DE60042533D1 - Sputterverfahren zur Abscheidung von Kohlenstoffschichten - Google Patents

Sputterverfahren zur Abscheidung von Kohlenstoffschichten

Info

Publication number
DE60042533D1
DE60042533D1 DE60042533T DE60042533T DE60042533D1 DE 60042533 D1 DE60042533 D1 DE 60042533D1 DE 60042533 T DE60042533 T DE 60042533T DE 60042533 T DE60042533 T DE 60042533T DE 60042533 D1 DE60042533 D1 DE 60042533D1
Authority
DE
Germany
Prior art keywords
deposition
sputtering process
carbon layers
layers
carbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60042533T
Other languages
English (en)
Inventor
Wen Hong Liu
Tsutomu Yamashita
Gang Peng
Tu Chen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WD Media LLC
Original Assignee
Komag Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komag Inc filed Critical Komag Inc
Application granted granted Critical
Publication of DE60042533D1 publication Critical patent/DE60042533D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8408—Processes or apparatus specially adapted for manufacturing record carriers protecting the magnetic layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Carbon And Carbon Compounds (AREA)
DE60042533T 1999-04-22 2000-04-19 Sputterverfahren zur Abscheidung von Kohlenstoffschichten Expired - Lifetime DE60042533D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/298,107 US6086730A (en) 1999-04-22 1999-04-22 Method of sputtering a carbon protective film on a magnetic disk with high sp3 content

Publications (1)

Publication Number Publication Date
DE60042533D1 true DE60042533D1 (de) 2009-08-27

Family

ID=23149061

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60042533T Expired - Lifetime DE60042533D1 (de) 1999-04-22 2000-04-19 Sputterverfahren zur Abscheidung von Kohlenstoffschichten

Country Status (7)

Country Link
US (1) US6086730A (de)
EP (1) EP1046726B1 (de)
JP (1) JP5022533B2 (de)
DE (1) DE60042533D1 (de)
MY (1) MY124998A (de)
SG (1) SG100616A1 (de)
TW (1) TW570991B (de)

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Also Published As

Publication number Publication date
JP5022533B2 (ja) 2012-09-12
US6086730A (en) 2000-07-11
EP1046726A3 (de) 2003-07-23
SG100616A1 (en) 2003-12-26
TW570991B (en) 2004-01-11
MY124998A (en) 2006-07-31
EP1046726B1 (de) 2009-07-15
JP2000331336A (ja) 2000-11-30
EP1046726A2 (de) 2000-10-25

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