JP4716367B2 - 処理装置及び処理方法 - Google Patents

処理装置及び処理方法 Download PDF

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Publication number
JP4716367B2
JP4716367B2 JP2005349555A JP2005349555A JP4716367B2 JP 4716367 B2 JP4716367 B2 JP 4716367B2 JP 2005349555 A JP2005349555 A JP 2005349555A JP 2005349555 A JP2005349555 A JP 2005349555A JP 4716367 B2 JP4716367 B2 JP 4716367B2
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processing
processing liquid
liquid
treatment liquid
holding space
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JP2005349555A
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Japanese (ja)
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JP2007157928A5 (enExample
JP2007157928A (ja
Inventor
秀史 東野
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Shibaura Mechatronics Corp
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Shibaura Mechatronics Corp
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Priority to JP2005349555A priority Critical patent/JP4716367B2/ja
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Publication of JP2007157928A5 publication Critical patent/JP2007157928A5/ja
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  • Cleaning Or Drying Semiconductors (AREA)
JP2005349555A 2005-12-02 2005-12-02 処理装置及び処理方法 Expired - Fee Related JP4716367B2 (ja)

Priority Applications (1)

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JP2005349555A JP4716367B2 (ja) 2005-12-02 2005-12-02 処理装置及び処理方法

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JP2005349555A JP4716367B2 (ja) 2005-12-02 2005-12-02 処理装置及び処理方法

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JP2007157928A JP2007157928A (ja) 2007-06-21
JP2007157928A5 JP2007157928A5 (enExample) 2009-01-29
JP4716367B2 true JP4716367B2 (ja) 2011-07-06

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JP2005349555A Expired - Fee Related JP4716367B2 (ja) 2005-12-02 2005-12-02 処理装置及び処理方法

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5527960B2 (ja) * 2008-10-31 2014-06-25 東京応化工業株式会社 回転処理装置
JP5320455B2 (ja) * 2011-12-16 2013-10-23 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP2016134508A (ja) * 2015-01-20 2016-07-25 東京エレクトロン株式会社 基板処理方法、基板処理装置、及びコンピュータ読み取り可能な記録媒体
JP2023140682A (ja) * 2022-03-23 2023-10-05 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0669126A (ja) * 1992-08-18 1994-03-11 Mitsubishi Electric Corp ウエハ周辺部クリーニング装置
JPH08195370A (ja) * 1995-01-13 1996-07-30 Sony Corp エッジクリーン方法
JP4127866B2 (ja) * 1996-05-21 2008-07-30 東京応化工業株式会社 基板端縁部被膜の除去方法
JPH10229040A (ja) * 1997-02-17 1998-08-25 Dainippon Screen Mfg Co Ltd 基板処理装置
JP3761415B2 (ja) * 2001-03-30 2006-03-29 大日本スクリーン製造株式会社 基板周縁処理装置および基板周縁処理方法

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JP2007157928A (ja) 2007-06-21

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