DE60121091D1 - Verfahren zur Herstellung von Mehrschichtensysteme - Google Patents

Verfahren zur Herstellung von Mehrschichtensysteme

Info

Publication number
DE60121091D1
DE60121091D1 DE60121091T DE60121091T DE60121091D1 DE 60121091 D1 DE60121091 D1 DE 60121091D1 DE 60121091 T DE60121091 T DE 60121091T DE 60121091 T DE60121091 T DE 60121091T DE 60121091 D1 DE60121091 D1 DE 60121091D1
Authority
DE
Germany
Prior art keywords
production
layer systems
systems
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60121091T
Other languages
English (en)
Inventor
Andrey E Dr Yakshin
Eric Drs Louis
Frederik Dr Bijkerk
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE60121091T priority Critical patent/DE60121091D1/de
Application granted granted Critical
Publication of DE60121091D1 publication Critical patent/DE60121091D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5873—Removal of material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
DE60121091T 2000-04-18 2001-04-11 Verfahren zur Herstellung von Mehrschichtensysteme Expired - Lifetime DE60121091D1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE60121091T DE60121091D1 (de) 2000-04-18 2001-04-11 Verfahren zur Herstellung von Mehrschichtensysteme

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10019045A DE10019045B4 (de) 2000-04-18 2000-04-18 Verfahren zum Herstellen von Viellagensystemen
DE60121091T DE60121091D1 (de) 2000-04-18 2001-04-11 Verfahren zur Herstellung von Mehrschichtensysteme

Publications (1)

Publication Number Publication Date
DE60121091D1 true DE60121091D1 (de) 2006-08-10

Family

ID=7639077

Family Applications (2)

Application Number Title Priority Date Filing Date
DE10019045A Expired - Fee Related DE10019045B4 (de) 2000-04-18 2000-04-18 Verfahren zum Herstellen von Viellagensystemen
DE60121091T Expired - Lifetime DE60121091D1 (de) 2000-04-18 2001-04-11 Verfahren zur Herstellung von Mehrschichtensysteme

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE10019045A Expired - Fee Related DE10019045B4 (de) 2000-04-18 2000-04-18 Verfahren zum Herstellen von Viellagensystemen

Country Status (4)

Country Link
US (1) US6483597B2 (de)
EP (1) EP1148149B1 (de)
JP (1) JP2002048902A (de)
DE (2) DE10019045B4 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070281109A1 (en) * 2000-03-31 2007-12-06 Carl Zeiss Smt Ag Multilayer system with protecting layer system and production method
JP3632757B2 (ja) * 2001-01-31 2005-03-23 古河電気工業株式会社 光学フィルタの製造方法
US6798499B2 (en) * 2001-07-18 2004-09-28 Alps Electric Co., Ltd. Method of forming optical thin films on substrate at high accuracy and apparatus therefor
EP1446811A1 (de) * 2001-10-24 2004-08-18 Carl Zeiss SMT AG Prozess zur herstellung von mehrschichtsystemen
JP2003342728A (ja) * 2002-05-24 2003-12-03 Alps Electric Co Ltd 光学薄膜の成膜装置及び成膜方法
WO2009033503A1 (en) 2007-09-12 2009-03-19 Flisom Ag Method for manufacturing a compound film
DE102011077983A1 (de) 2011-06-22 2012-12-27 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines reflektiven optischen Elements für die EUV-Lithographie
CN106017338B (zh) * 2016-05-26 2018-08-24 国家纳米科学中心 一种确定薄膜连续性的临界厚度的方法
IL253578B (en) * 2017-07-19 2018-06-28 Nova Measuring Instr Ltd Measurement of patterns using x-rays

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2750421C2 (de) 1977-11-11 1986-09-25 Leybold-Heraeus GmbH, 5000 Köln Meßverfahren und Meßvorrichtungen für die Herstellung von Vielfach-Schichtsystemen
US4676646A (en) * 1985-10-15 1987-06-30 Energy Conversion Devices, Inc. Method and apparatus for controlling thickness of a layer of an optical data storage device by measuring an optical property of the layer
JPS61296305A (ja) * 1985-06-25 1986-12-27 Horiba Ltd 多層膜干渉フイルタの製造方法
JPH0798993B2 (ja) * 1986-07-23 1995-10-25 日本板硝子株式会社 膜厚制御方法
US5310603A (en) * 1986-10-01 1994-05-10 Canon Kabushiki Kaisha Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray
US4909631A (en) * 1987-12-18 1990-03-20 Tan Raul Y Method for film thickness and refractive index determination
CA1323234C (en) * 1989-09-21 1993-10-19 Gordon G. Shepherd Phase-controlled thin film multilayers for michelson interferometers
JPH0443906A (ja) * 1990-06-11 1992-02-13 Matsushita Electric Ind Co Ltd 光学的膜厚モニタ装置
DE69309505T2 (de) * 1992-01-17 1997-07-24 Matsushita Electric Ind Co Ltd Verfahren und Gerät zur Herstellung mehrschichtiger Filme
US5307395A (en) * 1992-09-30 1994-04-26 The United States Of America As Represented By The Secretary Of The Navy Low-damage multilayer mirror for the soft X-ray region
BE1007607A3 (nl) * 1993-10-08 1995-08-22 Philips Electronics Nv Multilaagspiegel met verlopende brekingsindex.
US5883720A (en) * 1996-06-26 1999-03-16 Matsushita Electric Industrial Co., Ltd. Method of measuring a film thickness of multilayer thin film
US6028669A (en) * 1997-07-23 2000-02-22 Luxtron Corporation Signal processing for in situ monitoring of the formation or removal of a transparent layer
FR2780778B3 (fr) * 1998-07-03 2000-08-11 Saint Gobain Vitrage Procede et dispositif pour la mesure de l'epaisseur d'un materiau transparent

Also Published As

Publication number Publication date
US6483597B2 (en) 2002-11-19
EP1148149A3 (de) 2003-12-17
JP2002048902A (ja) 2002-02-15
EP1148149B1 (de) 2006-06-28
US20010038456A1 (en) 2001-11-08
DE10019045B4 (de) 2005-06-23
DE10019045A1 (de) 2001-10-31
EP1148149A2 (de) 2001-10-24

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Legal Events

Date Code Title Description
8332 No legal effect for de