JPH05127086A - Method for uniformizing light intensity and exposure device using the same - Google Patents

Method for uniformizing light intensity and exposure device using the same

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Publication number
JPH05127086A
JPH05127086A JP28746991A JP28746991A JPH05127086A JP H05127086 A JPH05127086 A JP H05127086A JP 28746991 A JP28746991 A JP 28746991A JP 28746991 A JP28746991 A JP 28746991A JP H05127086 A JPH05127086 A JP H05127086A
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light
exposure
surface
optical
system
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JP28746991A
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Japanese (ja)
Inventor
Yasuo Nakajima
Yasuhiro Tanaka
Yoshiharu Yamamoto
Tomonobu Yoshikawa
康夫 中嶋
智延 吉川
義春 山本
康弘 田中
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Matsushita Electric Ind Co Ltd
松下電器産業株式会社
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70058Mask illumination systems

Abstract

PURPOSE: To obtain the uniform illumination distribution in the light exposure surface in an illumination optical system using a integrator optical system.
CONSTITUTION: By providing a light shielding means 6 shielding a light incident beam 1 just before an integrator optical system 2, the only one part of incident light quantity distribution is controlled. By deteriorating one part of the light intensity on the light exposure surface 5, the illumination distribution of the exposure surface 5 can be uniformized. Thus, the light shielding means with rougher accuracy than inserting a uniform transparent filter to just before the exposure light can be used.
COPYRIGHT: (C)1993,JPO&Japio

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【産業上の利用分野】本発明はレーザ光などを光源とした照明光学系において、露光面において均一な照度分布を得るための光強度の均一化方法に関するものである。 The present invention relates to the illumination optical system such as a laser beam as a light source, to a uniform method of light intensity in order to obtain a uniform illuminance distribution in the exposure plane.

【0002】 [0002]

【従来の技術】縮小投影型装置などに代表される露光装置では、露光面を均一に照明することが最重要課題である。 BACKGROUND OF THE INVENTION exposure apparatus typified reduction projection apparatus, it is paramount to uniformly illuminate the exposure plane. そのため光源の光を多数の2次光源に分割して、露光面を多重に照明するためにはインテグレータ光学系が用いられている。 Therefore by dividing the light from the light source into a number of secondary light sources, in order to illuminate the exposure plane to multiplex the integrator optical system is used. (例えば特開昭58−147708号公報) 図5に従来のインテグレータを用いた照明光学系を示す。 It shows an illumination optical system using a conventional integrator (e.g. JP 58-147708 JP) FIG. インテグレータに入射する光線20はインテグレータ光学系21によって2次光源22に分割される。 It rays 20 incident on the integrator is divided by the integrator optical system 21 to the secondary light source 22. インテグレータの数は図面では便宜上4個であるが、実際には10×10程度のインテグレータを用いることによって100個の2次光源を作ることができる。 The number of integrators in the drawing is a convenience four, actually can make 100 a secondary light source by using the integrator of about 10 × 10. 2次光源2 Secondary light source 2
2を集光レンズ23によって露光面24を照明する。 2 to illuminate the exposure surface 24 by the condenser lens 23. すなわち露光面24は2次光源の数だけ多重に照明される。 That exposure surface 24 is illuminated in multiple the number of secondary light sources. したがって入射光線20の強度分布が図6に示すように不均一な場合でも、露光面24の照度分布は図7に示すように均一化される。 Thus the intensity distribution of the incident light 20 even if such a non-uniform 6, the illuminance distribution of the exposure surface 24 is uniform as shown in FIG.

【0003】 [0003]

【発明が解決しようとする課題】しかしながら、上記のような構成では、照明光学系の設計値からのずれや、アライメント誤差により、必ずしも均一な照明が完全に得られるとは限らない。 [SUMMARY OF THE INVENTION However, in the above configuration, and deviation from the design value of the illumination optical system, the alignment error, not necessarily uniform illumination can be obtained completely. 例えば、入射光線20の強度分布が、図8に示すように光軸に対して左右非対称になると、露光面24の照度分布も図9に示すように非対称性が残存して、照度分布の均一度が悪くなる。 For example, the intensity distribution of the incident light beam 20 is equal to or asymmetric with respect to the optical axis as shown in FIG. 8, the illuminance distribution of the exposure surface 24 remains asymmetry as shown in FIG. 9, the illuminance distribution uniform once it becomes worse. したがって露光面での光強度の均一性を高めるためには、非常に高精度な光学系の加工が必要になったり、あるいは光学系の調整が困難になったりする。 Therefore in order to enhance the uniformity of light intensity at the exposure plane it is very or require machining of high-precision optical system, or the adjustment of the optical system becomes difficult.

【0004】また露光面の近くに、照度の不均一性に応じた、透過率を持ったフィルターを配置することにより、均一な照度分布を得る方法もあるが、例えば1%の均一性を得るためには、フィルターの透過率の精度も1 [0004] close to the exposure surface, corresponding to the non-uniformity of illumination, by placing a filter having a transmittance, there is a method of obtaining a uniform illuminance distribution is obtained, for example, 1% homogeneity in order, the accuracy of the transmittance of the filter 1
%の精度で制御しなければならないなどの問題点を有していた。 %, Such as it must be controlled with an accuracy of had a problem.

【0005】本発明は上記問題点に鑑み、精度の高いアライメントや、露光面直前の透過率フィルターを用いる事なく、簡単な光線遮蔽物などによって、高精度な光強度の均一化方法を提供するものである。 [0005] The present invention has been made in view of the above problems, a high alignment and accuracy, without using the transmission filter of the exposure surface immediately before, such as by simple light shield, provides a uniform method for high-precision light intensity it is intended.

【0006】 [0006]

【課題を解決するための手段】上記問題点を解決するために、本発明の光強度の均一化方法は、光源と前記光源を分割して多数の2次光源を形成するインテグレータ光学系と前記インテグレータ光学系により多重に照明される露光面からなり、前記インテグレータ光学系の一部を前記露光面の光強度が均一化するよう光線遮光手段によって光線の透過量を調整するように構成したものである。 In order to solve the above problems SUMMARY OF THE INVENTION, homogenization method of the light intensity of the present invention includes an integrator optical system for forming a plurality of secondary light sources by dividing light source and the light source the It consists exposure surface to be illuminated multiplexed by the integrator optical system, which was configured to adjust the amount of transmitted light by ray shielding means to the light intensity equalizing the exposure surface a part of the integrator optical system is there.

【0007】 [0007]

【作用】本発明は上記した構成によって、不均一な強度分布を持つ入射光をインテグレータ光学系により分割し、それぞれの2次光源から、露光面を多重に照明する。 The configuration DETAILED DESCRIPTION OF THE INVENTION The present invention described above, the incident light having a non-uniform intensity distribution divided by the integrator optical system, from the respective secondary light sources to illuminate the exposure plane to multiplex. この状態において、露光面は入射光よりも光強度の均一化が進んでいる。 In this state, the exposure surface is progressing uniformity of light intensity than the incident light. しかしアライメント誤差や、光学系の製作誤差により不均一性が残存する。 However or alignment error, nonuniformity remains due to manufacturing errors of the optical system. これを取り除くために、インテグレータ光学系の一部を遮光する。 To remove this, shading a part of the integrator optical system. 遮光物は光線をまったく透過させないか、あるいは一部透過するようなものであるため、露光面を照射している一部分の光強度が低下する。 Since shader or not at all transmitted through the beam, or is such as to partially transmitting, the light intensity of a portion which is irradiated with the exposure surface is reduced. インテグレータ光学系の中の1つのレンズの一部のみを遮光した場合、露光面での光強度の低下に与える影響は、インテグレータの全個数をn個とした場合1/nになる。 If you shielding only a portion of the one lens in the integrator optical system, the effect on reduction of the light intensity at the exposure plane is to 1 / n If the total number of the integrator and is n. したがって遮光部が光線を100%透過させないものであっても、インテグレータ光学系が10×10すなわち100個の場合は、1% Therefore, even those light shielding part does not transmit the light 100% if the integrator optical system 10 × 10 i.e. 100 1%
の精度で露光面の光強度の不均一性を補正することができることとなる。 And thus it is possible to correct the non-uniformity of the light intensity of the exposure surface in accuracy.

【0008】 [0008]

【実施例】以下、本発明の実施例の光強度の均一化方法について、図面を参照しながら説明する。 EXAMPLES Hereinafter, the equalizing method of the light intensity of the embodiment of the present invention will be described with reference to the drawings. 図1は本発明の実施例を示す光路図である。 Figure 1 is an optical path diagram showing an embodiment of the present invention. 入射光1はインテグレータ光学系2によって多数の2次光源3に分割される。 Incident light 1 is split into a number of secondary light sources 3 by the integrator optical system 2. 2
次光源3は集光レンズ4によって露光面5を多重に照射する。 The next light source 3 for irradiating the exposure surface 5 by the condenser lens 4 to the multiplexer. インテグレータ光学系の一部に遮光物6を挿入することによって入射光線の一部は遮られて、遮光光線部7を形成する。 It is blocked some of the incident light by inserting a shader 6 in a part of the integrator optical system to form the light shielding light unit 7.

【0009】入射光1の光の強度分布が図8に示すような対称性を欠いているため、遮光物6を挿入する前の露光面5の光強度分布が図9のように不均一になっている場合を考える。 [0009] Since the intensity distribution of the incident light first light lacks symmetry as shown in FIG. 8, the light intensity distribution of the exposure surface 5 before inserting the shader 6 is so unevenly 9 consider the case that going on. 遮光物6が全く光を透過せず、かつ入射光1の光源がレーザ光の様に点光源と見なせる場合は、 If the obstruction 6 is not at all transmitted light, and the light source incident light 1 can be regarded as a point light source like a laser beam,
遮光光線部7により遮られた露光面5の一部が、インテグレータ光学系のレンズ総数をnとしたとき1/nだけ光量が低下する。 Some of the exposure surface 5 is blocked by the light blocking light unit 7, the light amount is reduced by 1 / n when the lens total number of the integrator optical system and the n. したがって光強度分布は、図2のようになって、遮光物6を挿入する以前よりも露光面5における光強度の均一性が増すことになる。 Thus the light intensity distribution becomes as shown in FIG. 2, so that the uniformity of the light intensity is increased at the exposure surface 5 than before inserting the shader 6.

【0010】さらに光源が点光源でなく有限の大きさを持っている場合には入射光1は完全な平行光線だけでなく斜めの光線も含まれることになる。 Furthermore the light source is to be included rays obliquely not only the incident light 1 is perfectly parallel rays when they have a finite size, not a point light source. したがって、遮光物6によってできる露光面上の影は、図2の場合のようにエッジが鮮明なものではなく、図3に示すようにエッジが滑らかになる。 Therefore, the shadow on the exposure plane can be by shaders 6, not edge is sharp as in the case of FIG. 2, smooth edge as shown in FIG. その結果図3に示すように光強度の均一性をより良好に改善できる場合もある。 Sometimes result, as shown in Figure 3 the uniformity of light intensity can be better improved.

【0011】また遮光物6は完全に光を透過させないようなものである必要はなく、透過量が滑らかに変化するものを、点光源光学系の場合に用いて図3のような結果を得ることも可能である。 [0011] Shaders 6 is not entirely necessary is such as not to transmit light, what amount of transmission changes smoothly to give the results shown in FIG. 3 used in case of a point light source optical system it is also possible. その場合の遮光物6の透過量の制御は、遮光物6を露光面5の直前に挿入する場合に比べて、1/nの精度で事足りる。 Control of the amount of transmission of light shielding material 6 in this case, as compared with the case of inserting the shader 6 immediately before the exposure surface 5, suffice with a precision of 1 / n.

【0012】さらに遮光物6はインテグレータ光学系2 Furthermore shader 6 integrator optical system 2
の中のレンズ1つのみに限定する必要はなく、複数のレンズに対してさまざまな遮光物を挿入することにより、 Need not be limited to the lens only one of the, by inserting various shaders for multiple lenses,
よりきめ細かな光強度の均一化を実施することもできる。 It is also possible to implement more uniform fine-grained light intensity. またインテグレータ光学系2のどのレンズに遮光物を挿入するかについては、入射光1の強度分布に応じて、低下量を増やしたいときには、入射光量の大きいレンズの直前に挿入するなどをして、容易に光強度の均一化のための光量低下量の調整を行うことができる。 With respect to the Insert the shaders in the lens of the integrator optical system 2 throat, in accordance with the intensity distribution of the incident light 1, when it is desired to increase the reduction amount, and the like are inserted immediately before the large lens of the incident light intensity, readily can be adjusted light amount reduction amount for uniformity of light intensity.

【0013】また遮光物6はインテグレータ光学系2と接触していても良く、さらに実施令では光線の入射側に挿入したが、出射側に密着させても、あるいは出射側から少し離れた位置に配置しても良い。 [0013] Shaders 6 may be in contact with the integrator optical system 2 has been inserted on the incident side of the light beam in still carried Ordinance, it is brought into close contact with the exit side, or slightly away from the exit side it may be arranged. またこの光強度の均一化方法を用いることにより、露光面が均一な照度分布をもった露光装置を実現することができる。 Also by using a uniform method for the light intensity, it can be exposed surface to realize the exposure apparatus having a uniform illuminance distribution.

【0014】図4はエキシマレーザを用いた縮小投影露光装置の概略図である。 [0014] FIG. 4 is a schematic view of a reduction projection exposure apparatus using an excimer laser. エキシマレーザ8の光路はミラー9、11、および15により曲げられる。 The optical path of the excimer laser 8 is bent by the mirror 9, 11, and 15. その間ビームエキスパンダー10によりエキシマレーザ8の光線の形状を矩形に近づけた上で、インテグレータ光学系13 After having approached to the shape of the beam of the excimer laser 8 to the rectangular through between the beam expander 10, the integrator optical system 13
に入射する。 Incident on. インテグレータ光学系13の直前にはレチクル面17の光強度の均一化を図るための光線遮光フィルター12を挿入する。 Immediately before the integrator optical system 13 inserts a light shielding filter 12 in order to uniform the light intensity of the reticle plane 17. インテグレータ光学系13を出射した光は、集光レンズ14、コンデンサーレンズ16 Light emitted from the integrator optical system 13, the condenser lens 14, a condenser lens 16
を通って、レチクル面17を照明する。 Through, illuminating the reticle surface 17. レチクル面17 Reticle plane 17
に描かれたパターンは縮小投影レンズ18によりウェハー19面上に露光される。 Pattern drawn is exposed on the wafer 19 surface by the reduction projection lens 18. 一般にエキシマレーザを用いた縮小投影露光装置などでは、レチクル面、あるいはウェハー面上の光強度の均一度を数%の範囲に制御する必要がある。 Generally in such reduction projection exposure apparatus using an excimer laser, it is necessary to control the uniformity of the light intensity on the reticle surface or wafer surface in the range of a few percent. このとき光線遮光フィルター12をレチクル面17の直前に挿入した場合は、光線遮光フィルターの透過率そのものを数%の精度に制御する必要があったが、インテグレータ光学系13の直前に挿入することで、その透過量の精度はインテグレータ光学系のレンズ個数分の1に緩和することができる。 The light shielding filter 12 at this time if you inserted just before the reticle plane 17, it was necessary to control the transmission itself of the light shielding filter a few percent accuracy, by inserting immediately before the integrator optical system 13 , the permeation amount of accuracy can be relaxed to one lens number of the integrator optical system component.

【0015】 [0015]

【発明の効果】以上のように本発明は、光源と前記光源を分割して多数の2次光源を形成するインテグレータ光学系と前記インテグレータ光学系により多重に照明される露光面からなり、前記インテグレータ光学系の一部を光線遮光手段によって光線の透過量を調整することにより、精度の低い、あるいは光線を完全に遮光してしまうようなフィルターで、露光面の光強度の均一化を図ることができる。 The present invention as described above, according to the present invention consists of an exposure surface to be illuminated multiplexed by the integrator optical system and the integrator optical system for forming a plurality of secondary light sources by dividing light source and the light source, the integrator by adjusting the amount of transmitted light by ray shielding means a part of the optical system, less accurate, or a filter that would completely shield the light, making it possible to uniform the light intensity of the exposure surface it can.

【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS

【図1】本発明の実施例の光強度の均一化方法を示す光路図 Optical path diagram illustrating a uniform method of the light intensity of the embodiment of the present invention; FIG

【図2】実施例によって得られた露光面の光強度の分布図 [Figure 2] distribution diagram of the light intensity of the exposure surface obtained examples

【図3】実施例によって得られた露光面の光強度の分布図 [Figure 3] distribution diagram of the light intensity of the exposure surface obtained examples

【図4】本発明の実施例の露光装置の概略図 Schematic view of an exposure apparatus according to an embodiment of the present invention; FIG

【図5】従来の照明光学系を示す光路図 Optical path diagram showing the Figure 5 a conventional illumination optical system

【図6】左右対称な入射光線の光強度の分布図 [6] distribution diagram of the light intensity of the symmetrical incident beam

【図7】左右対称な入射光線によって得られる露光面の光強度の分布図 [7] distribution diagram of the light intensity of the exposure surface obtained by symmetrical incident beam

【図8】左右が非対称な入射光線の光強度の分布図 [8] distribution diagram of the light intensity of the left and right asymmetrical incident light

【図9】左右が非対称な入射光線によって得られる露光面の光強度の分布図 [9] the left and right of the light intensity of the exposure surface obtained by asymmetric incident ray distribution map

【符号の説明】 DESCRIPTION OF SYMBOLS

1 入射光線 2 インテグレータ光学系 3 2次光源 4 集光レンズ 5 露光面 6 遮光物 1 incident beam 2 integrator optical system 3 secondary light source 4 a condenser lens 5 exposed surface 6 shader

───────────────────────────────────────────────────── フロントページの続き (72)発明者 吉川 智延 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 ────────────────────────────────────────────────── ─── of the front page continued (72) inventor Yoshikawa Satoshinobe Osaka Prefecture Kadoma Oaza Kadoma 1006 address Matsushita Electric industrial Co., Ltd. in

Claims (2)

    【特許請求の範囲】 [The claims]
  1. 【請求項1】 光源と前記光源を分割して多数の2次光源を形成するインテグレータ光学系と前記インテグレータ光学系により多重に照明される露光面からなり、前記インテグレータ光学系の一部を前記露光面の光強度が均一化するよう光線遮光手段によって光線の透過量を調整したことを特徴とする光強度の均一化方法。 1. A consists exposure surface to be illuminated multiplexed by the integrator optical system and the integrator optical system for forming a light source and a plurality of secondary light sources by dividing the light source, the exposure part of the integrator optical system equalizing method of the light intensity is characterized in that adjusting the amount of transmitted light by ray shielding means so that the light intensity of the surface is uniform.
  2. 【請求項2】 請求項1記載の光強度の均一化方法を用いた露光装置。 Wherein the exposure apparatus using the homogenization method of the light intensity according to claim 1.
JP28746991A 1991-11-01 1991-11-01 Method for uniformizing light intensity and exposure device using the same Pending JPH05127086A (en)

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