201030473 六、發明說明： 【發明所屬之技術領域】 本發明係關於半導體元件或印刷基板、液晶基板等製 造用曝光裝置所使用的光照射裝置。 【先前技術】 在第12圖中顯示習知之作爲曝光裝置等的光源裝置 φ 所被使用的光照射裝置的構成例。 在該圖中，由燈1所出射的光係藉由聚光鏡2而被聚 光，藉由第1反射鏡3將光路折返，透過波長選擇濾片 10或快門20而入射至積分器透鏡4。 積分器透鏡4係具有將入射至該透鏡4的光的照度分 布在被照射面中形成爲均一的功能。 由積分器透鏡4所出射的光係藉由第2反射鏡5予以 反射而入射至準直器透鏡6。由準直器透鏡6所出射的光 ® 係形成爲平行光而照射在被照射面8。 若爲第12圖所示裝置的情形，在被照射面8係被置 放有遮罩Μ，形成在遮罩Μ的遮罩圖案（未圖示）係透 過投影透鏡7而被投影在塗佈有阻劑等感光材的基板w 上而予以曝光。其中，關於未使用投影透鏡7而將遮罩M 與基板W相密接或近接，而將遮罩圖案曝光在基板w上 的裝置，亦使用同樣構成的光照射裝置。 此外，亦有在被照射面8配置被處理物而非遮罩M， 照射光而藉由光化學反應來進行被處理物之表面改質等的 -5- 201030473 情形。以如上所示之例而言，有液晶顯示元件用之光配向 膜的光配向處理。 以下將基板或配向膜等照射來自光照射裝置之光的對 象物稱爲工件。 積分器透鏡（亦稱爲蠅眼式透鏡（fly-eye lens))係 以縱橫方向並列配置有十數〜百程度的透鏡者。該各透鏡 將入射光作分割，經分割後的光在照射面相疊合，藉此使 照度分布成爲均一。亦即，即使入射至積分器透鏡之光的 @ 照度分布爲不均一，且入射至各透鏡的光的強度有所不同 ，亦因該出射光在同一照射面重複照射而成爲均一的照度 分布。藉由使用如上所述之積分器透鏡，可將被照射面的 照度分布形成爲±5%程度。 在第13圖中顯示因積分器透鏡所造成之上述照度分 布均一化的態樣。其中，在該圖中爲易於說明起見，顯示 有由3個透鏡所構成的積分器透鏡，但是實際上則係設有 十數〜數十透鏡。 © 在第13圖中，來自未圖示的燈的光被聚光，由該圖 的上方入射至積分器透鏡4，由積分器透鏡4所出射的光 係透過準直器透鏡6而被照射在該圖下方的被照射面8的 照射區域。 積分器透鏡4係由第1透鏡L1、第2透鏡L2、第3 透鏡L3所構成，入射至積分器透鏡4之光之圖面左右方 向的照度分布係呈圖中曲線圖1所示之中心部的照度爲高 、周邊部爲低的形狀。 -6- 201030473 積分器透鏡4係將入射至各個透鏡L的光投影在照射 區域全體。在第1透鏡L1係入射具有曲線圖1之A的照 度分布的光，在照射區域全體係作爲具有曲線圖2之A’ 般之照度分布的光而被投影。 同樣地，在第2透鏡L2係入射具有曲線圖1之B的 照度分布的光，在照射區域全體係作爲具有曲線圖2之 B’般之照度分布的光而被投影。在第3透鏡L3係入射具 ❿ 有曲線圖1之C的照度分布的光，在照射區域全體係作爲 具有曲線圖2之C’般之照度分布的光而被投影。 在照射區域中，上述八’、8，、（：’的照度分布被相加 。藉此，照射區域的照度分布係成爲如曲線圖3所示。與 曲線圖1相比，曲線圖3係照度分布已被均一化。 若增加構成積分器透鏡的透鏡數量，即提升如上所示 之照度分布均一的效果。如上所示，藉由使用積分器透鏡 ，可將被照射面8之光照射區域的照度分布形成爲±5%以 ⑩ 。 在將液晶基板或印刷基板等矩形狀工件進行曝光時， 使由光照射裝置所照射的光的形狀配合工件的形狀而形成 爲矩形狀。在如上所示之情形下，若將構成積分器透鏡4 之各個透鏡之相對光軸呈垂直方向的剖面形狀形成爲矩形 狀，則照射區域的形狀即爲矩形狀。以如上所示使用各透 鏡的剖面爲矩形狀的積分器透鏡之例而言，係有例如專利 文獻1所記載的光照射裝置。 此外，在如上所示之光照射裝置中，爲了從由燈1所 201030473 放射的光中僅取出曝光所需波長的光，在積分器透鏡4的 光入射側配置選擇波長的手段，即所謂的波長選擇濾片 1 0，亦例如專利文獻2之照明光學裝置之記載所示，自以 往以來已爲人所知。 其中，以配置在積分器透鏡4之光入射側的濾片而言 ，大部分爲用以遮斷比所需波長爲短的波長的光者。 [先行技術文獻] [專利文獻] [專利文獻1]日本特開2002-237442號公報 [專利文獻2]日本特開昭61-18 04 35號公報 [專利文獻3]日本特開20 04-245912號公報 【發明內容】 (發明所欲解決之課題） 上述波長選擇濾片（以下僅稱之爲濾片）係在石英或 玻璃等透明基板上蒸鍍無機多層膜而形成。所形成的膜係 按照所欲遮斷（所欲透過）的光的波長來設定材質或膜厚 而形成。 近年來，隨著液晶顯示基板或印刷基板的大面積化的 進展，在曝光裝置中亦期望光照射區域的擴大。以其對策 而言，例如專利文獻3所記載之光照射裝置所示，將複數 燈與聚光鏡相組合亦已被提出，光源亦已大型化。 若光源大型化，入射至積分器透鏡的光（光芒）亦變 大，配置在積分器之入射側的濾片亦需爲大型者。例如若 -8- 201030473 爲排列使用4支燈的光照射裝置的情形 7 0 0mm ° 但是，濾片係如上所述在玻璃板等 板）形成有無機蒸鍍膜者。以現實問題 (所欲透過）的波長不會移位的方式， 板的全面而形成均一特性的蒸鍍膜係有 爲至250mm〜3 00mm見方程度爲止。 〇 射裝置中所使用的濾片係難以由一枚玻 針對該問題，我等經精心硏究結果 保持框）及其隔條來保持複數較小的濾 大的濾片加以使用。但是，若由耐久性 ，框架及其隔條通常係由金屬所製作。 隔條係成爲不透明，隔條的粗細亦成爲 。當將如上所示之濾片配置在光路時， 置成在光芒之外，亦會有隔條將光遮光 ® 光照射面下的照度分布均一度降低。 本發明係爲了解決上述習知技術的 本發明之目的爲在具備有藉由框架及其 片板之濾片的光照射裝置中，防止光照 的均一度降低。 (解決課題之手段） 爲了解決上述課題，在本發明中， 排列配置光的入/出射面爲矩形（亦即 ，光芒的直徑約爲 (以下統稱爲玻璃 而言，以所欲遮斷 遍及大面積的玻璃 困難的，在現狀中 因此，在大型光照 璃板來製作。 ，考慮藉由框架（ 片板而作爲一個較 或成本的觀點來看 如此一來，框架或 5mm〜10mm程度 框架的外框即使配 而產生陰影，而使 問題點而硏創者， 隔條來保持複數濾 射面下之照度分布 係具備有：光源； 相對光軸呈垂直方 -9 - 201030473 向的剖面呈矩形）的複數透鏡，入射來自上述光源的光， 而將在光照射面的照度分布形成爲均一的積分器透鏡；及 將由上述光源所放射的光中僅透過特定波長範圍的光的濾 片，該濾片藉由框架及該框架的隔條來保持複數濾片板而 構成的光照射裝置中，將對上述濾片照射光的區域中之上 述濾片的框架隔條延伸的方向，相對積分器透鏡之構成上 述矩形之各邊的方向呈傾斜的方式（不會呈平行的方式） ，而且與上述積分器透鏡之上述矩形的對角線不呈平行的 _ 方式作配置。 在此，入射至上述濾片及積分器透鏡之光的照度係光 芒的中心部分（光軸的附近）爲較強，因此若在該部分以未 施加濾片的隔條的方式作配置，可將隔條陰影的影響減爲 更小，而可防止照度分布均一度的降低。亦即，以在光軸 所通過的透鏡及與其相鄰接的透鏡上未配置有隔條爲宜。 此外，在對上述濾片照射光的區域中，以上述濾片的 所有隔條相對上述積分器透鏡的邊呈傾斜，而且，以對上 @ 述透鏡的對角線不會呈平行的方式作配置爲宜，如上所示 ，可有效減小隔條陰影的影響。 (發明之效果） 在本發明中，以使濾片之框架的隔條延伸的方向相對 於積分器透鏡之各邊的方向呈傾斜的方式，而且以與積分 器透鏡之矩形的對角線不呈平行的方式作配置，因此上述 隔條之部分的陰影不會有因積分器透鏡的作用而在被照射 -10 - 201030473 面的照射區域中被相加的情形，因框架的隔條所造成的陰 影會在光照射面中被分散，而可防止照度分布均一度的降 低。 【實施方式】 第1圖係顯示本發明之實施例之光照射裝置的槪略構 成圖。與第12圖相同的構成係標註相同的元件符號。 _ 在本實施例中，光源Η係由2個燈la、lb、及將來 自各燈的光作反射且聚光的2個聚光鏡2a、2b所構成， 俾以在被照射面8中獲得廣面積的照射區域。關於構成， 由於基本上與習知的光照射裝置相同，故予以省略。 由光源Η所出射的光係藉由第1反射鏡3而將光路 折返，透過供波長選擇之用的濾片10或快門20而入射至 積分器透鏡4。 由積分器透鏡4所出射的光係藉由第2反射鏡5予以 ® 反射，在準直器透鏡6形成爲平行光而被照射在被照射面 8 ° 第2圖係本實施例之濾片1 0的構造，顯示藉由矩形 狀框架（保持框）l〇b及縱橫形成在該框架10b的4條隔 條10c來保持9枚矩形狀濾片板10a的濾片。第2圖（a )係由光入射側觀看濾片1〇的平面圖，第2圖（b)爲（ a )的A - A剖面圖。 濾片10係由：複數濾片板10a、保持各濾片板l〇a 的框架（保持框）l〇b、及相對該框架1 Ob呈彼此平行配 -11 - 201030473 置的隔條l〇c所構成。 濾片板l〇a係如上所述在石英或玻璃等透明基板蒸鍍 有無機多層膜者，例如邊長爲250mm〜300mm的正方形。 保持濾片板l〇a的框架（保持框）10b及其隔條10c爲 銀製，框架l〇b之隔條10c的寬幅爲5mm〜10mm，在內 側形成有凹部，各濾片板l〇a被嵌入在凹部而予以保持。 第3圖係由光入射側觀看積分器透鏡4的圖。在該圖 中，配置有3 X 6 = 1 8個配合光照射區域的形狀所形成且相 @ 對光軸呈垂直方向的剖面爲矩形狀的透鏡L。在實際的光 照射裝置中所使用的積分器透鏡4的透鏡L數爲80個〜 1 00 個。 第4圖與第5圖係顯示在第3圖所示之積分器透鏡4 的光入射側配置第2圖所示之濾片10時之本發明之實施 例之構成圖。第4圖係由光入射側觀看積分器透鏡4與濾 片10的圖，第5圖爲其斜視圖。 如第4圖所示，濾片10係以其框架l〇b的隔條10c Q 相對積分器透鏡4之各透鏡L的邊呈傾斜的方式（以框架 1 〇b相對各透鏡L的排列方向呈傾斜的方式），但是不會 與各透鏡的對角線呈平行的方式作配置。 亦即，當在各透鏡L的光入射面上，使各框架l〇b的 隔條l〇c朝光軸方向投影時，以各隔條l〇c的線狀陰影方 向不會與矩形狀的各透鏡L的各邊呈平行的方式，而且不 會與各透鏡的上述矩形的對角線呈平行的方式作配置。 如上所示，藉由配置框架的隔條10c，可防止框架的 -12- 201030473 隔條IOC所形成的陰影所造成的被照射面中的照度分布均 —度的降低。 其中，在第4圖中，爲易於理解起見，相對於積分器 透鏡4的大小，將濾片10的框架10b極端地顯示爲較粗 。實際上爲再稍微地細，投影在積分器透鏡的入射面的框 架的隔條l〇c的陰影亦較細。 使用第6圖與第7圖來說明若將濾片10之框架1 〇b Ο 的隔條l〇c以如上所述相對積分器透鏡4之各邊的方向呈 傾斜的方式作配置時，即可防止照度分布降低的理由。 第6圖（a)係由光入射側觀看積分器透鏡4的圖。 積分器透鏡4係設爲由以L1〜L9的編號所表示的9個剖 面呈正方形的透鏡所構成者。接著，假設作爲圓形的光照 射區域（光芒）所顯示的光入射至該積分器透鏡。 第6圖（b)與（c)係在該積分器透鏡4的光入射側 配置有濾片10的圖。 ® 爲簡單說明起見，在此濾片10係設爲以框架（濾片 框）l〇b來保持2枚濾片板10a者，位於2枚濾片板10a 之間的1支隔條l〇c影子會落在積分器透鏡4的光入射面 者。 第6圖（b)係將濾片10的框架10b的隔條10c與積 分器透鏡4的各透鏡L的邊呈平行地（將框架10b與矩形 透鏡的邊呈平行地）作配置的情形。第6圖（c )係將濾 片10的框架l〇b的隔條l〇C以相對積分器透鏡的各透鏡 排列方向呈傾斜地（將框架1 Ob相對矩形透鏡的邊呈傾斜 -13- 201030473 地）作配置的情形。 第7圖係顯示如第6圖所示在積分器透鏡4的光入射 側配置有濾片10時的照度分布圖。其中，該圖係以與前 述第13圖相同的影像所作成。 第7圖（a ) ( b) ( c )係第6圖（b )之情形的照度 分布，第7圖（d) (e) (f)係第6圖（c)之情形的照 度分布。 第7圖（a) (d)係顯示由各透鏡所出射的光的照度 © 分布，第7圖（b) (e)係將該等相加後的照度分布，第 7圖（c) (f)係顯示被照射面之光照射區域全體的照度 分布影像。 如上所述，積分器透鏡4係將入射至各個透鏡的光投 影在被照射面的照射區域全體。但是，若爲第6圖（b) 的情形’框架的隔條的陰影係以上下橫越過積分器透鏡的 透鏡L2與L5與L8的中央。 因此，如第7圖（a)所示，透鏡L5投影在照射區域 Θ 的光的照度分布係成爲中央部分的照度降低者。同樣地， 透鏡L2與L8所投影的光照度分布7亦成爲中央部分的 照度降低者。 該等照度分布若藉由積分器透鏡的作用而在被照射面 的照射區域中相加時，如第7圖（b )所示，透鏡L2與 L5與L8之照度低的部分亦會被相加。因此，所相加的照 度分布與其他部分相比，中央部分的照度會極端地低（暗 -14 - 201030473 結果，如第7圖（c)所示，照度極端低（暗）的區 域會橫越過被照射面的照射區域。因此，在光照射區域中 ，無法獲得所希望照度分布的均一度（例如±5% )。 相對於此，若爲第6圖（c)的情形，框架的隔條的 陰影係相對各透鏡排列方向呈傾斜，框架的陰影係橫越過 透鏡L2與L5與L8，但是該場所係透鏡L2爲右側，透鏡 L5爲中央附近，透鏡L8爲左側，各個場所有所不同。 〇 因此，如第7圖（d)所示，透鏡L5投影在照射區域 的光的照度分布會成爲中央部分的照度降低者，但是透鏡 L2所投影的光的照度分布係成爲右側部分的照度降低者 ，透鏡L8所投影的光的照度分布係成爲左側部分的照度 降低者，各照度低的部分並不相一致。 因此，該等照度分布若在被照射面的照射區域中被相 加時，如第7圖（e)所示，透鏡L2與L5與L8之照度 低的部分在照射區域之中不相重疊地而呈分散，雖然會有 G 框架陰影的影響，但是並不會產生照度極端低（暗）的區 域。 結果，如第7圖（f)所示，照度稍低（暗）的區域 以3個部位橫越過被照射面的照射區域，但是該部分的照 度降低較少。因此，在光照射區域中，可得所希望的照度 分布均一度（例如±5% )。 其中，第4圖中，濾片10的框架10b以相對積分器 透鏡4的各透鏡L的邊的方向（各透鏡排列方向）呈約 45°相交叉地作配置，但是並不一定限於最適爲45° 。 -15- 201030473 重點在於使各透鏡L的相同位置不會變暗乃爲重要的。 因此，當將框架l〇b的隔條10c相對積分器透鏡4的 各透鏡L的邊的方向呈傾斜地作配置時，必須以與各透鏡 的對角線不會呈平行的方式（不相一致的方式）作配置。 例如，如第8圖（a)所示，若以垂直於積分器透鏡 4之各透鏡L8的光軸的平面而切時的剖面爲正方形，若 將框架l〇b的隔條10c以相對各透鏡L排列方向呈45° 作配置，則框架的隔條陰影係與積分器透鏡的各透鏡的對 @ 角線相一致（呈平行），因此在透鏡L3、L5、L7係在相 同位置被投影出框架的隔條陰影。因此，如第7圖中之說 明所示，照度低的部分被相加，照度極端低的部分會以斜 向橫越光照射區域。 因此，如第8圖（b )所示，如上所示之情形係調整 濾片10之隔條l〇e對各透鏡L的邊的方向的角度，使隔 條l〇c陰影被投影在各透鏡L的位置不同。 在此，入射至積分器透鏡4的光的照度由於光芒的中 © 心部分（光軸的附近）較強，因此當在該部分上配置濾片10 的隔條10c時，會呈現較大的隔條10c的陰影的影響。 例如，如前述第6圖（b ) ( c )所示，當濾片1 0的 隔條l〇c通過積分器透鏡4的中央部分時，如第7圖所示 ，隔條l〇c陰影的影響強力呈現在通過照度較大的光所入 射的積分器透鏡4的中央部分的透鏡L5的光。 因此，若在積分器透鏡之被配置在光芒中心部分的透 鏡上未配置有濾片10的隔條10c，可減小上述隔條10c -16- 201030473 陰影的影響。在第6圖的例中，係以在積分器透鏡4中央 部分的透鏡L5,亦即光芒的光軸所通過的透鏡（及/或 與光軸相鄰接的透鏡）上未配置濾片10的隔條l〇c爲宜 在第6圖中係顯示配置有9個透鏡L的情形，但是如 前所述在實際的光照射裝置中所使用的積分器透鏡的透鏡 數爲更多。例如，如第9圖所示，積分器4的透鏡L爲 φ 66個，當光軸通過透鏡L30、L3 1、L42、L43之間時，在 光軸相鄰接的透鏡L30、L3 1、L4 2、L4 3之上未放置濾片 1 〇的隔條1 〇 C。 如以上所示，藉由在光芒的光軸所通過的透鏡（及/ 或與光軸相鄰接的透鏡）上未配置有濾片10的隔條10C ，可減小隔條l〇c陰影的影響。 在上述實施例中，係顯示將濾片配置在積分器透鏡之 光入射側之例，惟本發明亦可適用於其他情形。 © 第10圖係將濾片配置在積分器透鏡4之出射側之 例。其他構成與第1圖所示者相同，關於與第1圖相同構 成者，係標註相同的元件符號。 當將本發明之濾片10配置在積分器透鏡4的出射側 時，若離積分器透鏡4的距離較遠，則瀘片10的框架 10b的隔條10c陰影會直接投影在被照射面。但是，若爲 接近積分器透鏡4的出射側，由各透鏡出射的光相叠合的 位置之前（接近積分器透鏡4之側），濾片10的隔條 l〇c以相對於各透鏡L之邊的方向呈傾斜，而且與上述透 -17- 201030473 鏡的對角線不呈平行的方式作配置，藉此可達成在上述實 施例中所示之相同效果。 亦即，在積分器透鏡4之出射側附近配置濾片1〇， 且使上述隔條l〇c以光軸方向投影在各透鏡L的光入出射 面上時，以各隔條10c的陰影方向不會與矩形狀的各透鏡 L的各邊呈平行的方式，而且以不會與各透鏡的上述矩形 的對角線呈平行的方式作配置，藉此可防止框架的隔條 l〇c所形成陰影所造成之被照射面中之照度分布均一度的 @ 降低。 第1 1圖係當以光入射側的透鏡群4a與光出射側的透 鏡群4b構成積分器透鏡4時，將本發明之濾片10配置在 兩透鏡群4a、4b之間之#|。 在大型的光照射裝置中，爲了防止因積分器透鏡4大 型化所造成的成本上升，會有將積分器透鏡4如該圖所示 分成光入射側的透鏡群4a與光出射側的透鏡群4b而構成 的情形。在如上所示之情形下，考慮將濾片1 〇配置在兩 β 透鏡群之間。在如上所示之情形下，濾片1 〇的隔條1 〇c 以相對構成積分器透鏡之各透鏡L之邊的方向（各透鏡L 的排列方向）呈傾斜而且與上述透鏡L的對角線不呈平行 的方式作配置，藉此亦可達成在上述實施例中所示之相同 效果。 【圖式簡單說明】 第1圖係顯示本發明之實施例之光照射裝置的槪略構 -18 - 201030473 成圖。 第2圖係顯示本發明之實施例之濾片之構造圖。 第3圖係由光入射側觀看積分器透鏡的圖。 第4圖係顯示本發明之實施例之瀘片對積分器透鏡的 配置例圖（由光入射側所觀看的圖）。 第5圖係顯示本發明之實施例之濾片對積分器透鏡的 配置例圖（斜視圖）。 〇 第6圖係說明在本發明中可防止照度分布降低之理由 的圖（1 )。 第7圖係說明在本發明中可防止照度分布降低之理由 的圖（2)。 第8圖係說明積分器透鏡之各透鏡爲正方形時之濾片 配置圖。 第9圖係說明濾片之隔條對積分器透鏡之各透鏡之較 佳配置例圖。 第10圖係顯示將本發明之濾片配置在積分器透鏡之 出射側時之構成例圖。 第1 1圖係顯示當以光入射側的透鏡群4a與光出射側 的透鏡群4b構成積分器透鏡4時，將本發明之濾片配置 在積分器透鏡的光入射側與光出射側的透鏡群之間時之構 成例圖。 第12圖係顯示作爲習知之曝光裝置等的光源裝置所 被使用之光照射裝置之構成例圖。 第13圖係顯示藉由積分器透鏡所致之照度分布均一 -19- 201030473 化的態樣圖。 【主要元件符號說明】 1、 1 a、1 b :燈 2、 2a、 2b:聚光鏡 3 :第1反射鏡 4 :積分器透鏡 4a、4b :透鏡群 @ 5 :第2反射鏡 6 :準直器透鏡 7 :投影透鏡 8 :被照射面 1 〇 :濾片 1 〇 a :濾片板 1 Ob :框架 1 0 c :隔條 ❹ 2 0 :快門 Η :光源 L 1〜L 9 :透鏡 Μ :遮罩 W :基板 -20-[Technical Field] The present invention relates to a light irradiation device used in an exposure device for manufacturing a semiconductor element, a printed circuit board, or a liquid crystal substrate. [Prior Art] A configuration example of a light irradiation device which is used as a light source device φ of an exposure device or the like is shown in Fig. 12. In the figure, the light emitted from the lamp 1 is condensed by the condensing mirror 2, and the optical path is folded back by the first reflecting mirror 3, transmitted through the wavelength selective filter 10 or the shutter 20, and incident on the integrator lens 4. The integrator lens 4 has a function of distributing the illuminance of the light incident on the lens 4 to be uniform in the illuminated surface. The light emitted from the integrator lens 4 is reflected by the second mirror 5 and is incident on the collimator lens 6. The light emitted by the collimator lens 6 is formed into parallel light and is irradiated onto the illuminated surface 8. In the case of the device shown in Fig. 12, a mask 置 is placed on the illuminated surface 8, and a mask pattern (not shown) formed in the mask 透过 is projected through the projection lens 7 and projected onto the coating. It is exposed on a substrate w of a photosensitive material such as a resist. Among them, a light irradiation device having the same configuration is also used as a means for exposing the mask pattern to the substrate w without using the projection lens 7 and adhering the mask M to the substrate W. In addition, there is a case where the object to be treated is placed on the illuminated surface 8 instead of the mask M, and the surface of the object to be processed is modified by photochemical reaction by irradiation of light, etc. -5 - 201030473. In the case of the above, there is a photoalignment treatment of the photoalignment film for a liquid crystal display element. Hereinafter, an object that irradiates light from the light irradiation device, such as a substrate or an alignment film, is referred to as a workpiece. The integrator lens (also referred to as a fly-eye lens) is a lens in which a number of lenses of ten to several hundred are arranged side by side in the longitudinal and lateral directions. Each of the lenses divides the incident light, and the divided light is superimposed on the irradiation surface, whereby the illuminance distribution is uniform. That is, even if the @illuminance distribution of the light incident on the integrator lens is not uniform, and the intensity of the light incident on each lens is different, the emitted light is repeatedly irradiated on the same irradiation surface to have a uniform illuminance distribution. By using the integrator lens as described above, the illuminance distribution of the illuminated surface can be formed to the extent of ± 5%. The above-described illumination distribution uniformity caused by the integrator lens is shown in Fig. 13. Here, in the figure, an integrator lens composed of three lenses is shown for ease of explanation, but actually, ten to several tens of lenses are provided. © In Fig. 13, light from a lamp (not shown) is condensed, incident on the integrator lens 4 from above, and the light emitted from the integrator lens 4 is transmitted through the collimator lens 6. The illuminated area of the illuminated surface 8 below the figure. The integrator lens 4 is composed of the first lens L1, the second lens L2, and the third lens L3, and the illuminance distribution in the left-right direction of the light incident on the integrator lens 4 is at the center of the graph shown in FIG. The illuminance of the part is high and the peripheral part is low. -6- 201030473 The integrator lens 4 projects the light incident on each lens L on the entire irradiation area. Light having an illuminance distribution having A of the graph 1 is incident on the first lens L1, and is projected as light having an illuminance distribution like A' of the graph 2 in the entire irradiation region. Similarly, the light having the illuminance distribution of B of the graph 1 is incident on the second lens L2, and the whole system is projected as light having an illuminance distribution like B' of the graph 2 in the entire irradiation region. The third lens L3 is incident on the light having the illuminance distribution of C in the graph 1, and is projected as the light having the illuminance distribution of C' of the graph 2 in the entire irradiation region. In the irradiation region, the illuminance distributions of the above eight ', 8, and (: ' are added. Thereby, the illuminance distribution of the irradiation region is as shown in the graph 3. Compared with the graph 1, the graph 3 is The illuminance distribution has been uniformized. If the number of lenses constituting the integrator lens is increased, the effect of uniformity of the illuminance distribution as shown above is improved. As shown above, by using the integrator lens, the light irradiation region of the illuminated surface 8 can be used. The illuminance distribution is formed to be ±5% to 10. When a rectangular workpiece such as a liquid crystal substrate or a printed substrate is exposed, the shape of the light irradiated by the light irradiation device is formed into a rectangular shape in accordance with the shape of the workpiece. In the case where the cross-sectional shape of the respective optical axes constituting the integrator lens 4 in the vertical direction is formed in a rectangular shape, the shape of the irradiation region is a rectangular shape. An example of the rectangular integrator lens is a light irradiation device described in Patent Document 1. Further, in the light irradiation device as described above, in order to receive from the lamp 1 201030 In the light of 473, only the light of the wavelength required for the exposure is taken out, and the means for selecting the wavelength, that is, the so-called wavelength selective filter 10, is disposed on the light incident side of the integrator lens 4, and the illumination optical device of Patent Document 2 is also described. As shown in the figure, the filter disposed on the light incident side of the integrator lens 4 is mostly a light for blocking a wavelength shorter than a desired wavelength. [PRIOR ART DOCUMENT] [Patent Document 1] JP-A-2002-237442 [Patent Document 2] JP-A-61-18 04 35 (Patent Document 3) Japanese Patent Laid-Open No. 20 04-245912 SUMMARY OF THE INVENTION (Problems to be Solved by the Invention) The wavelength selective filter (hereinafter simply referred to as a filter) is formed by depositing an inorganic multilayer film on a transparent substrate such as quartz or glass. It is formed by setting the material or the film thickness according to the wavelength of the light to be blocked (to be transmitted). In recent years, as the liquid crystal display substrate or the printed circuit board has a large area, the light irradiation region is also desired in the exposure apparatus. Expansion For example, as shown in the light irradiation device described in Patent Document 3, a combination of a plurality of lamps and a condensing mirror has been proposed, and the light source has also been enlarged. When the light source is enlarged, light incident on the integrator lens (ray) is increased. The size of the filter disposed on the incident side of the integrator also needs to be large. For example, if -8-201030473 is a light irradiation device in which four lamps are arranged, the temperature is 70 mm. However, the filter is as described above. An inorganic vapor deposited film is formed on a glass plate or the like. In the case where the wavelength of the actual problem (to be transmitted) is not shifted, the vapor deposition film forming the uniformity of the entire surface of the panel has a degree of 250 mm to 300 mm square. The filter used in the squirting device is difficult to use for one glass. For the sake of this problem, I have carefully studied the results to keep the frame and its spacers to keep a large number of filter filters that are smaller. However, in terms of durability, the frame and its spacers are usually made of metal. The spacers become opaque and the thickness of the spacers becomes. When the filter shown above is placed on the optical path, it is placed outside the ray, and there is also a spacer that uniformly reduces the illuminance distribution under the light-shielding surface. SUMMARY OF THE INVENTION The present invention has been made to solve the above-described problems of the prior art, and to prevent the uniformity of illumination from being lowered in a light irradiation device including a filter having a frame and a sheet thereof. (Means for Solving the Problem) In order to solve the above problems, in the present invention, the entrance/exit surfaces of the arrayed light are rectangular (that is, the diameter of the ray is approximately (hereinafter collectively referred to as glass, the desired occlusion is large) The area of the glass is difficult, in the current situation, therefore, made in large-scale glass panels. Considering the frame (the sheet as a more cost-effective point of view, the frame or the frame of 5mm~10mm degree) Even if the frame is matched to create a shadow, and the problem is caused by the creator, the illuminance distribution of the spacer to maintain the complex filter surface is provided with: the light source; the relative optical axis is perpendicular to the -9 - 201030473 direction is rectangular) a plurality of lenses that are incident on the light from the light source, and that have an illuminance distribution on the light-irradiated surface as a uniform integrator lens; and a filter that transmits only light of a specific wavelength range among the light emitted by the light source, the filter In a light irradiation device comprising a frame and a spacer of the frame for holding a plurality of filter plates, a frame spacer of the filter in a region where the filter is irradiated with light The direction of extension is inclined relative to the direction of the sides of the integrator lens constituting the rectangle (not in a parallel manner), and is not parallel to the diagonal of the rectangle of the integrator lens Here, since the illuminance of the light incident on the filter and the integrator lens is strong in the central portion of the light (near the optical axis), the spacer is not disposed in the portion where the filter is not applied. The influence of the shadow of the spacer can be reduced to be smaller, and the uniformity of the illuminance distribution can be prevented from being lowered. That is, it is preferable that the lens passing through the optical axis and the lens adjacent thereto are not provided with a spacer. Further, in the region where the filter is irradiated with light, all the spacers of the filter are inclined with respect to the side of the integrator lens, and the diagonal lines of the upper lens are not parallel. Preferably, as shown above, the effect of the shadow of the spacer can be effectively reduced. (Effect of the Invention) In the present invention, the direction in which the spacer of the frame of the filter extends is opposite to the direction of each side of the integrator lens Present In an oblique manner, and arranged in a manner that is not parallel to the diagonal of the rectangle of the integrator lens, the shadow of the portion of the spacer is not illuminated by the action of the integrator lens -10 - 201030473 In the case where the irradiation regions are added, the shadows caused by the spacers of the frame are dispersed in the light irradiation surface, and the uniformity of the illuminance distribution can be prevented from being lowered. [Embodiment] FIG. 1 shows the present invention. The schematic configuration of the light irradiation device of the embodiment is the same as that of Fig. 12. In the present embodiment, the light source is composed of two lamps la, lb, and will be from each lamp. The light is reflected and collected by two condensing mirrors 2a and 2b, and a wide area of the irradiation area is obtained in the illuminated surface 8. The configuration is basically the same as that of the conventional light irradiation device, and therefore will be omitted. The light emitted from the light source 折 is folded back by the first reflecting mirror 3, and transmitted to the integrator lens 4 through the filter 10 or the shutter 20 for wavelength selection. The light emitted from the integrator lens 4 is reflected by the second mirror 5, and is collimated by the collimator lens 6 to be irradiated onto the illuminated surface 8°. FIG. 2 is a filter of the embodiment. The structure of 10 shows a filter in which nine rectangular filter sheets 10a are held by a rectangular frame (holding frame) 10b and four spacers 10c formed in the frame 10b. Fig. 2(a) is a plan view of the filter 1A viewed from the light incident side, and Fig. 2(b) is a cross-sectional view taken along line A-A of (a). The filter 10 is composed of a plurality of filter plates 10a, a frame (holding frame) lb holding each of the filter plates 10a, and a spacer which is disposed parallel to each other with respect to the frame 1 Ob -11 - 201030473. c constitutes. The filter plate 10a is a layer in which an inorganic multilayer film is deposited on a transparent substrate such as quartz or glass as described above, for example, a square having a side length of 250 mm to 300 mm. The frame (holding frame) 10b and the spacer 10c for holding the filter plate 10a are made of silver, and the spacer 10c of the frame 10b has a width of 5 mm to 10 mm, and a concave portion is formed on the inner side, and each filter plate is formed. a is embedded in the recess and held. Fig. 3 is a view of the integrator lens 4 viewed from the light incident side. In the figure, a lens L having a shape in which 3 X 6 = 18 matching light irradiation regions are formed and a cross section perpendicular to the optical axis is arranged is arranged. The number of lenses L of the integrator lens 4 used in the actual light irradiation device is 80 to 100. Fig. 4 and Fig. 5 are views showing a configuration of an embodiment of the present invention when the filter 10 shown in Fig. 2 is placed on the light incident side of the integrator lens 4 shown in Fig. 3. Fig. 4 is a view showing the integrator lens 4 and the filter 10 viewed from the light incident side, and Fig. 5 is a perspective view thereof. As shown in Fig. 4, the filter 10 is inclined such that the spacer 10c Q of the frame 10b is inclined with respect to the side of each lens L of the integrator lens 4 (the arrangement direction of the frame 1 〇b with respect to each lens L) It is inclined, but it is not arranged in parallel with the diagonal of each lens. In other words, when the spacers l〇c of the respective frames 10b are projected toward the optical axis direction on the light incident surface of each lens L, the linear shadow directions of the respective spacers l〇c are not rectangular. The sides of the respective lenses L are parallel and are not arranged in parallel with the diagonal of the rectangle of each lens. As described above, by arranging the spacer 10c of the frame, the uniformity of the illuminance distribution in the illuminated surface caused by the shadow formed by the -12-201030473 spacer IOC of the frame can be prevented. Here, in Fig. 4, the frame 10b of the filter 10 is extremely thickly displayed with respect to the size of the integrator lens 4 for the sake of easy understanding. In fact, to be slightly thinner, the shadow of the spacer l〇c projected on the entrance surface of the integrator lens is also fine. 6 and 7 are used to explain that when the spacer l〇c of the frame 1 〇b 滤 of the filter 10 is arranged to be inclined with respect to the direction of each side of the integrator lens 4 as described above, The reason why the illuminance distribution can be prevented from being lowered. Fig. 6(a) is a view of the integrator lens 4 viewed from the light incident side. The integrator lens 4 is composed of nine lenses having a square cross section indicated by the numbers of L1 to L9. Next, it is assumed that light displayed as a circular illumination area (ray) is incident on the integrator lens. Figs. 6(b) and 6(c) are diagrams in which the filter 10 is disposed on the light incident side of the integrator lens 4. ® For the sake of simplicity, the filter 10 is set to be a frame (filter frame) l〇b for holding two filter sheets 10a, and one spacer between the two filter sheets 10a. The shadow of 〇c will fall on the light incident surface of the integrator lens 4. Fig. 6(b) shows a case where the spacer 10c of the frame 10b of the filter 10 is arranged in parallel with the side of each lens L of the integrator lens 4 (the frame 10b is parallel to the side of the rectangular lens). Fig. 6(c) shows that the spacer l〇C of the frame 10b of the filter 10 is inclined with respect to the lens arrangement direction of the integrator lens (the frame 1 Ob is inclined with respect to the side of the rectangular lens-13-201030473 Ground) for configuration. Fig. 7 is a view showing an illuminance distribution diagram when the filter 10 is disposed on the light incident side of the integrator lens 4 as shown in Fig. 6. Here, the drawing is made of the same image as the above-mentioned Fig. 13. Fig. 7(a) (b) (c) is the illuminance distribution in the case of Fig. 6(b), and Fig. 7(d)(e)(f) is the illuminance distribution in the case of Fig. 6(c). Fig. 7(a)(d) shows the illuminance© distribution of the light emitted by each lens, and Fig. 7(b)(e) shows the illuminance distribution after the addition, Fig. 7(c) ( f) is an illuminance distribution image showing the entire light-irradiated area of the illuminated surface. As described above, the integrator lens 4 projects the light incident on each lens on the entire irradiation area of the illuminated surface. However, in the case of Fig. 6(b), the shadow of the spacer of the frame traverses the center of the lenses L2 and L5 and L8 of the integrator lens. Therefore, as shown in Fig. 7(a), the illuminance distribution of the light projected by the lens L5 in the irradiation area Θ becomes the illuminance lowering in the central portion. Similarly, the illuminance distribution 7 projected by the lenses L2 and L8 also becomes the illuminance reducer of the central portion. When the illuminance distributions are added in the irradiation area of the illuminated surface by the action of the integrator lens, as shown in Fig. 7(b), the portions of the lenses L2 and L5 and L8 having low illuminance are also phased. plus. Therefore, the added illuminance distribution is extremely low in illumination in the central portion compared to other parts (dark-14 - 201030473 results, as shown in Fig. 7(c), the area where the illuminance is extremely low (dark) will be horizontal The irradiation area of the illuminated surface is crossed. Therefore, in the light irradiation region, the uniformity of the desired illuminance distribution (for example, ±5%) cannot be obtained. In contrast, in the case of Fig. 6(c), the frame is separated. The shadow of the strip is inclined with respect to the direction in which the lenses are arranged, and the shadow of the frame traverses the lenses L2 and L5 and L8, but the lens L2 is the right side, the lens L5 is near the center, and the lens L8 is the left side, and the places are different. Therefore, as shown in Fig. 7(d), the illuminance distribution of the light projected by the lens L5 in the irradiation region becomes the illuminance reduction of the central portion, but the illuminance distribution of the light projected by the lens L2 becomes the illuminance of the right portion. In the lowering, the illuminance distribution of the light projected by the lens L8 is such that the illuminance of the left side portion is lowered, and the portions having low illuminance do not coincide with each other. Therefore, the illuminance distribution is in the irradiation area of the illuminated surface. When added, as shown in Fig. 7(e), the portions of the lens L2 and L5 and L8 having low illuminance are dispersed without overlapping in the irradiation region, although there is a shadow of the G frame, but An area where the illuminance is extremely low (dark) is not generated. As a result, as shown in Fig. 7(f), the area where the illuminance is slightly lower (dark) traverses the irradiation area of the illuminated surface at three places, but the illuminance of the part The reduction is less. Therefore, in the light irradiation region, the desired illuminance distribution uniformity (for example, ±5%) can be obtained. wherein, in Fig. 4, the frame 10b of the filter 10 is opposed to each lens of the integrator lens 4. The direction of the sides of L (the direction in which the lenses are arranged) is arranged at approximately 45°, but is not necessarily limited to an optimum of 45°. -15- 201030473 The point is that the same position of each lens L is not darkened. Therefore, when the spacer 10c of the frame 10b is disposed obliquely with respect to the direction of the side of each lens L of the integrator lens 4, it must be parallel to the diagonal of each lens ( Inconsistent way) for configuration. For example, as shown in Figure 8 (a As shown in the figure, when the cross section perpendicular to the plane of the optical axis of each lens L8 of the integrator lens 4 is square, if the spacer 10c of the frame 10b is arranged at 45° with respect to the direction of the respective lenses L, In the configuration, the shadow of the spacer of the frame is consistent with the @角角 of the lenses of the integrator lens (parallel), so the spacers of the frame are projected at the same position in the lenses L3, L5, and L7. As shown in the description of Fig. 7, the portions where the illuminance is low are added, and the portion where the illuminance is extremely low traverses the region where the light is irradiated obliquely. Therefore, as shown in Fig. 8(b), as shown above In this case, the angle of the spacer l〇e of the filter 10 to the direction of the side of each lens L is adjusted so that the shadow of the spacer 10c is projected at the position of each lens L. Here, since the illuminance of the light incident on the integrator lens 4 is strong due to the middle portion of the ray (near the optical axis), when the spacer 10c of the filter 10 is disposed on the portion, the illuminance is large. The effect of the shadow of the spacer 10c. For example, as shown in the above-mentioned FIG. 6(b)(c), when the spacer l〇c of the filter 10 passes through the central portion of the integrator lens 4, as shown in FIG. 7, the spacer l〇c is shaded. The influence is strongly exhibited by the light of the lens L5 at the central portion of the integrator lens 4 incident by the illuminating light. Therefore, if the spacer 10c of the filter 10 is not disposed on the lens of the integrator lens disposed at the center portion of the ray, the influence of the shadow of the spacer 10c - 16 - 201030473 can be reduced. In the example of Fig. 6, the filter 10 is not disposed on the lens L5 in the central portion of the integrator lens 4, that is, the lens through which the optical axis of the light passes (and/or the lens adjacent to the optical axis). The spacer l〇c is preferably a case where nine lenses L are arranged in Fig. 6, but the number of lenses of the integrator lens used in the actual light irradiation device is as described above. For example, as shown in Fig. 9, the lens L of the integrator 4 is φ 66, and when the optical axis passes between the lenses L30, L3 1, L42, and L43, the lenses L30 and L3 1 adjacent to each other on the optical axis, L4 2, L4 3 is not placed on the filter 1 〇 spacer 1 〇C. As shown above, the spacer 10c can be reduced by the spacer 10C on which the filter 10 is not disposed on the lens (and/or the lens adjacent to the optical axis) through which the optical axis of the light passes. Impact. In the above embodiment, the example in which the filter is disposed on the light incident side of the integrator lens is shown, but the present invention is also applicable to other cases. © Fig. 10 shows an example in which the filter is placed on the exit side of the integrator lens 4. Other configurations are the same as those in Fig. 1, and the same components as those in Fig. 1 are denoted by the same reference numerals. When the filter 10 of the present invention is disposed on the exit side of the integrator lens 4, if the distance from the integrator lens 4 is long, the shadow of the spacer 10c of the frame 10b of the cymbal 10 is directly projected onto the illuminated surface. However, if it is close to the exit side of the integrator lens 4, before the position where the light emitted by each lens overlaps (close to the side of the integrator lens 4), the spacer 10c of the filter 10 is opposed to each lens L. The direction of the side is inclined, and is arranged in a manner that is not parallel to the diagonal of the above-mentioned -17-201030473 mirror, whereby the same effect as shown in the above embodiment can be achieved. In other words, when the filter 1 is disposed in the vicinity of the exit side of the integrator lens 4, and the spacers l〇c are projected on the light entrance/exit surface of each lens L in the optical axis direction, the shadow of each spacer 10c is used. The direction is not parallel to the sides of the rectangular lenses L, and is arranged so as not to be parallel to the diagonal of the rectangle of each lens, thereby preventing the spacers of the frame from being 〇c The illuminance distribution in the illuminated surface caused by the shadow formed is uniformly reduced by @. In the first embodiment, when the lens group 4a on the light incident side and the lens group 4b on the light exit side constitute the integrator lens 4, the filter 10 of the present invention is disposed between the two lens groups 4a and 4b. In the large-sized light irradiation device, in order to prevent an increase in cost due to an increase in size of the integrator lens 4, the integrator lens 4 is divided into a lens group 4a on the light incident side and a lens group on the light exit side as shown in the figure. 4b constitutes a situation. In the case shown above, it is considered to arrange the filter 1 之间 between the two β lens groups. In the case as described above, the spacer 1 〇c of the filter 1 呈 is inclined with respect to the direction of the side of each lens L constituting the integrator lens (the arrangement direction of each lens L) and diagonally opposite to the above-mentioned lens L The lines are not arranged in a parallel manner, whereby the same effects as shown in the above embodiments can be achieved. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing the outline of a light irradiation device of an embodiment of the present invention -18 - 201030473. Fig. 2 is a view showing the construction of a filter according to an embodiment of the present invention. Fig. 3 is a view of the integrator lens viewed from the light incident side. Fig. 4 is a view showing an arrangement example of the cymbal-to-integrator lens of the embodiment of the present invention (viewed from the light incident side). Fig. 5 is a view showing an arrangement of a filter to an integrator lens (oblique view) of an embodiment of the present invention. Fig. 6 is a view (1) for explaining the reason why the illuminance distribution can be prevented from being lowered in the present invention. Fig. 7 is a view (2) for explaining the reason why the illuminance distribution can be prevented from being lowered in the present invention. Fig. 8 is a view showing a filter arrangement diagram when the lenses of the integrator lens are square. Figure 9 is a diagram showing a preferred arrangement of the spacers of the filter to the lenses of the integrator lens. Fig. 10 is a view showing an example of the configuration in which the filter of the present invention is disposed on the exit side of the integrator lens. In the first embodiment, when the lens group 4a on the light incident side and the lens group 4b on the light exit side constitute the integrator lens 4, the filter of the present invention is disposed on the light incident side and the light exit side of the integrator lens. An example of the structure between the lens groups. Fig. 12 is a view showing an example of the configuration of a light irradiation device used as a light source device such as a conventional exposure device. Figure 13 is a diagram showing the uniformity of illuminance distribution by the integrator lens -19-201030473. [Description of main component symbols] 1, 1 a, 1 b: lamp 2, 2a, 2b: condensing mirror 3: first mirror 4: integrator lens 4a, 4b: lens group @ 5: second mirror 6: collimation Lens 7 : Projection lens 8 : illuminated surface 1 〇: filter 1 〇 a : filter plate 1 Ob : frame 1 0 c : spacer ❹ 2 0 : shutter Η : light source L 1 to L 9 : lens Μ : Mask W: Substrate-20-