JP5362186B2 - ナノインプリント用樹脂組成物 - Google Patents

ナノインプリント用樹脂組成物 Download PDF

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Publication number
JP5362186B2
JP5362186B2 JP2007078019A JP2007078019A JP5362186B2 JP 5362186 B2 JP5362186 B2 JP 5362186B2 JP 2007078019 A JP2007078019 A JP 2007078019A JP 2007078019 A JP2007078019 A JP 2007078019A JP 5362186 B2 JP5362186 B2 JP 5362186B2
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JP
Japan
Prior art keywords
group
resin composition
resin
acid
film
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Expired - Fee Related
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JP2007078019A
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English (en)
Japanese (ja)
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JP2008238416A (ja
JP2008238416A5 (enExample
Inventor
弘人 三宅
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Daicel Corp
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Daicel Corp
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Priority to JP2007078019A priority Critical patent/JP5362186B2/ja
Publication of JP2008238416A publication Critical patent/JP2008238416A/ja
Publication of JP2008238416A5 publication Critical patent/JP2008238416A5/ja
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Expired - Fee Related legal-status Critical Current
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP2007078019A 2007-03-24 2007-03-24 ナノインプリント用樹脂組成物 Expired - Fee Related JP5362186B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007078019A JP5362186B2 (ja) 2007-03-24 2007-03-24 ナノインプリント用樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007078019A JP5362186B2 (ja) 2007-03-24 2007-03-24 ナノインプリント用樹脂組成物

Publications (3)

Publication Number Publication Date
JP2008238416A JP2008238416A (ja) 2008-10-09
JP2008238416A5 JP2008238416A5 (enExample) 2010-01-14
JP5362186B2 true JP5362186B2 (ja) 2013-12-11

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ID=39910344

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JP2007078019A Expired - Fee Related JP5362186B2 (ja) 2007-03-24 2007-03-24 ナノインプリント用樹脂組成物

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JP (1) JP5362186B2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5729744B2 (ja) * 2008-12-26 2015-06-03 荒川化学工業株式会社 表面にパターンが形成された積層体
JP5625281B2 (ja) * 2009-08-07 2014-11-19 Dic株式会社 硬化性樹脂組成物、その硬化物、及びプラスチックレンズ
CN102939640B (zh) * 2010-04-19 2016-05-11 日产化学工业株式会社 高耐擦伤性压印材料
US9631081B2 (en) 2012-04-27 2017-04-25 Nissan Chemical Industries, Ltd. Imprint material
CN105008966B (zh) 2012-09-20 2019-12-03 3M创新有限公司 包含纳米颗粒和含有亚烷基氧重复单元的单体的微结构化膜
US9461355B2 (en) 2013-03-29 2016-10-04 Intel Corporation Method apparatus and material for radio frequency passives and antennas
WO2015105050A1 (en) 2014-01-07 2015-07-16 Toyo Gosei Co., Ltd. A composition and a method for manufacturing a component
CN114975098A (zh) * 2015-02-27 2022-08-30 佳能株式会社 纳米压印液体材料及其制造方法、固化产物图案的制造方法和电路板的制造方法
KR101930421B1 (ko) 2017-05-12 2018-12-19 한국기계연구원 나노마이크로기반 회절광학소자 및 이의 형성방법
US10705268B2 (en) * 2018-06-29 2020-07-07 Applied Materials, Inc. Gap fill of imprinted structure with spin coated high refractive index material for optical components
US12044963B2 (en) * 2020-01-22 2024-07-23 Applied Materials, Inc. High refractive index imprint compositions and materials and processes for making the same

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0725938A (ja) * 1993-07-15 1995-01-27 Daicel Chem Ind Ltd 硬化性ビニル重合体およびその製造方法
JPH08339081A (ja) * 1995-06-09 1996-12-24 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物及びその製造方法
JPH107747A (ja) * 1996-06-25 1998-01-13 Daicel Chem Ind Ltd 硬化性樹脂組成物
JP3751686B2 (ja) * 1996-07-02 2006-03-01 Ａｚエレクトロニックマテリアルズ株式会社 感光性樹脂組成物
JPH1017614A (ja) * 1996-07-05 1998-01-20 Daicel Chem Ind Ltd 光硬化性樹脂
JP2000191737A (ja) * 1998-12-28 2000-07-11 Daicel Chem Ind Ltd 硬化性樹脂組成物
JP2001106747A (ja) * 1999-08-02 2001-04-17 Toray Ind Inc 感光性樹脂組成物
JP4222770B2 (ja) * 2002-03-29 2009-02-12 リンテック株式会社 パターン形成用シートおよびパターン形成方法
DE10217151A1 (de) * 2002-04-17 2003-10-30 Clariant Gmbh Nanoimprint-Resist
JP4275468B2 (ja) * 2003-06-16 2009-06-10 大日本印刷株式会社 凹凸パターン形成材料、凹凸パターン受容体、凹凸パターン形成方法、転写箔、及び光学物品
JP4268910B2 (ja) * 2003-09-17 2009-05-27 大日本印刷株式会社 微細凹凸パターンの形成方法
JP4986059B2 (ja) * 2005-04-07 2012-07-25 日本化薬株式会社 反応性エポキシカルボキシレート化合物及びそれを用いた活性エネルギー線硬化性樹脂組成物
JP5000112B2 (ja) * 2005-09-09 2012-08-15 東京応化工業株式会社 ナノインプリントリソグラフィによるパターン形成方法

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