JP5036311B2 - ミラーｍ３の前にレンズを伴う複数のミラーを含む投影対物レンズ - Google Patents

ミラーｍ３の前にレンズを伴う複数のミラーを含む投影対物レンズ Download PDF

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JP5036311B2
JP5036311B2 JP2006522918A JP2006522918A JP5036311B2 JP 5036311 B2 JP5036311 B2 JP 5036311B2 JP 2006522918 A JP2006522918 A JP 2006522918A JP 2006522918 A JP2006522918 A JP 2006522918A JP 5036311 B2 JP5036311 B2 JP 5036311B2
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optical path
curved mirror
mirror
last
lens
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Expired - Fee Related
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Japanese (ja)
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JP2007502019A5 (cg-RX-API-DMAC7.html
JP2007502019A (ja
Inventor
マン，ハンス−ユルゲン
エプル，アレキサンダー
フディマ，ラッセル
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0836—Catadioptric systems using more than three curved mirrors
    • G02B17/0844—Catadioptric systems using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2006522918A 2003-08-12 2004-07-16 ミラーｍ３の前にレンズを伴う複数のミラーを含む投影対物レンズ Expired - Fee Related JP5036311B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/639,780 2003-08-12
US10/639,780 US7085075B2 (en) 2003-08-12 2003-08-12 Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
PCT/EP2004/007910 WO2005015283A1 (en) 2003-08-12 2004-07-16 Projection objectives including a plurality of curved mirrors with lenses ahead of the last but one mirror

Publications (3)

Publication Number Publication Date
JP2007502019A JP2007502019A (ja) 2007-02-01
JP2007502019A5 JP2007502019A5 (cg-RX-API-DMAC7.html) 2007-08-16
JP5036311B2 true JP5036311B2 (ja) 2012-09-26

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JP2006522918A Expired - Fee Related JP5036311B2 (ja) 2003-08-12 2004-07-16 ミラーｍ３の前にレンズを伴う複数のミラーを含む投影対物レンズ

Country Status (5)

Country Link
US (2) US7085075B2 (cg-RX-API-DMAC7.html)
EP (1) EP1654577A1 (cg-RX-API-DMAC7.html)
JP (1) JP5036311B2 (cg-RX-API-DMAC7.html)
TW (1) TW200508818A (cg-RX-API-DMAC7.html)
WO (1) WO2005015283A1 (cg-RX-API-DMAC7.html)

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US20060171040A1 (en) 2006-08-03
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