JP4707685B2 - Pdp保護膜材料及び該製造方法 - Google Patents
Pdp保護膜材料及び該製造方法 Download PDFInfo
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- JP4707685B2 JP4707685B2 JP2007044457A JP2007044457A JP4707685B2 JP 4707685 B2 JP4707685 B2 JP 4707685B2 JP 2007044457 A JP2007044457 A JP 2007044457A JP 2007044457 A JP2007044457 A JP 2007044457A JP 4707685 B2 JP4707685 B2 JP 4707685B2
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/03—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on magnesium oxide, calcium oxide or oxide mixtures derived from dolomite
- C04B35/04—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on magnesium oxide, calcium oxide or oxide mixtures derived from dolomite based on magnesium oxide
- C04B35/043—Refractories from grain sized mixtures
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
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- C04B35/03—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on magnesium oxide, calcium oxide or oxide mixtures derived from dolomite
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
- H01B3/10—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances metallic oxides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/10—AC-PDPs with at least one main electrode being out of contact with the plasma
- H01J11/12—AC-PDPs with at least one main electrode being out of contact with the plasma with main electrodes provided on both sides of the discharge space
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
- H01J11/20—Constructional details
- H01J11/34—Vessels, containers or parts thereof, e.g. substrates
- H01J11/40—Layers for protecting or enhancing the electron emission, e.g. MgO layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3205—Alkaline earth oxides or oxide forming salts thereof, e.g. beryllium oxide
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3205—Alkaline earth oxides or oxide forming salts thereof, e.g. beryllium oxide
- C04B2235/3208—Calcium oxide or oxide-forming salts thereof, e.g. lime
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3217—Aluminum oxide or oxide forming salts thereof, e.g. bauxite, alpha-alumina
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3224—Rare earth oxide or oxide forming salts thereof, e.g. scandium oxide
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- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3256—Molybdenum oxides, molybdates or oxide forming salts thereof, e.g. cadmium molybdate
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3294—Antimony oxides, antimonates, antimonites or oxide forming salts thereof, indium antimonate
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Structural Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Gas-Filled Discharge Tubes (AREA)
Description
20 前面基板誘電体
30 MgO保護層
40 維持電極
50 アドレス電極
60 隔壁
70 蛍光体
80 背面基板
90 背面基板誘電層
Claims (4)
- 酸化マグネシウムを主成分とし、BeOである第1ドーピング物質及びAl2O3 である第2ドーピング物質を同時に含めた蒸着源を用いて真空蒸着工程により形成されたことを特徴とするACPDP用保護膜。
- 第1ドーピング物質及び第2ドーピング物質は、酸化マグネシウムに対してそれぞれ50ppmないし8000ppm範囲に添加されることを特徴とする請求項1に記載のACPDP用保護膜。
- 第1ドーピング物質及び第2ドーピング物質の含量は、酸化マグネシウムに対してそれぞれ500ppmないし2000ppmであることを特徴とする請求項1に記載のACPDP用保護膜。
- 前記保護膜には不純物としてFeが30ppm、Alが50ppm、Siが50ppm、Niが5ppm、Naが5ppm、Kが5ppm以下に維持されることを特徴とする請求項1〜3のいずれか一項に記載のACPDP用保護膜。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2006-0098603 | 2006-10-10 | ||
KR1020060098603A KR100805858B1 (ko) | 2006-10-10 | 2006-10-10 | 피디피 보호막 재료 및 그 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008098139A JP2008098139A (ja) | 2008-04-24 |
JP4707685B2 true JP4707685B2 (ja) | 2011-06-22 |
Family
ID=39275156
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007044457A Expired - Fee Related JP4707685B2 (ja) | 2006-10-10 | 2007-02-23 | Pdp保護膜材料及び該製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7868550B2 (ja) |
JP (1) | JP4707685B2 (ja) |
KR (1) | KR100805858B1 (ja) |
CN (1) | CN101162674A (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010080388A (ja) * | 2008-09-29 | 2010-04-08 | Panasonic Corp | プラズマディスプレイパネル |
JP2010103077A (ja) | 2008-09-29 | 2010-05-06 | Panasonic Corp | プラズマディスプレイパネル |
JP2010140837A (ja) * | 2008-12-15 | 2010-06-24 | Panasonic Corp | プラズマディスプレイパネル |
KR101176602B1 (ko) | 2009-09-04 | 2012-08-23 | (주)씨앤켐 | 피디피용 저전압 보호막 재료 및 그 제조방법 |
JP5363381B2 (ja) * | 2010-03-09 | 2013-12-11 | パナソニック株式会社 | プラズマディスプレイパネル |
WO2011118155A1 (ja) * | 2010-03-26 | 2011-09-29 | パナソニック株式会社 | プラズマディスプレイパネルの製造方法 |
JP2012185916A (ja) * | 2011-03-03 | 2012-09-27 | Panasonic Corp | プラズマディスプレイパネル |
JP2013008643A (ja) * | 2011-06-27 | 2013-01-10 | Ulvac Japan Ltd | プラズマディスプレイパネルとその製造方法 |
CN103787587A (zh) * | 2011-12-31 | 2014-05-14 | 四川虹欧显示器件有限公司 | 用于pdp的介质保护层材料及其制备方法以及介质保护层 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06316671A (ja) * | 1993-05-07 | 1994-11-15 | Hokuriku Toryo Kk | 誘電体保護剤 |
JP2000103614A (ja) * | 1998-09-28 | 2000-04-11 | Daiichi Kigensokagaku Kogyo Co Ltd | プラズマディスプレイ用MgO材料及びその製造方法ならびにプラズマディスプレイ |
JP2002150953A (ja) * | 2000-08-29 | 2002-05-24 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネルおよびその製造方法ならびにプラズマディスプレイパネル表示装置 |
JP2005149743A (ja) * | 2003-11-11 | 2005-06-09 | Pioneer Plasma Display Corp | プラズマディスプレイパネルの保護膜の形成材料、プラズマディスプレイパネル及びプラズマ表示装置 |
JP2006169636A (ja) * | 2004-12-17 | 2006-06-29 | Samsung Sdi Co Ltd | 保護膜、該保護膜形成用の複合体、該保護膜の製造方法及び該保護膜を備えたプラズマディスプレイ装置 |
JP2006207013A (ja) * | 2004-07-14 | 2006-08-10 | Mitsubishi Materials Corp | MgO蒸着材 |
JP2009537063A (ja) * | 2006-05-11 | 2009-10-22 | パナソニック株式会社 | 低電圧材料を有するプラズマディスプレイパネル |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3073451B2 (ja) * | 1996-11-20 | 2000-08-07 | 富士通株式会社 | プラズマディスプレイパネルの製造方法 |
FR2764907B1 (fr) | 1997-06-24 | 1999-09-03 | Thomson Tubes Electroniques | Procede de realisation d'un depot a base de magnesie sur une dalle de panneau de visualisation |
JP4674360B2 (ja) * | 2004-03-19 | 2011-04-20 | テクノロジーシードインキュベーション株式会社 | 電子ビーム蒸着法により成膜する酸化マグネシウム薄膜材料 |
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2006
- 2006-10-10 KR KR1020060098603A patent/KR100805858B1/ko not_active IP Right Cessation
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2007
- 2007-02-16 US US11/707,596 patent/US7868550B2/en not_active Expired - Fee Related
- 2007-02-23 JP JP2007044457A patent/JP4707685B2/ja not_active Expired - Fee Related
- 2007-03-02 CN CNA2007100796938A patent/CN101162674A/zh active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06316671A (ja) * | 1993-05-07 | 1994-11-15 | Hokuriku Toryo Kk | 誘電体保護剤 |
JP2000103614A (ja) * | 1998-09-28 | 2000-04-11 | Daiichi Kigensokagaku Kogyo Co Ltd | プラズマディスプレイ用MgO材料及びその製造方法ならびにプラズマディスプレイ |
JP2002150953A (ja) * | 2000-08-29 | 2002-05-24 | Matsushita Electric Ind Co Ltd | プラズマディスプレイパネルおよびその製造方法ならびにプラズマディスプレイパネル表示装置 |
JP2005149743A (ja) * | 2003-11-11 | 2005-06-09 | Pioneer Plasma Display Corp | プラズマディスプレイパネルの保護膜の形成材料、プラズマディスプレイパネル及びプラズマ表示装置 |
JP2006207013A (ja) * | 2004-07-14 | 2006-08-10 | Mitsubishi Materials Corp | MgO蒸着材 |
JP2006169636A (ja) * | 2004-12-17 | 2006-06-29 | Samsung Sdi Co Ltd | 保護膜、該保護膜形成用の複合体、該保護膜の製造方法及び該保護膜を備えたプラズマディスプレイ装置 |
JP2009537063A (ja) * | 2006-05-11 | 2009-10-22 | パナソニック株式会社 | 低電圧材料を有するプラズマディスプレイパネル |
Also Published As
Publication number | Publication date |
---|---|
US7868550B2 (en) | 2011-01-11 |
US20080085375A1 (en) | 2008-04-10 |
KR100805858B1 (ko) | 2008-02-21 |
JP2008098139A (ja) | 2008-04-24 |
CN101162674A (zh) | 2008-04-16 |
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