JP5022533B2 - 高いsp3含有率をもつ磁気ディスク上に、炭素保護フィルムをスパッタリングする方法 - Google Patents
高いsp3含有率をもつ磁気ディスク上に、炭素保護フィルムをスパッタリングする方法 Download PDFInfo
- Publication number
- JP5022533B2 JP5022533B2 JP2000122444A JP2000122444A JP5022533B2 JP 5022533 B2 JP5022533 B2 JP 5022533B2 JP 2000122444 A JP2000122444 A JP 2000122444A JP 2000122444 A JP2000122444 A JP 2000122444A JP 5022533 B2 JP5022533 B2 JP 5022533B2
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- Prior art keywords
- carbon
- voltage
- film
- negative
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229910052799 carbon Inorganic materials 0.000 title claims description 156
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- 238000000034 method Methods 0.000 title claims description 78
- 238000004544 sputter deposition Methods 0.000 title claims description 71
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- 239000001257 hydrogen Substances 0.000 claims description 15
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- 229910001429 cobalt ion Inorganic materials 0.000 description 1
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- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
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- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
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- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8408—Processes or apparatus specially adapted for manufacturing record carriers protecting the magnetic layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Carbon And Carbon Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/298,107 US6086730A (en) | 1999-04-22 | 1999-04-22 | Method of sputtering a carbon protective film on a magnetic disk with high sp3 content |
| US09/298107 | 1999-04-22 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000331336A JP2000331336A (ja) | 2000-11-30 |
| JP2000331336A5 JP2000331336A5 (enExample) | 2007-06-07 |
| JP5022533B2 true JP5022533B2 (ja) | 2012-09-12 |
Family
ID=23149061
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000122444A Expired - Fee Related JP5022533B2 (ja) | 1999-04-22 | 2000-04-24 | 高いsp3含有率をもつ磁気ディスク上に、炭素保護フィルムをスパッタリングする方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6086730A (enExample) |
| EP (1) | EP1046726B1 (enExample) |
| JP (1) | JP5022533B2 (enExample) |
| DE (1) | DE60042533D1 (enExample) |
| MY (1) | MY124998A (enExample) |
| SG (1) | SG100616A1 (enExample) |
| TW (1) | TW570991B (enExample) |
Families Citing this family (126)
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| US6290821B1 (en) * | 1999-07-15 | 2001-09-18 | Seagate Technology Llc | Sputter deposition utilizing pulsed cathode and substrate bias power |
| US6350353B2 (en) * | 1999-11-24 | 2002-02-26 | Applied Materials, Inc. | Alternate steps of IMP and sputtering process to improve sidewall coverage |
| US6565719B1 (en) * | 2000-06-27 | 2003-05-20 | Komag, Inc. | Magnetic disk comprising a first carbon overcoat having a high SP3 content and a second carbon overcoat having a low SP3 content |
| US6902773B1 (en) * | 2000-11-21 | 2005-06-07 | Hitachi Global Storage Technologies Netherlands, B.V. | Energy gradient ion beam deposition of carbon overcoats on rigid disk media for magnetic recordings |
| US6638608B1 (en) | 2001-03-16 | 2003-10-28 | Seagate Technology Llc | Protection overcoat for recording media |
| US20030049496A1 (en) * | 2001-09-11 | 2003-03-13 | Pocker Daryl J. | Thin film protective layer with buffering interface |
| US6875492B1 (en) | 2001-11-15 | 2005-04-05 | Maxtor Corporation | Carbon overcoat for magnetic recording medium |
| US6767592B2 (en) | 2001-12-05 | 2004-07-27 | Seagate Technology Llc | Method for thin film protective overcoat |
| DE10203730B4 (de) * | 2002-01-30 | 2010-09-16 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Abscheidung von metallfreien Kohlenstoffschichten |
| US7378356B2 (en) * | 2002-03-16 | 2008-05-27 | Springworks, Llc | Biased pulse DC reactive sputtering of oxide films |
| US6896773B2 (en) * | 2002-11-14 | 2005-05-24 | Zond, Inc. | High deposition rate sputtering |
| US20040209123A1 (en) * | 2003-04-17 | 2004-10-21 | Bajorek Christopher H. | Method of fabricating a discrete track recording disk using a bilayer resist for metal lift-off |
| US7300556B2 (en) * | 2003-08-29 | 2007-11-27 | Hitachi Global Storage Technologies Netherlands B.V. | Method for depositing a thin film adhesion layer |
| US9771648B2 (en) | 2004-08-13 | 2017-09-26 | Zond, Inc. | Method of ionized physical vapor deposition sputter coating high aspect-ratio structures |
| US20050103620A1 (en) * | 2003-11-19 | 2005-05-19 | Zond, Inc. | Plasma source with segmented magnetron cathode |
| US20050150862A1 (en) * | 2004-01-13 | 2005-07-14 | Harper Bruce M. | Workpiece alignment assembly |
| US20050151300A1 (en) * | 2004-01-13 | 2005-07-14 | Harper Bruce M. | Workpiece isothermal imprinting |
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| US7686606B2 (en) * | 2004-01-20 | 2010-03-30 | Wd Media, Inc. | Imprint embossing alignment system |
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| US9123508B2 (en) * | 2004-02-22 | 2015-09-01 | Zond, Llc | Apparatus and method for sputtering hard coatings |
| US20050249983A1 (en) * | 2004-05-06 | 2005-11-10 | Seagate Technology Llc | Thickness gradient protective overcoat layers by filtered cathodic arc deposition |
| EP2477207A3 (en) * | 2004-09-24 | 2014-09-03 | Zond, Inc. | Apparatus for generating high-current electrical discharges |
| US20060278521A1 (en) * | 2005-06-14 | 2006-12-14 | Stowell Michael W | System and method for controlling ion density and energy using modulated power signals |
| US7758982B2 (en) * | 2005-09-02 | 2010-07-20 | Hitachi Global Storage Technologies Netherlands B.V. | SiN overcoat for perpendicular magnetic recording media |
| US8900771B2 (en) * | 2006-08-17 | 2014-12-02 | GM Global Technology Operations LLC | Non-noble metal inexpensive conductive coatings for fuel cell bipolar plates |
| EP1912266A1 (en) * | 2006-10-10 | 2008-04-16 | STMicroelectronics S.r.l. | Method of forming phase change memory devices in a pulsed DC deposition chamber |
| JP2008171505A (ja) * | 2007-01-12 | 2008-07-24 | Showa Denko Kk | 炭素保護膜の形成方法及び磁気記録媒体の製造方法、磁気記録媒体並びに磁気記録再生装置 |
| US20080311012A1 (en) * | 2007-06-12 | 2008-12-18 | Uri Levy | Transmissive window for hydrooptic disinfection system |
| JP5117895B2 (ja) | 2008-03-17 | 2013-01-16 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気記録媒体及びその製造方法 |
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| JP5453666B2 (ja) | 2008-03-30 | 2014-03-26 | ダブリュディ・メディア・シンガポール・プライベートリミテッド | 磁気ディスク及びその製造方法 |
| JP2011034603A (ja) * | 2008-03-31 | 2011-02-17 | Hoya Corp | 垂直磁気記録媒体 |
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| US8877359B2 (en) | 2008-12-05 | 2014-11-04 | Wd Media (Singapore) Pte. Ltd. | Magnetic disk and method for manufacturing same |
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