JP5371964B2 - 水反応性Al膜の製造方法及び成膜室用構成部材 - Google Patents
水反応性Al膜の製造方法及び成膜室用構成部材 Download PDFInfo
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- JP5371964B2 JP5371964B2 JP2010510106A JP2010510106A JP5371964B2 JP 5371964 B2 JP5371964 B2 JP 5371964B2 JP 2010510106 A JP2010510106 A JP 2010510106A JP 2010510106 A JP2010510106 A JP 2010510106A JP 5371964 B2 JP5371964 B2 JP 5371964B2
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
- C23C4/08—Metallic material containing only metal elements
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/18—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/18—After-treatment
- C23C4/185—Separation of the coating from the substrate
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Coating By Spraying Or Casting (AREA)
- Physical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Description
・3NAl−3wt%In
・3NAl−4wt%In
・4NAl−2wt%In
・4NAl−3wt%In
・4NAl−4wt%In
・5NAl−1.5wt%In
・5NAl−2.5wt%In
・5NAl−3.5wt%In
・3NAl−3wt%In(吹き付けガス:N2)
・3NAl−3wt%In(吹き付けガス:Air)
・4NAl−3wt%In(吹き付けガス:N2)
・4NAl−3wt%In(吹き付けガス:Air)
・4NAl−3wt%In−0.05wt%Si(このうち、不純物Si:90ppm)
・4NAl−3wt%In−0.1wt%Si(このうち、不純物Si:100ppm)
・4NAl−3wt%In−0.2wt%Si(このうち、不純物Si:100ppm)
・4NAl−2.6wt%In−0.5wt%Si(このうち、不純物Si:100ppm)
・4NAl−3wt%In−0.1wt%Si(このうち、不純物Si:100ppm)
・4NAl−4wt%In−0.5wt%Si(このうち、不純物Si:100ppm)
・5NAl−1.5wt%In−0.05wt%Si(このうち、不純物Si:100ppm)
・5NAl−2.6wt%In−0.1wt%Si(このうち、不純物Si:100ppm)
・5NAl−3.5wt%In−0.5wt%Si(このうち、不純物Si:100ppm)
Alとして2NAl及び4NAlを用い、以下のAl−Bi組成におけるAl純度とBi濃度と得られた溶射膜の溶解性との関係を比較検討した。Biの添加量は、Al重量基準である。
・ 2NAl−0.5wt%Bi
・ 2NAl−1wt%Bi
・ 4NAl−0.2wt%Bi
・ 4NAl−0.5wt%Bi
・ 4NAl−1wt%Bi
参考例1の結果に鑑み、4NAlを用い、Bi及びSiを添加(不純物Si量との合計量)したAl−Bi−Si組成におけるBi添加量と、Si添加量と、得られた溶射膜の溶解性との関係を検討した。Bi及びSiの添加量は、Al重量基準である。
・4NAl−1wt%Bi−0.25wt%Si(このうち、不純物Si:90pm)
・4NAl−1wt%Bi−0.5wt%Si(このうち、不純物Si:100ppm)
・4NAl−1.4wt%Bi−0.7wt%Si(このうち、不純物Si:100ppm)
・4NAl−1wt%Bi−0.85wt%Si(このうち、不純物Si:100ppm)
参考例2で得られた4NAl−1wt%Bi−0.5wt%Si溶射膜(膜厚200μm)で表面が被覆された防着板を設けたスパッタリング装置を用いて白金(Pt)成膜を30サイクル実施した後、このPtの付着した防着板を取り外し、80℃の温水により処理したところ、20分で溶射膜が溶解し、Ptの付着膜が防着板から剥離した。このため、成膜材料であるPtを容易に回収できた。この際、温水中にはBiの他にAlOOHが沈殿していた。
2NAl、3NAl及び4NAlを用い、Inを添加したAl−In組成におけるAl純度と、Al中の不純物Cu量と、得られた溶射膜の溶解性との関係を検討した。Inの添加量は、Al重量基準である。
・3NAl(不純物Cu:70ppm)−3wt%In
・3NAl(不純物Cu:検出限界以下)−3wt%In
・4NAl(不純物Cu:検出限界以下)−3wt%In
本参考例では、4NAlを用い、Inを添加したAl−In組成における不純物Cuの量と、得られた溶射膜の溶解性との関係を検討した。Inの添加量は、Al重量基準である。
・4NAl(不純物Cu:<10ppm)−3wt%In
・4NAl(不純物Cu:40ppm)−2.5wt%In
・4NAl(不純物Cu:40ppm)−3wt%In
・4NAl(不純物Cu:10ppm)−3wt%In
・4NAl(不純物Cu:20ppm)−3wt%In
・4NAl(不純物Cu:30ppm)−2.5wt%In
Claims (4)
- 4NAl又は5NAlに、Al基準で、2〜5wt%のInを添加した材料を組成が均一になるように溶融し、この溶融材料を、フレーム溶射法により基材表面に対して溶射して急冷凝固させることにより、Al結晶粒中にInが均一に分散してなるAl膜であって、このAl膜に、成膜装置内で実施される成膜プロセスによる上限温度が300〜350℃の熱履歴を受けさせた後、40〜130℃の温水に浸漬して溶解した際の溶解電流密度が50mA/cm2以上であるAl膜を形成することを特徴とする水反応性Al膜の製造方法。
- 4NAl又は5NAlに、Al基準で、2〜5wt%のIn、及びAl中の不純物Si量を勘案して、不純物Si量との合計で0.04〜0.6wt%となる量のSiを添加した材料を組成が均一になるように溶融し、この溶融材料を、フレーム溶射法により基材表面に対して溶射し、急冷凝固させることにより、Al結晶粒中にInが均一に分散してなるAl膜を形成することを特徴とする水反応性Al膜の製造方法。
- 請求項1又は2記載の方法により製造された水反応性Al膜を表面に備えたことを特徴とする成膜装置の成膜室用構成部材。
- 前記構成部材が、防着板、シャッター又はマスクであることを特徴とする請求項3記載の成膜室用構成部材。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010510106A JP5371964B2 (ja) | 2008-04-30 | 2009-04-27 | 水反応性Al膜の製造方法及び成膜室用構成部材 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008118857 | 2008-04-30 | ||
JP2008118857 | 2008-04-30 | ||
PCT/JP2009/058255 WO2009133836A1 (ja) | 2008-04-30 | 2009-04-27 | 水反応性Al膜の製造方法及び成膜室用構成部材 |
JP2010510106A JP5371964B2 (ja) | 2008-04-30 | 2009-04-27 | 水反応性Al膜の製造方法及び成膜室用構成部材 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2009133836A1 JPWO2009133836A1 (ja) | 2011-09-01 |
JP5371964B2 true JP5371964B2 (ja) | 2013-12-18 |
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Application Number | Title | Priority Date | Filing Date |
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JP2010510106A Active JP5371964B2 (ja) | 2008-04-30 | 2009-04-27 | 水反応性Al膜の製造方法及び成膜室用構成部材 |
Country Status (10)
Country | Link |
---|---|
US (1) | US20110041760A1 (ja) |
EP (1) | EP2281914B1 (ja) |
JP (1) | JP5371964B2 (ja) |
KR (1) | KR20100135323A (ja) |
CN (1) | CN102016100B (ja) |
MY (1) | MY152991A (ja) |
RU (1) | RU2468116C2 (ja) |
SG (1) | SG189755A1 (ja) |
TW (1) | TWI465605B (ja) |
WO (1) | WO2009133836A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AT391183B (de) * | 1988-09-14 | 1990-08-27 | Alois Liemberger Fa | Beleuchtungskoerper |
RU2466205C2 (ru) * | 2008-04-30 | 2012-11-10 | Улвак, Инк. | РЕАГИРУЮЩИЙ С ВОДОЙ Al КОМПОЗИТНЫЙ МАТЕРИАЛ, РЕАГИРУЮЩАЯ С ВОДОЙ Al ПЛЕНКА, СПОСОБ ПОЛУЧЕНИЯ ДАННОЙ Al ПЛЕНКИ И СОСТАВЛЯЮЩИЙ ЭЛЕМЕНТ ПЛЕНКООБРАЗУЮЩЕЙ КАМЕРЫ |
US20130276701A1 (en) | 2010-12-27 | 2013-10-24 | Sharp Kabushiki Kaisha | Deposition device, and collection device |
CN103240484A (zh) * | 2012-02-01 | 2013-08-14 | 上海科秉电子科技有限公司 | 一种用于u型槽内层表面的粗糙化方法 |
ITBA20130034A1 (it) * | 2013-04-30 | 2014-10-31 | Mrs S R L | Metodo per la pulizia di superfici in apparati di deposizione di film sottili da fase vapore e per il recupero del materiale rimosso |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62290888A (ja) * | 1974-12-23 | 1987-12-17 | オロンジオ デ ノラ エス エイ | アルミニウム合金陽極の性能改良法 |
JPH1030896A (ja) * | 1996-07-17 | 1998-02-03 | Furukawa Electric Co Ltd:The | 高耐食性アルミニウムチューブの製造方法および前記方法により製造された高耐食性アルミニウムチューブ |
JP2005256063A (ja) * | 2004-03-10 | 2005-09-22 | Ulvac Japan Ltd | 水崩壊性Al複合材料、この材料からなるAl膜、Al粉及びこれらの製造方法、並びに成膜室用構成部材及び成膜材料の回収方法 |
JP2006002223A (ja) * | 2004-06-18 | 2006-01-05 | Sumitomo Precision Prod Co Ltd | 耐食性被膜 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3960606A (en) * | 1975-03-12 | 1976-06-01 | Southwire Company | Aluminum silicon alloy and method of preparation thereof |
JPH0637074A (ja) * | 1992-07-17 | 1994-02-10 | Fujitsu Ltd | 半導体製造装置のクリーニング方法 |
JP2002317267A (ja) * | 2001-04-17 | 2002-10-31 | Nec Kagoshima Ltd | 薄膜製造方法 |
RU2213802C2 (ru) * | 2001-09-28 | 2003-10-10 | Федеральное государственное унитарное предприятие "Московское машиностроительное производственное предприятие "Салют" | Способ нанесения покрытий на сплавы |
RU2212473C1 (ru) * | 2002-01-24 | 2003-09-20 | Федеральное государственное унитарное предприятие "Московское машиностроительное производственное предприятие "Салют" | Способ нанесения покрытий на сплавы |
US7579067B2 (en) * | 2004-11-24 | 2009-08-25 | Applied Materials, Inc. | Process chamber component with layered coating and method |
JP5371966B2 (ja) * | 2008-04-30 | 2013-12-18 | 株式会社アルバック | 水反応性Al膜の製造方法及び成膜室用構成部材 |
WO2012026349A1 (ja) * | 2010-08-27 | 2012-03-01 | 株式会社アルバック | 水反応性Al複合材料、水反応性Al溶射膜、このAl溶射膜の製造方法、及び成膜室用構成部材 |
-
2009
- 2009-04-27 WO PCT/JP2009/058255 patent/WO2009133836A1/ja active Application Filing
- 2009-04-27 US US12/989,974 patent/US20110041760A1/en not_active Abandoned
- 2009-04-27 MY MYPI20104894 patent/MY152991A/en unknown
- 2009-04-27 JP JP2010510106A patent/JP5371964B2/ja active Active
- 2009-04-27 EP EP09738773.2A patent/EP2281914B1/en active Active
- 2009-04-27 SG SG2013025556A patent/SG189755A1/en unknown
- 2009-04-27 CN CN2009801154095A patent/CN102016100B/zh active Active
- 2009-04-27 KR KR1020107026608A patent/KR20100135323A/ko active Search and Examination
- 2009-04-27 RU RU2010148765/02A patent/RU2468116C2/ru active
- 2009-04-29 TW TW098114187A patent/TWI465605B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62290888A (ja) * | 1974-12-23 | 1987-12-17 | オロンジオ デ ノラ エス エイ | アルミニウム合金陽極の性能改良法 |
JPH1030896A (ja) * | 1996-07-17 | 1998-02-03 | Furukawa Electric Co Ltd:The | 高耐食性アルミニウムチューブの製造方法および前記方法により製造された高耐食性アルミニウムチューブ |
JP2005256063A (ja) * | 2004-03-10 | 2005-09-22 | Ulvac Japan Ltd | 水崩壊性Al複合材料、この材料からなるAl膜、Al粉及びこれらの製造方法、並びに成膜室用構成部材及び成膜材料の回収方法 |
JP2006002223A (ja) * | 2004-06-18 | 2006-01-05 | Sumitomo Precision Prod Co Ltd | 耐食性被膜 |
Also Published As
Publication number | Publication date |
---|---|
KR20100135323A (ko) | 2010-12-24 |
JPWO2009133836A1 (ja) | 2011-09-01 |
RU2468116C2 (ru) | 2012-11-27 |
EP2281914B1 (en) | 2015-02-25 |
WO2009133836A1 (ja) | 2009-11-05 |
TW201009121A (en) | 2010-03-01 |
US20110041760A1 (en) | 2011-02-24 |
CN102016100B (zh) | 2013-04-10 |
EP2281914A4 (en) | 2011-04-20 |
CN102016100A (zh) | 2011-04-13 |
EP2281914A1 (en) | 2011-02-09 |
MY152991A (en) | 2014-12-31 |
SG189755A1 (en) | 2013-05-31 |
TWI465605B (zh) | 2014-12-21 |
RU2010148765A (ru) | 2012-06-10 |
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