TW200508818A - Projection objectives including a plurality of mirrors with lenses ahead of mirror m3 - Google Patents

Projection objectives including a plurality of mirrors with lenses ahead of mirror m3

Info

Publication number
TW200508818A
TW200508818A TW093121047A TW93121047A TW200508818A TW 200508818 A TW200508818 A TW 200508818A TW 093121047 A TW093121047 A TW 093121047A TW 93121047 A TW93121047 A TW 93121047A TW 200508818 A TW200508818 A TW 200508818A
Authority
TW
Taiwan
Prior art keywords
mirrors
mirror
planar
last non
projection objectives
Prior art date
Application number
TW093121047A
Other languages
English (en)
Chinese (zh)
Inventor
Hans Juergen Mann
Alexander Epple
Russell Hudyma
Original Assignee
Zeiss Carl Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag filed Critical Zeiss Carl Smt Ag
Publication of TW200508818A publication Critical patent/TW200508818A/zh

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • G02B17/0892Catadioptric systems specially adapted for the UV
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • G02B17/0836Catadioptric systems using more than three curved mirrors
    • G02B17/0844Catadioptric systems using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • G02B17/0856Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70225Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW093121047A 2003-08-12 2004-07-14 Projection objectives including a plurality of mirrors with lenses ahead of mirror m3 TW200508818A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/639,780 US7085075B2 (en) 2003-08-12 2003-08-12 Projection objectives including a plurality of mirrors with lenses ahead of mirror M3

Publications (1)

Publication Number Publication Date
TW200508818A true TW200508818A (en) 2005-03-01

Family

ID=34135943

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093121047A TW200508818A (en) 2003-08-12 2004-07-14 Projection objectives including a plurality of mirrors with lenses ahead of mirror m3

Country Status (5)

Country Link
US (2) US7085075B2 (cg-RX-API-DMAC7.html)
EP (1) EP1654577A1 (cg-RX-API-DMAC7.html)
JP (1) JP5036311B2 (cg-RX-API-DMAC7.html)
TW (1) TW200508818A (cg-RX-API-DMAC7.html)
WO (1) WO2005015283A1 (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113627344A (zh) * 2021-08-11 2021-11-09 苏州艾泽镭智能科技有限公司 双重生物特征检测系统、安全识别方法、应用及电子设备

Families Citing this family (135)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW538256B (en) * 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN100568101C (zh) * 2002-11-12 2009-12-09 Asml荷兰有限公司 光刻装置和器件制造方法
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7372541B2 (en) * 2002-11-12 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG121818A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR20130010039A (ko) * 2002-12-10 2013-01-24 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US7948604B2 (en) * 2002-12-10 2011-05-24 Nikon Corporation Exposure apparatus and method for producing device
KR101101737B1 (ko) * 2002-12-10 2012-01-05 가부시키가이샤 니콘 노광장치 및 노광방법, 디바이스 제조방법
US7242455B2 (en) * 2002-12-10 2007-07-10 Nikon Corporation Exposure apparatus and method for producing device
EP1571694A4 (en) * 2002-12-10 2008-10-15 Nikon Corp EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING THE DEVICE
JP4352874B2 (ja) * 2002-12-10 2009-10-28 株式会社ニコン 露光装置及びデバイス製造方法
SG157962A1 (en) 2002-12-10 2010-01-29 Nikon Corp Exposure apparatus and method for producing device
DE10261775A1 (de) 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
JP4223936B2 (ja) * 2003-02-06 2009-02-12 株式会社リコー 投射光学系、拡大投射光学系、拡大投射装置及び画像投射装置
EP2945016B1 (en) * 2003-02-26 2017-09-06 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
KR101345474B1 (ko) * 2003-03-25 2013-12-27 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP4902201B2 (ja) 2003-04-07 2012-03-21 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
KR101177331B1 (ko) * 2003-04-09 2012-08-30 가부시키가이샤 니콘 액침 리소그래피 유체 제어 시스템
KR101497289B1 (ko) 2003-04-10 2015-02-27 가부시키가이샤 니콘 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
JP4656057B2 (ja) * 2003-04-10 2011-03-23 株式会社ニコン 液浸リソグラフィ装置用電気浸透素子
JP4775256B2 (ja) 2003-04-10 2011-09-21 株式会社ニコン 液浸リソグラフィ装置用の減圧排出を含む環境システム
WO2004093160A2 (en) * 2003-04-10 2004-10-28 Nikon Corporation Run-off path to collect liquid for an immersion lithography apparatus
WO2004092830A2 (en) 2003-04-11 2004-10-28 Nikon Corporation Liquid jet and recovery system for immersion lithography
EP2161621B1 (en) * 2003-04-11 2018-10-24 Nikon Corporation Cleanup method for optics in an immersion lithography apparatus, and corresponding immersion lithography apparatus
SG139734A1 (en) * 2003-04-11 2008-02-29 Nikon Corp Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
CN1774667A (zh) 2003-04-17 2006-05-17 株式会社尼康 用在浸没式平版印刷方法中自动聚焦部件的光学配置
EP2722703A3 (en) 2003-05-06 2014-07-23 Nikon Corporation Projection optical system, and exposure apparatus and exposure method
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
TWI295414B (en) 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1624481A4 (en) * 2003-05-15 2008-01-30 Nikon Corp EXPOSURE DEVICE AND METHOD FOR MANUFACTURING COMPONENTS
TWI616932B (zh) * 2003-05-23 2018-03-01 Nikon Corp Exposure device and component manufacturing method
TWI614794B (zh) * 2003-05-23 2018-02-11 Nikon Corp 曝光方法及曝光裝置以及元件製造方法
KR20150036794A (ko) 2003-05-28 2015-04-07 가부시키가이샤 니콘 노광 방법, 노광 장치, 및 디바이스 제조 방법
US7213963B2 (en) * 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317504B2 (en) * 2004-04-08 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2261741A3 (en) 2003-06-11 2011-05-25 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101528089B1 (ko) * 2003-06-13 2015-06-11 가부시키가이샤 니콘 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
KR101265454B1 (ko) * 2003-06-19 2013-05-16 가부시키가이샤 니콘 노광 장치 및 디바이스 제조방법
EP1639391A4 (en) * 2003-07-01 2009-04-29 Nikon Corp USE OF FLUIDS SPECIFIED ISOTOPICALLY AS OPTICAL ELEMENTS
EP2853943B1 (en) * 2003-07-08 2016-11-16 Nikon Corporation Wafer table for immersion lithography
JP4844123B2 (ja) * 2003-07-09 2011-12-28 株式会社ニコン 露光装置、及びデバイス製造方法
EP2264532B1 (en) 2003-07-09 2012-10-31 Nikon Corporation Exposure apparatus and device manufacturing method
KR101296501B1 (ko) * 2003-07-09 2013-08-13 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
EP1650787A4 (en) 2003-07-25 2007-09-19 Nikon Corp INVESTIGATION METHOD AND INVESTIGATION DEVICE FOR AN OPTICAL PROJECTION SYSTEM AND METHOD OF MANUFACTURING AN OPTICAL PROJECTION SYSTEM
US7175968B2 (en) * 2003-07-28 2007-02-13 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a substrate
EP1503244A1 (en) 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
WO2005010962A1 (ja) 2003-07-28 2005-02-03 Nikon Corporation 露光装置及びデバイス製造方法、並びに露光装置の制御方法
US7326522B2 (en) 2004-02-11 2008-02-05 Asml Netherlands B.V. Device manufacturing method and a substrate
US7779781B2 (en) 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1670039B1 (en) * 2003-08-29 2014-06-04 Nikon Corporation Exposure apparatus and device producing method
KR101523180B1 (ko) 2003-09-03 2015-05-26 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
WO2005029559A1 (ja) * 2003-09-19 2005-03-31 Nikon Corporation 露光装置及びデバイス製造方法
US8208198B2 (en) * 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
KR101335736B1 (ko) * 2003-09-29 2013-12-02 가부시키가이샤 니콘 노광장치, 노광방법 및 디바이스 제조방법
WO2005036623A1 (ja) 2003-10-08 2005-04-21 Zao Nikon Co., Ltd. 基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造方法
WO2005036621A1 (ja) 2003-10-08 2005-04-21 Zao Nikon Co., Ltd. 基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造方法
JP2005136364A (ja) * 2003-10-08 2005-05-26 Zao Nikon Co Ltd 基板搬送装置、露光装置、並びにデバイス製造方法
TW200514138A (en) 2003-10-09 2005-04-16 Nippon Kogaku Kk Exposure equipment and exposure method, manufacture method of component
US7411653B2 (en) * 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
US7352433B2 (en) 2003-10-28 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7528929B2 (en) 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN102163004B (zh) * 2003-12-03 2014-04-09 株式会社尼康 曝光装置、曝光方法和器件制造方法
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JPWO2005057635A1 (ja) * 2003-12-15 2007-07-05 株式会社ニコン 投影露光装置及びステージ装置、並びに露光方法
JP4720506B2 (ja) * 2003-12-15 2011-07-13 株式会社ニコン ステージ装置、露光装置、及び露光方法
US20070081133A1 (en) * 2004-12-14 2007-04-12 Niikon Corporation Projection exposure apparatus and stage unit, and exposure method
JP5102492B2 (ja) * 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
US7394521B2 (en) * 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7463422B2 (en) * 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
JP5420821B2 (ja) 2004-01-14 2014-02-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 反射屈折投影対物レンズ
US20080151364A1 (en) * 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
WO2005071491A2 (en) 2004-01-20 2005-08-04 Carl Zeiss Smt Ag Exposure apparatus and measuring device for a projection lens
US7589822B2 (en) * 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
US7990516B2 (en) 2004-02-03 2011-08-02 Nikon Corporation Immersion exposure apparatus and device manufacturing method with liquid detection apparatus
JP4525676B2 (ja) 2004-03-25 2010-08-18 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
US7712905B2 (en) 2004-04-08 2010-05-11 Carl Zeiss Smt Ag Imaging system with mirror group
US7898642B2 (en) 2004-04-14 2011-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8054448B2 (en) * 2004-05-04 2011-11-08 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7616383B2 (en) 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005119368A2 (en) 2004-06-04 2005-12-15 Carl Zeiss Smt Ag System for measuring the image quality of an optical imaging system
EP2966670B1 (en) 2004-06-09 2017-02-22 Nikon Corporation Exposure apparatus and device manufacturing method
US20080273185A1 (en) * 2004-06-16 2008-11-06 Nikon Corporation Optical System, Exposing Apparatus and Exposing Method
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE602005016429D1 (de) 2004-07-12 2009-10-15 Nippon Kogaku Kk Hren
US7511798B2 (en) * 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
WO2006019124A1 (ja) * 2004-08-18 2006-02-23 Nikon Corporation 露光装置及びデバイス製造方法
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7880860B2 (en) 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1681597B1 (en) 2005-01-14 2010-03-10 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
SG124351A1 (en) 2005-01-14 2006-08-30 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US8692973B2 (en) * 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
EP1863070B1 (en) * 2005-01-31 2016-04-27 Nikon Corporation Exposure apparatus and method for manufacturing device
US20060198018A1 (en) * 2005-02-04 2006-09-07 Carl Zeiss Smt Ag Imaging system
US7282701B2 (en) 2005-02-28 2007-10-16 Asml Netherlands B.V. Sensor for use in a lithographic apparatus
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
JP2008542829A (ja) 2005-06-02 2008-11-27 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影対物レンズ
JP4944111B2 (ja) * 2005-08-16 2012-05-30 ベンベニュー メディカル, インコーポレイテッド 脊柱組織伸延装置
TWI451125B (zh) 2005-09-13 2014-09-01 Zeiss Carl Smt Gmbh 顯微蝕刻投影光學系統、包含此一光學系統之顯微蝕刻工具、使用此一顯微蝕刻工具於顯微蝕刻生產微結構元件之方法、藉此一方法所生產之微結構元件以及於此一光學系統中設計一光學表面的方法
US7357768B2 (en) * 2005-09-22 2008-04-15 William Marshall Recliner exerciser
US20070124987A1 (en) * 2005-12-05 2007-06-07 Brown Jeffrey K Electronic pest control apparatus
KR100768849B1 (ko) * 2005-12-06 2007-10-22 엘지전자 주식회사 계통 연계형 연료전지 시스템의 전원공급장치 및 방법
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102006014380A1 (de) * 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
JP5479890B2 (ja) * 2006-04-07 2014-04-23 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影光学システム、装置、及び製造方法
DE102006021797A1 (de) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
US8654305B2 (en) * 2007-02-15 2014-02-18 Asml Holding N.V. Systems and methods for insitu lens cleaning in immersion lithography
US8817226B2 (en) 2007-02-15 2014-08-26 Asml Holding N.V. Systems and methods for insitu lens cleaning using ozone in immersion lithography
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
TWI389551B (zh) * 2007-08-09 2013-03-11 Mstar Semiconductor Inc 迦瑪校正裝置
KR101448152B1 (ko) * 2008-03-26 2014-10-07 삼성전자주식회사 수직 포토게이트를 구비한 거리측정 센서 및 그를 구비한입체 컬러 이미지 센서
US9176393B2 (en) * 2008-05-28 2015-11-03 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus
US8946514B2 (en) * 2009-12-28 2015-02-03 E.I. Du Pont De Nemours And Company Sorghum fertility restorer genotypes and methods of marker-assisted selection
EP2381310B1 (en) 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus
TW201348689A (zh) * 2012-05-23 2013-12-01 Altek Corp 遠景檢測裝置及其遠景檢測方法
CN103424979A (zh) * 2012-05-23 2013-12-04 华晶科技股份有限公司 远景检测装置及其远景检测方法
US10545314B1 (en) 2014-03-16 2020-01-28 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low lateral chromatic aberration
US9316820B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low astigmatism
US9995910B1 (en) 2014-03-16 2018-06-12 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with high MTF
US9726859B1 (en) 2014-03-16 2017-08-08 Navitar Industries, Llc Optical assembly for a wide field of view camera with low TV distortion
US9316808B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with a low sag aspheric lens element
US9494772B1 (en) 2014-03-16 2016-11-15 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low field curvature
US10139595B1 (en) 2014-03-16 2018-11-27 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low first lens diameter to image diagonal ratio
US10386604B1 (en) 2014-03-16 2019-08-20 Navitar Industries, Llc Compact wide field of view digital camera with stray light impact suppression
US9091843B1 (en) 2014-03-16 2015-07-28 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low track length to focal length ratio
CN104062746B (zh) * 2014-06-23 2016-08-24 中国科学院光电技术研究所 一种大数值孔径的折反射浸没投影光学系统
CN105807410B (zh) * 2014-12-31 2018-11-09 上海微电子装备(集团)股份有限公司 一种基于高数值孔径的折反射式投影物镜
US9835835B1 (en) 2015-04-10 2017-12-05 Navitar Industries, Llc Projection zoom lens and camera
DE102016209847A1 (de) 2016-06-03 2016-07-28 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie mit optischer Korrekturenanordnung und Verfahren zum Betrieb einer Projektionsbelichtungsanlage
JP6882053B2 (ja) * 2016-12-05 2021-06-02 キヤノン株式会社 カタディオプトリック光学系、照明光学系、露光装置および物品製造方法
US11043239B2 (en) 2019-03-20 2021-06-22 Kla Corporation Magneto-optic Kerr effect metrology systems
US11650487B2 (en) * 2020-01-28 2023-05-16 Daniel Joseph Reiley Front converter optical assembly for camera

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2963537D1 (en) 1979-07-27 1982-10-07 Tabarelli Werner W Optical lithographic method and apparatus for copying a pattern onto a semiconductor wafer
US4509852A (en) 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
US4346164A (en) 1980-10-06 1982-08-24 Werner Tabarelli Photolithographic method for the manufacture of integrated circuits
US4469414A (en) * 1982-06-01 1984-09-04 The Perkin-Elmer Corporation Restrictive off-axis field optical system
US4695464A (en) * 1984-10-09 1987-09-22 The Dow Chemical Company Sustained release dosage form based on highly plasticized cellulose ether gels
JPS61156737A (ja) * 1984-12-27 1986-07-16 Canon Inc 回路の製造方法及び露光装置
US5052763A (en) * 1990-08-28 1991-10-01 International Business Machines Corporation Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations
US5537260A (en) * 1993-01-26 1996-07-16 Svg Lithography Systems, Inc. Catadioptric optical reduction system with high numerical aperture
US5323263A (en) * 1993-02-01 1994-06-21 Nikon Precision Inc. Off-axis catadioptric projection system
JP3690819B2 (ja) * 1993-02-03 2005-08-31 株式会社ニコン 投影光学系、それを用いた露光装置及び露光方法
US5592329A (en) * 1993-02-03 1997-01-07 Nikon Corporation Catadioptric optical system
JPH06235863A (ja) * 1993-02-12 1994-08-23 Nikon Corp 反射屈折光学系
US5515207A (en) * 1993-11-03 1996-05-07 Nikon Precision Inc. Multiple mirror catadioptric optical system
JP3395801B2 (ja) * 1994-04-28 2003-04-14 株式会社ニコン 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法
DE4417489A1 (de) * 1994-05-19 1995-11-23 Zeiss Carl Fa Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie
US5815310A (en) * 1995-12-12 1998-09-29 Svg Lithography Systems, Inc. High numerical aperture ring field optical reduction system
JPH103041A (ja) * 1996-06-14 1998-01-06 Nikon Corp 反射屈折縮小光学系
JPH1020195A (ja) * 1996-06-28 1998-01-23 Nikon Corp 反射屈折光学系
US6169627B1 (en) * 1996-09-26 2001-01-02 Carl-Zeiss-Stiftung Catadioptric microlithographic reduction objective
US6631036B2 (en) 1996-09-26 2003-10-07 Carl-Zeiss-Stiftung Catadioptric objective
DE10002626A1 (de) 2000-01-22 2001-07-26 Zeiss Carl Katadioptrisches Objektiv mit Asphären
DE19639586A1 (de) * 1996-09-26 1998-04-02 Zeiss Carl Fa Katadioptrisches Mikrolithographie-Reduktionsobjektiv
JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
EP1293832A1 (en) * 1998-06-08 2003-03-19 Nikon Corporation Projection exposure apparatus and method
KR20000034967A (ko) * 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
EP1035445B1 (de) * 1999-02-15 2007-01-31 Carl Zeiss SMT AG Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
JP2003535356A (ja) * 1999-12-29 2003-11-25 カール・ツアイス・スティフツング・トレーディング・アズ・カール・ツアイス 非球面レンズ表面が隣接して配置されている投影対物レンズ
TW538256B (en) * 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
JP2001228401A (ja) * 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
KR20010113527A (ko) 2000-06-19 2001-12-28 시마무라 테루오 투영 광학계, 그 제조 방법 및 투영 노광 장치
JP4245286B2 (ja) * 2000-10-23 2009-03-25 株式会社ニコン 反射屈折光学系および該光学系を備えた露光装置
JP2004514943A (ja) * 2000-11-28 2004-05-20 カール・ツアイス・エスエムテイ・アーゲー 157nmリソグラフィ用の反射屈折投影系
US7333245B2 (en) * 2001-07-16 2008-02-19 Hewlett-Packard Development Company, L.P. System and method for printing retained print jobs
JP2003114387A (ja) 2001-10-04 2003-04-18 Nikon Corp 反射屈折光学系および該光学系を備える投影露光装置
US20040075894A1 (en) * 2001-12-10 2004-04-22 Shafer David R. Catadioptric reduction objective
EP2722703A3 (en) 2003-05-06 2014-07-23 Nikon Corporation Projection optical system, and exposure apparatus and exposure method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113627344A (zh) * 2021-08-11 2021-11-09 苏州艾泽镭智能科技有限公司 双重生物特征检测系统、安全识别方法、应用及电子设备

Also Published As

Publication number Publication date
US20050036213A1 (en) 2005-02-17
JP5036311B2 (ja) 2012-09-26
JP2007502019A (ja) 2007-02-01
WO2005015283A1 (en) 2005-02-17
EP1654577A1 (en) 2006-05-10
US20060171040A1 (en) 2006-08-03
US7190530B2 (en) 2007-03-13
US7085075B2 (en) 2006-08-01

Similar Documents

Publication Publication Date Title
TW200508818A (en) Projection objectives including a plurality of mirrors with lenses ahead of mirror m3
WO2005069055A3 (en) Catadioptric projection objective
KR970075961A (ko) 초점길이 비율에 대한 큰 역초점길이를 갖는 투사렌즈
ATE329285T1 (de) Dezentrierte linsengruppe für die verwendung in einem ausseraxialen projektor
JP2007502019A5 (cg-RX-API-DMAC7.html)
TWI263797B (en) Zoom lens system
WO2002027400A3 (en) Illumination system particularly for microlithography
EP1059550A4 (en) REFRACTION REFLECTION IMAGE FORMING SYSTEM AND PROJECTION EXPOSURE APPARATUS INCLUDING THE OPTICAL SYSTEM
EP1336887A4 (en) CATADIOPTRIC SYSTEM AND EXPOSURE DEVICE PROVIDED WITH SAID SYSTEM
EP1167868A3 (en) Light projector, particularly for projecting light beams with variable dimensions and coloring
EP0730179A3 (en) Reflecting type of zoom lens
DE60126468D1 (de) Optischer Motor für SLM-Anzeigesysteme mit Auflichtschirm oder Durchlichtschirm
WO2004090600A3 (en) Catadioptric projection objective
DE602007007514D1 (de) Kompaktes zweifeld-ir2-ir3-bildgebungssystem
WO2003021326A1 (en) Projection lens
EP1983362A4 (en) catadioptric imaging system, exposure device, and device manufacturing method
CN104049368B (zh) 一种瞳距可调的穿透式视频眼镜光学引擎系统
JP2001042211A5 (cg-RX-API-DMAC7.html)
JP2002244046A5 (cg-RX-API-DMAC7.html)
TW200506413A (en) Projection optical unit, projection type color video display device, and rear projection type color video display device using the color video display device
EP1980890A4 (en) CATADIOPTRIC IMAGING SYSTEM, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD
TW200706940A (en) Zoom lens
CA2434752A1 (en) Compact device for imaging a printing form
TW200604720A (en) Projection optical system and pattern writing apparatus
HUP9602917A2 (hu) Fejre szerelt képmegjelenítő készülék