JP4638662B2 - 高純度四フッ化ゲルマニウムを製造するための方法 - Google Patents

高純度四フッ化ゲルマニウムを製造するための方法 Download PDF

Info

Publication number
JP4638662B2
JP4638662B2 JP2003293495A JP2003293495A JP4638662B2 JP 4638662 B2 JP4638662 B2 JP 4638662B2 JP 2003293495 A JP2003293495 A JP 2003293495A JP 2003293495 A JP2003293495 A JP 2003293495A JP 4638662 B2 JP4638662 B2 JP 4638662B2
Authority
JP
Japan
Prior art keywords
reactor
product
gas
germanium
germanium tetrafluoride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2003293495A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004131370A (ja
JP2004131370A5 (enExample
Inventor
ブハガット・サドヒア・ソロモン
メシュリ・ダヤル・ティー
メシュリ・サンジャイ・ディー
ぺティー・マイケル・シェーン
Original Assignee
アドヴァンス・リサーチ・ケミカルズ・インコーポレーテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by アドヴァンス・リサーチ・ケミカルズ・インコーポレーテッド filed Critical アドヴァンス・リサーチ・ケミカルズ・インコーポレーテッド
Publication of JP2004131370A publication Critical patent/JP2004131370A/ja
Publication of JP2004131370A5 publication Critical patent/JP2004131370A5/ja
Application granted granted Critical
Publication of JP4638662B2 publication Critical patent/JP4638662B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G17/00—Compounds of germanium
    • C01G17/04—Halides of germanium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Silicon Compounds (AREA)
JP2003293495A 2002-08-14 2003-08-14 高純度四フッ化ゲルマニウムを製造するための方法 Expired - Lifetime JP4638662B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/218,894 US6780390B2 (en) 2002-08-14 2002-08-14 Method of producing high purity germanium tetrafluoride

Publications (3)

Publication Number Publication Date
JP2004131370A JP2004131370A (ja) 2004-04-30
JP2004131370A5 JP2004131370A5 (enExample) 2006-09-21
JP4638662B2 true JP4638662B2 (ja) 2011-02-23

Family

ID=31495276

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003293495A Expired - Lifetime JP4638662B2 (ja) 2002-08-14 2003-08-14 高純度四フッ化ゲルマニウムを製造するための方法

Country Status (3)

Country Link
US (1) US6780390B2 (enExample)
EP (1) EP1394114A3 (enExample)
JP (1) JP4638662B2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010116282A (ja) * 2008-11-12 2010-05-27 Central Glass Co Ltd 四フッ化ゲルマニウムの製造方法
EP2429939A4 (en) * 2009-05-08 2012-12-05 Internat Isotopes Inc FLUOREXTRACTION SYSTEM AND RELATED METHODS
US20110097253A1 (en) * 2009-10-27 2011-04-28 Fluoromer Llc Fluorine purification
CN103439331B (zh) * 2013-09-04 2016-02-03 天津长芦华信化工股份有限公司 四氟化锗产品纯度的检测方法
CN112546659B (zh) * 2020-12-08 2022-02-15 云南临沧鑫圆锗业股份有限公司 一种四氟化锗的提纯装置及方法
CN113419019B (zh) * 2021-08-10 2022-08-19 云南大学 一种检测高纯四氟化锗杂质含量的气相色谱系统及方法
CN114560497A (zh) * 2022-03-03 2022-05-31 中船(邯郸)派瑞特种气体股份有限公司 一种制备高纯四氟化钛的方法
CN115231609B (zh) * 2022-08-24 2024-05-10 和远潜江电子特种气体有限公司 一种高纯四氟化锗的合成纯化方法及系统

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2904398A (en) * 1957-06-07 1959-09-15 Du Pont Production of inorganic fluorine compounds
JPH01234301A (ja) * 1988-03-16 1989-09-19 Mitsui Toatsu Chem Inc ガス状金属弗化物の製造方法
DE68916988T2 (de) * 1988-03-16 1995-03-16 Mitsui Toatsu Chemicals Verfahren zur Herstellung von gasförmigen Fluoriden.
DE3841212A1 (de) * 1988-12-07 1990-06-13 Siemens Ag Verfahren zum herstellen von germaniumtetrafluorid
JP3258413B2 (ja) * 1993-02-12 2002-02-18 三井化学株式会社 四フッ化ゲルマニウムの製造方法
DE19537759C1 (de) * 1995-10-10 1996-11-28 Siemens Ag Verfahren und Vorrichtung zur Implantation von Dotierstoff
US5918106A (en) * 1998-06-05 1999-06-29 Starmet Corp. Method for producing uranium oxide and a non-radioactive fluorine compound from uranium tetrafluoride and a solid oxide compound
JP2000072438A (ja) * 1998-08-25 2000-03-07 Mitsui Chemicals Inc 四弗化ゲルマニウムの精製方法
US20010049457A1 (en) * 1999-12-29 2001-12-06 Stephens Matthew D. Method of fluorinating a halogenated organic substance
JP3550074B2 (ja) * 2000-04-07 2004-08-04 東洋炭素株式会社 フッ素ガスまたは三フッ化窒素ガス発生用炭素電極及びそれを用いたフッ素ガスまたは三フッ化窒素ガス発生装置
JP3891764B2 (ja) * 2000-07-17 2007-03-14 セントラル硝子株式会社 Ｆ２ガスの精製方法

Also Published As

Publication number Publication date
JP2004131370A (ja) 2004-04-30
EP1394114A2 (en) 2004-03-03
US6780390B2 (en) 2004-08-24
US20040076577A1 (en) 2004-04-22
EP1394114A3 (en) 2004-07-28

Similar Documents

Publication Publication Date Title
US5324498A (en) Purification of tungsten hexafluoride
US5753567A (en) Cleaning of metallic contaminants from the surface of polycrystalline silicon with a halogen gas or plasma
JP4638662B2 (ja) 高純度四フッ化ゲルマニウムを製造するための方法
WO1999033749A1 (fr) PROCEDE DE PREPARATION DE Si EXTREMEMENT PUR, ET EQUIPEMENT POUR LA MISE EN OEUVRE DE CE PROCEDE
CN103201824B (zh) 由固体材料制备化合物或其中间体以及使用该化合物和中间体的设备和方法
KR20180114106A (ko) 불소 화합물 가스의 정제 방법
TWI525043B (zh) Recovery method and recovery unit of iodinated iodide compound derived from iodine iodide
JP2017141149A (ja) フッ素ガスの精製方法
US6103212A (en) Method for making UHP tungsten hexafluoride
JP6133877B2 (ja) Ｂ２ｆ４製造プロセス
KR19980070988A (ko) 증기상 전달충전에 의해 전자용 특제 가스를 정제하는 방법 및장치
KR100972992B1 (ko) 질화 알루미늄 분말의 제조방법 및 질화 알루미늄 분말을제조하기 위한 화학기상합성 장치
JPH02172814A (ja) 高純度金属フッ化物の製造方法
CN112313175A (zh) 三氯化硼的制造方法
CN111994875A (zh) 制备氟化产物的系统和方法
TWI781444B (zh) 五氟化溴之製造方法
CN118791044A (zh) 一种二氯二氧化钼产品的除杂方法
HK1063773A (en) Method for producing high purity germanium tetrafluoride
JP2004131370A5 (enExample)
JP2008513345A (ja) 四フッ化マンガンの製造法
JP5032040B2 (ja) セレン化水素の製造方法
KR102723168B1 (ko) 고순도의 몰리브덴옥시할라이드를 연속적으로 제조하는 방법 및 그 시스템
WO2017138367A1 (ja) フッ素ガスの精製方法
JPH0891832A (ja) 高純度フッ化アルミニウム及びその製造方法
JPH0438801B2 (enExample)

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060803

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060803

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090714

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20091014

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20091019

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20091113

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20091118

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100114

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100510

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100726

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20101028

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20101126

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131203

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

Ref document number: 4638662

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term