JP4936146B2 - 基板処理装置及びこれを用いた基板処理装置洗浄方法 - Google Patents
基板処理装置及びこれを用いた基板処理装置洗浄方法 Download PDFInfo
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- JP4936146B2 JP4936146B2 JP2008261852A JP2008261852A JP4936146B2 JP 4936146 B2 JP4936146 B2 JP 4936146B2 JP 2008261852 A JP2008261852 A JP 2008261852A JP 2008261852 A JP2008261852 A JP 2008261852A JP 4936146 B2 JP4936146 B2 JP 4936146B2
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- 238000004140 cleaning Methods 0.000 title claims description 99
- 239000000758 substrate Substances 0.000 title claims description 86
- 238000000034 method Methods 0.000 title claims description 33
- 239000012530 fluid Substances 0.000 claims description 55
- 239000007788 liquid Substances 0.000 claims description 47
- 230000008878 coupling Effects 0.000 claims description 22
- 238000010168 coupling process Methods 0.000 claims description 22
- 238000005859 coupling reaction Methods 0.000 claims description 22
- 238000001035 drying Methods 0.000 claims description 11
- 238000002347 injection Methods 0.000 claims description 11
- 239000007924 injection Substances 0.000 claims description 11
- 238000005507 spraying Methods 0.000 claims description 5
- 238000007599 discharging Methods 0.000 claims description 2
- 230000032258 transport Effects 0.000 claims description 2
- 238000011084 recovery Methods 0.000 description 67
- 239000007789 gas Substances 0.000 description 18
- 239000004065 semiconductor Substances 0.000 description 8
- 239000007921 spray Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68792—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
200 基板支持部材
310、320 ノズル
330 垂直移動部
340 回転駆動部
350 流体供給部
400 基板処理装置
Claims (7)
- 基板の処理工程が行われる空間を提供する処理容器と、
前記処理容器内に受容されて前記基板を固定させ、前記処理容器に向けて流体を噴射する少なくとも一つの噴射孔が側面に形成された基板支持部材と、を含み、
前記基板支持部材は、
基板が載置され、一方向に回転し、前記噴射孔が形成されたスピンヘッドと、
前記スピンヘッドと結合されて前記スピンヘッドを支持する固定軸と、
前記固定軸内に内蔵され、前記流体を輸送する供給配管と、
前記スピンヘッド及び前記固定軸と結合し、前記供給配管から前記流体を供給されて前記噴射孔に提供する回転結合部と、を含み
前記流体は、前記処理容器を洗浄するための洗浄液と、前記洗浄後に前記処理容器を乾燥させるための乾燥ガスであることを特徴とする基板処理装置。 - 前記噴射孔は、前記スピンヘッドの側面から前記スピンヘッドの中心軸側に延長されて形成されたことを特徴とする請求項1に記載の基板処理装置。
- 前記回転結合部は、
前記供給配管からの前記流体が流入する少なくとも一つの供給孔を有し、前記固定軸に固定された本体部と、
前記スピンヘッドに結合され前記スピンヘッドと共に回転し、前記固定軸と結合して前記流体を提供され、前記流体を排出する少なくとも一つの排出孔を有する回転部と、
前記回転部と前記本体部との間に介在して前記回転部と前記本体部とを結合する少なくとも一つの軸受と、を含むことを特徴とする請求項1に記載の基板処理装置。 - 前記回転部及び前記スピンヘッドと結合し、前記排出孔から排出された前記流体を前記噴射孔に提供する少なくとも一つの洗浄配管をさらに含むことを特徴とする請求項3に記載の基板処理装置。
- 前記本体部及び前記供給配管と結合し、前記供給配管から排出された前記流体を前記本体部に提供する少なくとも一つの連結配管をさらに含むことを特徴とする請求項4に記載の基板処理装置。
- 処理容器内に受容された基板支持部材の内部に流体を提供するステップと、
前記基板支持部材を回転させ、これと同時に前記基板支持部材の側面の噴射孔から前記流体が噴射されて前記処理容器を洗浄するステップと、を含み、
前記処理容器を洗浄するステップは、
前記流体をなす洗浄液を前記基板支持部材が回転しながら噴射して前記処理容器を洗浄するステップと、
前記流体をなす乾燥ガスを前記基板支持部材が回転しながら噴射して前記処理容器を乾燥させるステップと、を含むことを特徴とする基板処理装置洗浄方法。 - 前記基板支持部材は、前記流体が噴射される間、前記処理容器内での垂直位置が調節されることを特徴とする請求項6の基板処理装置洗浄方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2007-0102489 | 2007-10-11 | ||
KR1020070102489A KR100901495B1 (ko) | 2007-10-11 | 2007-10-11 | 기판 처리 장치 및 그 세정 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009094516A JP2009094516A (ja) | 2009-04-30 |
JP4936146B2 true JP4936146B2 (ja) | 2012-05-23 |
Family
ID=40532991
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008261852A Active JP4936146B2 (ja) | 2007-10-11 | 2008-10-08 | 基板処理装置及びこれを用いた基板処理装置洗浄方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20090095325A1 (ja) |
JP (1) | JP4936146B2 (ja) |
KR (1) | KR100901495B1 (ja) |
CN (1) | CN101409211B (ja) |
TW (1) | TWI428966B (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI421928B (zh) * | 2010-06-10 | 2014-01-01 | Grand Plastic Technology Co Ltd | 清洗蝕刻機台之自動清洗方法 |
WO2013001930A1 (ja) * | 2011-06-28 | 2013-01-03 | 村田機械株式会社 | 保管装置と保管方法 |
KR102063319B1 (ko) * | 2012-10-04 | 2020-01-08 | 세메스 주식회사 | 스핀 헤드 및 이를 포함하는 기판 처리 장치, 그리고 상기 장치를 이용한 기판 처리 방법 |
JP6164826B2 (ja) * | 2012-12-05 | 2017-07-19 | 株式会社ディスコ | 洗浄装置 |
US10395915B2 (en) * | 2013-02-28 | 2019-08-27 | Semes Co., Ltd. | Nozzle assembly, substrate treatment apparatus including the nozzle assembly, and method of treating substrate using the assembly |
KR102036929B1 (ko) * | 2013-12-23 | 2019-10-25 | 주식회사 케이씨텍 | 화학 기계적 연마 시스템의 캐리어 헤드의 세정 장치 |
JP6353684B2 (ja) * | 2014-04-04 | 2018-07-04 | 株式会社ディスコ | 研削ホイール及び研削室の洗浄方法 |
TWI729584B (zh) * | 2019-11-22 | 2021-06-01 | 佳宸科技有限公司 | 濕製程用清潔機構 |
KR102408137B1 (ko) | 2019-12-12 | 2022-06-13 | 세메스 주식회사 | 기판 처리 장치 |
KR102583458B1 (ko) * | 2020-11-27 | 2023-09-26 | 세메스 주식회사 | 기판 처리액 회수 유닛 및 이를 구비하는 기판 처리 장치 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2893149B2 (ja) * | 1991-12-05 | 1999-05-17 | 東京エレクトロン株式会社 | 塗布装置 |
JP3388628B2 (ja) * | 1994-03-24 | 2003-03-24 | 東京応化工業株式会社 | 回転式薬液処理装置 |
JP3414916B2 (ja) * | 1996-02-27 | 2003-06-09 | 大日本スクリーン製造株式会社 | 基板処理装置および方法 |
US5947136A (en) * | 1996-09-10 | 1999-09-07 | Silicon Valley Group Inc. | Catch cup cleaning system |
JP3640837B2 (ja) * | 1999-06-28 | 2005-04-20 | 大日本スクリーン製造株式会社 | 基板処理装置 |
TW504776B (en) * | 1999-09-09 | 2002-10-01 | Mimasu Semiconductor Ind Co | Wafer rotary holding apparatus and wafer surface treatment apparatus with waste liquid recovery mechanism |
JP2003282515A (ja) * | 2002-03-27 | 2003-10-03 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
KR20070064162A (ko) * | 2005-12-16 | 2007-06-20 | 삼성전자주식회사 | 매엽식 기판 처리 장치 |
-
2007
- 2007-10-11 KR KR1020070102489A patent/KR100901495B1/ko active IP Right Grant
-
2008
- 2008-10-08 JP JP2008261852A patent/JP4936146B2/ja active Active
- 2008-10-09 TW TW097138927A patent/TWI428966B/zh active
- 2008-10-09 CN CN2008101488924A patent/CN101409211B/zh active Active
- 2008-10-10 US US12/287,575 patent/US20090095325A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
CN101409211A (zh) | 2009-04-15 |
KR20090037076A (ko) | 2009-04-15 |
CN101409211B (zh) | 2011-07-20 |
TW200926277A (en) | 2009-06-16 |
JP2009094516A (ja) | 2009-04-30 |
TWI428966B (zh) | 2014-03-01 |
KR100901495B1 (ko) | 2009-06-08 |
US20090095325A1 (en) | 2009-04-16 |
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