JP4740605B2 - 気体制御回転移動装置及び気体制御アクチュエータ - Google Patents

気体制御回転移動装置及び気体制御アクチュエータ Download PDF

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Publication number
JP4740605B2
JP4740605B2 JP2005020947A JP2005020947A JP4740605B2 JP 4740605 B2 JP4740605 B2 JP 4740605B2 JP 2005020947 A JP2005020947 A JP 2005020947A JP 2005020947 A JP2005020947 A JP 2005020947A JP 4740605 B2 JP4740605 B2 JP 4740605B2
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Japan
Prior art keywords
gas
movable
control
movable member
movable body
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Expired - Fee Related
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JP2005020947A
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Japanese (ja)
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JP2006210659A5 (enExample
JP2006210659A (ja
Inventor
勝美 佐々木
朋子 平山
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Pneumatic Servo Controls Ltd
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Pneumatic Servo Controls Ltd
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Priority to JP2005020947A priority Critical patent/JP4740605B2/ja
Publication of JP2006210659A publication Critical patent/JP2006210659A/ja
Publication of JP2006210659A5 publication Critical patent/JP2006210659A5/ja
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Expired - Fee Related legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Wire Bonding (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2005020947A 2005-01-28 2005-01-28 気体制御回転移動装置及び気体制御アクチュエータ Expired - Fee Related JP4740605B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005020947A JP4740605B2 (ja) 2005-01-28 2005-01-28 気体制御回転移動装置及び気体制御アクチュエータ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005020947A JP4740605B2 (ja) 2005-01-28 2005-01-28 気体制御回転移動装置及び気体制御アクチュエータ

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JP2006210659A JP2006210659A (ja) 2006-08-10
JP2006210659A5 JP2006210659A5 (enExample) 2008-03-13
JP4740605B2 true JP4740605B2 (ja) 2011-08-03

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JP2005020947A Expired - Fee Related JP4740605B2 (ja) 2005-01-28 2005-01-28 気体制御回転移動装置及び気体制御アクチュエータ

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JP (1) JP4740605B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2003846A (en) * 2008-12-19 2010-06-22 Asml Netherlands Bv Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless.
EP2221668B1 (en) * 2009-02-24 2021-04-14 ASML Netherlands B.V. Lithographic apparatus and positioning assembly

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5388440A (en) * 1977-01-14 1978-08-03 Hitachi Ltd Static pressure bearing guide
JPS53121569A (en) * 1977-03-31 1978-10-24 Toshiba Corp Vapor growth method
JPS5687318A (en) * 1979-12-18 1981-07-15 Toshiba Corp Finely movable table
JPS59129636A (ja) * 1983-01-10 1984-07-26 Hitachi Ltd ６自由度を有するステ−ジの制御装置
JPS6022239A (ja) * 1983-07-18 1985-02-04 Fujitsu Ltd 音声デ−タ編集方式
JPH061956B2 (ja) * 1984-08-10 1994-01-05 九州日立マクセル株式会社 充電回路
JPS62147433A (ja) * 1985-12-20 1987-07-01 Matsushita Electric Ind Co Ltd 液晶表示パネル線欠陥救済方法
JPS62156425A (ja) * 1985-12-28 1987-07-11 Fudo Constr Co Ltd 遮断板の打設工法
JPS63245347A (ja) * 1987-03-31 1988-10-12 Sumitomo Heavy Ind Ltd 微小駆動機構
JPH029550A (ja) * 1988-12-21 1990-01-12 Hitachi Ltd ６自由度微動ステージの駆動装置
JPH09317767A (ja) * 1996-05-28 1997-12-09 Nippon Seiko Kk 位置決め装置
JPH10148204A (ja) * 1996-11-18 1998-06-02 Ckd Corp アクチュエータ

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JP2006210659A (ja) 2006-08-10

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