JP4662534B2 - 水素ガス生成装置 - Google Patents
水素ガス生成装置 Download PDFInfo
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- JP4662534B2 JP4662534B2 JP2004290616A JP2004290616A JP4662534B2 JP 4662534 B2 JP4662534 B2 JP 4662534B2 JP 2004290616 A JP2004290616 A JP 2004290616A JP 2004290616 A JP2004290616 A JP 2004290616A JP 4662534 B2 JP4662534 B2 JP 4662534B2
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- 238000006356 dehydrogenation reaction Methods 0.000 claims description 332
- 239000000446 fuel Substances 0.000 claims description 269
- 239000001257 hydrogen Substances 0.000 claims description 214
- 229910052739 hydrogen Inorganic materials 0.000 claims description 214
- 239000003054 catalyst Substances 0.000 claims description 168
- 238000006243 chemical reaction Methods 0.000 claims description 161
- 238000005984 hydrogenation reaction Methods 0.000 claims description 90
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- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 claims description 49
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- 150000002431 hydrogen Chemical class 0.000 claims description 32
- -1 monocyclic alicyclic hydrocarbon Chemical class 0.000 claims description 26
- 229930195733 hydrocarbon Natural products 0.000 claims description 25
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- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- NHCREQREVZBOCH-UHFFFAOYSA-N 1-methyl-1,2,3,4,4a,5,6,7,8,8a-decahydronaphthalene Chemical compound C1CCCC2C(C)CCCC21 NHCREQREVZBOCH-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
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- 150000002739 metals Chemical class 0.000 description 2
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- 229910000510 noble metal Inorganic materials 0.000 description 2
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- ZONODCCBXBRQEZ-UHFFFAOYSA-N platinum tungsten Chemical compound [W].[Pt] ZONODCCBXBRQEZ-UHFFFAOYSA-N 0.000 description 2
- 150000003138 primary alcohols Chemical class 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
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- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
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- 150000001298 alcohols Chemical class 0.000 description 1
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- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
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- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 208000012839 conversion disease Diseases 0.000 description 1
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Images
Description
20…常圧型脱水素タンク(第2反応手段)
30…脱水素兼水素化タンク(第3反応手段)
12,22…脱水素触媒
13,23…燃料噴射装置
15,16,25,26,35,36…フィン付管型水冷冷却器
11,21,31…冷却用仕切板
32…脱水素兼水素化触媒
33…水素分離器
40…加熱器
60…燃料タンク
70…廃棄タンク
73…水素化用燃料タンク
80…補充タンク
110…水素エンジン(内燃機関)
Claims (10)
- 加熱雰囲気を一方から他方に挿通して外部を加熱する加熱手段と、
第1の脱水素触媒、冷却用部材及び前記第1の脱水素触媒が配された反応室、並びに前記第1の脱水素触媒上で液膜状態となるように脱水素用燃料を供給する第1の燃料供給手段を備え、供給された前記脱水素用燃料を加圧下、前記加熱手段により、脱水素反応と生成物の触媒表面からの離脱を行なう450℃以上の温度t1に加熱された前記第1の脱水素触媒上で脱水素反応させると共に、供給された前記脱水素用燃料のうち前記冷却用部材で液化した未反応の脱水素用燃料を再び前記第1の脱水素触媒上で脱水素反応させる第1反応手段と、
前記第1反応手段の前記加熱雰囲気の挿通方向下流側に設けられ、第2の脱水素触媒、冷却用部材及び前記第2の脱水素触媒が配された反応室、並びに前記第2の脱水素触媒上で液膜状態となるように脱水素用燃料を供給する第2の燃料供給手段を備え、かつ供給された脱水素用燃料を、前記加熱手段により温度t2(<t1)に加熱された前記第2の脱水素触媒上で脱水素反応させると共に、供給された前記脱水素用燃料のうち前記冷却用部材で液化した未反応の脱水素用燃料を再び前記第2の脱水素触媒上で脱水素反応させる第2反応手段と、
前記第2反応手段の前記加熱雰囲気の挿通方向下流側に設けられ、脱水素兼水素化触媒、該脱水素兼水素化触媒と接する脱水素用燃料として単環脂環式炭化水素及び2−プロパノールを混合した燃料、冷却用部材及び前記脱水素兼水素化触媒が配された反応室を備え、かつ前記加熱手段により温度t3(<t2)に加熱された前記脱水素兼水素化触媒上で、水素ガスが供給されないときには脱水素兼水素化触媒と接する前記脱水素用燃料を脱水素反応させ、水素ガスが供給されたときには脱水素兼水素化触媒と接する前記脱水素用燃料の脱水素反応により生成された脱水素生成物である水素化用燃料を水素化反応させる第3反応手段と、
を備えた水素ガス生成装置。 - 水素を含む燃料が供給されて作動する内燃機関を更に備え、前記内燃機関から排出された排出ガスを前記加熱手段に供給し、前記排出ガスを挿通して加熱するようにした請求項1に記載の水素ガス生成装置。
- 前記第1反応手段及び前記第2反応手段に供給される脱水素用燃料は、デカリンと単環脂環式炭化水素との混合燃料である請求項1又は請求項2に記載の水素ガス生成装置。
- 前記単環脂環式炭化水素は、置換シクロヘキサンである請求項1〜請求項3のいずれか1項に記載の水素ガス生成装置。
- 前記温度t2が300℃±100℃であって、前記温度t3が150℃以下である請求項1〜請求項4のいずれか1項に記載の水素ガス生成装置。
- 前記第1反応手段、前記第2反応手段、及び前記第3反応手段は、分離された水素ガスを排出する水素排出口とを更に備えた請求項1〜請求項5のいずれか1項に記載の水素ガス生成装置。
- 脱水素生成物を吸着除去して水素ガスを選択的に透過する水素分離部材が、少なくとも前記第3反応手段の前記水素排出口に設けられている請求項6に記載の水素ガス生成装置。
- 前記第1反応手段及び前記第2反応手段に供給される脱水素用燃料を貯留する脱水素用燃料貯留手段と、前記第1反応手段及び前記第2反応手段に供給された脱水素用燃料の脱水素反応により生成された脱水素生成物を貯留する脱水素生成物貯留手段とを更に備えた請求項1〜請求項7のいずれか1項に記載の水素ガス生成装置。
- 前記第3反応手段は、脱水素兼水素化触媒と接する脱水素用燃料及びその脱水素生成物である水素化用燃料を補充する補充手段を更に備えた請求項1〜請求項8のいずれか1項に記載の水素ガス生成装置。
- 前記第1反応手段、前記第2反応手段、及び前記第3反応手段は、前記冷却用部材として冷却用仕切板を介して隣接配置された、脱水素触媒又は脱水素兼水素化触媒が配された反応室と、前記反応室を冷却する冷却室とを備えている請求項1〜請求項9のいずれか1項に記載の水素ガス生成装置。
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JP5654371B2 (ja) * | 2011-01-31 | 2015-01-14 | 国際有機ハイドライド株式会社 | 水素ガス生成装置及び水素ガス生成方法 |
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