JP5327760B2 - 溶射用水反応性Al複合材料、水反応性Al溶射膜、このAl溶射膜の製造方法、及び成膜室用構成部材 - Google Patents
溶射用水反応性Al複合材料、水反応性Al溶射膜、このAl溶射膜の製造方法、及び成膜室用構成部材 Download PDFInfo
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- 239000002131 composite material Substances 0.000 title claims description 28
- 238000007751 thermal spraying Methods 0.000 title claims description 8
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 230000015572 biosynthetic process Effects 0.000 title description 13
- 239000012535 impurity Substances 0.000 claims description 70
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 50
- 239000000463 material Substances 0.000 claims description 48
- 229910052738 indium Inorganic materials 0.000 claims description 46
- 238000000034 method Methods 0.000 claims description 43
- 239000000758 substrate Substances 0.000 claims description 36
- 229910052797 bismuth Inorganic materials 0.000 claims description 32
- 230000008021 deposition Effects 0.000 claims description 27
- 229910052782 aluminium Inorganic materials 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 238000005507 spraying Methods 0.000 claims description 16
- 229910018117 Al-In Inorganic materials 0.000 claims description 12
- 229910018456 Al—In Inorganic materials 0.000 claims description 12
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- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 7
- 206010040844 Skin exfoliation Diseases 0.000 description 7
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- 239000011248 coating agent Substances 0.000 description 6
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- 238000011084 recovery Methods 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
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- 238000007733 ion plating Methods 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- 229910002706 AlOOH Inorganic materials 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
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- 239000007864 aqueous solution Substances 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
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- 229910052697 platinum Inorganic materials 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
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- 230000007613 environmental effect Effects 0.000 description 1
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- 229910052742 iron Inorganic materials 0.000 description 1
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- 239000012528 membrane Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
- C23C4/08—Metallic material containing only metal elements
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/18—After-treatment
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Coating By Spraying Or Casting (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Treatment Of Metals (AREA)
- Chemical Vapour Deposition (AREA)
Description
本発明の水反応性Al複合材料からなるAl膜は、所定量の不純物Cuを含むAl中にIn及び/又はBiが均一に高度に分散しているので、水、水蒸気、水溶液等のような水分の存在する雰囲気中で容易に反応して溶解する。
不純物Cu量が40ppm以下である4NAl及びIn又はBiを用意し、このAlに対して、2〜5wt%のIn又は0.7〜1.4wt%のBiを配合し、Al中にIn又はBiを均一に溶解させて、ロッド又はワイヤー形状に加工した物を溶射材料として用い、例えばフレーム溶射法により、公知の溶射条件で、成膜装置の防着板等の成膜室用構成部材となる基材の表面に吹き付けて急冷凝固させ、被覆することにより所望の水反応性Al溶射膜を備えた基材を製造することができる。かくして得られたAl溶射膜は、上記したように、Al結晶粒中にIn又はBi高度に分散した状態で存在している膜である。
不純物Cu量が40ppm以下である4NAl、In及びSiを用意し、このAlに対して、2〜5wt%のIn、及び4NAl中の不純物Si量を勘案し、不純物Si量との合計で0.04〜0.6wt%、好ましくは0.04〜0.2wt%となる量のSiを配合し、Al中にIn及びSiを均一に溶解させて、ロッド又はワイヤー形状に加工した物を溶射材料として用い、例えばフレーム溶射法により、成膜装置の防着板等の成膜室用構成部材となる基材の表面に吹き付けて急冷凝固させ、被覆することにより所望の水反応性Al溶射膜を備えた基材を製造することができる。かくして得られたAl溶射膜は、上記したように、Al結晶粒中にInが均一に高度に分散した状態で存在している膜である。
・3NAl(不純物Cu:70ppm)−3wt%In
・3NAl(不純物Cu:検出限界以下)−3wt%In
・4NAl(不純物Cu:検出限界以下)−3wt%In
・4NAl(不純物Cu:<10ppm)−3wt%In
・4NAl(不純物Cu:40ppm)−2.5wt%In
・4NAl(不純物Cu:40ppm)−3wt%In
・4NAl(不純物Cu:10ppm)−3wt%In
・4NAl(不純物Cu:20ppm)−3wt%In
・4NAl(不純物Cu:30ppm)−2.5wt%In
・4NAl(不純物Cu:10ppm以下)−3wt%In−0.1wt%Si
・4NAl(不純物Cu:10ppm以下)−4wt%In−0.5wt%Si
・5NAl(不純物Cu:10ppm以下)−1.5wt%In−0.05wt%Si
・5NAl(不純物Cu:10ppm以下)−2.6wt%In−0.1wt%Si
・5NAl(不純物Cu:10ppm以下)−3.5wt%In−0.5wt%Si
・4NAl(不純物Cu:10ppm)−0.75wt%Bi
・4NAl(不純物Cu:20ppm)−1wt%Bi−0.25wt%Si
・4NAl(不純物Cu:30ppm)−1wt%Bi−0.5wt%Si
・4NAl(不純物Cu:40ppm)−1.4wt%Bi−0.7wt%Si
・4NAl(不純物Cu:10ppm)−1wt%Bi−0.85wt%Si
Claims (5)
- 不純物Cu量が40ppm以下である2NAl〜5NAlから選ばれたAlに、Al基準で、2〜5wt%のIn及び0.7〜1.4wt%のBiから選ばれた少なくとも一種の金属を添加してなり、さらに、Al中に存在する不純物Si量との合計で、Al−Inの場合0.04〜0.6wt%、Al−Biの場合0.25〜0.7wt%となる量のSiを添加してなることを特徴とする溶射用水反応性Al複合材料。
- 不純物Cu量が40ppm以下である2NAl〜5NAlから選ばれたAlに、Al基準で、2〜5wt%のIn及び0.7〜1.4wt%のBiから選ばれた少なくとも一種の金属に、さらに、Al中に存在する不純物Si量との合計でAl−Inの場合0.04〜0.6wt%、Al−Biの場合0.25〜0.7wt%となる量のSiを添加してなる材料を組成が均一になるように溶融し、この溶融材料を基材表面に対して溶射して急冷凝固させることにより成膜することを特徴とする水反応性Al溶射膜の製造方法。
- 請求項1記載の溶射用水反応性Al複合材料からなることを特徴とする水反応性Al溶射膜。
- 請求項1記載の溶射用水反応性Al複合材料からなる水反応性Al溶射膜又は請求項2記載の方法により製造された水反応性Al溶射膜を表面に備えたことを特徴とする成膜装置の成膜室用構成部材。
- 前記構成部材が、防着板、シャッター又はマスクであることを特徴とする請求項4記載の成膜室用構成部材。
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JP2010510109A JP5327760B2 (ja) | 2008-04-30 | 2009-04-27 | 溶射用水反応性Al複合材料、水反応性Al溶射膜、このAl溶射膜の製造方法、及び成膜室用構成部材 |
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JP2008118854 | 2008-04-30 | ||
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JP2010510109A JP5327760B2 (ja) | 2008-04-30 | 2009-04-27 | 溶射用水反応性Al複合材料、水反応性Al溶射膜、このAl溶射膜の製造方法、及び成膜室用構成部材 |
PCT/JP2009/058258 WO2009133839A1 (ja) | 2008-04-30 | 2009-04-27 | 水反応性Al複合材料、水反応性Al膜、このAl膜の製造方法、及び成膜室用構成部材 |
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US (1) | US20110041761A1 (ja) |
EP (1) | EP2284290B1 (ja) |
JP (1) | JP5327760B2 (ja) |
KR (1) | KR20100136558A (ja) |
CN (1) | CN102016102B (ja) |
MY (1) | MY152678A (ja) |
RU (1) | RU2468117C2 (ja) |
SG (1) | SG189749A1 (ja) |
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WO2016035599A1 (ja) * | 2014-09-05 | 2016-03-10 | 株式会社アルバック | 水反応性Al複合材料、水反応性Al合金溶射膜、このAl合金溶射膜の製造方法、及び成膜室用構成部材 |
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CN103270187A (zh) * | 2010-12-27 | 2013-08-28 | 夏普株式会社 | 蒸镀装置和回收装置 |
JP6726523B2 (ja) * | 2016-05-10 | 2020-07-22 | 株式会社アルバック | 水分検出素子製造方法、水崩壊性配線膜製造方法、水崩壊性薄膜製造方法、水分検出素子 |
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JPS6280287A (ja) * | 1985-10-03 | 1987-04-13 | Mitsubishi Alum Co Ltd | Al合金製犠牲陽極材 |
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JPH1030896A (ja) * | 1996-07-17 | 1998-02-03 | Furukawa Electric Co Ltd:The | 高耐食性アルミニウムチューブの製造方法および前記方法により製造された高耐食性アルミニウムチューブ |
JP2005256063A (ja) * | 2004-03-10 | 2005-09-22 | Ulvac Japan Ltd | 水崩壊性Al複合材料、この材料からなるAl膜、Al粉及びこれらの製造方法、並びに成膜室用構成部材及び成膜材料の回収方法 |
JP2006002223A (ja) * | 2004-06-18 | 2006-01-05 | Sumitomo Precision Prod Co Ltd | 耐食性被膜 |
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- 2009-04-27 SG SG2013025465A patent/SG189749A1/en unknown
- 2009-04-27 RU RU2010148774/02A patent/RU2468117C2/ru active
- 2009-04-27 EP EP09738776.5A patent/EP2284290B1/en active Active
- 2009-04-27 WO PCT/JP2009/058258 patent/WO2009133839A1/ja active Application Filing
- 2009-04-27 KR KR1020107026605A patent/KR20100136558A/ko not_active Application Discontinuation
- 2009-04-27 JP JP2010510109A patent/JP5327760B2/ja active Active
- 2009-04-27 CN CN200980115456.XA patent/CN102016102B/zh active Active
- 2009-04-27 MY MYPI20104873 patent/MY152678A/en unknown
- 2009-04-27 US US12/989,991 patent/US20110041761A1/en not_active Abandoned
- 2009-04-29 TW TW98114184A patent/TWI471429B/zh active
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2016035599A1 (ja) * | 2014-09-05 | 2016-03-10 | 株式会社アルバック | 水反応性Al複合材料、水反応性Al合金溶射膜、このAl合金溶射膜の製造方法、及び成膜室用構成部材 |
JP5899387B1 (ja) * | 2014-09-05 | 2016-04-06 | 株式会社アルバック | 水反応性Al複合材料、水反応性Al合金溶射膜、このAl合金溶射膜の製造方法、及び成膜室用構成部材 |
KR20160130322A (ko) * | 2014-09-05 | 2016-11-10 | 가부시키가이샤 알박 | 수반응성 Al 복합 재료, 수반응성 Al 합금 용사막, 이 Al 합금 용사막의 제조 방법, 및 성막실용 구성 부재 |
KR101702282B1 (ko) | 2014-09-05 | 2017-02-03 | 가부시키가이샤 알박 | 수반응성 Al 복합 재료, 수반응성 Al 합금 용사막, 이 Al 합금 용사막의 제조 방법, 및 성막실용 구성 부재 |
Also Published As
Publication number | Publication date |
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EP2284290B1 (en) | 2016-08-03 |
EP2284290A1 (en) | 2011-02-16 |
US20110041761A1 (en) | 2011-02-24 |
WO2009133839A1 (ja) | 2009-11-05 |
CN102016102B (zh) | 2012-07-11 |
MY152678A (en) | 2014-10-31 |
KR20100136558A (ko) | 2010-12-28 |
JPWO2009133839A1 (ja) | 2011-09-01 |
SG189749A1 (en) | 2013-05-31 |
CN102016102A (zh) | 2011-04-13 |
EP2284290A4 (en) | 2011-04-20 |
RU2468117C2 (ru) | 2012-11-27 |
TWI471429B (zh) | 2015-02-01 |
TW201005107A (en) | 2010-02-01 |
RU2010148774A (ru) | 2012-06-10 |
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