JP5367841B2 - 半導体基板の接合方法およびmemsデバイス - Google Patents
半導体基板の接合方法およびmemsデバイス Download PDFInfo
- Publication number
- JP5367841B2 JP5367841B2 JP2011544987A JP2011544987A JP5367841B2 JP 5367841 B2 JP5367841 B2 JP 5367841B2 JP 2011544987 A JP2011544987 A JP 2011544987A JP 2011544987 A JP2011544987 A JP 2011544987A JP 5367841 B2 JP5367841 B2 JP 5367841B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrate
- layer
- aluminum
- bonding
- containing layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
- B23K20/02—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating by means of a press ; Diffusion bonding
- B23K20/023—Thermo-compression bonding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
- B23K20/16—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating with interposition of special material to facilitate connection of the parts, e.g. material for absorbing or producing gas
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
- B23K20/22—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating taking account of the properties of the materials to be welded
- B23K20/233—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating taking account of the properties of the materials to be welded without ferrous layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00261—Processes for packaging MEMS devices
- B81C1/00269—Bonding of solid lids or wafers to the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/94—Batch processes at wafer-level, i.e. with connecting carried out on a wafer comprising a plurality of undiced individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2203/00—Forming microstructural systems
- B81C2203/01—Packaging MEMS
- B81C2203/0118—Bonding a wafer on the substrate, i.e. where the cap consists of another wafer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29117—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29117—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
- H01L2224/29124—Aluminium [Al] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32135—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/32145—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45025—Plural core members
- H01L2224/4503—Stacked arrangements
- H01L2224/45032—Two-layer arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/832—Applying energy for connecting
- H01L2224/83201—Compression bonding
- H01L2224/83203—Thermocompression bonding, e.g. diffusion bonding, pressure joining, thermocompression welding or solid-state welding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/83801—Soldering or alloying
- H01L2224/83805—Soldering or alloying involving forming a eutectic alloy at the bonding interface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01032—Germanium [Ge]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01322—Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/146—Mixed devices
- H01L2924/1461—MEMS
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/162—Disposition
- H01L2924/16235—Connecting to a semiconductor or solid-state bodies, i.e. cap-to-chip
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Micromachines (AREA)
- Pressure Sensors (AREA)
- Pressure Welding/Diffusion-Bonding (AREA)
Description
また、上記の重量比を精度よく制御することができ、封止率および接合強度の高い接合を、効率よく行うことができる。
本実施形態に係るMEMSデバイスは、このような共晶接合により製造されたものであり、例えば、加速度センサ、角速度センサ、赤外線センサ、圧力センサ、磁気センサおよび音響センサが考えられる。
図示のように、MEMSチップ10は、シリコン(Si)から成る基板11と、基板11の中央に微細加工技術により形成されたセンシング部12と、を有している。センシング部12は、基板11の中央に掘り込むように形成され、上述のように加速度センサ、角速度センサ、赤外線センサ、圧力センサ、磁気センサおよび音響センサ等の素子で構成されている。また、基板11には、センシング部12を囲繞するように、平面視方形環状の接合部30aが配設されている。実施形態のMEMSチップ10では、センシング部12および接合部30aが後述するCMOSチップ20と対面するように表裏反転させて、CMOSチップ20と接合される。そして、MEMSチップ10の接合部30aが、CMOSチップ20に形成した接合部30bに突き合わされ、接合部30bに成膜された金属層により、両者が共晶接合される。なお、基板11は、請求項でいう第1半導体基板に相当し、センシング部12は、請求項でいうMEMS構造体に相当する。
12 センシング部 11,21 基板
20 CMOSチップ 22 集積回路
31 含アルミニウム層 32 ゲルマニウム層
35 筋状層部 36 枝状層部
41 ピット
Claims (8)
- 第1半導体基板の接合面と第2半導体基板の接合面との間に、アルミニウムを主成分とする含アルミニウム層とゲルマニウム層とを接触状態で介在させ、加圧・加熱して、前記第1半導体基板と前記第2半導体基板とを共晶接合する半導体基板の接合方法であって、
共晶合金化する前記含アルミニウム層に対する前記ゲルマニウム層の重量比を、27wt%から52wt%とし、
前記ゲルマニウム層の全てと、これに接触する前記含アルミニウム層の一部とが共晶合金化するように、前記ゲルマニウム層の膜厚を調節することを特徴とする半導体基板の接合方法。 - 前記重量比を、33wt%から42wt%としたことを特徴とする請求項1に記載の半導体基板の接合方法。
- 前記含アルミニウム層および前記ゲルマニウム層が、前記第1半導体基板および前記第2半導体基板のいずれか一方に成膜されていることを特徴とする請求項1または2に記載の半導体基板の接合方法。
- 前記含アルミニウム層は、所定の幅を有して平面視環状に成膜され、
前記ゲルマニウム層は、前記含アルミニウム層上に平面視環状に成膜された1以上の筋状層部を有していることを特徴とする請求項3に記載の半導体基板の接合方法。 - 前記含アルミニウム層は、所定の幅を有して平面視環状に成膜され、
前記ゲルマニウム層は、前記含アルミニウム層上に平面視環状に成膜された筋状層部と、前記筋状層部から分岐した複数の枝状層部と、を有していることを特徴とする請求項3に記載の半導体基板の接合方法。 - 前記含アルミニウム層および前記ゲルマニウム層が、前記第2半導体基板に成膜され、
前記第1半導体基板の接合面には、前記加圧・加熱により生じた共晶合金が浸入するピットが形成されていることを特徴とする請求項3ないし5のいずれかに記載の半導体基板の接合方法。 - 請求項1ないし6のいずれかに記載の半導体基板の接合方法によって、接合して成るMEMSデバイスであって、
前記第1半導体基板は、前記接合面側に掘り込むようにして作りこんだMEMS構造体を有し、
前記第2半導体基板は、前記接合面側に形成した前記MEMS構造体を制御する集積回路を有していることを特徴とするMEMSデバイス。 - 加速度センサ、角速度センサ、赤外線センサ、圧力センサ、磁気センサおよび音響センサのいずれかであることを特徴とする請求項7に記載のMEMSデバイス。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2009/006786 WO2011070625A1 (ja) | 2009-12-11 | 2009-12-11 | 半導体基板の接合方法およびmemsデバイス |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2011070625A1 JPWO2011070625A1 (ja) | 2013-04-22 |
JP5367841B2 true JP5367841B2 (ja) | 2013-12-11 |
Family
ID=44145197
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011544987A Active JP5367841B2 (ja) | 2009-12-11 | 2009-12-11 | 半導体基板の接合方法およびmemsデバイス |
Country Status (3)
Country | Link |
---|---|
US (1) | US20120299128A1 (ja) |
JP (1) | JP5367841B2 (ja) |
WO (1) | WO2011070625A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6062393B2 (ja) * | 2014-05-12 | 2017-01-18 | 株式会社豊田中央研究所 | 半導体装置の製造方法及び半導体装置 |
CN106542492A (zh) | 2015-09-23 | 2017-03-29 | 中芯国际集成电路制造(北京)有限公司 | 焊盘结构、焊环结构和mems器件的封装方法 |
US10793427B2 (en) * | 2017-04-04 | 2020-10-06 | Kionix, Inc. | Eutectic bonding with AlGe |
CN110116984B (zh) * | 2018-02-06 | 2022-01-28 | 中芯国际集成电路制造(上海)有限公司 | Mems器件及其制备方法 |
CN111137844B (zh) * | 2019-12-31 | 2023-07-28 | 绍兴中芯集成电路制造股份有限公司 | 共晶键合方法和半导体器件 |
FI20205914A1 (en) * | 2020-09-21 | 2022-03-22 | Teknologian Tutkimuskeskus Vtt Oy | Disc level component packaging |
DE102020215021A1 (de) | 2020-11-30 | 2022-06-02 | Robert Bosch Gesellschaft mit beschränkter Haftung | Mikromechanische Vorrichtung mit elektrisch kontaktierter Kappe |
EP4033521A1 (en) * | 2021-01-26 | 2022-07-27 | Infineon Technologies AG | Method for wafer bonding and compound semiconductor device |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58125673A (ja) * | 1982-01-12 | 1983-07-26 | 新明和工業株式会社 | 拡散接合方法 |
JPS60191679A (ja) * | 1984-03-13 | 1985-09-30 | Hitachi Ltd | 耐熱超合金の拡散接合方法 |
JPS61111789A (ja) * | 1984-11-07 | 1986-05-29 | Hitachi Ltd | 金属部材の接合法 |
JPH04317313A (ja) * | 1991-02-22 | 1992-11-09 | Messerschmitt Boelkow Blohm Gmbh <Mbb> | シリコン半導体素子を接合するための方法 |
JPH081644U (ja) * | 1996-04-12 | 1996-12-03 | 三菱マテリアル株式会社 | 半導体装置用軽量基板 |
JP2000000036U (ja) * | 1996-01-12 | 2000-03-31 | 三菱マテリアル株式会社 | 半導体装置用軽量基板 |
JP2003068916A (ja) * | 2001-08-24 | 2003-03-07 | Sumitomo Electric Ind Ltd | 半導体素子収納用パッケージ |
JP2008177481A (ja) * | 2007-01-22 | 2008-07-31 | Hitachi Metals Ltd | 半導体センサー装置およびその製造方法 |
JP2010069599A (ja) * | 2008-09-22 | 2010-04-02 | Alps Electric Co Ltd | Memsセンサ |
JP2010238921A (ja) * | 2009-03-31 | 2010-10-21 | Alps Electric Co Ltd | Memsセンサ |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6406636B1 (en) * | 1999-06-02 | 2002-06-18 | Megasense, Inc. | Methods for wafer to wafer bonding using microstructures |
US7442570B2 (en) * | 2005-03-18 | 2008-10-28 | Invensence Inc. | Method of fabrication of a AL/GE bonding in a wafer packaging environment and a product produced therefrom |
-
2009
- 2009-12-11 WO PCT/JP2009/006786 patent/WO2011070625A1/ja active Application Filing
- 2009-12-11 US US13/513,403 patent/US20120299128A1/en not_active Abandoned
- 2009-12-11 JP JP2011544987A patent/JP5367841B2/ja active Active
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58125673A (ja) * | 1982-01-12 | 1983-07-26 | 新明和工業株式会社 | 拡散接合方法 |
JPS60191679A (ja) * | 1984-03-13 | 1985-09-30 | Hitachi Ltd | 耐熱超合金の拡散接合方法 |
JPS61111789A (ja) * | 1984-11-07 | 1986-05-29 | Hitachi Ltd | 金属部材の接合法 |
JPH04317313A (ja) * | 1991-02-22 | 1992-11-09 | Messerschmitt Boelkow Blohm Gmbh <Mbb> | シリコン半導体素子を接合するための方法 |
JP2000000036U (ja) * | 1996-01-12 | 2000-03-31 | 三菱マテリアル株式会社 | 半導体装置用軽量基板 |
JPH081644U (ja) * | 1996-04-12 | 1996-12-03 | 三菱マテリアル株式会社 | 半導体装置用軽量基板 |
JP2003068916A (ja) * | 2001-08-24 | 2003-03-07 | Sumitomo Electric Ind Ltd | 半導体素子収納用パッケージ |
JP2008177481A (ja) * | 2007-01-22 | 2008-07-31 | Hitachi Metals Ltd | 半導体センサー装置およびその製造方法 |
JP2010069599A (ja) * | 2008-09-22 | 2010-04-02 | Alps Electric Co Ltd | Memsセンサ |
JP2010238921A (ja) * | 2009-03-31 | 2010-10-21 | Alps Electric Co Ltd | Memsセンサ |
Also Published As
Publication number | Publication date |
---|---|
US20120299128A1 (en) | 2012-11-29 |
JPWO2011070625A1 (ja) | 2013-04-22 |
WO2011070625A1 (ja) | 2011-06-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5367842B2 (ja) | 半導体基板の接合方法およびmemsデバイス | |
JP5367841B2 (ja) | 半導体基板の接合方法およびmemsデバイス | |
JP4885956B2 (ja) | 微小電気機械システムのパッケージング及び配線 | |
US8729685B2 (en) | Bonding process and bonded structures | |
TWI498975B (zh) | 封裝結構與基材的接合方法 | |
JP2008218811A (ja) | 機能素子パッケージ | |
TWI566305B (zh) | 製造三維積體電路的方法 | |
JP2010093257A (ja) | ウェーハレベルの気密インターフェイスチップを実施するためのシステム及び方法 | |
JP5300470B2 (ja) | 半導体パッケージ及び同パッケージを形成する方法 | |
JP5021098B2 (ja) | 半導体基板の接合方法およびmemsデバイス | |
TW201718390A (zh) | 使用金屬矽化物形成的互補式金屬氧化物半導體微機電系統整合 | |
JP2010171368A (ja) | 半導体装置およびその製造方法 | |
JP2007067175A (ja) | 半導体装置の製造方法 | |
JP6062393B2 (ja) | 半導体装置の製造方法及び半導体装置 | |
KR100908648B1 (ko) | 복층 범프 구조물 및 그 제조 방법 | |
US8513091B2 (en) | Method for wafer bonding using gold and indium | |
JP2018085421A (ja) | 半導体装置 | |
JP4913928B2 (ja) | 電子デバイスおよび電子デバイスの製造方法 | |
JP5187341B2 (ja) | 半導体装置の製造方法 | |
JP2009117869A (ja) | 機能素子パッケージの製造方法 | |
JP2012079935A (ja) | 複合基板の製造方法、及び複合基板 | |
JP4913923B2 (ja) | 電子デバイスおよび電子デバイスの製造方法 | |
TW201604977A (zh) | 晶圓級封裝結構的製法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20130510 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20130510 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130820 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130911 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5367841 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |