JP4893730B2 - 極端紫外光光源装置 - Google Patents

極端紫外光光源装置 Download PDF

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Publication number
JP4893730B2
JP4893730B2 JP2008329570A JP2008329570A JP4893730B2 JP 4893730 B2 JP4893730 B2 JP 4893730B2 JP 2008329570 A JP2008329570 A JP 2008329570A JP 2008329570 A JP2008329570 A JP 2008329570A JP 4893730 B2 JP4893730 B2 JP 4893730B2
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Japan
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raw material
energy beam
discharge
recess
light source
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JP2008329570A
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English (en)
Japanese (ja)
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JP2010153563A (ja
Inventor
拓馬 横山
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Ushio Denki KK
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Ushio Denki KK
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Priority to JP2008329570A priority Critical patent/JP4893730B2/ja
Priority to EP20090015807 priority patent/EP2203033B1/fr
Publication of JP2010153563A publication Critical patent/JP2010153563A/ja
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Publication of JP4893730B2 publication Critical patent/JP4893730B2/ja
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
JP2008329570A 2008-12-25 2008-12-25 極端紫外光光源装置 Active JP4893730B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008329570A JP4893730B2 (ja) 2008-12-25 2008-12-25 極端紫外光光源装置
EP20090015807 EP2203033B1 (fr) 2008-12-25 2009-12-21 Dispositif de source lumineuse à rayonnement ultraviolet extrême

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008329570A JP4893730B2 (ja) 2008-12-25 2008-12-25 極端紫外光光源装置

Publications (2)

Publication Number Publication Date
JP2010153563A JP2010153563A (ja) 2010-07-08
JP4893730B2 true JP4893730B2 (ja) 2012-03-07

Family

ID=42140034

Family Applications (1)

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JP2008329570A Active JP4893730B2 (ja) 2008-12-25 2008-12-25 極端紫外光光源装置

Country Status (2)

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EP (1) EP2203033B1 (fr)
JP (1) JP4893730B2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4255123A1 (fr) 2022-03-30 2023-10-04 Ushio Denki Kabushiki Kaisha Appareil de source lumineuse

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010047419B4 (de) 2010-10-01 2013-09-05 Xtreme Technologies Gmbh Verfahren und Vorrichtung zur Erzeugung von EUV-Strahlung aus einem Gasentladungsplasma
JP5724986B2 (ja) * 2012-10-30 2015-05-27 ウシオ電機株式会社 放電電極
DE102013000407B4 (de) * 2013-01-11 2020-03-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Verbesserung der Benetzbarkeit einer rotierenden Elektrode in einer Gasentladungslampe
JP6089955B2 (ja) * 2013-05-20 2017-03-08 株式会社Ihi プラズマ光源
RU2670273C2 (ru) * 2017-11-24 2018-10-22 Общество с ограниченной ответственностью "РнД-ИСАН" Устройство и способ для генерации излучения из лазерной плазмы

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2897005B1 (ja) * 1998-02-27 1999-05-31 工業技術院長 レーザプラズマ光源及びこれを用いた輻射線発生方法
JP4052155B2 (ja) 2003-03-17 2008-02-27 ウシオ電機株式会社 極端紫外光放射源及び半導体露光装置
DE10359464A1 (de) * 2003-12-17 2005-07-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung
RU2278483C2 (ru) * 2004-04-14 2006-06-20 Владимир Михайлович Борисов Эуф источник с вращающимися электродами и способ получения эуф излучения из газоразрядной плазмы
JP4904809B2 (ja) * 2005-12-28 2012-03-28 ウシオ電機株式会社 極端紫外光光源装置
JP5149514B2 (ja) * 2007-02-20 2013-02-20 ギガフォトン株式会社 極端紫外光源装置
EP1976344B1 (fr) * 2007-03-28 2011-04-20 Tokyo Institute Of Technology Source lumineuse d'ultraviolets extrêmes et procédé pour générer un rayonnement UV extrême
JP2008270149A (ja) * 2007-03-28 2008-11-06 Tokyo Institute Of Technology 極端紫外光光源装置および極端紫外光発生方法
JP2009087807A (ja) * 2007-10-01 2009-04-23 Tokyo Institute Of Technology 極端紫外光発生方法及び極端紫外光光源装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4255123A1 (fr) 2022-03-30 2023-10-04 Ushio Denki Kabushiki Kaisha Appareil de source lumineuse

Also Published As

Publication number Publication date
EP2203033A3 (fr) 2010-09-08
EP2203033A2 (fr) 2010-06-30
EP2203033B1 (fr) 2014-09-10
JP2010153563A (ja) 2010-07-08

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