JP2007157928A5 - - Google Patents

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Publication number
JP2007157928A5
JP2007157928A5 JP2005349555A JP2005349555A JP2007157928A5 JP 2007157928 A5 JP2007157928 A5 JP 2007157928A5 JP 2005349555 A JP2005349555 A JP 2005349555A JP 2005349555 A JP2005349555 A JP 2005349555A JP 2007157928 A5 JP2007157928 A5 JP 2007157928A5
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JP
Japan
Prior art keywords
processing
processing liquid
liquid
unit
holding space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005349555A
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English (en)
Japanese (ja)
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JP4716367B2 (ja
JP2007157928A (ja
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Publication date
Application filed filed Critical
Priority to JP2005349555A priority Critical patent/JP4716367B2/ja
Priority claimed from JP2005349555A external-priority patent/JP4716367B2/ja
Publication of JP2007157928A publication Critical patent/JP2007157928A/ja
Publication of JP2007157928A5 publication Critical patent/JP2007157928A5/ja
Application granted granted Critical
Publication of JP4716367B2 publication Critical patent/JP4716367B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005349555A 2005-12-02 2005-12-02 処理装置及び処理方法 Expired - Fee Related JP4716367B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005349555A JP4716367B2 (ja) 2005-12-02 2005-12-02 処理装置及び処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005349555A JP4716367B2 (ja) 2005-12-02 2005-12-02 処理装置及び処理方法

Publications (3)

Publication Number Publication Date
JP2007157928A JP2007157928A (ja) 2007-06-21
JP2007157928A5 true JP2007157928A5 (enExample) 2009-01-29
JP4716367B2 JP4716367B2 (ja) 2011-07-06

Family

ID=38241912

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005349555A Expired - Fee Related JP4716367B2 (ja) 2005-12-02 2005-12-02 処理装置及び処理方法

Country Status (1)

Country Link
JP (1) JP4716367B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5527960B2 (ja) * 2008-10-31 2014-06-25 東京応化工業株式会社 回転処理装置
JP5320455B2 (ja) * 2011-12-16 2013-10-23 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP2016134508A (ja) * 2015-01-20 2016-07-25 東京エレクトロン株式会社 基板処理方法、基板処理装置、及びコンピュータ読み取り可能な記録媒体
JP2023140682A (ja) * 2022-03-23 2023-10-05 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0669126A (ja) * 1992-08-18 1994-03-11 Mitsubishi Electric Corp ウエハ周辺部クリーニング装置
JPH08195370A (ja) * 1995-01-13 1996-07-30 Sony Corp エッジクリーン方法
JP4127866B2 (ja) * 1996-05-21 2008-07-30 東京応化工業株式会社 基板端縁部被膜の除去方法
JPH10229040A (ja) * 1997-02-17 1998-08-25 Dainippon Screen Mfg Co Ltd 基板処理装置
JP3761415B2 (ja) * 2001-03-30 2006-03-29 大日本スクリーン製造株式会社 基板周縁処理装置および基板周縁処理方法

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