JP5152972B2 - SiOCH膜の製造方法 - Google Patents
SiOCH膜の製造方法 Download PDFInfo
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- JP5152972B2 JP5152972B2 JP2007523380A JP2007523380A JP5152972B2 JP 5152972 B2 JP5152972 B2 JP 5152972B2 JP 2007523380 A JP2007523380 A JP 2007523380A JP 2007523380 A JP2007523380 A JP 2007523380A JP 5152972 B2 JP5152972 B2 JP 5152972B2
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/452—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/02274—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition in the presence of a plasma [PECVD]
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- Organic Chemistry (AREA)
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- Mechanical Engineering (AREA)
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Description
従来、層間絶縁膜として、例えば、TMCTS(Tetra-Methyl-Cyclo-Tetra-Siloxane)やTMS(Tetra-Methyl-Silane)のような原料を用いて、プラズマCVD法によりSiOCH膜が形成されていた(例えば、非特許文献1参照)。
FUJITSU.52, 4, p.374-381 (07, 2001)
しかしながら、TEOSを原料に用いたプラズマCVD法では、SiO膜は形成できるが、SiOCH膜の形成は困難であった。
この原因は、図1に示すような分子構造を有するTEOSでは、熱エネルギ等が加わると、OとC2H5との間の接続部が優先的に切断され、SiOCH膜ではなくSiO膜が形成されるためと考えられる。
また、層間絶縁膜に用いるためには、良質なSiOCH膜を、室温のような低温で作製することも必要であった。
プラズマ源でプラズマを発生させる工程と、
基板が保持された製膜室にTEOSガスを供給する工程と、
該プラズマ源から該プラズマを該製膜室に導入する導入工程と、
該プラズマを該TEOSに接触させて該TEOSを分解し、該基板上にSiOCH膜を堆積させる工程とを含み、
該プラズマ源と該製膜室とを分離することにより、該製膜室中で該TEOSと接触するプラズマのエネルギを小さくし、
以下の式(1):
e+Si(OC 2 H 5 ) n (OH) 4-n --> Si(OC 2 H 5 ) n-1 (OH) 4-n+1 +C 2 H 4 +e
;n=1〜4............式(1)
で示されるTEOSの前駆体の分解反応を抑制しつつSiOCH膜を堆積し、
該TEOSが接触した上記プラズマのイオン電流密度が、略0.05〜略0.2mA/cm 2 であることを特徴とするSiOCH膜の製造方法である。
プラズマCVD装置100は、プラズマを発生させるプラズマ源10と、SiOCH膜を作製する製膜室20とが分離されたリモートプラズマCVD装置となっている。プラズマ源10と製膜室20との間は、例えば配管30のような接続部により接続されている。プラズマ源10、製膜室20、および配管30は、例えばステンレス鋼から形成される。
なお、工程2のArプラズマの発生と、工程3のTEOSの供給とをほぼ同時に行っても構わない。
;n=1〜4............式(1)
RF power イオン電流密度 プラズマ密度
(W) (mA/cm2) (cm-3)
50.00 1.1465 2.6914e+09
75.00 1.6558 3.8870e+09
100.00 2.2075 5.1821e+09
125.00 2.6320 6.1784e+09
150.00 3.0139 7.0751e+09
200.00 3.4808 8.1710e+09
250.00 4.5843 1.0761e+10
300.00 5.0936 1.1957e+10
L=375mm
RF power イオン電流密度 プラズマ密度
(W) (mA/cm2) (cm-3)
50 0.0614 2.43e+09
100 0.147 6.06e+09
150 0.221 9.64e+09
200 0.323 1.46e+10
250 0.421 1.95e+10
300 0.514 2.53e+10
350 0.656 3.36e+10
L=275mm
RF power イオン電流密度 プラズマ密度
(W) (mA/cm2) (cm-3)
50 0.244 9.55e+09
100 0.396 1.62e+10
150 0.535 2.32e+10
200 0.613 2.67e+10
250 0.797 3.51e+10
300 0.916 4.17e+10
350 1.02 4.72e+10
L=375mm L=275mm
RF power 飽和温度 飽和温度
(W) (℃) (℃)
50 30 32
75 33 36
100 38 43
200 50 58
300 59 68
従って、好適な製膜条件では、イオン電流密度は、0.05〜0.2mA/cm2程度、プラズマ密度は、2×109〜1×1010cm−3程度となる。
また、図7に示した電力の範囲では、SiOCH膜中のCの含有量は20%を超えている。
Claims (5)
- プラズマ源でプラズマを発生させる工程と、
基板が保持された製膜室にTEOSガスを供給する工程と、
該プラズマ源から該プラズマを該製膜室に導入する導入工程と、
該プラズマを該TEOSに接触させて該TEOSを分解し、該基板上にSiOCH膜を堆積させる工程とを含み、
該プラズマ源と該製膜室とを分離することにより、該製膜室中で該TEOSと接触するプラズマのエネルギを小さくし、
以下の式(1):
e+Si(OC2H5)n(OH)4-n --> Si(OC2H5)n-1(OH)4-n+1+C2H4+e
;n=1〜4............式(1)
で示されるTEOSの前駆体の分解反応を抑制しつつSiOCH膜を堆積し、
該TEOSが接触した上記プラズマのイオン電流密度が、略0.05〜略0.2mA/cm 2 であることを特徴とするSiOCH膜の製造方法。 - 上記TEOSが接触した上記プラズマのプラズマ密度が、略2×109〜略1×1010cm−3であることを特徴とする請求項1に記載の製造方法。
- 上記導入工程が、プラズマ源と製膜室との間の圧力差により上記プラズマを移動させる工程であることを特徴とする請求項1に記載の製造方法。
- 上記SiOCH膜の堆積速度が、略4〜略5nm/分であることを特徴とする請求項1に記載の製造方法。
- 上記SiOCH膜の堆積中の上記基板温度が、略30℃以下であることを特徴とする請求項1に記載の製造方法。
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JP2007523380A JP5152972B2 (ja) | 2005-06-30 | 2006-06-06 | SiOCH膜の製造方法 |
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JP2005192373 | 2005-06-30 | ||
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JP2007523380A JP5152972B2 (ja) | 2005-06-30 | 2006-06-06 | SiOCH膜の製造方法 |
PCT/JP2006/311321 WO2007004381A1 (ja) | 2005-06-30 | 2006-06-06 | SiOCH膜の製造方法およびプラズマCVD装置、並びにSiOCH膜 |
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JP5152972B2 true JP5152972B2 (ja) | 2013-02-27 |
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0922795A (ja) * | 1995-07-04 | 1997-01-21 | Sony Corp | プラズマcvd装置およびプラズマcvd方法 |
JPH11269657A (ja) * | 1997-12-04 | 1999-10-05 | Nippon Sheet Glass Co Ltd | シリカ系膜被覆物品を製造する方法 |
JP2001326279A (ja) * | 2000-05-18 | 2001-11-22 | Canon Sales Co Inc | 半導体装置及びその製造方法 |
JP2004311646A (ja) * | 2003-04-04 | 2004-11-04 | Asm Japan Kk | プラズマ処理装置 |
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JP4294976B2 (ja) * | 2003-02-27 | 2009-07-15 | 東京エレクトロン株式会社 | 基板処理装置 |
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0922795A (ja) * | 1995-07-04 | 1997-01-21 | Sony Corp | プラズマcvd装置およびプラズマcvd方法 |
JPH11269657A (ja) * | 1997-12-04 | 1999-10-05 | Nippon Sheet Glass Co Ltd | シリカ系膜被覆物品を製造する方法 |
JP2001326279A (ja) * | 2000-05-18 | 2001-11-22 | Canon Sales Co Inc | 半導体装置及びその製造方法 |
JP2004311646A (ja) * | 2003-04-04 | 2004-11-04 | Asm Japan Kk | プラズマ処理装置 |
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JPWO2007004381A1 (ja) | 2009-01-22 |
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