JP4921713B2 - ホウケイ酸ガラス組成及びその使用 - Google Patents
ホウケイ酸ガラス組成及びその使用 Download PDFInfo
- Publication number
- JP4921713B2 JP4921713B2 JP2004557504A JP2004557504A JP4921713B2 JP 4921713 B2 JP4921713 B2 JP 4921713B2 JP 2004557504 A JP2004557504 A JP 2004557504A JP 2004557504 A JP2004557504 A JP 2004557504A JP 4921713 B2 JP4921713 B2 JP 4921713B2
- Authority
- JP
- Japan
- Prior art keywords
- range
- borosilicate glass
- oxide
- total weight
- respect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00023—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems without movable or flexible elements
- B81C1/00119—Arrangement of basic structures like cavities or channels, e.g. suitable for microfluidic systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00783—Laminate assemblies, i.e. the reactor comprising a stack of plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00819—Materials of construction
- B01J2219/00831—Glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/40—Product characteristics
- C03B2215/41—Profiled surfaces
- C03B2215/412—Profiled surfaces fine structured, e.g. fresnel lenses, prismatic reflectors, other sharp-edged surface profiles
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Dispersion Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Glass Compositions (AREA)
Description
11 第1基板
13 微小構造体
15 前駆物質
17 第2基板
19 第1アセンブリ
21 第2アセンブリ
Claims (2)
- CTEが30×10-7/℃乃至45×10-7/℃の範囲にあり、軟化点が600乃至1000℃の範囲にあるホウケイ酸ガラスであって、
前記ホウケイ酸ガラスは耐酸性試験において重量パーセント減少が10ミリグラム/dm2より低く、前記ホウケイ酸ガラスは耐アルカリ性試験において重量パーセント減少が250ミリグラム/dm2より低く、
前記ホウケイ酸ガラス組成は、
総重量に対して68%乃至73%の範囲のSiO2と、
総重量に対して13%乃至17%の範囲のB2O3と、
総重量に対して8%乃至15%の範囲のAl2O3と、
総重量に対して2%乃至5%の範囲の酸化リチウム(Li2O)と、
総重量に対して1%乃至3%の範囲の酸化ジルコニウム(ZrO2)と、を含み、
SiO2、Al2O3、及びZrO2の重量パーセントの合計は総重量の78%より低いことを特徴とするホウケイ酸ガラス。 - ホウケイ酸ガラスの製造方法であって、
総重量に対して68%乃至73%の範囲の二酸化ケイ素(SiO2)と、
総重量に対して13%乃至17%の範囲の酸化ホウ素(B2O3)と、
総重量に対して8%乃至15%の範囲の酸化アルミニウム(Al2O3)と、
総重量に対して2%乃至5%の範囲の少なくとも1つの酸化リチウム(Li 2 O)と、
総重量に対して1%乃至3%の範囲の酸化ジルコニウム(ZrO 2 )と、を含んで、SiO 2 、Al 2 O 3 、及びZrO 2 の重量パーセントの合計は総重量の78%より低く、重量パーセント合計が総重量に対して0.1%乃至7%の範囲にある少なくとも1つのアルカリ土類酸化物及び少なくとも1つの希土類酸化物と、を含む複数の成分を混合して均質混合物を形成する工程と、
前記均質混合物を溶かす工程と、
前記ホウケイ酸ガラスを形成する前記均質混合物を焼結する工程と、を含み、
前記ホウケイ酸ガラスは30×10-7/℃乃至45×10-7/℃の範囲の熱膨張係数(CTE)を有し、前記均質混合物は焼結することによって、前記ホウケイ酸ガラスが膨張するのを防止するインヒビタ酸化物を添加することなく失透に対する耐性を有し、
前記アルカリ土類酸化物は酸化バリウム(BaO)、酸化ストロンチウム(SrO)、酸化カルシウム(CaO)、及びマグネシウム(MgO)から選択され、前記希土類酸化物は酸化ランタン(La2O3)、酸化タンタル(Ta2O3)、酸化イットリウム(Y2O3)及び酸化セリウム(CeO2)から選択され、
前記ホウケイ酸ガラスの軟化点は600乃至1000℃の範囲にあり、前記ホウケイ酸ガラスは耐酸性試験において重量パーセント減少が10ミリグラム/dm2より低く、前記ホウケイ酸ガラスは耐アルカリ性試験において重量パーセント減少が250ミリグラム/dm2より低いことを特徴とする方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02292981A EP1426345A1 (en) | 2002-12-03 | 2002-12-03 | Borosilicate glass compositions and uses therof |
EP02292981.4 | 2002-12-03 | ||
PCT/US2003/038320 WO2004050575A1 (en) | 2002-12-03 | 2003-12-03 | Borosilicate glass compositions and uses thereof |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2006520309A JP2006520309A (ja) | 2006-09-07 |
JP2006520309A5 JP2006520309A5 (ja) | 2010-05-13 |
JP4921713B2 true JP4921713B2 (ja) | 2012-04-25 |
Family
ID=32309493
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004557504A Expired - Fee Related JP4921713B2 (ja) | 2002-12-03 | 2003-12-03 | ホウケイ酸ガラス組成及びその使用 |
Country Status (5)
Country | Link |
---|---|
US (2) | US7341966B2 (ja) |
EP (2) | EP1426345A1 (ja) |
JP (1) | JP4921713B2 (ja) |
AU (1) | AU2003302681A1 (ja) |
WO (1) | WO2004050575A1 (ja) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI245026B (en) * | 2003-05-23 | 2005-12-11 | Picvue Optoelectronics Interna | Composition for producing glass substrate |
US20070123410A1 (en) | 2005-11-30 | 2007-05-31 | Morena Robert M | Crystallization-free glass frit compositions and frits made therefrom for microreactor devices |
WO2007131988A1 (en) * | 2006-05-15 | 2007-11-22 | Corning Incorporated | Sintered glass and glass-ceramic structures and methods for producing |
ES2329713T3 (es) * | 2006-05-15 | 2009-11-30 | Corning Incorporated | Estructuras de vitroceramica y de vidrio sinterizadas y procedimientos de produccion. |
EP1964818A3 (en) * | 2007-02-28 | 2008-09-10 | Corning Incorporated | Method for making microfluidic devices |
EP2065347A1 (en) | 2007-11-30 | 2009-06-03 | Corning Incorporated | Durable frit composition and composites and devices comprised thereof |
EP2335894A4 (en) * | 2008-09-12 | 2013-10-30 | Ngk Insulators Ltd | METHOD FOR MANUFACTURING THREE DIMENSIONAL MOLDED PARTS |
US8341976B2 (en) * | 2009-02-19 | 2013-01-01 | Corning Incorporated | Method of separating strengthened glass |
US9017991B2 (en) | 2009-03-13 | 2015-04-28 | Tufts University | Methods tip assemblies and kits for introducing material into cells |
EP2289845A1 (en) * | 2009-08-28 | 2011-03-02 | Corning Incorporated | Layered sintered microfluidic devices with controlled compression during sintering and associated methods |
JP5911240B2 (ja) * | 2010-10-04 | 2016-04-27 | キヤノン株式会社 | 多孔質ガラス、その製造方法、光学部材および撮像装置 |
CN104144745B (zh) * | 2011-11-30 | 2017-03-08 | 康宁股份有限公司 | 流体模块永久堆叠件组件和方法 |
TWI564262B (zh) | 2012-02-29 | 2017-01-01 | 康寧公司 | 高cte之硼矽酸鉀核心玻璃與包含其之玻璃物件 |
US9670088B2 (en) | 2014-05-20 | 2017-06-06 | Corning Incorporated | Scratch resistant glass and method of making |
JP6881312B2 (ja) * | 2015-10-30 | 2021-06-02 | 日本電気硝子株式会社 | 結晶性ガラス封止材 |
JP6936954B2 (ja) * | 2016-09-06 | 2021-09-22 | 日本電気硝子株式会社 | マイクロ流路デバイス用ガラス基板 |
CA3117986A1 (en) | 2018-11-26 | 2020-06-04 | Owens Corning Intellectual Capital, Llc | High performance fiberglass composition with improved specific modulus |
DK3887329T3 (da) | 2018-11-26 | 2024-04-29 | Owens Corning Intellectual Capital Llc | Højydelsesglasfibersammensætning med forbedret elasticitetskoefficient |
CN114667162A (zh) | 2019-09-16 | 2022-06-24 | Abk生物医学公司 | 放射性微粒和非放射性微粒的组合物 |
Citations (3)
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JPH05270859A (ja) * | 1991-04-17 | 1993-10-19 | Cookson Group Plc | 釉薬組成物及び施釉方法 |
JPH0761837A (ja) * | 1993-08-12 | 1995-03-07 | Nippon Electric Glass Co Ltd | 低膨張結晶化ガラス装飾用組成物及びこれを用いて装飾した低膨張結晶化ガラス板 |
JP2000095540A (ja) * | 1998-08-01 | 2000-04-04 | Carl Zeiss:Fa | ガラス又はガラスセラミックスの施釉、琺瑯掛けもしくは装飾用の鉛及びカドミウムを含有しないガラス組成物、及び該ガラス組成物で被覆されたガラスセラミックスの製造方法 |
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JP2004315280A (ja) * | 2003-04-15 | 2004-11-11 | Asahi Techno Glass Corp | 蛍光ランプ用ガラス |
JP4039381B2 (ja) * | 2004-03-25 | 2008-01-30 | コニカミノルタオプト株式会社 | ガラス組成物を用いた情報記録媒体用ガラス基板及びこれを用いた情報記録媒体 |
-
2002
- 2002-12-03 EP EP02292981A patent/EP1426345A1/en not_active Withdrawn
-
2003
- 2003-12-02 US US10/728,523 patent/US7341966B2/en not_active Expired - Lifetime
- 2003-12-03 EP EP03808429A patent/EP1567459A1/en not_active Withdrawn
- 2003-12-03 WO PCT/US2003/038320 patent/WO2004050575A1/en not_active Application Discontinuation
- 2003-12-03 JP JP2004557504A patent/JP4921713B2/ja not_active Expired - Fee Related
- 2003-12-03 AU AU2003302681A patent/AU2003302681A1/en not_active Abandoned
-
2008
- 2008-01-18 US US12/009,418 patent/US7596968B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05270859A (ja) * | 1991-04-17 | 1993-10-19 | Cookson Group Plc | 釉薬組成物及び施釉方法 |
JPH0761837A (ja) * | 1993-08-12 | 1995-03-07 | Nippon Electric Glass Co Ltd | 低膨張結晶化ガラス装飾用組成物及びこれを用いて装飾した低膨張結晶化ガラス板 |
JP2000095540A (ja) * | 1998-08-01 | 2000-04-04 | Carl Zeiss:Fa | ガラス又はガラスセラミックスの施釉、琺瑯掛けもしくは装飾用の鉛及びカドミウムを含有しないガラス組成物、及び該ガラス組成物で被覆されたガラスセラミックスの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2006520309A (ja) | 2006-09-07 |
EP1426345A1 (en) | 2004-06-09 |
US20040152580A1 (en) | 2004-08-05 |
US7341966B2 (en) | 2008-03-11 |
US20090099001A1 (en) | 2009-04-16 |
US7596968B2 (en) | 2009-10-06 |
EP1567459A1 (en) | 2005-08-31 |
AU2003302681A1 (en) | 2004-06-23 |
WO2004050575A1 (en) | 2004-06-17 |
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