JP4976922B2 - 基板搬送装置 - Google Patents
基板搬送装置 Download PDFInfo
- Publication number
- JP4976922B2 JP4976922B2 JP2007141492A JP2007141492A JP4976922B2 JP 4976922 B2 JP4976922 B2 JP 4976922B2 JP 2007141492 A JP2007141492 A JP 2007141492A JP 2007141492 A JP2007141492 A JP 2007141492A JP 4976922 B2 JP4976922 B2 JP 4976922B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- support
- magnetic body
- end surface
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims description 181
- 230000007246 mechanism Effects 0.000 claims description 48
- 230000007723 transport mechanism Effects 0.000 claims description 7
- 230000032258 transport Effects 0.000 description 42
- 230000003287 optical effect Effects 0.000 description 10
- 230000003028 elevating effect Effects 0.000 description 9
- 239000000428 dust Substances 0.000 description 4
- 238000009434 installation Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Images
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manipulator (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007141492A JP4976922B2 (ja) | 2007-05-29 | 2007-05-29 | 基板搬送装置 |
TW97114611A TWI414475B (zh) | 2007-05-29 | 2008-04-22 | Substrate handling device |
CN2008101088599A CN101315524B (zh) | 2007-05-29 | 2008-05-29 | 基板搬运装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007141492A JP4976922B2 (ja) | 2007-05-29 | 2007-05-29 | 基板搬送装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008300389A JP2008300389A (ja) | 2008-12-11 |
JP4976922B2 true JP4976922B2 (ja) | 2012-07-18 |
Family
ID=40106567
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007141492A Expired - Fee Related JP4976922B2 (ja) | 2007-05-29 | 2007-05-29 | 基板搬送装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4976922B2 (zh) |
CN (1) | CN101315524B (zh) |
TW (1) | TWI414475B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014084228A1 (ja) * | 2012-11-30 | 2014-06-05 | 株式会社ニコン | 吸引装置、搬入方法、搬送システム及び露光装置、並びにデバイス製造方法 |
CN109078863B (zh) * | 2018-07-27 | 2024-04-16 | 苏州精濑光电有限公司 | 一种光学检测设备 |
CN114615816B (zh) * | 2022-04-12 | 2022-12-23 | 苏州天准科技股份有限公司 | 板材曝光设备 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2818074B2 (ja) * | 1992-05-22 | 1998-10-30 | 大日本スクリーン製造株式会社 | 近接露光装置のプリアライメント装置 |
JPH07147315A (ja) * | 1993-11-26 | 1995-06-06 | Nikon Corp | 基板搬送装置 |
JP3414491B2 (ja) * | 1994-05-12 | 2003-06-09 | オリンパス光学工業株式会社 | 基板保持部材及びこれを用いた基板外観検査装置 |
JP3563851B2 (ja) * | 1995-12-05 | 2004-09-08 | 大日本スクリーン製造株式会社 | 基板搬送装置 |
JP2002313884A (ja) * | 2001-04-10 | 2002-10-25 | Jeol Ltd | 板状体の位置のアライメント機構 |
JP4234964B2 (ja) * | 2002-09-10 | 2009-03-04 | 株式会社オーク製作所 | 露光装置 |
JP4664142B2 (ja) * | 2005-07-21 | 2011-04-06 | 住友重機械工業株式会社 | ステージ装置 |
JP4653588B2 (ja) * | 2005-08-12 | 2011-03-16 | 株式会社オーク製作所 | 露光装置および露光方法 |
-
2007
- 2007-05-29 JP JP2007141492A patent/JP4976922B2/ja not_active Expired - Fee Related
-
2008
- 2008-04-22 TW TW97114611A patent/TWI414475B/zh not_active IP Right Cessation
- 2008-05-29 CN CN2008101088599A patent/CN101315524B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN101315524A (zh) | 2008-12-03 |
CN101315524B (zh) | 2012-07-04 |
TWI414475B (zh) | 2013-11-11 |
JP2008300389A (ja) | 2008-12-11 |
TW200846267A (en) | 2008-12-01 |
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