JP5230189B2 - 液体吐出ヘッドの製造方法 - Google Patents

液体吐出ヘッドの製造方法 Download PDF

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Publication number
JP5230189B2
JP5230189B2 JP2007332552A JP2007332552A JP5230189B2 JP 5230189 B2 JP5230189 B2 JP 5230189B2 JP 2007332552 A JP2007332552 A JP 2007332552A JP 2007332552 A JP2007332552 A JP 2007332552A JP 5230189 B2 JP5230189 B2 JP 5230189B2
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JP
Japan
Prior art keywords
discharge
substrate
photosensitive resin
negative photosensitive
discharge portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007332552A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008173970A5 (enExample
JP2008173970A (ja
Inventor
昭二 芝
明彦 岡野
義一 齋藤
環樹 佐藤
工 鈴木
雅彦 久保田
宏恵 石倉
新祐 辻
麻紀 加藤
和宏 浅井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2007332552A priority Critical patent/JP5230189B2/ja
Publication of JP2008173970A publication Critical patent/JP2008173970A/ja
Publication of JP2008173970A5 publication Critical patent/JP2008173970A5/ja
Application granted granted Critical
Publication of JP5230189B2 publication Critical patent/JP5230189B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/162Manufacturing of the nozzle plates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14016Structure of bubble jet print heads
    • B41J2/14032Structure of the pressure chamber
    • B41J2/1404Geometrical characteristics
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • B41J2/1629Manufacturing processes etching wet etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1631Manufacturing processes photolithography
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1645Manufacturing processes thin film formation thin film formation by spincoating
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/70Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2002/14475Structure thereof only for on-demand ink jet heads characterised by nozzle shapes or number of orifices per chamber
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2202/00Embodiments of or processes related to ink-jet or thermal heads
    • B41J2202/01Embodiments of or processes related to ink-jet heads
    • B41J2202/11Embodiments of or processes related to ink-jet heads characterised by specific geometrical characteristics

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
JP2007332552A 2006-12-22 2007-12-25 液体吐出ヘッドの製造方法 Expired - Fee Related JP5230189B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007332552A JP5230189B2 (ja) 2006-12-22 2007-12-25 液体吐出ヘッドの製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006346266 2006-12-22
JP2006346266 2006-12-22
JP2007332552A JP5230189B2 (ja) 2006-12-22 2007-12-25 液体吐出ヘッドの製造方法

Publications (3)

Publication Number Publication Date
JP2008173970A JP2008173970A (ja) 2008-07-31
JP2008173970A5 JP2008173970A5 (enExample) 2010-11-25
JP5230189B2 true JP5230189B2 (ja) 2013-07-10

Family

ID=39565441

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007332552A Expired - Fee Related JP5230189B2 (ja) 2006-12-22 2007-12-25 液体吐出ヘッドの製造方法

Country Status (5)

Country Link
US (1) US7971964B2 (enExample)
JP (1) JP5230189B2 (enExample)
KR (1) KR100974112B1 (enExample)
CN (1) CN101204880B (enExample)
TW (1) TWI335273B (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5506600B2 (ja) * 2010-08-25 2014-05-28 キヤノン株式会社 液体吐出ヘッドの製造方法
JP5065464B2 (ja) * 2010-09-29 2012-10-31 キヤノン株式会社 液体吐出ヘッドおよび液体吐出ヘッドの製造方法
US8652767B2 (en) * 2011-02-28 2014-02-18 Canon Kabushiki Kaisha Liquid ejection head and process for producing the same
CN103252997B (zh) * 2012-02-16 2015-12-16 珠海纳思达珠海赛纳打印科技股份有限公司 一种液体喷头及其制造方法
JP6008556B2 (ja) * 2012-04-25 2016-10-19 キヤノン株式会社 液体吐出ヘッドの製造方法及び露光方法
JP6071560B2 (ja) 2013-01-07 2017-02-01 キヤノン株式会社 液体吐出ヘッドの製造方法
JP6071565B2 (ja) * 2013-01-11 2017-02-01 キヤノン株式会社 液体吐出ヘッドの製造方法
JP6180143B2 (ja) * 2013-03-22 2017-08-16 キヤノン株式会社 液体吐出ヘッドの製造方法
JP6193715B2 (ja) * 2013-10-08 2017-09-06 キヤノン株式会社 液体吐出ヘッド
JP6341799B2 (ja) * 2014-08-19 2018-06-13 キヤノン株式会社 液体吐出ヘッドの製造方法
JP6632225B2 (ja) * 2015-06-05 2020-01-22 キヤノン株式会社 吐出口面の撥水処理方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0645242B2 (ja) * 1984-12-28 1994-06-15 キヤノン株式会社 液体噴射記録ヘツドの製造方法
JP3674885B2 (ja) * 1996-08-07 2005-07-27 コニカミノルタホールディングス株式会社 インクジェット記録ヘッド
US6379571B1 (en) * 1998-06-11 2002-04-30 Canon Kabushiki Kaisha Etching method for processing substrate, dry etching method for polyetheramide resin layer, production method of ink-jet printing head, ink-jet head and ink-jet printing apparatus
JP3957920B2 (ja) 1998-06-11 2007-08-15 キヤノン株式会社 インクジェットヘッドの製造方法
JP2001179979A (ja) * 1999-12-22 2001-07-03 Canon Inc 液体噴射記録ヘッド及びその製造方法
JP3751227B2 (ja) * 2001-07-02 2006-03-01 ニックス株式会社 金型装置
JP3862624B2 (ja) * 2002-07-10 2006-12-27 キヤノン株式会社 液体吐出ヘッドおよび、該ヘッドの製造方法
JP2004042389A (ja) 2002-07-10 2004-02-12 Canon Inc 微細構造体の製造方法、液体吐出ヘッドの製造方法および液体吐出ヘッド
JP4761498B2 (ja) * 2004-06-28 2011-08-31 キヤノン株式会社 感光性樹脂組成物、ならびにこれを用いた段差パターンの製造方法及びインクジェットヘッドの製造方法
EP1763706B1 (en) * 2004-06-28 2013-12-11 Canon Kabushiki Kaisha Method for manufacturing liquid discharge head
CN100590524C (zh) * 2004-09-30 2010-02-17 三菱制纸株式会社 用于制版掩膜的喷墨记录用片材及制造苯胺印刷版的方法
KR100612027B1 (ko) * 2005-05-12 2006-08-11 삼성전자주식회사 가교 폴리머를 이용한 잉크젯 프린트헤드의 제조방법
JP2006315310A (ja) * 2005-05-13 2006-11-24 Sony Corp 液体吐出ヘッドの製造方法、液体吐出ヘッド及び液体吐出装置
JP2006347072A (ja) * 2005-06-17 2006-12-28 Canon Inc 液体吐出ヘッドの製造方法、液体吐出ヘッド、および液体吐出記録装置
KR100717023B1 (ko) * 2005-08-27 2007-05-10 삼성전자주식회사 잉크젯 프린트헤드 및 그 제조방법

Also Published As

Publication number Publication date
CN101204880B (zh) 2012-04-04
CN101204880A (zh) 2008-06-25
KR100974112B1 (ko) 2010-08-04
TW200914280A (en) 2009-04-01
JP2008173970A (ja) 2008-07-31
US20080252689A1 (en) 2008-10-16
US7971964B2 (en) 2011-07-05
TWI335273B (en) 2011-01-01
KR20080059043A (ko) 2008-06-26

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