JP5020385B2 - 複数表面上の接触角の低減 - Google Patents

複数表面上の接触角の低減 Download PDF

Info

Publication number
JP5020385B2
JP5020385B2 JP2010539479A JP2010539479A JP5020385B2 JP 5020385 B2 JP5020385 B2 JP 5020385B2 JP 2010539479 A JP2010539479 A JP 2010539479A JP 2010539479 A JP2010539479 A JP 2010539479A JP 5020385 B2 JP5020385 B2 JP 5020385B2
Authority
JP
Japan
Prior art keywords
surfactant
imprint
template
lithography template
fluid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2010539479A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011508686A5 (enExample
JP2011508686A (ja
Inventor
シュ，フランク・ワイ
マックマッキン，イアン・エム
ラド，パンカジ・ビイ
Original Assignee
モレキュラー・インプリンツ・インコーポレーテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by モレキュラー・インプリンツ・インコーポレーテッド filed Critical モレキュラー・インプリンツ・インコーポレーテッド
Publication of JP2011508686A publication Critical patent/JP2011508686A/ja
Publication of JP2011508686A5 publication Critical patent/JP2011508686A5/ja
Application granted granted Critical
Publication of JP5020385B2 publication Critical patent/JP5020385B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
JP2010539479A 2007-12-18 2008-12-18 複数表面上の接触角の低減 Active JP5020385B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US1457407P 2007-12-18 2007-12-18
US61/014,574 2007-12-18
US12/336,821 2008-12-17
US12/336,821 US8142703B2 (en) 2005-10-05 2008-12-17 Imprint lithography method
PCT/US2008/013827 WO2009082458A2 (en) 2007-12-18 2008-12-18 Contact angle attenuations on multiple surfaces

Publications (3)

Publication Number Publication Date
JP2011508686A JP2011508686A (ja) 2011-03-17
JP2011508686A5 JP2011508686A5 (enExample) 2012-05-31
JP5020385B2 true JP5020385B2 (ja) 2012-09-05

Family

ID=40801728

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010539479A Active JP5020385B2 (ja) 2007-12-18 2008-12-18 複数表面上の接触角の低減

Country Status (6)

Country Link
US (1) US8142703B2 (enExample)
EP (1) EP2227575A4 (enExample)
JP (1) JP5020385B2 (enExample)
KR (1) KR20100105659A (enExample)
CN (1) CN101903159A (enExample)
WO (1) WO2009082458A2 (enExample)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7307118B2 (en) * 2004-11-24 2007-12-11 Molecular Imprints, Inc. Composition to reduce adhesion between a conformable region and a mold
US20050160934A1 (en) * 2004-01-23 2005-07-28 Molecular Imprints, Inc. Materials and methods for imprint lithography
US8846195B2 (en) * 2005-07-22 2014-09-30 Canon Nanotechnologies, Inc. Ultra-thin polymeric adhesion layer
US8808808B2 (en) * 2005-07-22 2014-08-19 Molecular Imprints, Inc. Method for imprint lithography utilizing an adhesion primer layer
US8142703B2 (en) 2005-10-05 2012-03-27 Molecular Imprints, Inc. Imprint lithography method
US8272254B2 (en) * 2008-08-04 2012-09-25 Brighton Technologies Group, Inc Device and method to measure wetting characteristics
US8361546B2 (en) * 2008-10-30 2013-01-29 Molecular Imprints, Inc. Facilitating adhesion between substrate and patterned layer
US20100109195A1 (en) * 2008-11-05 2010-05-06 Molecular Imprints, Inc. Release agent partition control in imprint lithography
NL2003875A (en) * 2009-02-04 2010-08-05 Asml Netherlands Bv Imprint lithography method and apparatus.
WO2011066450A2 (en) * 2009-11-24 2011-06-03 Molecular Imprints, Inc. Adhesion layers in nanoimprint lithography
JP2011222732A (ja) 2010-04-09 2011-11-04 Fujifilm Corp パターン形成方法及びパターン基板製造方法
JP2013069920A (ja) * 2011-09-22 2013-04-18 Toshiba Corp 成膜方法およびパターン形成方法
CN102507393B (zh) * 2011-11-08 2013-05-22 国网技术学院 一种涂层表面接触角测量装置及测试方法
JP6328001B2 (ja) 2013-08-30 2018-05-23 キヤノン株式会社 インプリント用硬化性組成物、膜、膜の製造方法
EP3210008B1 (en) * 2014-10-24 2024-02-28 Brighton Technologies LLC Method and device for detecting substances on surfaces
US10829644B2 (en) 2016-03-31 2020-11-10 Canon Kabushiki Kaisha Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold
US10754245B2 (en) 2016-03-31 2020-08-25 Canon Kabushiki Kaisha Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold
US10754243B2 (en) 2016-03-31 2020-08-25 Canon Kabushiki Kaisha Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold
US10845700B2 (en) 2016-03-31 2020-11-24 Canon Kabushiki Kaisha Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold
US10754244B2 (en) 2016-03-31 2020-08-25 Canon Kabushiki Kaisha Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold
US10578965B2 (en) 2016-03-31 2020-03-03 Canon Kabushiki Kaisha Pattern forming method
US10883006B2 (en) 2016-03-31 2021-01-05 Canon Kabushiki Kaisha Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold
KR102265572B1 (ko) 2017-03-08 2021-06-17 캐논 가부시끼가이샤 광 나노임프린트 기술을 사용한 패턴 형성 방법, 임프린트 장치 및 경화성 조성물
JP7425602B2 (ja) 2017-03-08 2024-01-31 キヤノン株式会社 パターン形成方法、ならびに加工基板、光学部品及び石英モールドレプリカの製造方法、ならびにインプリント前処理コーティング材料及びそれとインプリントレジストとのセット
KR102385158B1 (ko) 2017-03-08 2022-04-12 캐논 가부시끼가이샤 패턴 형성 방법, 임프린트 전처리 코팅 재료, 및 기판의 전처리 방법
JP7034696B2 (ja) * 2017-12-14 2022-03-14 キヤノン株式会社 硬化物パターンの製造方法、加工基板の製造方法、回路基板の製造方法、電子部品の製造方法、およびインプリントモールドの製造方法
CN115970784A (zh) 2018-07-20 2023-04-18 布赖顿技术有限责任公司 从液体微滴分配系统收集样本确定微滴质量的方法和装置

Family Cites Families (140)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3403122A (en) 1967-12-22 1968-09-24 Minnesota Mining & Mfg Emulsion polymerization of water insoluble omega-(n-perfluoroalkanesulfonyl) aminoalkyl acrylates or methacrylates
US3810874A (en) 1969-03-10 1974-05-14 Minnesota Mining & Mfg Polymers prepared from poly(perfluoro-alkylene oxide) compounds
US3787351A (en) 1972-02-28 1974-01-22 Minnesota Mining & Mfg Use of soluble fluoroaliphatic oligomers in resin composite articles
US4303761A (en) 1979-05-29 1981-12-01 E. I. Du Pont De Nemours And Company Fluoroelastomer gelling agents and products made therefrom
US4617238A (en) 1982-04-01 1986-10-14 General Electric Company Vinyloxy-functional organopolysiloxane compositions
US4585829A (en) 1983-09-30 1986-04-29 Union Carbide Corporation Internal mold release for reaction injection molded polyurethanes
US4512848A (en) 1984-02-06 1985-04-23 Exxon Research And Engineering Co. Procedure for fabrication of microstructures over large areas using physical replication
US4614667A (en) 1984-05-21 1986-09-30 Minnesota Mining And Manufacturing Company Composite low surface energy liner of perfluoropolyether
US4845008A (en) 1986-02-20 1989-07-04 Fuji Photo Film Co., Ltd. Light-sensitive positive working, o-guinone diazide presensitized plate with mixed solvent
JPH0762761B2 (ja) 1986-03-28 1995-07-05 富士写真フイルム株式会社 画像形成材料
EP0255303B1 (en) 1986-07-25 1989-10-11 Oki Electric Industry Company, Limited Negative resist material, method for its manufacture and method for using it
US4931351A (en) 1987-01-12 1990-06-05 Eastman Kodak Company Bilayer lithographic process
US4731155A (en) 1987-04-15 1988-03-15 General Electric Company Process for forming a lithographic mask
US5028366A (en) 1988-01-12 1991-07-02 Air Products And Chemicals, Inc. Water based mold release compositions for making molded polyurethane foam
US4835084A (en) 1988-03-21 1989-05-30 Eastman Kodak Company Electrostatographic toner and method of producing the same
JPH0224848A (ja) * 1988-07-14 1990-01-26 Canon Inc 光記録媒体用基板の製造方法
JPH0292603A (ja) * 1988-09-30 1990-04-03 Hoya Corp 案内溝付き情報記録用基板の製造方法
US5169494A (en) 1989-03-27 1992-12-08 Matsushita Electric Industrial Co., Ltd. Fine pattern forming method
US6054034A (en) 1990-02-28 2000-04-25 Aclara Biosciences, Inc. Acrylic microchannels and their use in electrophoretic applications
DE4228853C2 (de) 1991-09-18 1993-10-21 Schott Glaswerke Optischer Wellenleiter mit einem planaren oder nur geringfügig gewölbten Substrat und Verfahren zu dessen Herstellung sowie Verwendung eines solchen
US5331020A (en) 1991-11-14 1994-07-19 Dow Corning Limited Organosilicon compounds and compositions containing them
US5298556A (en) 1992-07-21 1994-03-29 Tse Industries, Inc. Mold release composition and method coating a mold core
US5601641A (en) 1992-07-21 1997-02-11 Tse Industries, Inc. Mold release composition with polybutadiene and method of coating a mold core
US5283148A (en) 1992-09-18 1994-02-01 Minnesota Mining And Manufacturing Company Liquid toners for use with perfluorinated solvents
DE4306997A1 (de) 1993-03-05 1994-09-08 Thera Ges Fuer Patente Hydrophilierte Polyether
DE69405451T2 (de) 1993-03-16 1998-03-12 Koninkl Philips Electronics Nv Verfahren und Vorrichtung zur Herstellung eines strukturierten Reliefbildes aus vernetztem Photoresist auf einer flachen Substratoberfläche
US5594042A (en) 1993-05-18 1997-01-14 Dow Corning Corporation Radiation curable compositions containing vinyl ether functional polyorganosiloxanes
US5861467A (en) 1993-05-18 1999-01-19 Dow Corning Corporation Radiation curable siloxane compositions containing vinyl ether functionality and methods for their preparation
US5380644A (en) 1993-08-10 1995-01-10 Minnesota Mining And Manufacturing Company Additive for the reduction of mottle in photothermographic and thermographic elements
US5389696A (en) 1993-09-17 1995-02-14 Miles Inc. Process for the production of molded products using internal mold release agents
US6776094B1 (en) 1993-10-04 2004-08-17 President & Fellows Of Harvard College Kit For Microcontact Printing
US5462700A (en) 1993-11-08 1995-10-31 Alliedsignal Inc. Process for making an array of tapered photopolymerized waveguides
US5631314A (en) 1994-04-27 1997-05-20 Tokyo Ohka Kogyo Co., Ltd. Liquid coating composition for use in forming photoresist coating films and photoresist material using said composition
US5542978A (en) 1994-06-10 1996-08-06 Johnson & Johnson Vision Products, Inc. Apparatus for applying a surfactant to mold surfaces
US5837314A (en) 1994-06-10 1998-11-17 Johnson & Johnson Vision Products, Inc. Method and apparatus for applying a surfactant to mold surfaces
JP3278306B2 (ja) 1994-10-31 2002-04-30 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
US5849209A (en) 1995-03-31 1998-12-15 Johnson & Johnson Vision Products, Inc. Mold material made with additives
US5849222A (en) 1995-09-29 1998-12-15 Johnson & Johnson Vision Products, Inc. Method for reducing lens hole defects in production of contact lens blanks
US6468642B1 (en) 1995-10-03 2002-10-22 N.V. Bekaert S.A. Fluorine-doped diamond-like coatings
US5747234A (en) 1995-11-13 1998-05-05 Eastman Kodak Company Photographic element
US6309580B1 (en) 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US20040137734A1 (en) 1995-11-15 2004-07-15 Princeton University Compositions and processes for nanoimprinting
US20030080471A1 (en) 2001-10-29 2003-05-01 Chou Stephen Y. Lithographic method for molding pattern with nanoscale features
US20040036201A1 (en) 2000-07-18 2004-02-26 Princeton University Methods and apparatus of field-induced pressure imprint lithography
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US7758794B2 (en) 2001-10-29 2010-07-20 Princeton University Method of making an article comprising nanoscale patterns with reduced edge roughness
US6518189B1 (en) 1995-11-15 2003-02-11 Regents Of The University Of Minnesota Method and apparatus for high density nanostructures
US6482742B1 (en) 2000-07-18 2002-11-19 Stephen Y. Chou Fluid pressure imprint lithography
US6204343B1 (en) 1996-12-11 2001-03-20 3M Innovative Properties Company Room temperature curable resin
US6156389A (en) 1997-02-03 2000-12-05 Cytonix Corporation Hydrophobic coating compositions, articles coated with said compositions, and processes for manufacturing same
US6093455A (en) 1997-05-23 2000-07-25 Deco Patents, Inc. Method and compositions for decorating glass
TW494125B (en) 1997-07-11 2002-07-11 Rohm And Haas Compary Preparation of fluorinated polymers
US6475704B1 (en) 1997-09-12 2002-11-05 Canon Kabushiki Kaisha Method for forming fine structure
US6169139B1 (en) 1998-04-27 2001-01-02 Dupont Dow Elastomers Llc Fluoroelastomer latex
JP3780700B2 (ja) 1998-05-26 2006-05-31 セイコーエプソン株式会社 パターン形成方法、パターン形成装置、パターン形成用版、パターン形成用版の製造方法、カラーフィルタの製造方法、導電膜の製造方法及び液晶パネルの製造方法
KR100273172B1 (ko) 1998-08-01 2001-03-02 윤덕용 아크릴 측쇄에 디옥사스피로환기 유도체를 갖는 화합물을 이용한 포토레지스트
US6713238B1 (en) 1998-10-09 2004-03-30 Stephen Y. Chou Microscale patterning and articles formed thereby
EP1003078A3 (en) 1998-11-17 2001-11-07 Corning Incorporated Replicating a nanoscale pattern
US6373489B1 (en) * 1999-01-12 2002-04-16 Schlumberger Technology Corporation Scalable visualization for interactive geometry modeling
US6245421B1 (en) 1999-02-04 2001-06-12 Kodak Polychrome Graphics Llc Printable media for lithographic printing having a porous, hydrophilic layer and a method for the production thereof
US6334960B1 (en) 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
TW465815U (en) 1999-04-09 2001-11-21 Hon Hai Prec Ind Co Ltd Electrical connector
CA2374241A1 (en) 1999-06-11 2000-12-21 Bausch & Lomb Incorporated Lens molds with protective coatings for production of contact lenses and other ophthalmic products
US6276273B1 (en) 1999-06-11 2001-08-21 Kodak Polychrome Graphics Llc Surfactant-pretreated printing plate substrate, lithographic printing plate and method for production thereof
WO2001018305A1 (en) 1999-09-10 2001-03-15 Nano-Tex, Llc Water-repellent and soil-resistant finish for textiles
US6517995B1 (en) 1999-09-14 2003-02-11 Massachusetts Institute Of Technology Fabrication of finely featured devices by liquid embossing
JP4855616B2 (ja) 1999-10-27 2012-01-18 スリーエム イノベイティブ プロパティズ カンパニー フルオロケミカルスルホンアミド界面活性剤
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
WO2001047003A2 (en) 1999-12-23 2001-06-28 University Of Massachusetts Methods and apparatus for forming submicron patterns on films
KR20010098809A (ko) 2000-04-25 2001-11-08 마쯔모또 에이찌 Ｅｌ 표시 소자의 격벽 형성용 감방사선성 수지 조성물,격벽 및 ｅｌ 표시 소자
US6774183B1 (en) 2000-04-27 2004-08-10 Bostik, Inc. Copolyesters having improved retained adhesion
JP3802732B2 (ja) 2000-05-12 2006-07-26 信越化学工業株式会社 レジスト材料及びパターン形成方法
US6372838B1 (en) 2000-06-28 2002-04-16 3M Innovative Properties Company Fine latex and seed method of making
US7211214B2 (en) 2000-07-18 2007-05-01 Princeton University Laser assisted direct imprint lithography
US7635262B2 (en) 2000-07-18 2009-12-22 Princeton University Lithographic apparatus for fluid pressure imprint lithography
US6448301B1 (en) 2000-09-08 2002-09-10 3M Innovative Properties Company Crosslinkable polymeric compositions and use thereof
US20020126189A1 (en) 2000-09-21 2002-09-12 Gloster Daniel F. Systems and methods for lithography
AU2001297642A1 (en) 2000-10-12 2002-09-04 Board Of Regents, The University Of Texas System Template for room temperature, low pressure micro- and nano-imprint lithography
US6503914B1 (en) 2000-10-23 2003-01-07 Board Of Regents, The University Of Texas System Thienopyrimidine-based inhibitors of the Src family
DE10062203A1 (de) 2000-12-13 2002-06-20 Creavis Tech & Innovation Gmbh Verfahren zur Abformung von hydrophoben Polymeren zur Erzeugung von Oberflächen mit beständig wasser- und ölabweisenden Eigenschaften
KR20020047490A (ko) 2000-12-13 2002-06-22 윤종용 실리콘을 함유하는 감광성 폴리머 및 이를 포함하는레지스트 조성물
US6783719B2 (en) 2001-01-19 2004-08-31 Korry Electronics, Co. Mold with metal oxide surface compatible with ionic release agents
JP2004524564A (ja) 2001-02-27 2004-08-12 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 新規ポリマー、ポリマー合成方法およびフォトレジスト組成物
US6387787B1 (en) 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use
KR100442859B1 (ko) 2001-04-04 2004-08-02 삼성전자주식회사 실리콘을 함유하는 알킬 비닐 에테르의 중합체로이루어지는 감광성 폴리머 및 이를 포함하는 레지스트조성물
US6737489B2 (en) 2001-05-21 2004-05-18 3M Innovative Properties Company Polymers containing perfluorovinyl ethers and applications for such polymers
US7037574B2 (en) 2001-05-23 2006-05-02 Veeco Instruments, Inc. Atomic layer deposition for fabricating thin films
US6736857B2 (en) 2001-05-25 2004-05-18 3M Innovative Properties Company Method for imparting soil and stain resistance to carpet
JP2005505754A (ja) 2001-07-25 2005-02-24 ザ トラスティーズ オブ プリンストン ユニバーシテイ 高スループットのマクロ分子分析用のナノチャンネル・アレイ並びにその準備および使用
US6721529B2 (en) 2001-09-21 2004-04-13 Nexpress Solutions Llc Release agent donor member having fluorocarbon thermoplastic random copolymer overcoat
US6790905B2 (en) 2001-10-09 2004-09-14 E. I. Du Pont De Nemours And Company Highly repellent carpet protectants
US6649272B2 (en) 2001-11-08 2003-11-18 3M Innovative Properties Company Coating composition comprising fluorochemical polyether silane polycondensate and use thereof
US7455955B2 (en) 2002-02-27 2008-11-25 Brewer Science Inc. Planarization method for multi-layer lithography processing
JP2004002702A (ja) 2002-02-28 2004-01-08 Merck Patent Gmbh プレポリマー材料、ポリマー材料、インプリンティングプロセスおよびその使用
EP1342736B1 (en) 2002-02-28 2013-05-08 Merck Patent GmbH Prepolymer material, polymer material, imprinting process and their Use
US20030235787A1 (en) 2002-06-24 2003-12-25 Watts Michael P.C. Low viscosity high resolution patterning material
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7442336B2 (en) * 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US6900881B2 (en) 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US6957608B1 (en) 2002-08-02 2005-10-25 Kovio, Inc. Contact print methods
US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US20040065252A1 (en) 2002-10-04 2004-04-08 Sreenivasan Sidlgata V. Method of forming a layer on a substrate to facilitate fabrication of metrology standards
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US7750059B2 (en) 2002-12-04 2010-07-06 Hewlett-Packard Development Company, L.P. Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure
US7365103B2 (en) 2002-12-12 2008-04-29 Board Of Regents, The University Of Texas System Compositions for dark-field polymerization and method of using the same for imprint lithography processes
JP4210858B2 (ja) 2002-12-26 2009-01-21 日産化学工業株式会社 アルカリ溶解型リソグラフィー用ギャップフィル材形成組成物
US20040168613A1 (en) 2003-02-27 2004-09-02 Molecular Imprints, Inc. Composition and method to form a release layer
US7452574B2 (en) 2003-02-27 2008-11-18 Molecular Imprints, Inc. Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
US6830819B2 (en) 2003-03-18 2004-12-14 Xerox Corporation Fluorosilicone release agent for fluoroelastomer fuser members
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7122079B2 (en) 2004-02-27 2006-10-17 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
EP1606834B1 (en) 2003-03-27 2013-06-05 Korea Institute Of Machinery & Materials Uv nanoimprint lithography process using elementwise embossed stamp
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US20050160934A1 (en) 2004-01-23 2005-07-28 Molecular Imprints, Inc. Materials and methods for imprint lithography
US7307118B2 (en) 2004-11-24 2007-12-11 Molecular Imprints, Inc. Composition to reduce adhesion between a conformable region and a mold
US20060108710A1 (en) 2004-11-24 2006-05-25 Molecular Imprints, Inc. Method to reduce adhesion between a conformable region and a mold
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
JP2005014348A (ja) 2003-06-25 2005-01-20 Fuji Photo Film Co Ltd 平版印刷版原版及び平版印刷方法
US20050098534A1 (en) 2003-11-12 2005-05-12 Molecular Imprints, Inc. Formation of conductive templates employing indium tin oxide
KR100595515B1 (ko) * 2003-12-31 2006-07-03 엘지전자 주식회사 미세 구조물 성형용 금형 및 미세 구조 성형용 금형의단층막 이형제 코팅 방법
US8076386B2 (en) 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
CN1283445C (zh) * 2004-03-19 2006-11-08 中国科学院化学研究所 改变固体薄膜材料表面浸润性的方法
US7309225B2 (en) 2004-08-13 2007-12-18 Molecular Imprints, Inc. Moat system for an imprint lithography template
US7282550B2 (en) 2004-08-16 2007-10-16 Molecular Imprints, Inc. Composition to provide a layer with uniform etch characteristics
US7939131B2 (en) 2004-08-16 2011-05-10 Molecular Imprints, Inc. Method to provide a layer with uniform etch characteristics
US20060062922A1 (en) 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
US20060081557A1 (en) 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
KR101357816B1 (ko) * 2004-11-24 2014-02-04 몰레큘러 임프린츠 인코퍼레이티드 몰드와 중합가능한 조성물 사이에 바람직한 특성을제공하는 방법 및 조성물
US20060145398A1 (en) 2004-12-30 2006-07-06 Board Of Regents, The University Of Texas System Release layer comprising diamond-like carbon (DLC) or doped DLC with tunable composition for imprint lithography templates and contact masks
JP4584754B2 (ja) * 2005-04-06 2010-11-24 株式会社日立産機システム ナノプリント金型、その製造方法及びこの金型を用いたナノプリント装置並びにナノプリント方法
US7759407B2 (en) 2005-07-22 2010-07-20 Molecular Imprints, Inc. Composition for adhering materials together
US8808808B2 (en) 2005-07-22 2014-08-19 Molecular Imprints, Inc. Method for imprint lithography utilizing an adhesion primer layer
US8557351B2 (en) 2005-07-22 2013-10-15 Molecular Imprints, Inc. Method for adhering materials together
US8142703B2 (en) 2005-10-05 2012-03-27 Molecular Imprints, Inc. Imprint lithography method
JP2007320142A (ja) * 2006-05-31 2007-12-13 Meisho Kiko Kk ナノインプリント用モールド
US20080000373A1 (en) 2006-06-30 2008-01-03 Maria Petrucci-Samija Printing form precursor and process for preparing a stamp from the precursor
TWI340944B (en) * 2006-10-27 2011-04-21 Chimei Innolux Corp Liquid crystal display, driving circuit and driving method thereof
US20080110557A1 (en) 2006-11-15 2008-05-15 Molecular Imprints, Inc. Methods and Compositions for Providing Preferential Adhesion and Release of Adjacent Surfaces
US20100109195A1 (en) 2008-11-05 2010-05-06 Molecular Imprints, Inc. Release agent partition control in imprint lithography

Also Published As

Publication number Publication date
CN101903159A (zh) 2010-12-01
EP2227575A2 (en) 2010-09-15
KR20100105659A (ko) 2010-09-29
US20090136654A1 (en) 2009-05-28
US8142703B2 (en) 2012-03-27
WO2009082458A2 (en) 2009-07-02
JP2011508686A (ja) 2011-03-17
EP2227575A4 (en) 2010-12-15
WO2009082458A3 (en) 2009-12-30

Similar Documents

Publication Publication Date Title
JP5020385B2 (ja) 複数表面上の接触角の低減
JP5084823B2 (ja) 基板上の複数のフィールドをパターニングすること
US7281919B2 (en) System for controlling a volume of material on a mold
JP5139421B2 (ja) 厚さが変化するテンプレート
JP4514754B2 (ja) 毛管作用によるインプリント技術
US7462028B2 (en) Partial vacuum environment imprinting
US20080303187A1 (en) Imprint Fluid Control
JP5404654B2 (ja) テンプレート形成時の限界寸法制御
JP5198282B2 (ja) 基板とモールドとの間に位置するガスを排出するための方法
TWI402159B (zh) 模板分離期間之應力減低的技術
US20070114686A1 (en) Method for expelling gas positioned between a substrate and a mold
JP5728478B2 (ja) 隣接するフィールドのアラインメント方法
WO2005072120A2 (en) Materials and methods for imprint lithography
JP2005533393A (ja) インプリント・リソグラフィ・プロセスおよびシステム
JP2006528088A (ja) 成形される領域と成形型のパターンとの間の接着を低減させる方法
CN101932754A (zh) 单相流体印刻平板印刷方法
JP5982386B2 (ja) 非凸形ナノ構造のパターン形成
EP2222764A2 (en) Controlling thickness of residual layer
US20100095862A1 (en) Double Sidewall Angle Nano-Imprint Template
JP2020127008A (ja) 質量速度変動フィーチャを有するテンプレート、テンプレートを使用するナノインプリントリソグラフィ装置、およびテンプレートを使用する方法
TW200936361A (en) Contact angle attenuations on multiple surfaces

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20111219

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20111219

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120403

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20120403

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20120423

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120529

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120612

R150 Certificate of patent or registration of utility model

Ref document number: 5020385

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150622

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250