers 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 27
- 150000001875 compounds Chemical class 0.000 claims description 26
- 239000000463 material Substances 0.000 claims description 24
- 125000004429 atom Chemical group 0.000 claims description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 15
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 14
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 14
- 239000011888 foil Substances 0.000 claims description 13
- 229910052582 BN Inorganic materials 0.000 claims description 7
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 7
- 239000005046 Chlorosilane Substances 0.000 claims description 7
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 7
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 7
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 7
- 239000011787 zinc oxide Substances 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- 239000000460 chlorine Substances 0.000 claims 1
- 239000000203 mixture Substances 0.000 description 76
- 238000009472 formulation Methods 0.000 description 49
- 239000002245 particle Substances 0.000 description 35
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 26
- 239000010410 layer Substances 0.000 description 26
- 239000011889 copper foil Substances 0.000 description 20
- 239000010935 stainless steel Substances 0.000 description 14
- 229910001220 stainless steel Inorganic materials 0.000 description 14
- 239000002585 base Substances 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- 229920005989 resin Polymers 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 10
- 238000012360 testing method Methods 0.000 description 10
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 10
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 238000009413 insulation Methods 0.000 description 7
- 238000007639 printing Methods 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 230000007774 longterm Effects 0.000 description 6
- 229920001296 polysiloxane Polymers 0.000 description 6
- 229940126214 compound 3 Drugs 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000007650 screen-printing Methods 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000003929 acidic solution Substances 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 4
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 230000001464 adherent effect Effects 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000008602 contraction Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical group CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical group CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Insulated Metal Substrates For Printed Circuits (AREA)
Description
上述した配線板1の製造法および配線板1は、本発明の好適な形態の一例ではあるが、これに限定されるものではなく本発明の要旨を変更しない範囲において種々変形実施が可能である。
(R’O)n SiR4−n
R:CH3、C2H5、C3H7、C4H9、C6H5
R’:CH3、C2H5、C3H7、C4H9
n: 1〜4
W=100−〔(100−L)2+a2+b2〕1/2・・・(1)
2 金属基板(金属基材)
3 配合物
3A 硬化した配合物
4 銅箔(金属箔)
5 配線層
Claims (9)
- 1種または2種以上のアルコキシシラン(但し、Si原子に直接結合するアルコキシル基以外の基または原子が2個以上のものを除く)またはクロルシラン(但し、Si原子に直接結合する塩素原子以外の基または原子が2個以上のものを除く)から誘導されるポリシロキサン構造を有する物質と、絶縁性および放熱性を有する無機粒子を含む配合物で金属基材の面を被覆し、上記配合物を硬化する工程を有することを特徴とする配線板の製造法。
- 前記硬化する工程の前に、金属箔または金属板と前記配合物とを固着し、前記硬化する工程の後に、上記金属箔または上記金属板を部分的に除去して配線層を形成する工程を有することを特徴とする請求項1記載の配線板の製造法。
- 前記無機粒子は、酸化珪素、酸化アルミニウム、酸化亜鉛、窒化アルミニウムおよび窒化ホウ素のうち少なくとも1種以上を含むものであることを特徴とする請求項1または2記載の配線板の製造法。
- 前記金属基材は、表面に微小孔を有することを特徴とする請求項1、2または3記載の配線板の製造法。
- 前記金属基材は、金属糸を織ったものであることを特徴とする請求項1、2または3記載の配線板の製造法。
- 絶縁部材として、1種または2種以上のアルコキシシラン(但し、Si原子に直接結合するアルコキシル基以外の基または原子が2個以上のものを除く)またはクロルシラン(但し、Si原子に直接結合する塩素原子以外の基または原子が2個以上のものを除く)から誘導されるポリシロキサン構造を有する物質を硬化した物質と、絶縁性および放熱性を有する無機粒子を含む硬化した配合物を用いたことを特徴とする配線板。
- 前記配合物は、前記無機粒子を60から80質量部含むことを特徴とする請求項6記載の配線板。
- 前記無機粒子は、酸化珪素、酸化アルミニウム、酸化亜鉛、窒化アルミニウムおよび窒化ホウ素のうち少なくとも1種以上を含むものであることを特徴とする請求項6または7記載の配線板。
- 前記硬化した配合物は、ハンター方式による白色度が87以上であることを特徴とする請求項6、7または8記載の配線板。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012099355A JP5468104B2 (ja) | 2012-04-25 | 2012-04-25 | 配線板の製造法および配線板 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012099355A JP5468104B2 (ja) | 2012-04-25 | 2012-04-25 | 配線板の製造法および配線板 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007206943A Division JP2009043914A (ja) | 2007-08-08 | 2007-08-08 | 配線板の製造法および配線板 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012165009A JP2012165009A (ja) | 2012-08-30 |
JP5468104B2 true JP5468104B2 (ja) | 2014-04-09 |
Family
ID=46844029
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012099355A Active JP5468104B2 (ja) | 2012-04-25 | 2012-04-25 | 配線板の製造法および配線板 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5468104B2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6146354B2 (ja) * | 2014-03-25 | 2017-06-14 | 富士ゼロックス株式会社 | 定着装置及び画像形成装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0748588B2 (ja) * | 1987-01-07 | 1995-05-24 | 東芝ケミカル株式会社 | プリント配線用金属基板の製造方法 |
DE4209631A1 (de) * | 1992-03-25 | 1993-09-30 | Basf Ag | Monolithischer Trägerkatalysator, Verfahren zu seiner Herstellung und seine Verwendung |
JPH0653647A (ja) * | 1992-07-28 | 1994-02-25 | Matsushita Electric Works Ltd | 金属コア積層板用の金属板の表面処理法 |
JPH10142992A (ja) * | 1996-09-12 | 1998-05-29 | Ushio Inc | 加熱ローラ |
JP2005060501A (ja) * | 2003-08-11 | 2005-03-10 | Wacker Asahikasei Silicone Co Ltd | コーティング用シリコーン組成物 |
JP2005251562A (ja) * | 2004-03-04 | 2005-09-15 | Nissan Motor Co Ltd | 固体酸化物形燃料電池用セル、セル板及び固体酸化物形燃料電池 |
JP4288671B2 (ja) * | 2004-03-31 | 2009-07-01 | 荒川化学工業株式会社 | ポリアミドイミド樹脂、メトキシシリル基含有シラン変性ポリアミドイミド樹脂、ポリアミドイミド樹脂組成物、硬化膜および金属箔積層体 |
US20070148467A1 (en) * | 2005-12-23 | 2007-06-28 | World Properties, Inc. | Thermal management circuit materials, method of manufacture thereof, and articles formed therefrom |
-
2012
- 2012-04-25 JP JP2012099355A patent/JP5468104B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2012165009A (ja) | 2012-08-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2009043914A (ja) | 配線板の製造法および配線板 | |
JP5775231B1 (ja) | 付加硬化型シリコーン組成物 | |
KR101152263B1 (ko) | 광학 장치용 금속 기재 회로 기판 및 이의 제조방법 | |
JP5650092B2 (ja) | シリコーンプリプレグ、それを用いたシリコーン樹脂板、シリコーン金属張積層板、シリコーン金属ベース基板及びled実装基板 | |
JP2008260798A (ja) | 熱伝導性硬化物及びその製造方法 | |
CN106661331B (zh) | 单晶氧化铝填充的管芯粘结膏 | |
TWI527845B (zh) | Polysiloxane condensation reactants | |
JP6519794B2 (ja) | 電着液、およびメタルコア基板の製造方法 | |
KR20170028885A (ko) | 개선된 경도 및 내충격성을 갖는 졸-겔 조성물 | |
JP2010205955A (ja) | 熱伝導性電子回路基板およびそれを用いた電子機器ならびにその製造方法 | |
WO2015163352A1 (ja) | 硬化性樹脂組成物及びその硬化物 | |
KR100865771B1 (ko) | 방열용 코팅제 조성물 | |
TWI613843B (zh) | 散熱基板、具有散熱基板的裝置及散熱基板的製造方法 | |
JP5468104B2 (ja) | 配線板の製造法および配線板 | |
JP6517103B2 (ja) | 放熱基板、デバイス及び放熱基板の製造方法 | |
TWI777939B (zh) | 覆銅層合板及其製造方法 | |
KR101129973B1 (ko) | 방열 세라믹 코팅 조성물 및 그 제조방법 | |
JP5314874B2 (ja) | 保護膜層用封止剤 | |
TWI724156B (zh) | 熱傳導性複合薄片 | |
JP2003165906A (ja) | シリコーンゲル組成物およびシリコーンゲル | |
JP2017183506A (ja) | 樹脂成形体用材料 | |
JP5430136B2 (ja) | 部材表面の改質方法。 | |
JP6645911B2 (ja) | シリコーン樹脂基板及びその製造方法、並びに光半導体装置 | |
JP2013225697A (ja) | 熱伝導性電子回路基板およびそれを用いた電子機器ならびにその製造方法 | |
WO2012073899A1 (ja) | 硬化物製造用キット及び硬化物製造用組成物、並びにその使用 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130604 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130719 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140121 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140128 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5468104 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313117 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313117 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |