JP4640345B2 - 電力用半導体装置 - Google Patents

電力用半導体装置 Download PDF

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Publication number
JP4640345B2
JP4640345B2 JP2007014734A JP2007014734A JP4640345B2 JP 4640345 B2 JP4640345 B2 JP 4640345B2 JP 2007014734 A JP2007014734 A JP 2007014734A JP 2007014734 A JP2007014734 A JP 2007014734A JP 4640345 B2 JP4640345 B2 JP 4640345B2
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JP
Japan
Prior art keywords
conductor
semiconductor element
hole
solder
electrode
Prior art date
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Active
Application number
JP2007014734A
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English (en)
Japanese (ja)
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JP2008182074A (ja
JP2008182074A5 (enExample
Inventor
泰成 日野
泰 中島
功治 平岡
治雄 高尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
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Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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Priority to JP2007014734A priority Critical patent/JP4640345B2/ja
Publication of JP2008182074A publication Critical patent/JP2008182074A/ja
Publication of JP2008182074A5 publication Critical patent/JP2008182074A5/ja
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • H01L2224/0601Structure
    • H01L2224/0603Bonding areas having different sizes, e.g. different heights or widths
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/34Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
    • H01L2224/39Structure, shape, material or disposition of the strap connectors after the connecting process
    • H01L2224/40Structure, shape, material or disposition of the strap connectors after the connecting process of an individual strap connector
    • H01L2224/401Disposition
    • H01L2224/40135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/40137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73221Strap and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • H01L2924/13055Insulated gate bipolar transistor [IGBT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • H01L2924/13091Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
JP2007014734A 2007-01-25 2007-01-25 電力用半導体装置 Active JP4640345B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007014734A JP4640345B2 (ja) 2007-01-25 2007-01-25 電力用半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007014734A JP4640345B2 (ja) 2007-01-25 2007-01-25 電力用半導体装置

Publications (3)

Publication Number Publication Date
JP2008182074A JP2008182074A (ja) 2008-08-07
JP2008182074A5 JP2008182074A5 (enExample) 2008-12-25
JP4640345B2 true JP4640345B2 (ja) 2011-03-02

Family

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Family Applications (1)

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JP2007014734A Active JP4640345B2 (ja) 2007-01-25 2007-01-25 電力用半導体装置

Country Status (1)

Country Link
JP (1) JP4640345B2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103137506A (zh) * 2011-11-25 2013-06-05 三菱电机株式会社 接合方法以及半导体装置的制造方法
DE112016005807T5 (de) 2015-12-16 2018-09-27 Mitsubishi Electric Corporation Halbleitereinheit und Verfahren zur Herstellung derselben

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011086743A (ja) * 2009-10-15 2011-04-28 Mitsubishi Electric Corp 電力用半導体装置、及び該電力用半導体装置の製造方法
JP5702937B2 (ja) 2010-03-12 2015-04-15 株式会社日立製作所 半導体装置
JP5521771B2 (ja) * 2010-05-21 2014-06-18 株式会社デンソー 半導体モジュールおよびその製造方法
JP2012069640A (ja) * 2010-09-22 2012-04-05 Toshiba Corp 半導体装置及び電力用半導体装置
JP5813963B2 (ja) 2011-02-28 2015-11-17 ローム株式会社 半導体装置、および、半導体装置の実装構造
EP2698817B1 (en) 2011-08-10 2018-10-24 Fuji Electric Co., Ltd. Semiconductor device and method for manufacturing semiconductor device
JP5545306B2 (ja) * 2012-02-15 2014-07-09 株式会社デンソー 電子装置
US9653390B2 (en) 2012-09-04 2017-05-16 Mitsubishi Electric Corporation Semiconductor device and semiconductor device manufacturing method
JP5910456B2 (ja) * 2012-10-22 2016-04-27 株式会社豊田自動織機 半導体装置
US10157865B2 (en) 2013-03-08 2018-12-18 Mitsubishi Electric Corporation Semiconductor device with metal film and method for manufacturing semiconductor device with metal film
WO2016189643A1 (ja) 2015-05-26 2016-12-01 三菱電機株式会社 半導体装置の製造方法
JP6162764B2 (ja) * 2015-09-17 2017-07-12 ローム株式会社 半導体装置、および、半導体装置の実装構造
JP6721329B2 (ja) 2015-12-21 2020-07-15 三菱電機株式会社 パワー半導体装置およびその製造方法
DE112016007417T5 (de) 2016-11-08 2019-07-25 Mitsubishi Electric Corporation Halbleitervorrichtung
CN108109983B (zh) * 2017-12-14 2024-05-10 常州星海电子股份有限公司 一种汽车专用整流二极管结构
JP6936310B2 (ja) * 2018-02-27 2021-09-15 新電元工業株式会社 半導体装置及び半導体装置の製造方法
JP7042651B2 (ja) * 2018-02-28 2022-03-28 三菱電機株式会社 電力用半導体装置および電力変換装置
DE112018007782T5 (de) * 2018-06-29 2021-04-01 Mitsubishi Electric Corporation Halbleitervorrichtung
JP7156155B2 (ja) * 2019-04-19 2022-10-19 三菱電機株式会社 半導体モジュール
DE112019007795B4 (de) 2019-10-08 2025-02-06 Mitsubishi Electric Corp. Halbleitervorrichtung
WO2021075016A1 (ja) * 2019-10-17 2021-04-22 三菱電機株式会社 半導体装置および半導体装置の製造方法
CN118039508B (zh) * 2024-04-12 2024-06-14 无锡利普思半导体有限公司 功率模块内部连接工艺

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58119665A (ja) * 1982-01-11 1983-07-16 Hitachi Ltd 半導体装置及びその製法
JP2003218305A (ja) * 2002-01-18 2003-07-31 Sanken Electric Co Ltd 半導体装置
JP2003318349A (ja) * 2002-04-22 2003-11-07 Nec Corp 半導体装置
JP4078993B2 (ja) * 2003-01-27 2008-04-23 三菱電機株式会社 半導体装置
JP4281050B2 (ja) * 2003-03-31 2009-06-17 株式会社デンソー 半導体装置
JP2006060106A (ja) * 2004-08-23 2006-03-02 Origin Electric Co Ltd リード部材及び表面実装型半導体装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103137506A (zh) * 2011-11-25 2013-06-05 三菱电机株式会社 接合方法以及半导体装置的制造方法
US9087778B2 (en) 2011-11-25 2015-07-21 Mitsubishi Electric Corporation Joining method and semiconductor device manufacturing method
CN103137506B (zh) * 2011-11-25 2016-02-10 三菱电机株式会社 接合方法以及半导体装置的制造方法
DE112016005807T5 (de) 2015-12-16 2018-09-27 Mitsubishi Electric Corporation Halbleitereinheit und Verfahren zur Herstellung derselben
DE112016005807B4 (de) 2015-12-16 2024-05-08 Mitsubishi Electric Corporation Halbleitereinheit und Verfahren zur Herstellung derselben

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JP2008182074A (ja) 2008-08-07

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