JP4533339B2 - 面発光レーザ - Google Patents
面発光レーザ Download PDFInfo
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- JP4533339B2 JP4533339B2 JP2006109913A JP2006109913A JP4533339B2 JP 4533339 B2 JP4533339 B2 JP 4533339B2 JP 2006109913 A JP2006109913 A JP 2006109913A JP 2006109913 A JP2006109913 A JP 2006109913A JP 4533339 B2 JP4533339 B2 JP 4533339B2
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- photonic crystal
- multilayer mirror
- refractive index
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/11—Comprising a photonic bandgap structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2004—Confining in the direction perpendicular to the layer structure
- H01S5/2018—Optical confinement, e.g. absorbing-, reflecting- or waveguide-layers
- H01S5/2027—Reflecting region or layer, parallel to the active layer, e.g. to modify propagation of the mode in the laser or to influence transverse modes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34326—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on InGa(Al)P, e.g. red laser
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Biophysics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Semiconductor Lasers (AREA)
- Optical Integrated Circuits (AREA)
Description
APPLIED PHYSICS LETTERS 88,081113(2006)
多層膜ミラーと、活性層と、周期的に屈折率が変化する屈折率周期構造層とが、基板の面内方向に垂直な方向に積層されており、
該屈折率周期構造層と該多層膜ミラーとで構成される導波路内に共振モードを有し、
該屈折率周期構造層は、それに垂直に波長λの光を入射光させると、少なくとも透過光と、該多層膜ミラーに入射し得る回折光とに分かれるように構成されており、且つ
該多層膜ミラーは、該透過光に対する反射率よりも、該回折光に対する反射率の方が高くなるように構成されていることを特徴とする。
1500は基板、1300は多層膜ミラー(DBR、Distributed Bragg Reflector)、1105は下クラッド層、1200は活性層、1100は上クラッド層、1020は前述したフォトニック結晶層である。なお、多層膜ミラー1300の積層方向は、基板1500の面内方向に対して垂直な方向となる。
本発明においては、上述したようにフォトニック結晶層1020と、多層膜ミラー1300とで構成される導波路内に共振モードが存在するように構成する。その結果、フォトニック結晶層内に光を閉じ込める必要が無くなるので、フォトニック結晶層の基板側界面に低屈折率媒体を配置することが必須ではなくなる。
まず、本発明に係る第1の実施例について、図3を用いて説明する。
本発明に係る第2の実施例は、図4にその要部を示すように、第1の実施例における基板2500と、多層膜反射鏡2300(これを第1の多層膜反射鏡とする)との間に、第2の多層膜反射鏡2350を備えている点が特徴である。
1010 空孔
1020 フォトニック結晶層
1030 垂直入射光
1040 垂直透過光
1050 回折光
1051、2051 多層膜ミラー入射光
1052、2052 多層膜ミラー反射光
1060 基板垂直方向回折光
1100 上部クラッド層
1105 下部クラッド層
1200 活性層
1300 多層膜ミラー
1350 多層膜sミラー
1500 基板
2000 スラブ層
2025 ホール列
2060 基板垂直方向基板反対側回折光
2065 基板垂直方向基板側回折光
2100 上部クラッド層
2105 下部クラッド層
2200 多重量子井戸(活性層)
2300 多層膜反射鏡
2500 基板
2800 上部電極
2805 下部電極
Claims (3)
- 発振波長λの面発光レーザであって、
多層膜ミラーと、下部クラッド層と、活性層と、有効屈折率がnである上部クラッド層と、基板に対して面内方向に屈折率が周期的に変化するフォトニック結晶層とが、基板の面内方向に垂直な方向にこの順で積層されており、
前記フォトニック結晶層は、それに垂直に波長λの光を入射光させると、該入射光の入射方向となす角度が0度である透過光と、該入射光の入射方向とのなす角度が0度及び90度でない角度θで前記多層膜ミラーに入射する回折光とに分かれるように、格子間隔aがλ/(n・sinθ)で構成されており、
前記多層膜ミラーは、該多層膜ミラーを構成する各層の屈折率をn i とし、該各層の界面と該多層膜ミラーに入射した光の進行方向とのなす角度をθ i としたときに、前記透過光に対する反射率よりも、該回折光に対する反射率の方が高くなるように、各層の光学的膜厚がλ/(4・cosθ i )で構成されており、
前記フォトニック結晶層と前記多層膜ミラーとで構成される導波路は、前記基板に対して面内方向に共振モードを有し、
前記フォトニック結晶層は、前記基板に対して垂直方向に前記共振モードの光を回折するように構成され、該基板側とは反対側にレーザ光を出射することを特徴とする面発光レーザ。 - 前記フォトニック結晶層は、三角格子または正方格子からなる周期性を有するフォトニック結晶層である請求項1記載の面発光レーザ。
- 前記基板と前記多層膜ミラーとの間に、前記透過光に対する反射率が、前記回折光に対する反射率よりも高い、前記多層膜ミラーとは別の反射鏡を有することを特徴とする請求項1記載の面発光レーザ。
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006109913A JP4533339B2 (ja) | 2006-04-12 | 2006-04-12 | 面発光レーザ |
PCT/JP2007/058018 WO2007119761A2 (en) | 2006-04-12 | 2007-04-05 | Vcsel with photonic crystal mirror for waveguiding by diffraction |
AT07741454T ATE513344T1 (de) | 2006-04-12 | 2007-04-05 | Vcsel mit spiegel aus einem photonischen kristall für wellenleitung mittels beugung |
US11/916,230 US7796665B2 (en) | 2006-04-12 | 2007-04-05 | Surface emitting laser |
KR1020087027310A KR100991068B1 (ko) | 2006-04-12 | 2007-04-05 | 회절에 의한 도파용 포토닉 결정미러를 가진 면발광 레이저 |
EP07741454A EP2011206B1 (en) | 2006-04-12 | 2007-04-05 | Vcsel with photonic crystal mirror for waveguiding by diffraction |
CN2007800130535A CN101421889B (zh) | 2006-04-12 | 2007-04-05 | 具有用于衍射导波的光子晶体镜的vcsel |
US12/853,393 US8249123B2 (en) | 2006-04-12 | 2010-08-10 | Surface emitting laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006109913A JP4533339B2 (ja) | 2006-04-12 | 2006-04-12 | 面発光レーザ |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007287733A JP2007287733A (ja) | 2007-11-01 |
JP2007287733A5 JP2007287733A5 (ja) | 2010-04-08 |
JP4533339B2 true JP4533339B2 (ja) | 2010-09-01 |
Family
ID=38609910
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006109913A Expired - Fee Related JP4533339B2 (ja) | 2006-04-12 | 2006-04-12 | 面発光レーザ |
Country Status (7)
Country | Link |
---|---|
US (2) | US7796665B2 (ja) |
EP (1) | EP2011206B1 (ja) |
JP (1) | JP4533339B2 (ja) |
KR (1) | KR100991068B1 (ja) |
CN (1) | CN101421889B (ja) |
AT (1) | ATE513344T1 (ja) |
WO (1) | WO2007119761A2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7053686B2 (ja) | 2017-06-30 | 2022-04-12 | レオナルド・エッセ・ピ・ア | 空中静止可能な航空機のためのロータ |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4709259B2 (ja) | 2007-10-12 | 2011-06-22 | キヤノン株式会社 | 面発光レーザ |
JP5171318B2 (ja) * | 2008-03-05 | 2013-03-27 | キヤノン株式会社 | 面発光レーザアレイ |
JP4968959B2 (ja) * | 2008-03-06 | 2012-07-04 | キヤノン株式会社 | フォトニック結晶および該フォトニック結晶を用いた面発光レーザ |
JP5388666B2 (ja) * | 2008-04-21 | 2014-01-15 | キヤノン株式会社 | 面発光レーザ |
JP5106487B2 (ja) * | 2008-07-31 | 2012-12-26 | キヤノン株式会社 | 面発光レーザの製造方法及び面発光レーザアレイの製造方法、該製造方法による面発光レーザアレイを備えている光学機器 |
JP4639249B2 (ja) | 2008-07-31 | 2011-02-23 | キヤノン株式会社 | 面発光レーザの製造方法及び面発光レーザアレイの製造方法、面発光レーザ及び面発光レーザアレイ、面発光レーザアレイを備えている光学機器 |
JP5038371B2 (ja) * | 2008-09-26 | 2012-10-03 | キヤノン株式会社 | 面発光レーザの製造方法 |
JP5183555B2 (ja) * | 2009-04-02 | 2013-04-17 | キヤノン株式会社 | 面発光レーザアレイ |
JP5312159B2 (ja) * | 2009-04-08 | 2013-10-09 | キヤノン株式会社 | 3次元フォトニック結晶の製造方法および光機能素子、発光素子 |
CN101655885B (zh) * | 2009-08-27 | 2012-01-11 | 南京理工大学 | 一种高效率二维光子晶体偏轴定向发射器的设计方法 |
US9042421B2 (en) | 2010-10-18 | 2015-05-26 | Canon Kabushiki Kaisha | Surface emitting laser, surface emitting laser array, and optical apparatus having surface emitting laser array |
KR101799521B1 (ko) | 2011-05-24 | 2017-11-20 | 삼성전자 주식회사 | 광결정형 광변조기 및 이를 구비하는 3차원 영상 획득 장치 |
KR101928436B1 (ko) | 2012-10-10 | 2019-02-26 | 삼성전자주식회사 | 광 집적 회로용 하이브리드 수직 공명 레이저 |
EP2961185B1 (en) * | 2013-02-20 | 2020-03-04 | Panasonic Intellectual Property Corporation of America | Control method for information apparatus and program |
JP7378686B2 (ja) | 2021-08-31 | 2023-11-13 | シチズン電子株式会社 | Led発光装置 |
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JP2003273456A (ja) * | 2002-03-14 | 2003-09-26 | Japan Science & Technology Corp | 2次元フォトニック結晶面発光レーザ |
WO2005086302A1 (ja) * | 2004-03-05 | 2005-09-15 | Kyoto University | 2次元フォトニック結晶面発光レーザ光源 |
WO2005101598A1 (ja) * | 2004-04-13 | 2005-10-27 | Hamamatsu Photonics K.K. | 半導体発光素子及びその製造方法 |
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2006
- 2006-04-12 JP JP2006109913A patent/JP4533339B2/ja not_active Expired - Fee Related
-
2007
- 2007-04-05 AT AT07741454T patent/ATE513344T1/de not_active IP Right Cessation
- 2007-04-05 WO PCT/JP2007/058018 patent/WO2007119761A2/en active Application Filing
- 2007-04-05 KR KR1020087027310A patent/KR100991068B1/ko not_active IP Right Cessation
- 2007-04-05 EP EP07741454A patent/EP2011206B1/en not_active Not-in-force
- 2007-04-05 CN CN2007800130535A patent/CN101421889B/zh not_active Expired - Fee Related
- 2007-04-05 US US11/916,230 patent/US7796665B2/en not_active Expired - Fee Related
-
2010
- 2010-08-10 US US12/853,393 patent/US8249123B2/en not_active Expired - Fee Related
Patent Citations (5)
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US6603605B1 (en) * | 1999-11-05 | 2003-08-05 | Interuniversitair Microelektronica Centrum (Imec, Vzw) | System for guiding a beam of electromagnetic radiation |
JP2005538532A (ja) * | 2002-02-12 | 2005-12-15 | ニコラエビチ レデンチョフ,ニコライ | 傾斜型共振器半導体レーザー(tcsl)及びその製造方法 |
JP2003273456A (ja) * | 2002-03-14 | 2003-09-26 | Japan Science & Technology Corp | 2次元フォトニック結晶面発光レーザ |
WO2005086302A1 (ja) * | 2004-03-05 | 2005-09-15 | Kyoto University | 2次元フォトニック結晶面発光レーザ光源 |
WO2005101598A1 (ja) * | 2004-04-13 | 2005-10-27 | Hamamatsu Photonics K.K. | 半導体発光素子及びその製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP7053686B2 (ja) | 2017-06-30 | 2022-04-12 | レオナルド・エッセ・ピ・ア | 空中静止可能な航空機のためのロータ |
Also Published As
Publication number | Publication date |
---|---|
CN101421889A (zh) | 2009-04-29 |
WO2007119761B1 (en) | 2008-05-22 |
CN101421889B (zh) | 2011-01-19 |
US8249123B2 (en) | 2012-08-21 |
KR20090015920A (ko) | 2009-02-12 |
WO2007119761A2 (en) | 2007-10-25 |
US7796665B2 (en) | 2010-09-14 |
JP2007287733A (ja) | 2007-11-01 |
US20100303117A1 (en) | 2010-12-02 |
EP2011206B1 (en) | 2011-06-15 |
ATE513344T1 (de) | 2011-07-15 |
EP2011206A2 (en) | 2009-01-07 |
KR100991068B1 (ko) | 2010-10-29 |
WO2007119761A3 (en) | 2008-04-03 |
US20100014548A1 (en) | 2010-01-21 |
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