JP5230189B2 - 液体吐出ヘッドの製造方法 - Google Patents
液体吐出ヘッドの製造方法 Download PDFInfo
- Publication number
- JP5230189B2 JP5230189B2 JP2007332552A JP2007332552A JP5230189B2 JP 5230189 B2 JP5230189 B2 JP 5230189B2 JP 2007332552 A JP2007332552 A JP 2007332552A JP 2007332552 A JP2007332552 A JP 2007332552A JP 5230189 B2 JP5230189 B2 JP 5230189B2
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- substrate
- photosensitive resin
- negative photosensitive
- discharge portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/162—Manufacturing of the nozzle plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14032—Structure of the pressure chamber
- B41J2/1404—Geometrical characteristics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14475—Structure thereof only for on-demand ink jet heads characterised by nozzle shapes or number of orifices per chamber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/11—Embodiments of or processes related to ink-jet heads characterised by specific geometrical characteristics
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Geometry (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007332552A JP5230189B2 (ja) | 2006-12-22 | 2007-12-25 | 液体吐出ヘッドの製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006346266 | 2006-12-22 | ||
| JP2006346266 | 2006-12-22 | ||
| JP2007332552A JP5230189B2 (ja) | 2006-12-22 | 2007-12-25 | 液体吐出ヘッドの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008173970A JP2008173970A (ja) | 2008-07-31 |
| JP2008173970A5 JP2008173970A5 (enExample) | 2010-11-25 |
| JP5230189B2 true JP5230189B2 (ja) | 2013-07-10 |
Family
ID=39565441
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007332552A Expired - Fee Related JP5230189B2 (ja) | 2006-12-22 | 2007-12-25 | 液体吐出ヘッドの製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7971964B2 (enExample) |
| JP (1) | JP5230189B2 (enExample) |
| KR (1) | KR100974112B1 (enExample) |
| CN (1) | CN101204880B (enExample) |
| TW (1) | TWI335273B (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5506600B2 (ja) * | 2010-08-25 | 2014-05-28 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| JP5065464B2 (ja) * | 2010-09-29 | 2012-10-31 | キヤノン株式会社 | 液体吐出ヘッドおよび液体吐出ヘッドの製造方法 |
| US8652767B2 (en) * | 2011-02-28 | 2014-02-18 | Canon Kabushiki Kaisha | Liquid ejection head and process for producing the same |
| CN103252997B (zh) * | 2012-02-16 | 2015-12-16 | 珠海纳思达珠海赛纳打印科技股份有限公司 | 一种液体喷头及其制造方法 |
| JP6008556B2 (ja) * | 2012-04-25 | 2016-10-19 | キヤノン株式会社 | 液体吐出ヘッドの製造方法及び露光方法 |
| JP6071560B2 (ja) | 2013-01-07 | 2017-02-01 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| JP6071565B2 (ja) * | 2013-01-11 | 2017-02-01 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| JP6180143B2 (ja) * | 2013-03-22 | 2017-08-16 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| JP6193715B2 (ja) * | 2013-10-08 | 2017-09-06 | キヤノン株式会社 | 液体吐出ヘッド |
| JP6341799B2 (ja) * | 2014-08-19 | 2018-06-13 | キヤノン株式会社 | 液体吐出ヘッドの製造方法 |
| JP6632225B2 (ja) * | 2015-06-05 | 2020-01-22 | キヤノン株式会社 | 吐出口面の撥水処理方法 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0645242B2 (ja) * | 1984-12-28 | 1994-06-15 | キヤノン株式会社 | 液体噴射記録ヘツドの製造方法 |
| JP3674885B2 (ja) * | 1996-08-07 | 2005-07-27 | コニカミノルタホールディングス株式会社 | インクジェット記録ヘッド |
| US6379571B1 (en) * | 1998-06-11 | 2002-04-30 | Canon Kabushiki Kaisha | Etching method for processing substrate, dry etching method for polyetheramide resin layer, production method of ink-jet printing head, ink-jet head and ink-jet printing apparatus |
| JP3957920B2 (ja) | 1998-06-11 | 2007-08-15 | キヤノン株式会社 | インクジェットヘッドの製造方法 |
| JP2001179979A (ja) * | 1999-12-22 | 2001-07-03 | Canon Inc | 液体噴射記録ヘッド及びその製造方法 |
| JP3751227B2 (ja) * | 2001-07-02 | 2006-03-01 | ニックス株式会社 | 金型装置 |
| JP3862624B2 (ja) * | 2002-07-10 | 2006-12-27 | キヤノン株式会社 | 液体吐出ヘッドおよび、該ヘッドの製造方法 |
| JP2004042389A (ja) | 2002-07-10 | 2004-02-12 | Canon Inc | 微細構造体の製造方法、液体吐出ヘッドの製造方法および液体吐出ヘッド |
| JP4761498B2 (ja) * | 2004-06-28 | 2011-08-31 | キヤノン株式会社 | 感光性樹脂組成物、ならびにこれを用いた段差パターンの製造方法及びインクジェットヘッドの製造方法 |
| EP1763706B1 (en) * | 2004-06-28 | 2013-12-11 | Canon Kabushiki Kaisha | Method for manufacturing liquid discharge head |
| CN100590524C (zh) * | 2004-09-30 | 2010-02-17 | 三菱制纸株式会社 | 用于制版掩膜的喷墨记录用片材及制造苯胺印刷版的方法 |
| KR100612027B1 (ko) * | 2005-05-12 | 2006-08-11 | 삼성전자주식회사 | 가교 폴리머를 이용한 잉크젯 프린트헤드의 제조방법 |
| JP2006315310A (ja) * | 2005-05-13 | 2006-11-24 | Sony Corp | 液体吐出ヘッドの製造方法、液体吐出ヘッド及び液体吐出装置 |
| JP2006347072A (ja) * | 2005-06-17 | 2006-12-28 | Canon Inc | 液体吐出ヘッドの製造方法、液体吐出ヘッド、および液体吐出記録装置 |
| KR100717023B1 (ko) * | 2005-08-27 | 2007-05-10 | 삼성전자주식회사 | 잉크젯 프린트헤드 및 그 제조방법 |
-
2007
- 2007-11-16 US US11/941,431 patent/US7971964B2/en not_active Expired - Fee Related
- 2007-12-05 TW TW096146283A patent/TWI335273B/zh not_active IP Right Cessation
- 2007-12-07 KR KR1020070126838A patent/KR100974112B1/ko not_active Expired - Fee Related
- 2007-12-21 CN CN2007101600455A patent/CN101204880B/zh not_active Expired - Fee Related
- 2007-12-25 JP JP2007332552A patent/JP5230189B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN101204880B (zh) | 2012-04-04 |
| CN101204880A (zh) | 2008-06-25 |
| KR100974112B1 (ko) | 2010-08-04 |
| TW200914280A (en) | 2009-04-01 |
| JP2008173970A (ja) | 2008-07-31 |
| US20080252689A1 (en) | 2008-10-16 |
| US7971964B2 (en) | 2011-07-05 |
| TWI335273B (en) | 2011-01-01 |
| KR20080059043A (ko) | 2008-06-26 |
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