JP5709495B2 - 露光装置 - Google Patents
露光装置 Download PDFInfo
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- JP5709495B2 JP5709495B2 JP2010271667A JP2010271667A JP5709495B2 JP 5709495 B2 JP5709495 B2 JP 5709495B2 JP 2010271667 A JP2010271667 A JP 2010271667A JP 2010271667 A JP2010271667 A JP 2010271667A JP 5709495 B2 JP5709495 B2 JP 5709495B2
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- 239000000758 substrate Substances 0.000 claims description 35
- 238000009826 distribution Methods 0.000 claims description 25
- 239000011159 matrix material Substances 0.000 claims description 8
- 230000032258 transport Effects 0.000 description 14
- 230000007261 regionalization Effects 0.000 description 12
- 230000003287 optical effect Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000004397 blinking Effects 0.000 description 3
- 238000004040 coloring Methods 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
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- 239000011295 pitch Substances 0.000 description 1
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Description
図1は、本実施形態の露光装置の平面図であり、図2は、図1に示す露光装置の側面図である。尚、以下の図においては、基板の搬送方向をY軸正方向とする。
2 搬送装置
3 フォトマスク
31 開口パターン
32 開口パターン形成領域
4 光源
40 照射領域
41 露光領域
5 ビームエキスパンダ
6 フライアイレンズ
61 単レンズ
7 基板
Claims (1)
- 基板を搬送方向に搬送しながら、前記基板上に繰り返し露光を行う露光装置であって、
光源と、
前記光源と前記基板との間に配置されるフォトマスクと、
前記光源から出射された光の照度分布を一様にして前記フォトマスク上に照射するフライアイレンズとを備え、
前記フライアイレンズは、矩形状の単レンズが行列方向にマトリクス状に配列されたものであり、
前記フォトマスク上には、前記単レンズからの出射光が照射される照射領域が形成され、前記搬送方向に直交する方向における前記照射領域の長さが、前記搬送方向における前記照射領域の長さの1〜1.5倍であり、
前記フライアイレンズの縦方向の単レンズの数と、横方向の単レンズの数との比率が、1〜1.5倍である、露光装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010271667A JP5709495B2 (ja) | 2010-12-06 | 2010-12-06 | 露光装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2010271667A JP5709495B2 (ja) | 2010-12-06 | 2010-12-06 | 露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012123049A JP2012123049A (ja) | 2012-06-28 |
JP5709495B2 true JP5709495B2 (ja) | 2015-04-30 |
Family
ID=46504586
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2010271667A Active JP5709495B2 (ja) | 2010-12-06 | 2010-12-06 | 露光装置 |
Country Status (1)
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JP (1) | JP5709495B2 (ja) |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07135133A (ja) * | 1993-06-16 | 1995-05-23 | Nikon Corp | 照明光学装置 |
JP3879142B2 (ja) * | 1996-04-22 | 2007-02-07 | 株式会社ニコン | 露光装置 |
US5891806A (en) * | 1996-04-22 | 1999-04-06 | Nikon Corporation | Proximity-type microlithography apparatus and method |
JP3633105B2 (ja) * | 1996-06-10 | 2005-03-30 | 株式会社ニコン | プロキシミティ露光装置及び露光方法 |
JP4268813B2 (ja) * | 2003-02-14 | 2009-05-27 | 大日本印刷株式会社 | 露光方法及び露光装置 |
JP2008164729A (ja) * | 2006-12-27 | 2008-07-17 | Ushio Inc | 光照射器及び光照射装置並びに露光方法 |
JP2009210598A (ja) * | 2008-02-29 | 2009-09-17 | Nsk Ltd | ガラス基板および近接スキャン露光装置並びに近接スキャン露光方法 |
JP5458372B2 (ja) * | 2009-04-03 | 2014-04-02 | 株式会社ブイ・テクノロジー | 露光方法及び露光装置 |
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2010
- 2010-12-06 JP JP2010271667A patent/JP5709495B2/ja active Active
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