JP2012123049A - 露光装置 - Google Patents
露光装置 Download PDFInfo
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- JP2012123049A JP2012123049A JP2010271667A JP2010271667A JP2012123049A JP 2012123049 A JP2012123049 A JP 2012123049A JP 2010271667 A JP2010271667 A JP 2010271667A JP 2010271667 A JP2010271667 A JP 2010271667A JP 2012123049 A JP2012123049 A JP 2012123049A
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- 239000000758 substrate Substances 0.000 claims abstract description 38
- 238000009826 distribution Methods 0.000 claims abstract description 27
- 239000011159 matrix material Substances 0.000 claims description 8
- 230000032258 transport Effects 0.000 description 14
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- 230000003287 optical effect Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000004397 blinking Effects 0.000 description 3
- 238000004040 coloring Methods 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
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- 239000011295 pitch Substances 0.000 description 1
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Abstract
【解決手段】露光装置は、光源と、光源と基板との間に配置されるフォトマスクと、フォトマスク上の照射領域40に照射される光の照度分布を一様にするフライアイレンズ6とを備える。照射領域40は、幅が縦の長さの1〜1.5倍である。
【選択図】図3
Description
図1は、本実施形態の露光装置の平面図であり、図2は、図1に示す露光装置の側面図である。尚、以下の図においては、基板の搬送方向をY軸正方向とする。
2 搬送装置
3 フォトマスク
31 開口パターン
32 開口パターン形成領域
4 光源
40 照射領域
41 露光領域
5 ビームエキスパンダ
6 フライアイレンズ
61 単レンズ
7 基板
Claims (2)
- 基板を搬送方向に搬送しながら、前記基板上に繰り返し露光を行う露光装置であって、
光源と、
前記光源と前記基板との間に配置されるフォトマスクと、
前記光源か出射された光の照度分布を一様にして前記フォトマスク上に照射するフライアイレンズとを備え、
前記フライアイレンズは、矩形状の単レンズが行列方向にマトリクス状に配列されたものであり、
前記フォトマスク上には、前記単レンズからの出射光が照射される照射領域が形成され、前記搬送方向に直交する方向における前記照射領域の長さが、前記搬送方向における前記照射領域の長さの1〜1.5倍である、露光装置。 - 前記フライアイレンズの縦方向の単レンズの数と、横方向の単レンズの数との比率が、1〜1.5倍である、請求項1に記載の露光装置。
Priority Applications (1)
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JP2010271667A JP5709495B2 (ja) | 2010-12-06 | 2010-12-06 | 露光装置 |
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JP2010271667A JP5709495B2 (ja) | 2010-12-06 | 2010-12-06 | 露光装置 |
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JP2012123049A true JP2012123049A (ja) | 2012-06-28 |
JP5709495B2 JP5709495B2 (ja) | 2015-04-30 |
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JP2010271667A Active JP5709495B2 (ja) | 2010-12-06 | 2010-12-06 | 露光装置 |
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JP (1) | JP5709495B2 (ja) |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07135133A (ja) * | 1993-06-16 | 1995-05-23 | Nikon Corp | 照明光学装置 |
JPH09289159A (ja) * | 1996-04-22 | 1997-11-04 | Nikon Corp | 露光装置 |
JPH09330863A (ja) * | 1996-06-10 | 1997-12-22 | Nikon Corp | プロキシミティ露光装置及び露光方法 |
US5891806A (en) * | 1996-04-22 | 1999-04-06 | Nikon Corporation | Proximity-type microlithography apparatus and method |
JP2004246144A (ja) * | 2003-02-14 | 2004-09-02 | Dainippon Printing Co Ltd | 露光方法、露光装置及び照明装置 |
JP2008164729A (ja) * | 2006-12-27 | 2008-07-17 | Ushio Inc | 光照射器及び光照射装置並びに露光方法 |
JP2009210598A (ja) * | 2008-02-29 | 2009-09-17 | Nsk Ltd | ガラス基板および近接スキャン露光装置並びに近接スキャン露光方法 |
JP2010243680A (ja) * | 2009-04-03 | 2010-10-28 | V Technology Co Ltd | 露光方法及び露光装置 |
-
2010
- 2010-12-06 JP JP2010271667A patent/JP5709495B2/ja active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07135133A (ja) * | 1993-06-16 | 1995-05-23 | Nikon Corp | 照明光学装置 |
JPH09289159A (ja) * | 1996-04-22 | 1997-11-04 | Nikon Corp | 露光装置 |
US5891806A (en) * | 1996-04-22 | 1999-04-06 | Nikon Corporation | Proximity-type microlithography apparatus and method |
JPH09330863A (ja) * | 1996-06-10 | 1997-12-22 | Nikon Corp | プロキシミティ露光装置及び露光方法 |
JP2004246144A (ja) * | 2003-02-14 | 2004-09-02 | Dainippon Printing Co Ltd | 露光方法、露光装置及び照明装置 |
JP2008164729A (ja) * | 2006-12-27 | 2008-07-17 | Ushio Inc | 光照射器及び光照射装置並びに露光方法 |
JP2009210598A (ja) * | 2008-02-29 | 2009-09-17 | Nsk Ltd | ガラス基板および近接スキャン露光装置並びに近接スキャン露光方法 |
JP2010243680A (ja) * | 2009-04-03 | 2010-10-28 | V Technology Co Ltd | 露光方法及び露光装置 |
US20120075612A1 (en) * | 2009-04-03 | 2012-03-29 | Koichi Kajiyama | Exposure method and exposure apparatus |
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