JP4865270B2 - 露光装置、及びそれを用いたデバイス製造方法 - Google Patents

露光装置、及びそれを用いたデバイス製造方法 Download PDF

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Publication number
JP4865270B2
JP4865270B2 JP2005218727A JP2005218727A JP4865270B2 JP 4865270 B2 JP4865270 B2 JP 4865270B2 JP 2005218727 A JP2005218727 A JP 2005218727A JP 2005218727 A JP2005218727 A JP 2005218727A JP 4865270 B2 JP4865270 B2 JP 4865270B2
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Japan
Prior art keywords
optical
distribution
light
optical unit
exposure apparatus
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Expired - Fee Related
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JP2005218727A
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English (en)
Japanese (ja)
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JP2007036016A (ja
JP2007036016A5 (https=
Inventor
智朗 川上
健一郎 篠田
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005218727A priority Critical patent/JP4865270B2/ja
Priority to US11/460,354 priority patent/US7209218B2/en
Publication of JP2007036016A publication Critical patent/JP2007036016A/ja
Publication of JP2007036016A5 publication Critical patent/JP2007036016A5/ja
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Publication of JP4865270B2 publication Critical patent/JP4865270B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005218727A 2005-07-28 2005-07-28 露光装置、及びそれを用いたデバイス製造方法 Expired - Fee Related JP4865270B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005218727A JP4865270B2 (ja) 2005-07-28 2005-07-28 露光装置、及びそれを用いたデバイス製造方法
US11/460,354 US7209218B2 (en) 2005-07-28 2006-07-27 Exposure apparatus and method for manufacturing device using the exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005218727A JP4865270B2 (ja) 2005-07-28 2005-07-28 露光装置、及びそれを用いたデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2007036016A JP2007036016A (ja) 2007-02-08
JP2007036016A5 JP2007036016A5 (https=) 2008-09-11
JP4865270B2 true JP4865270B2 (ja) 2012-02-01

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JP2005218727A Expired - Fee Related JP4865270B2 (ja) 2005-07-28 2005-07-28 露光装置、及びそれを用いたデバイス製造方法

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US (1) US7209218B2 (https=)
JP (1) JP4865270B2 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4950795B2 (ja) * 2007-07-30 2012-06-13 キヤノン株式会社 露光装置、デバイス製造方法及び補正方法
DE102009016456A1 (de) 2008-06-03 2009-12-24 Carl Zeiss Smt Ag Beleuchtungsoptik für die Mikrolithografie
DE102009025362A1 (de) 2008-08-01 2010-02-04 Carl Zeiss Smt Ag Variabel einstellbare Streuscheibe für Projektionsbelichtungsanlage
US8147156B2 (en) * 2008-11-25 2012-04-03 Avery Dennison Corporation Tag making and stacking systems and method, tag stackers and stack trays
US8825142B2 (en) 2009-09-30 2014-09-02 Terumo Kabushiki Kaisha Imaging apparatus for diagnosis and control method thereof
CN104007619B (zh) * 2013-02-21 2016-03-30 上海微电子装备有限公司 一种光瞳面光强分布的测量方法
JP5843905B2 (ja) * 2013-04-23 2016-01-13 キヤノン株式会社 照明光学系、露光装置及びデバイス製造方法
CN108027840A (zh) * 2015-06-17 2018-05-11 国际箱包有限责任公司 用于在纸箱上虚拟显示图像的方法和计算机系统
JP6632252B2 (ja) * 2015-08-21 2020-01-22 キヤノン株式会社 検出装置、インプリント装置、物品の製造方法及び照明光学系
JP6980443B2 (ja) * 2017-07-28 2021-12-15 キヤノン株式会社 露光装置及び物品製造方法
DE102018201009A1 (de) 2018-01-23 2019-07-25 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102018201010A1 (de) 2018-01-23 2019-07-25 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
CN111707413B (zh) 2020-05-15 2021-11-26 中国科学院合肥物质科学研究院 一种基于单像素探测器的质心探测方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3230264B2 (ja) 1992-02-03 2001-11-19 株式会社ニコン 投影露光装置及び方法、並びに素子製造方法
JPH10189428A (ja) * 1996-12-20 1998-07-21 Nikon Corp 照明光学装置
JP3262039B2 (ja) 1997-07-18 2002-03-04 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
JP4545874B2 (ja) * 2000-04-03 2010-09-15 キヤノン株式会社 照明光学系、および該照明光学系を備えた露光装置と該露光装置によるデバイスの製造方法
JP3599648B2 (ja) * 2000-08-03 2004-12-08 キヤノン株式会社 照明装置、投影露光装置並びにそれを用いたデバイス製造方法
JP3958122B2 (ja) * 2001-05-11 2007-08-15 キヤノン株式会社 照明装置、およびそれを用いた露光装置、デバイス製造方法
JP2003068604A (ja) * 2001-08-23 2003-03-07 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP2003142387A (ja) * 2001-11-07 2003-05-16 Nikon Corp 照明光学装置、露光装置および露光方法
JP2003178952A (ja) * 2001-12-12 2003-06-27 Nikon Corp 照明光学装置、露光装置および露光方法
TW567406B (en) * 2001-12-12 2003-12-21 Nikon Corp Diffraction optical device, refraction optical device, illuminating optical device, exposure system and exposure method
JP3950731B2 (ja) * 2002-04-23 2007-08-01 キヤノン株式会社 照明光学系、当該照明光学系を有する露光装置及びデバイス製造方法
JP4332331B2 (ja) * 2002-08-05 2009-09-16 キヤノン株式会社 露光方法
JP2004224069A (ja) * 2003-01-20 2004-08-12 Bridgestone Corp 発電機

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JP2007036016A (ja) 2007-02-08
US20070024839A1 (en) 2007-02-01
US7209218B2 (en) 2007-04-24

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