JP5245251B2 - 光学的素子及び光学装置、並びに光学的素子の製造方法 - Google Patents

光学的素子及び光学装置、並びに光学的素子の製造方法 Download PDF

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JP5245251B2
JP5245251B2 JP2006350891A JP2006350891A JP5245251B2 JP 5245251 B2 JP5245251 B2 JP 5245251B2 JP 2006350891 A JP2006350891 A JP 2006350891A JP 2006350891 A JP2006350891 A JP 2006350891A JP 5245251 B2 JP5245251 B2 JP 5245251B2
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Prior art keywords
layer
adhesion
film
optical element
reactive gas
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Expired - Fee Related
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JP2006350891A
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English (en)
Japanese (ja)
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JP2008164660A5 (enExample
JP2008164660A (ja
Inventor
幹裕 竹友
利孝 河嶋
宜浩 大島
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Sony Corp
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Sony Corp
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Priority to JP2006350891A priority Critical patent/JP5245251B2/ja
Priority to US11/948,764 priority patent/US7880967B2/en
Publication of JP2008164660A publication Critical patent/JP2008164660A/ja
Publication of JP2008164660A5 publication Critical patent/JP2008164660A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0042—Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0089—Reactive sputtering in metallic mode
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/913—Material designed to be responsive to temperature, light, moisture

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Fluid Mechanics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
JP2006350891A 2006-12-27 2006-12-27 光学的素子及び光学装置、並びに光学的素子の製造方法 Expired - Fee Related JP5245251B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2006350891A JP5245251B2 (ja) 2006-12-27 2006-12-27 光学的素子及び光学装置、並びに光学的素子の製造方法
US11/948,764 US7880967B2 (en) 2006-12-27 2007-11-30 Optical element, optical device, and method of producing optical element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006350891A JP5245251B2 (ja) 2006-12-27 2006-12-27 光学的素子及び光学装置、並びに光学的素子の製造方法

Publications (3)

Publication Number Publication Date
JP2008164660A JP2008164660A (ja) 2008-07-17
JP2008164660A5 JP2008164660A5 (enExample) 2010-02-04
JP5245251B2 true JP5245251B2 (ja) 2013-07-24

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JP2006350891A Expired - Fee Related JP5245251B2 (ja) 2006-12-27 2006-12-27 光学的素子及び光学装置、並びに光学的素子の製造方法

Country Status (2)

Country Link
US (1) US7880967B2 (enExample)
JP (1) JP5245251B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5162271B2 (ja) * 2008-02-15 2013-03-13 Ａｇｃテクノグラス株式会社 光学多層膜付きガラス部材とその製造方法
JPWO2010016242A1 (ja) * 2008-08-04 2012-01-19 株式会社ニコン・エシロール 光学部品及び光学部品の製造方法
US10079257B2 (en) * 2012-04-13 2018-09-18 Taiwan Semiconductor Manufacturing Co., Ltd. Anti-reflective layer for backside illuminated CMOS image sensors
DE102012112739A1 (de) * 2012-10-23 2014-04-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Licht absorbierendes Schichtsystem und dessen Herstellung sowie dafür geeignetes Sputtertarget
KR101687777B1 (ko) * 2014-03-14 2016-12-19 (주)알에프트론 두 방향으로 정렬된 주석산화물반도체층을 갖는 전자 표시 장치용 기판 및 그의 제조 방법
US10985344B2 (en) 2017-10-27 2021-04-20 Applied Materials, Inc. Flexible cover lens films
CN108169825A (zh) * 2017-12-18 2018-06-15 池州市正彩电子科技有限公司 一种高硬度增透膜的成型方法
JP7716853B2 (ja) 2018-05-10 2025-08-01 アプライド マテリアルズ インコーポレイテッド フレキシブルディスプレイ用の交換可能なカバーレンズ
WO2020036693A1 (en) 2018-08-14 2020-02-20 Applied Materials, Inc. Multi-layer wet-dry hardcoats for flexible cover lens
KR102780681B1 (ko) 2019-06-26 2025-03-11 어플라이드 머티어리얼스, 인코포레이티드 폴더블 디스플레이들을 위한 플렉서블 다층 커버 렌즈 스택들

Family Cites Families (12)

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Publication number Priority date Publication date Assignee Title
DE19610012B4 (de) 1996-03-14 2005-02-10 Unaxis Deutschland Holding Gmbh Verfahren zur Stabilisierung eines Arbeitspunkts beim reaktiven Zerstäuben in einer Sauerstoff enthaltenden Atmosphäre
JP3614575B2 (ja) 1996-08-02 2005-01-26 ソニー株式会社 光学的素子又は装置、これらの製造方法、及びその製造装置
JP2001116921A (ja) 1999-10-15 2001-04-27 Sony Corp 光学部品及びその製造方法並びに光学部品の製造装置
AU2001241144A1 (en) * 2000-03-22 2001-10-03 Nippon Sheet Glass Co. Ltd. Substrate with photocatalytic film and method for producing the same
JP4665321B2 (ja) * 2001-03-09 2011-04-06 凸版印刷株式会社 積層体
US6589657B2 (en) * 2001-08-31 2003-07-08 Von Ardenne Anlagentechnik Gmbh Anti-reflection coatings and associated methods
JP2003094548A (ja) * 2001-09-26 2003-04-03 Sony Corp 反射防止フィルム
JP2003114302A (ja) 2001-10-04 2003-04-18 Sony Corp 反射防止フィルム及び反射防止偏光板の製造方法
US6830817B2 (en) * 2001-12-21 2004-12-14 Guardian Industries Corp. Low-e coating with high visible transmission
JP2005099513A (ja) * 2003-09-25 2005-04-14 Sekisui Chem Co Ltd 反射防止フィルム
JP4557558B2 (ja) * 2004-01-22 2010-10-06 株式会社アルバック 成膜方法
JP2006284453A (ja) 2005-04-01 2006-10-19 Sony Corp 薄膜密着性評価方法

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US20080158680A1 (en) 2008-07-03
US7880967B2 (en) 2011-02-01
JP2008164660A (ja) 2008-07-17

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