JP4820749B2 - 2次元フォトニック結晶面発光レーザ光源 - Google Patents
2次元フォトニック結晶面発光レーザ光源 Download PDFInfo
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- JP4820749B2 JP4820749B2 JP2006510751A JP2006510751A JP4820749B2 JP 4820749 B2 JP4820749 B2 JP 4820749B2 JP 2006510751 A JP2006510751 A JP 2006510751A JP 2006510751 A JP2006510751 A JP 2006510751A JP 4820749 B2 JP4820749 B2 JP 4820749B2
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- photonic crystal
- dimensional photonic
- laser light
- light source
- refractive index
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/185—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only horizontal cavities, e.g. horizontal cavity surface-emitting lasers [HCSEL]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/14—Semiconductor lasers with special structural design for lasing in a specific polarisation mode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/18—Semiconductor lasers with special structural design for influencing the near- or far-field
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/11—Comprising a photonic bandgap structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/185—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only horizontal cavities, e.g. horizontal cavity surface-emitting lasers [HCSEL]
- H01S5/187—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only horizontal cavities, e.g. horizontal cavity surface-emitting lasers [HCSEL] using Bragg reflection
Description
前記異屈折率領域はその平面形状が前記活性層側よりも該活性層の反対側において小さく、該活性層側の面における該異屈折率領域の重心と該反対側の面における該異屈折率領域の重心がずれるように形成されている、
ことを特徴とする。
22…陰電極
23…活性層
24…2次元フォトニック結晶層
25、311、312、411、412…空孔
261、262、263…スペーサ層
271、272…クラッド層
28…コンタクト層
321、322、422…段差
まず、以下の計算で用いる2次元フォトニック結晶のフォトニックバンドについて説明する。図5(a)は本実施例のように空孔を正方格子状に配置した場合のフォトニックバンド図である。比較のために、空孔配置を三角格子状とした場合のフォトニックバンド図を(b)に示す。なお、(a)は空孔を楕円形としたものの計算結果であるが、空孔が他の形状である場合にも基本的には同様である。
(b)の場合はk=0(Γ点)付近に6本のバンドが形成されるのに対して、(a)の場合、バンドは(b)の場合よりも少ない4本である。この4本のバンドのうち、低エネルギー(低周波数)側の2本のバンドのバンド端A, Bがレーザ発振に寄与する。有限周期構造をもつ実際のデバイスでは通常、Γ点付近で平坦な分散関係を持つバンド端BのQ値は大きく下がる傾向があり、Γ点付近の傾きの大きいバンド端Aがレーザ発振点に選ばれやすい。そのため、安定なレーザ動作を得るためには、無限周期系においてQ値が、バンド端Bよりもバンド端Aの方においてより高くなるように設計することが望ましい。
Claims (6)
- 板状の母材にそれとは屈折率が異なる領域である異屈折率領域を多数、周期的に配置して成る2次元フォトニック結晶と、該2次元フォトニック結晶の一方の側に設けた活性層とを備えるレーザ光源において、
前記異屈折率領域はその平面形状が前記活性層側よりも該活性層の反対側において小さく、該活性層側の面における該異屈折率領域の重心と該反対側の面における該異屈折率領域の重心がずれるように形成されている、
ことを特徴とする2次元フォトニック結晶を用いた面発光レーザ光源。 - 前記異屈折率領域の前記母材に垂直な面における断面形状が階段状であることを特徴とする請求項1に記載の2次元フォトニック結晶を用いた面発光レーザ光源。
- 前記異屈折率領域の前記活性層側の面における形状が正三角形であり、該活性層の反対側の面における形状がそれよりも小さい正三角形であることを特徴とする請求項1又は2に記載の2次元フォトニック結晶を用いた面発光レーザ光源。
- 前記異屈折率領域の前記活性層側の面における形状が円形であり、該活性層の反対側の面における形状がその円の一部を欠いた形状であることを特徴とする請求項1又は2に記載の2次元フォトニック結晶面を用いた発光レーザ光源。
- 前記異屈折率領域の配置が正方格子状であることを特徴とする請求項1〜4のいずれかに記載の2次元フォトニック結晶を用いた面発光レーザ光源。
- 前記異屈折率領域が空孔又は前記母材とは屈折率の異なる材料から成る部材により形成されることを特徴とする請求項1〜5のいずれかに記載の2次元フォトニック結晶を用いた面発光レーザ光源。
Priority Applications (1)
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JP2006510751A JP4820749B2 (ja) | 2004-03-05 | 2005-03-04 | 2次元フォトニック結晶面発光レーザ光源 |
Applications Claiming Priority (4)
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JP2004063110 | 2004-03-05 | ||
JP2004063110 | 2004-03-05 | ||
PCT/JP2005/003793 WO2005086302A1 (ja) | 2004-03-05 | 2005-03-04 | 2次元フォトニック結晶面発光レーザ光源 |
JP2006510751A JP4820749B2 (ja) | 2004-03-05 | 2005-03-04 | 2次元フォトニック結晶面発光レーザ光源 |
Publications (2)
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JPWO2005086302A1 JPWO2005086302A1 (ja) | 2008-01-24 |
JP4820749B2 true JP4820749B2 (ja) | 2011-11-24 |
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JP2006510751A Active JP4820749B2 (ja) | 2004-03-05 | 2005-03-04 | 2次元フォトニック結晶面発光レーザ光源 |
Country Status (7)
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US (1) | US7535943B2 (ja) |
EP (1) | EP1724887A1 (ja) |
JP (1) | JP4820749B2 (ja) |
KR (1) | KR101128944B1 (ja) |
CN (1) | CN100456583C (ja) |
CA (1) | CA2558225A1 (ja) |
WO (1) | WO2005086302A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10461502B2 (en) | 2016-02-29 | 2019-10-29 | Kyoto University | Two-dimensional photonic crystal surface emitting laser and method of manufacturing the same |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0677103B2 (ja) * | 1986-08-29 | 1994-09-28 | 株式会社コプテイツク | ソフト・フオ−カス・レンズ |
US20070030873A1 (en) * | 2005-08-03 | 2007-02-08 | Finisar Corporation | Polarization control in VCSELs using photonics crystals |
KR20080049734A (ko) | 2005-09-05 | 2008-06-04 | 고쿠리츠 다이가쿠 호진 교토 다이가쿠 | 2차원 포토닉 결정 면발광 레이저 광원 |
JP2007165542A (ja) * | 2005-12-13 | 2007-06-28 | Sumitomo Electric Ind Ltd | 面発光型半導体レーザ素子 |
JP4533339B2 (ja) * | 2006-04-12 | 2010-09-01 | キヤノン株式会社 | 面発光レーザ |
US7611914B1 (en) * | 2006-06-16 | 2009-11-03 | The United States Of America As Represented By The Director, National Security Agency | Method of fabricating turning mirror using sacrificial spacer layer and device made therefrom |
US7991036B2 (en) * | 2007-06-28 | 2011-08-02 | Konica Minolta Holdings, Inc. | Two-dimensional photonic crystal plane emission laser |
JP4347369B2 (ja) * | 2007-07-31 | 2009-10-21 | キヤノン株式会社 | 面発光レーザの製造方法 |
JP5152721B2 (ja) * | 2008-03-24 | 2013-02-27 | 国立大学法人横浜国立大学 | 半導体レーザ |
JP5303221B2 (ja) | 2008-08-29 | 2013-10-02 | 独立行政法人科学技術振興機構 | 2次元フォトニック結晶レーザ |
CN102259832A (zh) | 2010-05-27 | 2011-11-30 | 清华大学 | 三维纳米结构阵列的制备方法 |
US9130348B2 (en) * | 2010-07-30 | 2015-09-08 | Kyoto University | Two-dimensional photonic crystal laser |
JP6213915B2 (ja) * | 2013-03-04 | 2017-10-18 | 国立大学法人京都大学 | 半導体レーザ素子 |
CN105027428B (zh) | 2013-03-08 | 2017-09-22 | 国立研究开发法人科学技术振兴机构 | 热辐射光源以及太阳能发电装置 |
CN105143923B (zh) | 2013-04-17 | 2018-03-09 | 国立研究开发法人科学技术振兴机构 | 光子晶体以及利用该光子晶体的光学功能设备 |
GB201607996D0 (en) | 2016-05-06 | 2016-06-22 | Univ Glasgow | Laser device and method for its operation |
US11646546B2 (en) | 2017-03-27 | 2023-05-09 | Hamamatsu Photonics K.K. | Semiconductor light emitting array with phase modulation regions for generating beam projection patterns |
US11637409B2 (en) * | 2017-03-27 | 2023-04-25 | Hamamatsu Photonics K.K. | Semiconductor light-emitting module and control method therefor |
JP6959042B2 (ja) | 2017-06-15 | 2021-11-02 | 浜松ホトニクス株式会社 | 発光装置 |
DE112018006285T5 (de) | 2017-12-08 | 2021-01-28 | Hamamatsu Photonics K.K. | Lichtemittierende vorrichtung und herstellungsverfahren dafür |
JP7188689B2 (ja) | 2018-08-06 | 2022-12-13 | セイコーエプソン株式会社 | 発光装置およびプロジェクター |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000332351A (ja) * | 1999-05-21 | 2000-11-30 | Susumu Noda | 半導体発光デバイスおよび半導体発光デバイスの製造方法 |
JP2003023193A (ja) * | 2001-07-05 | 2003-01-24 | Japan Science & Technology Corp | 二次元フォトニック結晶面発光レーザ |
JP2004012781A (ja) * | 2002-06-06 | 2004-01-15 | Seiko Epson Corp | 発光装置、光通信用装置および光通信システム |
JP2004296538A (ja) * | 2003-03-25 | 2004-10-21 | Japan Science & Technology Agency | 2次元フォトニック結晶面発光レーザ |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1156063C (zh) * | 2000-06-06 | 2004-06-30 | 中国科学院物理研究所 | 一种光子晶体微腔结构 |
JP2003273456A (ja) * | 2002-03-14 | 2003-09-26 | Japan Science & Technology Corp | 2次元フォトニック結晶面発光レーザ |
JP3833953B2 (ja) | 2002-03-14 | 2006-10-18 | 独立行政法人科学技術振興機構 | 2次元フォトニック結晶面発光レーザ及びその製造方法 |
US6829281B2 (en) * | 2002-06-19 | 2004-12-07 | Finisar Corporation | Vertical cavity surface emitting laser using photonic crystals |
JP4641736B2 (ja) * | 2003-10-28 | 2011-03-02 | ソニー株式会社 | 面発光半導体レーザーとその製造方法及び光学装置 |
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2005
- 2005-03-04 EP EP05720065A patent/EP1724887A1/en not_active Withdrawn
- 2005-03-04 CN CNB2005800068499A patent/CN100456583C/zh active Active
- 2005-03-04 KR KR1020067020764A patent/KR101128944B1/ko active IP Right Grant
- 2005-03-04 US US10/591,035 patent/US7535943B2/en active Active
- 2005-03-04 JP JP2006510751A patent/JP4820749B2/ja active Active
- 2005-03-04 CA CA002558225A patent/CA2558225A1/en not_active Abandoned
- 2005-03-04 WO PCT/JP2005/003793 patent/WO2005086302A1/ja active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000332351A (ja) * | 1999-05-21 | 2000-11-30 | Susumu Noda | 半導体発光デバイスおよび半導体発光デバイスの製造方法 |
JP2003023193A (ja) * | 2001-07-05 | 2003-01-24 | Japan Science & Technology Corp | 二次元フォトニック結晶面発光レーザ |
JP2004012781A (ja) * | 2002-06-06 | 2004-01-15 | Seiko Epson Corp | 発光装置、光通信用装置および光通信システム |
JP2004296538A (ja) * | 2003-03-25 | 2004-10-21 | Japan Science & Technology Agency | 2次元フォトニック結晶面発光レーザ |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10461502B2 (en) | 2016-02-29 | 2019-10-29 | Kyoto University | Two-dimensional photonic crystal surface emitting laser and method of manufacturing the same |
Also Published As
Publication number | Publication date |
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CN100456583C (zh) | 2009-01-28 |
JPWO2005086302A1 (ja) | 2008-01-24 |
CN1926730A (zh) | 2007-03-07 |
WO2005086302A1 (ja) | 2005-09-15 |
US20070177647A1 (en) | 2007-08-02 |
CA2558225A1 (en) | 2005-09-15 |
KR20070006826A (ko) | 2007-01-11 |
US7535943B2 (en) | 2009-05-19 |
EP1724887A1 (en) | 2006-11-22 |
KR101128944B1 (ko) | 2012-03-27 |
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Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |