JP5371964B2 - 水反応性Al膜の製造方法及び成膜室用構成部材 - Google Patents
水反応性Al膜の製造方法及び成膜室用構成部材 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 56
- 238000000034 method Methods 0.000 claims abstract description 44
- 239000000470 constituent Substances 0.000 claims abstract description 20
- 238000010285 flame spraying Methods 0.000 claims abstract description 18
- 239000000203 mixture Substances 0.000 claims abstract description 18
- 239000012768 molten material Substances 0.000 claims abstract description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 60
- 229910052738 indium Inorganic materials 0.000 claims description 55
- 239000012535 impurity Substances 0.000 claims description 50
- 239000000758 substrate Substances 0.000 claims description 41
- 229910052710 silicon Inorganic materials 0.000 claims description 40
- 238000004090 dissolution Methods 0.000 claims description 35
- 230000008021 deposition Effects 0.000 claims description 24
- 239000013078 crystal Substances 0.000 claims description 15
- 238000005507 spraying Methods 0.000 abstract description 32
- 230000008018 melting Effects 0.000 abstract description 5
- 238000002844 melting Methods 0.000 abstract description 5
- 239000002994 raw material Substances 0.000 abstract 2
- 238000010791 quenching Methods 0.000 abstract 1
- 230000000171 quenching effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 278
- 238000010438 heat treatment Methods 0.000 description 53
- 239000007789 gas Substances 0.000 description 43
- 239000007921 spray Substances 0.000 description 34
- 239000012298 atmosphere Substances 0.000 description 28
- 238000000151 deposition Methods 0.000 description 23
- 229910052782 aluminium Inorganic materials 0.000 description 21
- 238000006243 chemical reaction Methods 0.000 description 21
- 230000000694 effects Effects 0.000 description 21
- 229910052797 bismuth Inorganic materials 0.000 description 18
- 239000002131 composite material Substances 0.000 description 15
- 239000007788 liquid Substances 0.000 description 15
- 238000007654 immersion Methods 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- 239000002585 base Substances 0.000 description 13
- 229910018117 Al-In Inorganic materials 0.000 description 12
- 229910018456 Al—In Inorganic materials 0.000 description 12
- 238000012545 processing Methods 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 11
- 230000009257 reactivity Effects 0.000 description 10
- 230000007423 decrease Effects 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 206010040844 Skin exfoliation Diseases 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 238000007664 blowing Methods 0.000 description 8
- 238000001816 cooling Methods 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 150000002739 metals Chemical class 0.000 description 6
- 238000011084 recovery Methods 0.000 description 6
- 238000001514 detection method Methods 0.000 description 5
- 238000007751 thermal spraying Methods 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 229910002706 AlOOH Inorganic materials 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 238000007733 ion plating Methods 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 150000002736 metal compounds Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000007712 rapid solidification Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
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- 238000009718 spray deposition Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
- C23C4/08—Metallic material containing only metal elements
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/18—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/18—After-treatment
- C23C4/185—Separation of the coating from the substrate
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Coating By Spraying Or Casting (AREA)
- Physical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Description
・3NAl−3wt%In
・3NAl−4wt%In
・4NAl−2wt%In
・4NAl−3wt%In
・4NAl−4wt%In
・5NAl−1.5wt%In
・5NAl−2.5wt%In
・5NAl−3.5wt%In
・3NAl−3wt%In(吹き付けガス:N2)
・3NAl−3wt%In(吹き付けガス:Air)
・4NAl−3wt%In(吹き付けガス:N2)
・4NAl−3wt%In(吹き付けガス:Air)
・4NAl−3wt%In−0.05wt%Si(このうち、不純物Si:90ppm)
・4NAl−3wt%In−0.1wt%Si(このうち、不純物Si:100ppm)
・4NAl−3wt%In−0.2wt%Si(このうち、不純物Si:100ppm)
・4NAl−2.6wt%In−0.5wt%Si(このうち、不純物Si:100ppm)
・4NAl−3wt%In−0.1wt%Si(このうち、不純物Si:100ppm)
・4NAl−4wt%In−0.5wt%Si(このうち、不純物Si:100ppm)
・5NAl−1.5wt%In−0.05wt%Si(このうち、不純物Si:100ppm)
・5NAl−2.6wt%In−0.1wt%Si(このうち、不純物Si:100ppm)
・5NAl−3.5wt%In−0.5wt%Si(このうち、不純物Si:100ppm)
Alとして2NAl及び4NAlを用い、以下のAl−Bi組成におけるAl純度とBi濃度と得られた溶射膜の溶解性との関係を比較検討した。Biの添加量は、Al重量基準である。
・ 2NAl−0.5wt%Bi
・ 2NAl−1wt%Bi
・ 4NAl−0.2wt%Bi
・ 4NAl−0.5wt%Bi
・ 4NAl−1wt%Bi
参考例1の結果に鑑み、4NAlを用い、Bi及びSiを添加(不純物Si量との合計量)したAl−Bi−Si組成におけるBi添加量と、Si添加量と、得られた溶射膜の溶解性との関係を検討した。Bi及びSiの添加量は、Al重量基準である。
・4NAl−1wt%Bi−0.25wt%Si(このうち、不純物Si:90pm)
・4NAl−1wt%Bi−0.5wt%Si(このうち、不純物Si:100ppm)
・4NAl−1.4wt%Bi−0.7wt%Si(このうち、不純物Si:100ppm)
・4NAl−1wt%Bi−0.85wt%Si(このうち、不純物Si:100ppm)
参考例2で得られた4NAl−1wt%Bi−0.5wt%Si溶射膜(膜厚200μm)で表面が被覆された防着板を設けたスパッタリング装置を用いて白金(Pt)成膜を30サイクル実施した後、このPtの付着した防着板を取り外し、80℃の温水により処理したところ、20分で溶射膜が溶解し、Ptの付着膜が防着板から剥離した。このため、成膜材料であるPtを容易に回収できた。この際、温水中にはBiの他にAlOOHが沈殿していた。
2NAl、3NAl及び4NAlを用い、Inを添加したAl−In組成におけるAl純度と、Al中の不純物Cu量と、得られた溶射膜の溶解性との関係を検討した。Inの添加量は、Al重量基準である。
・3NAl(不純物Cu:70ppm)−3wt%In
・3NAl(不純物Cu:検出限界以下)−3wt%In
・4NAl(不純物Cu:検出限界以下)−3wt%In
本参考例では、4NAlを用い、Inを添加したAl−In組成における不純物Cuの量と、得られた溶射膜の溶解性との関係を検討した。Inの添加量は、Al重量基準である。
・4NAl(不純物Cu:<10ppm)−3wt%In
・4NAl(不純物Cu:40ppm)−2.5wt%In
・4NAl(不純物Cu:40ppm)−3wt%In
・4NAl(不純物Cu:10ppm)−3wt%In
・4NAl(不純物Cu:20ppm)−3wt%In
・4NAl(不純物Cu:30ppm)−2.5wt%In
Claims (4)
- 4NAl又は5NAlに、Al基準で、2〜5wt%のInを添加した材料を組成が均一になるように溶融し、この溶融材料を、フレーム溶射法により基材表面に対して溶射して急冷凝固させることにより、Al結晶粒中にInが均一に分散してなるAl膜であって、このAl膜に、成膜装置内で実施される成膜プロセスによる上限温度が300〜350℃の熱履歴を受けさせた後、40〜130℃の温水に浸漬して溶解した際の溶解電流密度が50mA/cm2以上であるAl膜を形成することを特徴とする水反応性Al膜の製造方法。
- 4NAl又は5NAlに、Al基準で、2〜5wt%のIn、及びAl中の不純物Si量を勘案して、不純物Si量との合計で0.04〜0.6wt%となる量のSiを添加した材料を組成が均一になるように溶融し、この溶融材料を、フレーム溶射法により基材表面に対して溶射し、急冷凝固させることにより、Al結晶粒中にInが均一に分散してなるAl膜を形成することを特徴とする水反応性Al膜の製造方法。
- 請求項1又は2記載の方法により製造された水反応性Al膜を表面に備えたことを特徴とする成膜装置の成膜室用構成部材。
- 前記構成部材が、防着板、シャッター又はマスクであることを特徴とする請求項3記載の成膜室用構成部材。
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PCT/JP2009/058255 WO2009133836A1 (ja) | 2008-04-30 | 2009-04-27 | 水反応性Al膜の製造方法及び成膜室用構成部材 |
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CN (1) | CN102016100B (ja) |
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AT391183B (de) * | 1988-09-14 | 1990-08-27 | Alois Liemberger Fa | Beleuchtungskoerper |
KR101303386B1 (ko) * | 2008-04-30 | 2013-09-03 | 가부시키가이샤 알박 | 수 반응성 Al 복합 재료, 수 반응성 Al 막, 이 Al 막의 제조 방법, 및 성막실용 구성 부재 |
JP5319022B2 (ja) * | 2010-12-27 | 2013-10-16 | シャープ株式会社 | 蒸着装置および回収装置 |
CN103240484A (zh) * | 2012-02-01 | 2013-08-14 | 上海科秉电子科技有限公司 | 一种用于u型槽内层表面的粗糙化方法 |
ITBA20130034A1 (it) * | 2013-04-30 | 2014-10-31 | Mrs S R L | Metodo per la pulizia di superfici in apparati di deposizione di film sottili da fase vapore e per il recupero del materiale rimosso |
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JPS62290888A (ja) * | 1974-12-23 | 1987-12-17 | オロンジオ デ ノラ エス エイ | アルミニウム合金陽極の性能改良法 |
JPH1030896A (ja) * | 1996-07-17 | 1998-02-03 | Furukawa Electric Co Ltd:The | 高耐食性アルミニウムチューブの製造方法および前記方法により製造された高耐食性アルミニウムチューブ |
JP2005256063A (ja) * | 2004-03-10 | 2005-09-22 | Ulvac Japan Ltd | 水崩壊性Al複合材料、この材料からなるAl膜、Al粉及びこれらの製造方法、並びに成膜室用構成部材及び成膜材料の回収方法 |
JP2006002223A (ja) * | 2004-06-18 | 2006-01-05 | Sumitomo Precision Prod Co Ltd | 耐食性被膜 |
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US3960606A (en) * | 1975-03-12 | 1976-06-01 | Southwire Company | Aluminum silicon alloy and method of preparation thereof |
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- 2009-04-27 MY MYPI20104894 patent/MY152991A/en unknown
- 2009-04-27 SG SG2013025556A patent/SG189755A1/en unknown
- 2009-04-27 KR KR1020107026608A patent/KR20100135323A/ko active Search and Examination
- 2009-04-27 EP EP09738773.2A patent/EP2281914B1/en active Active
- 2009-04-27 RU RU2010148765/02A patent/RU2468116C2/ru active
- 2009-04-27 CN CN2009801154095A patent/CN102016100B/zh active Active
- 2009-04-27 JP JP2010510106A patent/JP5371964B2/ja active Active
- 2009-04-27 WO PCT/JP2009/058255 patent/WO2009133836A1/ja active Application Filing
- 2009-04-27 US US12/989,974 patent/US20110041760A1/en not_active Abandoned
- 2009-04-29 TW TW098114187A patent/TWI465605B/zh active
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Also Published As
Publication number | Publication date |
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TWI465605B (zh) | 2014-12-21 |
EP2281914A1 (en) | 2011-02-09 |
KR20100135323A (ko) | 2010-12-24 |
SG189755A1 (en) | 2013-05-31 |
CN102016100A (zh) | 2011-04-13 |
RU2010148765A (ru) | 2012-06-10 |
TW201009121A (en) | 2010-03-01 |
EP2281914B1 (en) | 2015-02-25 |
JPWO2009133836A1 (ja) | 2011-09-01 |
RU2468116C2 (ru) | 2012-11-27 |
US20110041760A1 (en) | 2011-02-24 |
MY152991A (en) | 2014-12-31 |
WO2009133836A1 (ja) | 2009-11-05 |
CN102016100B (zh) | 2013-04-10 |
EP2281914A4 (en) | 2011-04-20 |
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