JP5157945B2 - 光照射装置 - Google Patents
光照射装置 Download PDFInfo
- Publication number
- JP5157945B2 JP5157945B2 JP2009027048A JP2009027048A JP5157945B2 JP 5157945 B2 JP5157945 B2 JP 5157945B2 JP 2009027048 A JP2009027048 A JP 2009027048A JP 2009027048 A JP2009027048 A JP 2009027048A JP 5157945 B2 JP5157945 B2 JP 5157945B2
- Authority
- JP
- Japan
- Prior art keywords
- lens
- light
- filter
- frame
- integrator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000009826 distribution Methods 0.000 claims description 46
- 230000003287 optical effect Effects 0.000 description 19
- 239000000758 substrate Substances 0.000 description 8
- 239000011521 glass Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 238000005286 illumination Methods 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Microscoopes, Condenser (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009027048A JP5157945B2 (ja) | 2009-02-09 | 2009-02-09 | 光照射装置 |
TW098138433A TWI392975B (zh) | 2009-02-09 | 2009-11-12 | Light irradiation device |
KR1020090121825A KR101247491B1 (ko) | 2009-02-09 | 2009-12-09 | 광조사 장치 |
CN2010101135239A CN101799632B (zh) | 2009-02-09 | 2010-02-03 | 光照射装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009027048A JP5157945B2 (ja) | 2009-02-09 | 2009-02-09 | 光照射装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010182989A JP2010182989A (ja) | 2010-08-19 |
JP5157945B2 true JP5157945B2 (ja) | 2013-03-06 |
Family
ID=42595361
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009027048A Active JP5157945B2 (ja) | 2009-02-09 | 2009-02-09 | 光照射装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5157945B2 (ko) |
KR (1) | KR101247491B1 (ko) |
CN (1) | CN101799632B (ko) |
TW (1) | TWI392975B (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6315959B2 (ja) * | 2013-12-03 | 2018-04-25 | キヤノン株式会社 | 被照明面を照明する光学系、露光装置、インプリント装置、デバイス製造方法、および、光学系の製造方法 |
CN106292189A (zh) * | 2015-05-24 | 2017-01-04 | 上海微电子装备有限公司 | 一种照明系统 |
CN105549339B (zh) * | 2016-02-19 | 2017-08-11 | 京东方科技集团股份有限公司 | 一种曝光机及用于曝光机的光学过滤器 |
JP6674306B2 (ja) * | 2016-03-31 | 2020-04-01 | キヤノン株式会社 | 照明装置、光学装置、インプリント装置、投影装置、及び物品の製造方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61180435A (ja) * | 1985-02-06 | 1986-08-13 | Canon Inc | 照明光学装置 |
JPH05127086A (ja) * | 1991-11-01 | 1993-05-25 | Matsushita Electric Ind Co Ltd | 光強度の均一化方法およびそれを用いた露光装置 |
JPH07153674A (ja) * | 1993-11-30 | 1995-06-16 | Nec Corp | 縮小投影露光装置 |
JPH09171956A (ja) * | 1995-12-21 | 1997-06-30 | Nikon Corp | 露光装置 |
JP4310816B2 (ja) * | 1997-03-14 | 2009-08-12 | 株式会社ニコン | 照明装置、投影露光装置、デバイスの製造方法、及び投影露光装置の調整方法 |
JP2000250226A (ja) * | 1999-02-26 | 2000-09-14 | Nikon Corp | 露光装置 |
JP2000277409A (ja) * | 1999-03-23 | 2000-10-06 | Nikon Corp | 露光装置および照明領域設定装置 |
AU2940600A (en) * | 1999-03-24 | 2000-10-09 | Nikon Corporation | Exposure method and apparatus |
KR20020006690A (ko) * | 1999-03-24 | 2002-01-24 | 시마무라 테루오 | 위치계측장치, 위치계측방법 및 노광장치, 노광방법그리고 중첩계측장치, 중첩계측방법 |
JP3918440B2 (ja) * | 2001-02-09 | 2007-05-23 | ウシオ電機株式会社 | 照度分布均一化フィルタを備えた光照射装置 |
JP2002246297A (ja) * | 2001-02-20 | 2002-08-30 | Canon Inc | 光源装置、その光源装置に用いられるフライアイ・レンズ、その光源装置を有する露光装置 |
JP2003282412A (ja) | 2002-03-25 | 2003-10-03 | Ushio Inc | 光照射装置 |
JP2004245912A (ja) * | 2003-02-12 | 2004-09-02 | Ushio Inc | 光照射装置 |
JP4503967B2 (ja) * | 2003-09-26 | 2010-07-14 | 三星電子株式会社 | 調節フィルタ及び露光装置 |
JP2008281837A (ja) * | 2007-05-11 | 2008-11-20 | Harison Toshiba Lighting Corp | 露光装置 |
-
2009
- 2009-02-09 JP JP2009027048A patent/JP5157945B2/ja active Active
- 2009-11-12 TW TW098138433A patent/TWI392975B/zh active
- 2009-12-09 KR KR1020090121825A patent/KR101247491B1/ko active IP Right Grant
-
2010
- 2010-02-03 CN CN2010101135239A patent/CN101799632B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
KR20100091099A (ko) | 2010-08-18 |
TW201030473A (en) | 2010-08-16 |
KR101247491B1 (ko) | 2013-03-29 |
CN101799632A (zh) | 2010-08-11 |
JP2010182989A (ja) | 2010-08-19 |
CN101799632B (zh) | 2013-06-19 |
TWI392975B (zh) | 2013-04-11 |
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