JP5346450B2 - 窒化物半導体発光素子 - Google Patents
窒化物半導体発光素子 Download PDFInfo
- Publication number
- JP5346450B2 JP5346450B2 JP2007165599A JP2007165599A JP5346450B2 JP 5346450 B2 JP5346450 B2 JP 5346450B2 JP 2007165599 A JP2007165599 A JP 2007165599A JP 2007165599 A JP2007165599 A JP 2007165599A JP 5346450 B2 JP5346450 B2 JP 5346450B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- well
- laser diode
- light emitting
- active layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of group III and group V of the periodic system
- H01L33/32—Materials of the light emitting region containing only elements of group III and group V of the periodic system containing nitrogen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2004—Confining in the direction perpendicular to the layer structure
- H01S5/2009—Confining in the direction perpendicular to the layer structure by using electron barrier layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
- H01S5/3072—Diffusion blocking layer, i.e. a special layer blocking diffusion of dopants
Description
14 拡散防止層、
16 ウェル層、
20 基板、
22 バッファ層、
24 n型GaN層、
26 n型コンタクト層、
28 n型クラッド層、
32 n型光ガイド層、
34 キャリア障壁層、
36 p型光ガイド層、
38 p型クラッド層、
42 p型コンタクト層、
44 p型電極、
46 n型電極、
55 活性層、
100 窒化物半導体レーザダイオード。
Claims (16)
- 活性層と、
活性層の一方の側にn型半導体層及びその他方の側にp型半導体層を備える積層構造物と、を有し、
前記活性層は、
Inx1Ga(1-x1)N(0<x1≦1)で形成されたウェル層と、
前記ウェル層の両側にInx2Ga(1-x2)N(0≦x2<1)で形成される障壁層と、
前記ウェル層と障壁層との間に設けられてインジウム拡散を防止する拡散防止層と、を備え、x1>x2であり、
前記拡散防止層は、Inx3Ga(1-x3)N(0≦x3<0.01)で形成されることを特徴とする発光素子。 - 前記拡散防止層の厚さは、0.2ないし6nmの範囲であることを特徴とする請求項1に記載の発光素子。
- 前記活性層は、前記ウェル層、前記拡散防止層及び前記障壁層が複数層反復して形成された多重量子ウェル構造を有することを特徴とする請求項1または2に記載の発光素子。
- 前記発光素子は、レーザダイオードであることを特徴とする請求項1〜3のいずれか一項に記載の発光素子。
- 前記拡散防止層は、前記ウェル層の両側面のうち一方の側面に形成されることを特徴とする請求項1〜4のいずれか一項に記載の発光素子。
- 前記拡散防止層は、前記ウェル層の両側面に形成されることを特徴とする請求項1〜4のいずれか一項に記載の発光素子。
- 活性層と、
活性層の両側のn型半導体層及びp型半導体層を備える積層構造物と、を有し、
前記活性層は、
Inx1Ga(1-x1)N(0.16≦x1≦0.20)で形成されたウェル層と、
前記ウェル層の両側にInx2Ga(1-x2)N(0.01≦x2≦0.04)で形成された障壁層と、
前記ウェル層と障壁層との間に形成されるものであって、Inx3Ga(1-x3)N(0≦x3<0.01)で形成される拡散防止層と、を備えることを特徴とするレーザダイオード。 - 前記拡散防止層は、GaNで形成されることを特徴とする請求項7に記載のレーザダイオード。
- 前記拡散防止層の厚さは、0.2ないし6nmであることを特徴とする請求項7または8に記載のレーザダイオード。
- 前記活性層は、前記ウェル層、前記拡散防止層及び前記障壁層が複数層反復して形成された多重量子ウェル構造であることを特徴とする請求項7〜9のいずれか一項に記載のレーザダイオード。
- 前記拡散防止層は、前記ウェル層の両側面のうち一側面に形成されることを特徴とする請求項7〜10のいずれか一項に記載のレーザダイオード。
- 前記拡散防止層は、前記ウェル層の両側面に形成されることを特徴とする請求項7〜10のいずれか一項に記載のレーザダイオード。
- 前記活性層は、400ないし600nmの波長帯域の光を発光することを特徴とする請求項7〜12のいずれか一項に記載のレーザダイオード。
- 前記ウェル層のインジウム組成は、16ないし20%の範囲であることを特徴とする請求項7〜13のいずれか一項に記載のレーザダイオード。
- 前記障壁層のインジウム組成は、1ないし5%の範囲であることを特徴とする請求項14に記載のレーザダイオード。
- 前記拡散防止層のエネルギーバンドギャップは、前記ウェル層のエネルギーバンドギャップより大きく、前記障壁層のエネルギーバンドギャップより大きいかまたは同じであることを特徴とする請求項7〜15のいずれか一項に記載のレーザダイオード。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2006-0057089 | 2006-06-23 | ||
KR1020060057089A KR100818269B1 (ko) | 2006-06-23 | 2006-06-23 | 질화물 반도체 발광소자 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008004947A JP2008004947A (ja) | 2008-01-10 |
JP5346450B2 true JP5346450B2 (ja) | 2013-11-20 |
Family
ID=38873535
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007165599A Active JP5346450B2 (ja) | 2006-06-23 | 2007-06-22 | 窒化物半導体発光素子 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8279904B2 (ja) |
JP (1) | JP5346450B2 (ja) |
KR (1) | KR100818269B1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100997908B1 (ko) * | 2008-09-10 | 2010-12-02 | 박은현 | 3족 질화물 반도체 발광소자 |
JP5332451B2 (ja) * | 2008-09-25 | 2013-11-06 | 豊田合成株式会社 | Iii族窒化物系化合物半導体発光素子及びその製造方法 |
US20100176374A1 (en) * | 2009-01-13 | 2010-07-15 | Samsung Electro-Mechanics Co., Ltd | Nitride semiconductor device |
KR101641972B1 (ko) * | 2010-12-02 | 2016-07-25 | 엘지전자 주식회사 | 질화물계 반도체 발광 소자 |
US8837547B2 (en) * | 2011-03-17 | 2014-09-16 | Finisar Corporation | Lasers with InGaAs quantum wells with InGaP barrier layers with reduced decomposition |
JP2015060978A (ja) * | 2013-09-19 | 2015-03-30 | 株式会社東芝 | 半導体発光素子及びその製造方法 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07122812A (ja) | 1993-10-27 | 1995-05-12 | Fujitsu Ltd | 半導体レーザ |
JP3735601B2 (ja) * | 1994-09-19 | 2006-01-18 | 株式会社東芝 | 化合物半導体装置の製造方法 |
JP3752306B2 (ja) * | 1996-05-09 | 2006-03-08 | 日本オプネクスト株式会社 | 半導体レ−ザ |
JP3304782B2 (ja) | 1996-09-08 | 2002-07-22 | 豊田合成株式会社 | 半導体発光素子 |
JP3985283B2 (ja) * | 1997-01-22 | 2007-10-03 | ソニー株式会社 | 発光素子 |
JP2004297098A (ja) * | 1998-12-15 | 2004-10-21 | Nichia Chem Ind Ltd | 窒化物半導体発光素子 |
US6437372B1 (en) * | 2000-01-07 | 2002-08-20 | Agere Systems Guardian Corp. | Diffusion barrier spikes for III-V structures |
JP2001298214A (ja) * | 2000-02-10 | 2001-10-26 | Sharp Corp | 半導体発光素子およびその製造方法 |
JP2001320135A (ja) * | 2000-02-28 | 2001-11-16 | Fuji Photo Film Co Ltd | 半導体レーザ装置 |
US6973109B2 (en) * | 2000-02-28 | 2005-12-06 | Fuji Photo Film Co., Ltd. | Semiconductor laser device having strain buffer layer between compressive-strain quantum well layer and tensile-strain barrier layer |
JP3871623B2 (ja) | 2001-07-26 | 2007-01-24 | 松下電器産業株式会社 | 半導体レーザ装置の製造方法 |
TW554601B (en) * | 2001-07-26 | 2003-09-21 | Matsushita Electric Ind Co Ltd | Semiconductor laser device and method for fabricating the same |
WO2003041234A1 (fr) * | 2001-11-05 | 2003-05-15 | Nichia Corporation | Element semi-conducteur |
US6841409B2 (en) * | 2002-01-17 | 2005-01-11 | Matsushita Electric Industrial Co., Ltd. | Group III-V compound semiconductor and group III-V compound semiconductor device using the same |
US6831293B2 (en) * | 2002-03-19 | 2004-12-14 | Showa Denko Kabushiki Kaisha | P-n junction-type compound semiconductor light-emitting device, production method thereof, lamp and light source |
JP2003297098A (ja) | 2002-03-28 | 2003-10-17 | Seiko Epson Corp | 半導体記憶装置 |
JPWO2004042832A1 (ja) | 2002-11-06 | 2006-03-09 | サンケン電気株式会社 | 半導体発光素子及びその製造方法 |
US6878959B2 (en) * | 2002-11-22 | 2005-04-12 | Agilent Technologies, Inc. | Group III-V semiconductor devices including semiconductor materials made by spatially-selective intermixing of atoms on the group V sublattice |
US7282744B2 (en) * | 2003-05-09 | 2007-10-16 | Cree, Inc. | III-nitride optoelectronic device structure with high Al AlGaN diffusion barrier |
JP4412918B2 (ja) | 2003-05-28 | 2010-02-10 | シャープ株式会社 | 窒化物半導体発光素子及びその製造方法 |
KR100476567B1 (ko) * | 2003-09-26 | 2005-03-17 | 삼성전기주식회사 | 질화물 반도체 소자 |
KR101045202B1 (ko) * | 2003-10-17 | 2011-06-30 | 삼성전자주식회사 | III-V 족 GaN 계 반도체 소자 및 그 제조방법 |
US20080089376A1 (en) * | 2004-09-21 | 2008-04-17 | Takayoshi Anan | Current Confining Structure and Semiconductor Laser |
JP5048236B2 (ja) * | 2005-11-10 | 2012-10-17 | 住友電気工業株式会社 | 半導体発光素子、および半導体発光素子を作製する方法 |
KR101234783B1 (ko) * | 2006-07-13 | 2013-02-20 | 삼성전자주식회사 | 질화물계 반도체 발광소자 및 그 제조방법 |
-
2006
- 2006-06-23 KR KR1020060057089A patent/KR100818269B1/ko active IP Right Grant
-
2007
- 2007-06-19 US US11/812,439 patent/US8279904B2/en active Active
- 2007-06-22 JP JP2007165599A patent/JP5346450B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
KR100818269B1 (ko) | 2008-04-01 |
US8279904B2 (en) | 2012-10-02 |
KR20070122078A (ko) | 2007-12-28 |
US20070297474A1 (en) | 2007-12-27 |
JP2008004947A (ja) | 2008-01-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5242039B2 (ja) | 窒化物半導体発光素子 | |
JP4875455B2 (ja) | 窒化物半導体発光素子 | |
TWI603500B (zh) | Nitride semiconductor light-emitting device | |
JP4971377B2 (ja) | 窒化物半導体素子 | |
EP2843714B1 (en) | Semiconductor light emitting device including hole injection layer and method of fabricating the same. | |
JP4892618B2 (ja) | 半導体発光素子 | |
KR101018217B1 (ko) | 질화물 반도체 소자 | |
JP2007305851A (ja) | 窒化物半導体発光素子 | |
JP5346450B2 (ja) | 窒化物半導体発光素子 | |
JP2008288397A (ja) | 半導体発光装置 | |
JP2010171272A (ja) | 発光素子 | |
JP2007109885A (ja) | 半導体発光装置及びその製造方法 | |
JP4955202B2 (ja) | III−V族GaN系半導体素子及びその製造方法 | |
KR101025971B1 (ko) | 질화물 반도체 발광소자 | |
US7053418B2 (en) | Nitride based semiconductor device | |
KR20100049451A (ko) | 질화물 반도체 소자 | |
TWI567877B (zh) | Manufacturing method of nitride semiconductor device | |
JP5337862B2 (ja) | 半導体発光素子 | |
JP2010080741A (ja) | 半導体発光素子 | |
KR101018116B1 (ko) | 질화물 반도체 소자 및 그 제조방법 | |
JP2011066047A (ja) | 窒化物半導体発光素子 | |
KR101063286B1 (ko) | 확산방지층을 갖는 발광다이오드 | |
JP5554387B2 (ja) | 半導体発光素子 | |
JP2007201141A (ja) | 窒化物半導体素子及び窒化物半導体素子の製造方法 | |
JP4055794B2 (ja) | 窒化ガリウム系化合物半導体発光素子 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100129 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100422 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20100422 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20100422 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100607 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20120326 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120605 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20120816 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120905 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20121114 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130507 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130724 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130813 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130819 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5346450 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |