JP5260790B2 - 活性エネルギー線硬化性樹脂組成物、微細凹凸構造体及び微細凹凸構造体の製造方法 - Google Patents

活性エネルギー線硬化性樹脂組成物、微細凹凸構造体及び微細凹凸構造体の製造方法 Download PDF

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JP5260790B2
JP5260790B2 JP2012502352A JP2012502352A JP5260790B2 JP 5260790 B2 JP5260790 B2 JP 5260790B2 JP 2012502352 A JP2012502352 A JP 2012502352A JP 2012502352 A JP2012502352 A JP 2012502352A JP 5260790 B2 JP5260790 B2 JP 5260790B2
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resin composition
fine concavo
convex structure
active energy
energy ray
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JPWO2012096322A1 (ja
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毅 瀧原
英子 岡本
剛 大谷
祐介 中井
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Mitsubishi Chemical Corp
Mitsubishi Rayon Co Ltd
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Mitsubishi Chemical Corp
Mitsubishi Rayon Co Ltd
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B17/00—Methods preventing fouling
    • B08B17/02—Preventing deposition of fouling or of dust
    • B08B17/06—Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement
    • B08B17/065—Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement the surface having a microscopic surface pattern to achieve the same effect as a lotus flower
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/16—Surface shaping of articles, e.g. embossing; Apparatus therefor by wave energy or particle radiation, e.g. infrared heating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/10—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a discontinuous layer, i.e. formed of separate pieces of material
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/285—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety
    • C08F220/286—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety and containing polyethylene oxide in the alcohol moiety, e.g. methoxy polyethylene glycol (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/04—Polymers provided for in subclasses C08C or C08F
    • C08F290/046—Polymers of unsaturated carboxylic acids or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/062—Polyethers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Mechanical Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laminated Bodies (AREA)
JP2012502352A 2011-01-12 2012-01-12 活性エネルギー線硬化性樹脂組成物、微細凹凸構造体及び微細凹凸構造体の製造方法 Active JP5260790B2 (ja)

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JP2012502352A JP5260790B2 (ja) 2011-01-12 2012-01-12 活性エネルギー線硬化性樹脂組成物、微細凹凸構造体及び微細凹凸構造体の製造方法

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JP2011004091 2011-01-12
JP2011004085 2011-01-12
JP2011004091 2011-01-12
JP2011004085 2011-01-12
JP2012502352A JP5260790B2 (ja) 2011-01-12 2012-01-12 活性エネルギー線硬化性樹脂組成物、微細凹凸構造体及び微細凹凸構造体の製造方法
PCT/JP2012/050415 WO2012096322A1 (ja) 2011-01-12 2012-01-12 活性エネルギー線硬化性樹脂組成物、微細凹凸構造体及び微細凹凸構造体の製造方法

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JP2013053249A Active JP5352020B2 (ja) 2011-01-12 2013-03-15 活性エネルギー線硬化性樹脂組成物、微細凹凸構造体及び微細凹凸構造体の製造方法

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US (2) US9062142B2 (ko)
EP (1) EP2664636B1 (ko)
JP (2) JP5260790B2 (ko)
KR (2) KR101389166B1 (ko)
CN (2) CN103524683B (ko)
TW (1) TWI446109B (ko)
WO (1) WO2012096322A1 (ko)

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TW201325884A (zh) * 2011-12-29 2013-07-01 Hon Hai Prec Ind Co Ltd 光學薄膜壓印滾輪及該滾輪之製作方法
JPWO2014013922A1 (ja) * 2012-07-19 2016-06-30 日産化学工業株式会社 防汚性を有する凹凸形状の表面を有する構造体及びその製造方法
JP2014047299A (ja) * 2012-08-31 2014-03-17 Dexerials Corp 防汚体、表示装置、入力装置、電子機器および防汚性物品
JP6064467B2 (ja) * 2012-09-11 2017-01-25 株式会社リコー 光拡散素子および画像表示装置
JP6379458B2 (ja) * 2012-09-13 2018-08-29 日立化成株式会社 パターンを有する樹脂層を製造する方法、及びそれに用いられる樹脂組成物
JP5629025B2 (ja) * 2013-01-23 2014-11-19 デクセリアルズ株式会社 親水性積層体、及びその製造方法、防汚用積層体、物品、及びその製造方法、並びに防汚方法
JP6071108B2 (ja) * 2013-03-13 2017-02-01 荒川化学工業株式会社 光硬化型樹脂組成物およびこれを用いて得られる光学用フィルム
US10137661B2 (en) 2013-04-05 2018-11-27 Mitsubishi Chemical Corporation Microrelief structural body, decorative sheet, decorative resin molded body, method for producing microrelief structural body, and method for producing decorative resin molded body
JP5652516B1 (ja) * 2013-07-18 2015-01-14 大日本印刷株式会社 反射防止物品、及び画像表示装置
JP2015075560A (ja) * 2013-10-08 2015-04-20 デクセリアルズ株式会社 親油性積層体、及びその製造方法、並びに物品
JP2015074137A (ja) * 2013-10-08 2015-04-20 デクセリアルズ株式会社 親油性積層体、及びその製造方法、並びに物品
EP3073298A4 (en) * 2013-11-22 2017-08-23 Soken Chemical & Engineering Co., Ltd. Light-curable imprinting-resin composition and anti-reflective film
JP6435675B2 (ja) * 2014-07-14 2018-12-12 東洋インキＳｃホールディングス株式会社 光学的立体造形用樹脂組成物、及び立体造形物
JP6458392B2 (ja) * 2014-07-23 2019-01-30 デクセリアルズ株式会社 顔面保護用透明フィルム
JP2016035055A (ja) * 2014-07-31 2016-03-17 三洋化成工業株式会社 光学部品用活性エネルギー線硬化性組成物
JP6797529B2 (ja) * 2015-01-21 2020-12-09 東洋合成工業株式会社 光学部材の製造方法及びそれに用いられる組成物
JP2016157785A (ja) * 2015-02-24 2016-09-01 株式会社東芝 テンプレート形成方法、テンプレートおよびテンプレート基材
WO2017002506A1 (ja) * 2015-06-29 2017-01-05 日産化学工業株式会社 インプリント材料
CN108027675B (zh) * 2015-09-30 2021-10-08 富士胶片株式会社 静电电容型输入装置及其电极保护膜及其膜用组合物、转印薄膜、层叠体、图像显示装置
CN108541333A (zh) * 2015-12-22 2018-09-14 日产化学工业株式会社 压印材料
JP6224188B1 (ja) * 2016-08-08 2017-11-01 太陽インキ製造株式会社 半導体封止材
KR101913843B1 (ko) * 2016-10-12 2018-11-05 주식회사 세아테크놀러지 비아 콘택 형성 방법
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JPH02274713A (ja) * 1989-04-18 1990-11-08 Arakawa Chem Ind Co Ltd 光硬化性樹脂
JPH04247336A (ja) * 1991-02-04 1992-09-03 Teijin Ltd 光ディスク
JPH10166734A (ja) * 1996-12-06 1998-06-23 Nippon Kayaku Co Ltd 感熱記録体
JP2002216845A (ja) * 2001-01-18 2002-08-02 Nippon Synthetic Chem Ind Co Ltd:The 高分子固体電解質及びそれを用いた電気化学素子、二次電池
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CN103524683B (zh) 2016-04-27
KR101500897B1 (ko) 2015-03-12
TWI446109B (zh) 2014-07-21
EP2664636B1 (en) 2015-07-29
JP2013175733A (ja) 2013-09-05
US9062142B2 (en) 2015-06-23
EP2664636A1 (en) 2013-11-20
US9234065B2 (en) 2016-01-12
US20130302564A1 (en) 2013-11-14
JP5352020B2 (ja) 2013-11-27
CN103282394A (zh) 2013-09-04
JPWO2012096322A1 (ja) 2014-06-09
WO2012096322A1 (ja) 2012-07-19
CN103282394B (zh) 2015-07-01
CN103524683A (zh) 2014-01-22
KR20140002095A (ko) 2014-01-07
EP2664636A4 (en) 2014-10-08
TW201234105A (en) 2012-08-16
KR20130084699A (ko) 2013-07-25
US20140314993A1 (en) 2014-10-23
KR101389166B1 (ko) 2014-04-24

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