JP4826584B2 - 並進旋回２自由度ステージ装置およびこれを用いた３自由度ステージ装置 - Google Patents

並進旋回２自由度ステージ装置およびこれを用いた３自由度ステージ装置 Download PDF

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Publication number
JP4826584B2
JP4826584B2 JP2007523400A JP2007523400A JP4826584B2 JP 4826584 B2 JP4826584 B2 JP 4826584B2 JP 2007523400 A JP2007523400 A JP 2007523400A JP 2007523400 A JP2007523400 A JP 2007523400A JP 4826584 B2 JP4826584 B2 JP 4826584B2
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Japan
Prior art keywords
freedom
degree
translational
translation
stage device
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Expired - Fee Related
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JP2007523400A
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English (en)
Japanese (ja)
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JPWO2007004413A1 (ja
Inventor
剛彦 小宮
俊之 大須賀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yaskawa Electric Corp
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Yaskawa Electric Corp
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Publication date
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Priority to JP2007523400A priority Critical patent/JP4826584B2/ja
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Application granted granted Critical
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Expired - Fee Related legal-status Critical Current
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Machine Tool Units (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Machine Tool Positioning Apparatuses (AREA)
  • Machine Tool Sensing Apparatuses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007523400A 2005-06-30 2006-06-19 並進旋回２自由度ステージ装置およびこれを用いた３自由度ステージ装置 Expired - Fee Related JP4826584B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007523400A JP4826584B2 (ja) 2005-06-30 2006-06-19 並進旋回２自由度ステージ装置およびこれを用いた３自由度ステージ装置

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2005192131 2005-06-30
JP2005192131 2005-06-30
PCT/JP2006/312230 WO2007004413A1 (ja) 2005-06-30 2006-06-19 並進旋回２自由度ステージ装置およびこれを用いた３自由度ステージ装置
JP2007523400A JP4826584B2 (ja) 2005-06-30 2006-06-19 並進旋回２自由度ステージ装置およびこれを用いた３自由度ステージ装置

Publications (2)

Publication Number Publication Date
JPWO2007004413A1 JPWO2007004413A1 (ja) 2009-01-22
JP4826584B2 true JP4826584B2 (ja) 2011-11-30

Family

ID=37604286

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007523400A Expired - Fee Related JP4826584B2 (ja) 2005-06-30 2006-06-19 並進旋回２自由度ステージ装置およびこれを用いた３自由度ステージ装置

Country Status (5)

Country Link
JP (1) JP4826584B2 (enExample)
KR (1) KR20080002864A (enExample)
CN (1) CN101203354A (enExample)
TW (1) TW200707622A (enExample)
WO (1) WO2007004413A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010006466A1 (zh) * 2008-07-16 2010-01-21 北京航空航天大学 非对称直线驱动的平动加转动进给功能部件
CN101770166B (zh) * 2010-01-06 2011-12-28 天津大学 一种用于纳米压印光刻系统的两平动精密定位工作台
CN101750885B (zh) * 2010-01-06 2011-12-14 天津大学 二自由度精密定位工作台
CN102998899B (zh) * 2012-12-05 2014-09-17 天津大学 二自由度纳米定位平台
US10016818B2 (en) * 2015-12-11 2018-07-10 The Boeing Company Multi-axis adjustment apparatus for machining a workpiece and associated method
KR102052135B1 (ko) * 2018-04-09 2019-12-04 주식회사 에이치비테크놀러지 사이드 듀얼 그립퍼 구동방식의 θ축 얼라인 조정이 가능한 AOI 검사 장비
CN112193371A (zh) * 2020-10-09 2021-01-08 九江精密测试技术研究所 一种船用三自由度位移平台
CN112517724A (zh) * 2020-11-28 2021-03-19 武汉重型机床集团有限公司 一种加工范围可调旋轮座

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02202031A (ja) * 1989-01-31 1990-08-10 Nippon Seiko Kk 回動テーブル装置
JPH04146038A (ja) * 1990-10-04 1992-05-20 Matsushita Electric Ind Co Ltd 位置決めテーブル
JPH10256351A (ja) * 1997-03-14 1998-09-25 Toshiba Corp 画像処理アライメント装置
JPH11245128A (ja) * 1998-02-26 1999-09-14 Thk Co Ltd ２軸平行・１軸旋回運動案内機構およびこれを用いた２軸平行・１軸旋回テーブル装置
JPH11300558A (ja) * 1998-04-15 1999-11-02 Thk Co Ltd 移動テーブル装置
JP2002228411A (ja) * 2001-02-05 2002-08-14 Hitachi Kokusai Electric Inc 二次元測定装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06294B2 (ja) * 1986-09-03 1994-01-05 新明和工業株式会社 位置決め装置
JP2675307B2 (ja) * 1987-08-28 1997-11-12 株式会社日立製作所 プリアライナー装置
JP3733808B2 (ja) * 1999-10-26 2006-01-11 松下電器産業株式会社 ＸＹθ３軸移動テーブル

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02202031A (ja) * 1989-01-31 1990-08-10 Nippon Seiko Kk 回動テーブル装置
JPH04146038A (ja) * 1990-10-04 1992-05-20 Matsushita Electric Ind Co Ltd 位置決めテーブル
JPH10256351A (ja) * 1997-03-14 1998-09-25 Toshiba Corp 画像処理アライメント装置
JPH11245128A (ja) * 1998-02-26 1999-09-14 Thk Co Ltd ２軸平行・１軸旋回運動案内機構およびこれを用いた２軸平行・１軸旋回テーブル装置
JPH11300558A (ja) * 1998-04-15 1999-11-02 Thk Co Ltd 移動テーブル装置
JP2002228411A (ja) * 2001-02-05 2002-08-14 Hitachi Kokusai Electric Inc 二次元測定装置

Also Published As

Publication number Publication date
CN101203354A (zh) 2008-06-18
WO2007004413A1 (ja) 2007-01-11
KR20080002864A (ko) 2008-01-04
TWI302723B (enExample) 2008-11-01
JPWO2007004413A1 (ja) 2009-01-22
TW200707622A (en) 2007-02-16

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