KR20080002864A - 병진 선회 2차 자유도 스테이지 장치 및 이를 이용한 3차자유도 스테이지 장치 - Google Patents

병진 선회 2차 자유도 스테이지 장치 및 이를 이용한 3차자유도 스테이지 장치 Download PDF

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Publication number
KR20080002864A
KR20080002864A KR1020077024407A KR20077024407A KR20080002864A KR 20080002864 A KR20080002864 A KR 20080002864A KR 1020077024407 A KR1020077024407 A KR 1020077024407A KR 20077024407 A KR20077024407 A KR 20077024407A KR 20080002864 A KR20080002864 A KR 20080002864A
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KR
South Korea
Prior art keywords
freedom
translational
degree
stage apparatus
turning
Prior art date
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Ceased
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KR1020077024407A
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English (en)
Korean (ko)
Inventor
타케히코 코미야
토시유키 오스가
Original Assignee
가부시키가이샤 야스카와덴키
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 야스카와덴키 filed Critical 가부시키가이샤 야스카와덴키
Publication of KR20080002864A publication Critical patent/KR20080002864A/ko
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682—Mask-wafer alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Machine Tool Units (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Machine Tool Positioning Apparatuses (AREA)
  • Machine Tool Sensing Apparatuses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020077024407A 2005-06-30 2006-06-19 병진 선회 2차 자유도 스테이지 장치 및 이를 이용한 3차자유도 스테이지 장치 Ceased KR20080002864A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00192131 2005-06-30
JP2005192131 2005-06-30

Publications (1)

Publication Number Publication Date
KR20080002864A true KR20080002864A (ko) 2008-01-04

Family

ID=37604286

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077024407A Ceased KR20080002864A (ko) 2005-06-30 2006-06-19 병진 선회 2차 자유도 스테이지 장치 및 이를 이용한 3차자유도 스테이지 장치

Country Status (5)

Country Link
JP (1) JP4826584B2 (enExample)
KR (1) KR20080002864A (enExample)
CN (1) CN101203354A (enExample)
TW (1) TW200707622A (enExample)
WO (1) WO2007004413A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010006466A1 (zh) * 2008-07-16 2010-01-21 北京航空航天大学 非对称直线驱动的平动加转动进给功能部件
CN101770166B (zh) * 2010-01-06 2011-12-28 天津大学 一种用于纳米压印光刻系统的两平动精密定位工作台
CN101750885B (zh) * 2010-01-06 2011-12-14 天津大学 二自由度精密定位工作台
CN102998899B (zh) * 2012-12-05 2014-09-17 天津大学 二自由度纳米定位平台
US10016818B2 (en) * 2015-12-11 2018-07-10 The Boeing Company Multi-axis adjustment apparatus for machining a workpiece and associated method
KR102052135B1 (ko) * 2018-04-09 2019-12-04 주식회사 에이치비테크놀러지 사이드 듀얼 그립퍼 구동방식의 θ축 얼라인 조정이 가능한 AOI 검사 장비
CN112193371A (zh) * 2020-10-09 2021-01-08 九江精密测试技术研究所 一种船用三自由度位移平台
CN112517724A (zh) * 2020-11-28 2021-03-19 武汉重型机床集团有限公司 一种加工范围可调旋轮座

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06294B2 (ja) * 1986-09-03 1994-01-05 新明和工業株式会社 位置決め装置
JP2675307B2 (ja) * 1987-08-28 1997-11-12 株式会社日立製作所 プリアライナー装置
JPH02202031A (ja) * 1989-01-31 1990-08-10 Nippon Seiko Kk 回動テーブル装置
JP2523978B2 (ja) * 1990-10-04 1996-08-14 松下電器産業株式会社 位置決めテ―ブル
JP3607449B2 (ja) * 1997-03-14 2005-01-05 株式会社東芝 画像処理アライメント装置
JPH11245128A (ja) * 1998-02-26 1999-09-14 Thk Co Ltd ２軸平行・１軸旋回運動案内機構およびこれを用いた２軸平行・１軸旋回テーブル装置
JPH11300558A (ja) * 1998-04-15 1999-11-02 Thk Co Ltd 移動テーブル装置
JP3733808B2 (ja) * 1999-10-26 2006-01-11 松下電器産業株式会社 ＸＹθ３軸移動テーブル
JP2002228411A (ja) * 2001-02-05 2002-08-14 Hitachi Kokusai Electric Inc 二次元測定装置

Also Published As

Publication number Publication date
CN101203354A (zh) 2008-06-18
WO2007004413A1 (ja) 2007-01-11
TWI302723B (enExample) 2008-11-01
JP4826584B2 (ja) 2011-11-30
JPWO2007004413A1 (ja) 2009-01-22
TW200707622A (en) 2007-02-16

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