JP5253081B2 - 投影光学系、露光装置及びデバイスの製造方法 - Google Patents

投影光学系、露光装置及びデバイスの製造方法 Download PDF

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Publication number
JP5253081B2
JP5253081B2 JP2008265715A JP2008265715A JP5253081B2 JP 5253081 B2 JP5253081 B2 JP 5253081B2 JP 2008265715 A JP2008265715 A JP 2008265715A JP 2008265715 A JP2008265715 A JP 2008265715A JP 5253081 B2 JP5253081 B2 JP 5253081B2
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Japan
Prior art keywords
lens
optical system
projection optical
intersection
center position
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Expired - Fee Related
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JP2008265715A
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English (en)
Japanese (ja)
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JP2010096866A5 (cg-RX-API-DMAC7.html
JP2010096866A (ja
Inventor
寛之 結城
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2008265715A priority Critical patent/JP5253081B2/ja
Priority to US12/577,635 priority patent/US8432532B2/en
Publication of JP2010096866A publication Critical patent/JP2010096866A/ja
Publication of JP2010096866A5 publication Critical patent/JP2010096866A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2008265715A 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法 Expired - Fee Related JP5253081B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008265715A JP5253081B2 (ja) 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法
US12/577,635 US8432532B2 (en) 2008-10-14 2009-10-12 Projection optical system with rarefaction compensation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008265715A JP5253081B2 (ja) 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2010096866A JP2010096866A (ja) 2010-04-30
JP2010096866A5 JP2010096866A5 (cg-RX-API-DMAC7.html) 2011-12-01
JP5253081B2 true JP5253081B2 (ja) 2013-07-31

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JP2008265715A Expired - Fee Related JP5253081B2 (ja) 2008-10-14 2008-10-14 投影光学系、露光装置及びデバイスの製造方法

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Country Link
US (1) US8432532B2 (cg-RX-API-DMAC7.html)
JP (1) JP5253081B2 (cg-RX-API-DMAC7.html)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NZ726432A (en) 2014-04-25 2022-07-01 Bayer Healthcare Llc Syringe with rolling diaphragm
HK1251434A1 (zh) 2015-04-24 2019-02-01 Bayer Healthcare Llc 具有卷动膜片的针筒
TWI737812B (zh) 2016-09-16 2021-09-01 美商拜耳保健公司 具有注射保持元件之壓力套及用於將流體輸送給一患者之流體注入器
US11547793B2 (en) 2016-10-17 2023-01-10 Bayer Healthcare Llc Fluid injector with syringe engagement mechanism
US11207462B2 (en) 2016-10-17 2021-12-28 Bayer Healthcare Llc Fluid injector with syringe engagement mechanism
ES2904369T3 (es) 2017-09-13 2022-04-04 Bayer Healthcare Llc Capuchón de jeringa deslizante para llenado y distribución por separado
CN112912119A (zh) 2018-09-11 2021-06-04 拜耳医药保健有限责任公司 流体注入器系统的注射器固定特征
WO2021050507A1 (en) 2019-09-10 2021-03-18 Bayer Healthcare Llc Pressure jackets and syringe retention features for angiography fluid injectors
PH12022552170A1 (en) 2020-02-21 2023-12-11 Bayer Healthcare Llc Fluid path connectors for medical fluid delivery
FI4110452T3 (fi) 2020-02-28 2025-01-17 Bayer Healthcare Llc Nesteensekoitussarja
EP4121141A1 (en) 2020-03-16 2023-01-25 Bayer HealthCare LLC Stopcock apparatus for angiography injector fluid paths
WO2021257699A1 (en) 2020-06-18 2021-12-23 Bayer Healthcare Llc In-line air bubble suspension apparatus for angiography injector fluid paths
JP7648739B2 (ja) 2020-08-11 2025-03-18 バイエル・ヘルスケア・エルエルシー 血管造影用シリンジの特徴
IL302694A (en) 2020-12-01 2023-07-01 Bayer Healthcare Llc Cassette for keeping liquid path components for a liquid injector system
CA3223779A1 (en) 2021-06-17 2022-12-22 Bayer Healthcare Llc System and method for detecting fluid type in tubing for fluid injector apparatus

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0989434B1 (en) * 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptric optical system and exposure apparatus having the same
KR20000034967A (ko) * 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
US6339505B1 (en) * 2000-06-26 2002-01-15 International Business Machines Corporation Method for radiation projection and lens assembly for semiconductor exposure tools
JP2004511092A (ja) * 2000-10-03 2004-04-08 コーニング　インコーポレイテッド フォトリソグラフィの方法およびフォトリソグラフィ装置
US7190527B2 (en) * 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
DE10210899A1 (de) * 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie
KR20040104691A (ko) * 2002-05-03 2004-12-10 칼 짜이스 에스엠테 아게 높은 개구를 갖는 투영 대물렌즈
JP4174400B2 (ja) * 2003-09-24 2008-10-29 信越石英株式会社 シリカガラスの選別方法
JP2005114881A (ja) * 2003-10-06 2005-04-28 Nikon Corp 投影光学系、露光装置、および露光方法
US6992753B2 (en) * 2003-12-24 2006-01-31 Carl Zeiss Smt Ag Projection optical system
DE602005008707D1 (de) 2004-01-14 2008-09-18 Zeiss Carl Smt Ag Catadioptrisches projektionsobjektiv
TWI395069B (zh) 2004-02-18 2013-05-01 尼康股份有限公司 投影光學系統、曝光裝置以及曝光方法
JP2006073687A (ja) 2004-09-01 2006-03-16 Nikon Corp 投影光学系、投影光学系の製造方法、露光装置、および露光方法
JP4868209B2 (ja) 2004-11-10 2012-02-01 株式会社ニコン 投影光学系、露光装置、および露光方法
WO2006051689A1 (ja) 2004-11-10 2006-05-18 Nikon Corporation 投影光学系、露光装置、および露光方法
DE102006027787A1 (de) * 2005-07-05 2007-01-18 Carl Zeiss Smt Ag Projektionsbelichtungsanlage und Betriebsmethode dieser
JP2008063181A (ja) 2006-09-07 2008-03-21 Shin Etsu Chem Co Ltd エキシマレーザー用合成石英ガラス基板及びその製造方法

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US8432532B2 (en) 2013-04-30
JP2010096866A (ja) 2010-04-30
US20100091361A1 (en) 2010-04-15

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