JP4640913B2 - ピロロ[3,4−c]ピロールの直接製造方法 - Google Patents

ピロロ[3,4−c]ピロールの直接製造方法 Download PDF

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Publication number
JP4640913B2
JP4640913B2 JP2003526922A JP2003526922A JP4640913B2 JP 4640913 B2 JP4640913 B2 JP 4640913B2 JP 2003526922 A JP2003526922 A JP 2003526922A JP 2003526922 A JP2003526922 A JP 2003526922A JP 4640913 B2 JP4640913 B2 JP 4640913B2
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JP
Japan
Prior art keywords
formula
water
alkyl
nitrile
hydrogen
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Expired - Lifetime
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JP2003526922A
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English (en)
Japanese (ja)
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JP2005512960A (ja
JP2005512960A5 (enExample
Inventor
リュフィー,ヴァンサン
モドゥー,フローランス
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BASF Schweiz AG
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Ciba Holding AG
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D487/00Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D491/00Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
    • C07D491/02Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains two hetero rings
    • C07D491/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00Other synthetic dyes of known constitution
    • C09B57/004Diketopyrrolopyrrole dyes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033Blends of pigments; Mixtured crystals; Solid solutions
    • C09B67/0034Mixtures of two or more pigments or dyes of the same type
    • C09B67/0039Mixtures of diketopyrrolopyrroles
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/06Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2211/00Chemical nature of organic luminescent or tenebrescent compounds
    • C09K2211/10Non-macromolecular compounds
    • C09K2211/1003Carbocyclic compounds
    • C09K2211/1011Condensed systems
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2211/00Chemical nature of organic luminescent or tenebrescent compounds
    • C09K2211/10Non-macromolecular compounds
    • C09K2211/1018Heterocyclic compounds
    • C09K2211/1025Heterocyclic compounds characterised by ligands
    • C09K2211/1029Heterocyclic compounds characterised by ligands containing one nitrogen atom as the heteroatom
    • C09K2211/1033Heterocyclic compounds characterised by ligands containing one nitrogen atom as the heteroatom with oxygen
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2211/00Chemical nature of organic luminescent or tenebrescent compounds
    • C09K2211/10Non-macromolecular compounds
    • C09K2211/1018Heterocyclic compounds
    • C09K2211/1025Heterocyclic compounds characterised by ligands
    • C09K2211/1044Heterocyclic compounds characterised by ligands containing two nitrogen atoms as heteroatoms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Paints Or Removers (AREA)
  • Cosmetics (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Compounds Of Unknown Constitution (AREA)
  • Electroluminescent Light Sources (AREA)
JP2003526922A 2001-09-11 2002-09-03 ピロロ[3,4−c]ピロールの直接製造方法 Expired - Lifetime JP4640913B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP01810875 2001-09-11
EP01811249 2001-12-20
EP02405223 2002-03-22
PCT/EP2002/009791 WO2003022847A2 (en) 2001-09-11 2002-09-03 Process for the direct preparation of pyrrolo[3,4-c]pyrroles

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010128646A Division JP5345975B2 (ja) 2001-09-11 2010-06-04 ピロロ[3,4−c]ピロールの直接製造方法

Publications (3)

Publication Number Publication Date
JP2005512960A JP2005512960A (ja) 2005-05-12
JP2005512960A5 JP2005512960A5 (enExample) 2006-01-05
JP4640913B2 true JP4640913B2 (ja) 2011-03-02

Family

ID=27224407

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2003526922A Expired - Lifetime JP4640913B2 (ja) 2001-09-11 2002-09-03 ピロロ[3,4−c]ピロールの直接製造方法
JP2003526923A Expired - Fee Related JP4707951B2 (ja) 2001-09-11 2002-09-03 ジケトピロロピロールの調製方法
JP2010128646A Expired - Fee Related JP5345975B2 (ja) 2001-09-11 2010-06-04 ピロロ[3,4−c]ピロールの直接製造方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2003526923A Expired - Fee Related JP4707951B2 (ja) 2001-09-11 2002-09-03 ジケトピロロピロールの調製方法
JP2010128646A Expired - Fee Related JP5345975B2 (ja) 2001-09-11 2010-06-04 ピロロ[3,4−c]ピロールの直接製造方法

Country Status (13)

Country Link
US (3) US7326793B2 (enExample)
EP (2) EP1425282B1 (enExample)
JP (3) JP4640913B2 (enExample)
KR (2) KR100927810B1 (enExample)
CN (2) CN1553913B (enExample)
AT (2) ATE357446T1 (enExample)
AU (2) AU2002340851A1 (enExample)
CA (1) CA2457710A1 (enExample)
DE (2) DE60210120T2 (enExample)
DK (1) DK1436296T3 (enExample)
MX (1) MXPA04002334A (enExample)
WO (2) WO2003022847A2 (enExample)
ZA (1) ZA200401106B (enExample)

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CN1553938B (zh) * 2001-06-29 2010-11-03 西巴特殊化学品控股有限公司 荧光二酮吡咯并吡咯
CN1553913B (zh) * 2001-09-11 2011-10-05 西巴特殊化学品控股有限公司 吡咯并[3,4-c]吡咯的直接制备方法
AU2004255863A1 (en) * 2003-07-07 2005-01-20 Ciba Specialty Chemicals Holding Inc. Process for the preparation of furopyrroles
MXPA06004377A (es) 2003-10-23 2006-06-14 Ciba Sc Holding Ag Mezclas de pigmentos de dicetopirrolopirrol estables al calor.
WO2008030115A2 (en) * 2006-09-06 2008-03-13 Elena Korchagina Fluorescent cell markers
JP4986451B2 (ja) * 2005-06-30 2012-07-25 信一郎 礒部 マーキング剤
CN101490177B (zh) 2006-07-20 2013-07-17 Dic株式会社 高色度c.i.颜料红254及其制造方法
DE102007011068A1 (de) * 2007-03-07 2008-09-11 Clariant International Ltd. Verfahren zur direkten Herstellung feinteiliger Diketopyrrolopyrrolpigmente
JP5497991B2 (ja) * 2008-03-13 2014-05-21 富士フイルム株式会社 顔料微粒子の製造方法
JP5268410B2 (ja) * 2008-04-11 2013-08-21 富士フイルム株式会社 顔料分散組成物、顔料分散組成物の製造方法、着色重合性組成物、カラーフィルタ、及びカラーフィルタの製造方法
KR101935644B1 (ko) 2008-10-31 2019-01-04 바스프 에스이 유기 전계 효과 트랜지스터에 사용하기 위한 디케토피롤로피롤 중합체
BRPI1011853A2 (pt) 2009-05-27 2019-09-24 Basf Se polímero, material, camada ou componente semicondutores orgânicos, dispositivo semicondutor, processos para a preparação de um dispositivo semicondutor orgânico, e de um polímero, e, uso do polímero e/ou do material, camada ou componente semicondutores orgãnicos.
JP5629067B2 (ja) * 2009-08-18 2014-11-19 富士フイルム株式会社 顔料微粒子分散体、これを用いたカラーフィルタ、及び顔料微粒子分散体の製造方法、並びに顔料誘導体化合物
WO2011054731A1 (en) 2009-11-05 2011-05-12 Basf Se Fluorescent materials
KR101222552B1 (ko) * 2010-03-25 2013-01-16 경북대학교 산학협력단 컬러필터용 고내열성 dpp계 염료 및 그 제조방법
CN101831197A (zh) * 2010-05-17 2010-09-15 南通市争妍颜料化工有限公司 颜料红254的高遮盖力品种hl的生产工艺
KR101839636B1 (ko) 2010-05-19 2018-03-16 바스프 에스이 유기 반도체 소자에 사용하기 위한 디케토피롤로피롤 중합체
WO2012017005A2 (en) 2010-08-05 2012-02-09 Basf Se Polymers based on benzodiones
GB201200184D0 (en) 2012-01-06 2012-02-22 Johnson Matthey Plc Tracers and method of marking liquids
CN103012409B (zh) * 2012-12-07 2015-05-27 辽宁鸿港化工有限公司 制备吡咯并吡咯-1,4-二酮衍生物的改进方法
WO2014181763A1 (ja) * 2013-05-07 2014-11-13 山本化成株式会社 感熱発色性組成物及び該組成物を用いてなる感熱記録材料
CN110791117A (zh) * 2018-08-01 2020-02-14 浙江浩川科技有限公司 一种芳香亚胺基取代的dpp类有机颜料及合成方法和用途
CN110791116A (zh) * 2018-08-01 2020-02-14 浙江浩川科技有限公司 一种含碳碳双键的dpp类有机颜料及合成方法和用途
CN110693754B (zh) * 2019-11-16 2022-08-23 烟台东方化学有限公司 一种抗菌消炎的吡啶酮组合物及包含其的化妆品
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CN1553913B (zh) * 2001-09-11 2011-10-05 西巴特殊化学品控股有限公司 吡咯并[3,4-c]吡咯的直接制备方法

Also Published As

Publication number Publication date
US20040171847A1 (en) 2004-09-02
US20040249162A1 (en) 2004-12-09
CA2457710A1 (en) 2003-03-20
CN1553912A (zh) 2004-12-08
WO2003022847A2 (en) 2003-03-20
DE60219037T8 (de) 2008-04-03
ZA200401106B (en) 2004-10-19
CN1553913A (zh) 2004-12-08
DE60210120T2 (de) 2006-08-17
ATE357446T1 (de) 2007-04-15
JP4707951B2 (ja) 2011-06-22
US20070117889A1 (en) 2007-05-24
US7326793B2 (en) 2008-02-05
US8883889B2 (en) 2014-11-11
KR100927810B1 (ko) 2009-11-23
WO2003022848A3 (en) 2003-09-18
WO2003022847A3 (en) 2003-09-25
EP1425282B1 (en) 2007-03-21
AU2002342633A1 (en) 2003-03-24
ATE321049T1 (de) 2006-04-15
EP1436296B1 (en) 2006-03-22
JP2010222368A (ja) 2010-10-07
CN1553913B (zh) 2011-10-05
EP1436296A2 (en) 2004-07-14
DE60210120D1 (de) 2006-05-11
KR20040029479A (ko) 2004-04-06
JP2005512960A (ja) 2005-05-12
US7186847B2 (en) 2007-03-06
KR20040029478A (ko) 2004-04-06
JP2005508903A (ja) 2005-04-07
MXPA04002334A (es) 2004-06-29
DE60219037D1 (de) 2007-05-03
DK1436296T3 (da) 2006-07-17
EP1425282A2 (en) 2004-06-09
DE60219037T2 (de) 2007-12-13
JP5345975B2 (ja) 2013-11-20
WO2003022848A2 (en) 2003-03-20
AU2002340851A1 (en) 2003-03-24

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