JP5157945B2 - 光照射装置 - Google Patents

光照射装置 Download PDF

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Publication number
JP5157945B2
JP5157945B2 JP2009027048A JP2009027048A JP5157945B2 JP 5157945 B2 JP5157945 B2 JP 5157945B2 JP 2009027048 A JP2009027048 A JP 2009027048A JP 2009027048 A JP2009027048 A JP 2009027048A JP 5157945 B2 JP5157945 B2 JP 5157945B2
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JP
Japan
Prior art keywords
lens
light
filter
frame
integrator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2009027048A
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English (en)
Japanese (ja)
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JP2010182989A (ja
Inventor
真史 新堀
一好 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Priority to JP2009027048A priority Critical patent/JP5157945B2/ja
Priority to TW098138433A priority patent/TWI392975B/zh
Priority to KR1020090121825A priority patent/KR101247491B1/ko
Priority to CN2010101135239A priority patent/CN101799632B/zh
Publication of JP2010182989A publication Critical patent/JP2010182989A/ja
Application granted granted Critical
Publication of JP5157945B2 publication Critical patent/JP5157945B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
JP2009027048A 2009-02-09 2009-02-09 光照射装置 Active JP5157945B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2009027048A JP5157945B2 (ja) 2009-02-09 2009-02-09 光照射装置
TW098138433A TWI392975B (zh) 2009-02-09 2009-11-12 Light irradiation device
KR1020090121825A KR101247491B1 (ko) 2009-02-09 2009-12-09 광조사 장치
CN2010101135239A CN101799632B (zh) 2009-02-09 2010-02-03 光照射装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009027048A JP5157945B2 (ja) 2009-02-09 2009-02-09 光照射装置

Publications (2)

Publication Number Publication Date
JP2010182989A JP2010182989A (ja) 2010-08-19
JP5157945B2 true JP5157945B2 (ja) 2013-03-06

Family

ID=42595361

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009027048A Active JP5157945B2 (ja) 2009-02-09 2009-02-09 光照射装置

Country Status (4)

Country Link
JP (1) JP5157945B2 (ko)
KR (1) KR101247491B1 (ko)
CN (1) CN101799632B (ko)
TW (1) TWI392975B (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6315959B2 (ja) * 2013-12-03 2018-04-25 キヤノン株式会社 被照明面を照明する光学系、露光装置、インプリント装置、デバイス製造方法、および、光学系の製造方法
CN106292189A (zh) * 2015-05-24 2017-01-04 上海微电子装备有限公司 一种照明系统
CN105549339B (zh) * 2016-02-19 2017-08-11 京东方科技集团股份有限公司 一种曝光机及用于曝光机的光学过滤器
JP6674306B2 (ja) * 2016-03-31 2020-04-01 キヤノン株式会社 照明装置、光学装置、インプリント装置、投影装置、及び物品の製造方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61180435A (ja) * 1985-02-06 1986-08-13 Canon Inc 照明光学装置
JPH05127086A (ja) * 1991-11-01 1993-05-25 Matsushita Electric Ind Co Ltd 光強度の均一化方法およびそれを用いた露光装置
JPH07153674A (ja) * 1993-11-30 1995-06-16 Nec Corp 縮小投影露光装置
JPH09171956A (ja) * 1995-12-21 1997-06-30 Nikon Corp 露光装置
JP4310816B2 (ja) * 1997-03-14 2009-08-12 株式会社ニコン 照明装置、投影露光装置、デバイスの製造方法、及び投影露光装置の調整方法
JP2000250226A (ja) * 1999-02-26 2000-09-14 Nikon Corp 露光装置
JP2000277409A (ja) * 1999-03-23 2000-10-06 Nikon Corp 露光装置および照明領域設定装置
AU2940600A (en) * 1999-03-24 2000-10-09 Nikon Corporation Exposure method and apparatus
KR20020006690A (ko) * 1999-03-24 2002-01-24 시마무라 테루오 위치계측장치, 위치계측방법 및 노광장치, 노광방법그리고 중첩계측장치, 중첩계측방법
JP3918440B2 (ja) * 2001-02-09 2007-05-23 ウシオ電機株式会社 照度分布均一化フィルタを備えた光照射装置
JP2002246297A (ja) * 2001-02-20 2002-08-30 Canon Inc 光源装置、その光源装置に用いられるフライアイ・レンズ、その光源装置を有する露光装置
JP2003282412A (ja) 2002-03-25 2003-10-03 Ushio Inc 光照射装置
JP2004245912A (ja) * 2003-02-12 2004-09-02 Ushio Inc 光照射装置
JP4503967B2 (ja) * 2003-09-26 2010-07-14 三星電子株式会社 調節フィルタ及び露光装置
JP2008281837A (ja) * 2007-05-11 2008-11-20 Harison Toshiba Lighting Corp 露光装置

Also Published As

Publication number Publication date
KR20100091099A (ko) 2010-08-18
TW201030473A (en) 2010-08-16
KR101247491B1 (ko) 2013-03-29
CN101799632A (zh) 2010-08-11
JP2010182989A (ja) 2010-08-19
CN101799632B (zh) 2013-06-19
TWI392975B (zh) 2013-04-11

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