JP4913750B2 - 感光性転写材料、隔壁及びその形成方法、光学素子及びその製造方法、並びに表示装置 - Google Patents

感光性転写材料、隔壁及びその形成方法、光学素子及びその製造方法、並びに表示装置 Download PDF

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Publication number
JP4913750B2
JP4913750B2 JP2007545337A JP2007545337A JP4913750B2 JP 4913750 B2 JP4913750 B2 JP 4913750B2 JP 2007545337 A JP2007545337 A JP 2007545337A JP 2007545337 A JP2007545337 A JP 2007545337A JP 4913750 B2 JP4913750 B2 JP 4913750B2
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Japan
Prior art keywords
group
resin layer
photosensitive resin
layer
substrate
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Expired - Fee Related
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JP2007545337A
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English (en)
Japanese (ja)
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JPWO2007058355A1 (ja
Inventor
豪 安藤
直孝 和地
浩一 川村
裕一 若田
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Fujifilm Corp
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Fujifilm Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Structural Engineering (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Architecture (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Laminated Bodies (AREA)
JP2007545337A 2005-11-21 2006-11-21 感光性転写材料、隔壁及びその形成方法、光学素子及びその製造方法、並びに表示装置 Expired - Fee Related JP4913750B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007545337A JP4913750B2 (ja) 2005-11-21 2006-11-21 感光性転写材料、隔壁及びその形成方法、光学素子及びその製造方法、並びに表示装置

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2005336349 2005-11-21
JP2005336349 2005-11-21
JP2006162702 2006-06-12
JP2006162702 2006-06-12
PCT/JP2006/323175 WO2007058355A1 (ja) 2005-11-21 2006-11-21 感光性転写材料、隔壁及びその形成方法、光学素子及びその製造方法、並びに表示装置
JP2007545337A JP4913750B2 (ja) 2005-11-21 2006-11-21 感光性転写材料、隔壁及びその形成方法、光学素子及びその製造方法、並びに表示装置

Publications (2)

Publication Number Publication Date
JPWO2007058355A1 JPWO2007058355A1 (ja) 2009-05-07
JP4913750B2 true JP4913750B2 (ja) 2012-04-11

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JP2007545337A Expired - Fee Related JP4913750B2 (ja) 2005-11-21 2006-11-21 感光性転写材料、隔壁及びその形成方法、光学素子及びその製造方法、並びに表示装置

Country Status (5)

Country Link
JP (1) JP4913750B2 (zh)
KR (1) KR20080070809A (zh)
CN (1) CN101313249B (zh)
TW (1) TW200739267A (zh)
WO (1) WO2007058355A1 (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007069703A1 (ja) 2005-12-15 2007-06-21 Asahi Glass Company, Limited 含フッ素重合体、ネガ型感光性組成物及び隔壁
EP2149803A1 (en) * 2007-05-30 2010-02-03 Asahi Glass Company, Limited Method for producing substrate with partition wall and pixel formed thereon
JP5068603B2 (ja) * 2007-08-22 2012-11-07 富士フイルム株式会社 感光性転写材料、隔壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
JP5324868B2 (ja) 2007-09-26 2013-10-23 富士フイルム株式会社 光硬化性コーティング組成物、オーバープリント及びその製造方法
JP5523677B2 (ja) * 2007-09-26 2014-06-18 富士フイルム株式会社 顔料分散組成物、光硬化性組成物、およびカラーフィルタ
JP5249588B2 (ja) 2008-01-11 2013-07-31 東京応化工業株式会社 着色感光性樹脂組成物
JP5720395B2 (ja) * 2011-04-20 2015-05-20 大日本印刷株式会社 タッチパネル付カラーフィルタ用保護層形成用組成物
KR102047231B1 (ko) * 2012-12-10 2019-11-21 엘지디스플레이 주식회사 전기영동 표시소자 및 그 제조방법
TWI507775B (zh) * 2013-10-24 2015-11-11 Chunghwa Picture Tubes Ltd 透明顯示裝置
JP2017167171A (ja) * 2014-08-05 2017-09-21 旭硝子株式会社 感光性樹脂溶液、パターニング膜の形成方法および含フッ素樹脂膜の微細加工方法
KR102071376B1 (ko) 2015-08-31 2020-01-30 후지필름 가부시키가이샤 경화성 조성물, 경화막의 제조 방법, 컬러 필터, 차광막, 고체 촬상 소자 및 화상 표시 장치
CN110546599B (zh) * 2017-05-31 2023-05-09 日本瑞翁株式会社 触摸传感器基材及其制造方法、触摸传感器部件及其制造方法以及显示装置
WO2021014759A1 (ja) * 2019-07-22 2021-01-28 三菱ケミカル株式会社 感光性着色樹脂組成物、硬化物、隔壁及び画像表示装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0283546A (ja) * 1988-09-20 1990-03-23 Toray Ind Inc フォトレジストフィルム
JP2005064143A (ja) * 2003-08-08 2005-03-10 Seiko Epson Corp レジストパターンの形成方法、配線パターンの形成方法、半導体装置の製造方法、電気光学装置及び電子機器

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0762761B2 (ja) * 1986-03-28 1995-07-05 富士写真フイルム株式会社 画像形成材料
US4963471A (en) * 1989-07-14 1990-10-16 E. I. Du Pont De Nemours And Company Holographic photopolymer compositions and elements for refractive index imaging
JP2001013682A (ja) * 1999-06-30 2001-01-19 Hitachi Chem Co Ltd 感光性エレメント及びこれを用いたカラーフィルタの製造法
JP2002025432A (ja) * 2000-07-04 2002-01-25 Hitachi Chem Co Ltd 誘電体層及び障壁形成用樹脂組成物エレメント及びこれを用いたプラズマディスプレイパネル用基板の製造法
US6740470B2 (en) * 2001-02-08 2004-05-25 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
CN1278183C (zh) * 2001-12-13 2006-10-04 富士胶片株式会社 图像形成材料
JP2003345026A (ja) * 2002-05-24 2003-12-03 Tokyo Ohka Kogyo Co Ltd 反射防止膜形成用塗布液組成物およびこれを用いたホトレジスト積層体、並びにホトレジストパターンの形成方法
JP4310970B2 (ja) * 2002-06-17 2009-08-12 凸版印刷株式会社 カラーフィルターの製造方法
JP3851594B2 (ja) * 2002-07-04 2006-11-29 Ａｚエレクトロニックマテリアルズ株式会社 反射防止コーティング用組成物およびパターン形成方法
JP4129543B2 (ja) * 2002-08-08 2008-08-06 三菱樹脂株式会社 ドライフィルムレジスト用保護フィルム

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0283546A (ja) * 1988-09-20 1990-03-23 Toray Ind Inc フォトレジストフィルム
JP2005064143A (ja) * 2003-08-08 2005-03-10 Seiko Epson Corp レジストパターンの形成方法、配線パターンの形成方法、半導体装置の製造方法、電気光学装置及び電子機器

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Publication number Publication date
TW200739267A (en) 2007-10-16
JPWO2007058355A1 (ja) 2009-05-07
CN101313249A (zh) 2008-11-26
WO2007058355A1 (ja) 2007-05-24
CN101313249B (zh) 2012-07-11
KR20080070809A (ko) 2008-07-31

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