JP4636916B2 - ３次元フォトニック結晶の作製方法 - Google Patents

３次元フォトニック結晶の作製方法 Download PDF

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Publication number
JP4636916B2
JP4636916B2 JP2005089181A JP2005089181A JP4636916B2 JP 4636916 B2 JP4636916 B2 JP 4636916B2 JP 2005089181 A JP2005089181 A JP 2005089181A JP 2005089181 A JP2005089181 A JP 2005089181A JP 4636916 B2 JP4636916 B2 JP 4636916B2
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JP
Japan
Prior art keywords
unit
layer thickness
layer
photonic crystal
laminated structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005089181A
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English (en)
Japanese (ja)
Other versions
JP2006267898A5 (enExample
JP2006267898A (ja
Inventor
章成 高木
光 星
聖雄 池本
和哉 野林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005089181A priority Critical patent/JP4636916B2/ja
Priority to US11/376,985 priority patent/US7463814B2/en
Publication of JP2006267898A publication Critical patent/JP2006267898A/ja
Publication of JP2006267898A5 publication Critical patent/JP2006267898A5/ja
Priority to US12/330,432 priority patent/US7680382B2/en
Application granted granted Critical
Publication of JP4636916B2 publication Critical patent/JP4636916B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
    • G02B1/005—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials made of photonic crystals or photonic band gap materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1225—Basic optical elements, e.g. light-guiding paths comprising photonic band-gap structures or photonic lattices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/11—Comprising a photonic bandgap structure

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Biophysics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Optical Integrated Circuits (AREA)
JP2005089181A 2005-03-25 2005-03-25 ３次元フォトニック結晶の作製方法 Expired - Fee Related JP4636916B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2005089181A JP4636916B2 (ja) 2005-03-25 2005-03-25 ３次元フォトニック結晶の作製方法
US11/376,985 US7463814B2 (en) 2005-03-25 2006-03-15 Method for fabricating three-dimensional photonic crystal
US12/330,432 US7680382B2 (en) 2005-03-25 2008-12-08 Method for fabricating three-dimensional photonic crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005089181A JP4636916B2 (ja) 2005-03-25 2005-03-25 ３次元フォトニック結晶の作製方法

Publications (3)

Publication Number Publication Date
JP2006267898A JP2006267898A (ja) 2006-10-05
JP2006267898A5 JP2006267898A5 (enExample) 2008-05-08
JP4636916B2 true JP4636916B2 (ja) 2011-02-23

Family

ID=37203903

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005089181A Expired - Fee Related JP4636916B2 (ja) 2005-03-25 2005-03-25 ３次元フォトニック結晶の作製方法

Country Status (2)

Country Link
US (2) US7463814B2 (enExample)
JP (1) JP4636916B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4341296B2 (ja) * 2003-05-21 2009-10-07 富士ゼロックス株式会社 フォトニック結晶３次元構造体の製造方法
DE102004022140B4 (de) * 2004-05-05 2007-03-08 Atmel Germany Gmbh Verfahren zur Herstellung einer Photonic-Band-Gap-Struktur und Bauelement mit einer derartig hergestellten Photonic-Band-Gap-Struktur
JP4603847B2 (ja) * 2004-10-15 2010-12-22 キヤノン株式会社 共振器および発光素子および波長変換素子
JP4636916B2 (ja) * 2005-03-25 2011-02-23 キヤノン株式会社 ３次元フォトニック結晶の作製方法
JP4378352B2 (ja) * 2005-04-28 2009-12-02 キヤノン株式会社 周期構造体の製造方法
TWI380136B (en) * 2008-02-29 2012-12-21 Nanya Technology Corp Exposing system, mask and design method thereof
CN112226713A (zh) * 2020-09-07 2021-01-15 潘涛 一种金属板材镀锌装置及其加工方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5406573A (en) * 1992-12-22 1995-04-11 Iowa State University Research Foundation Periodic dielectric structure for production of photonic band gap and method for fabricating the same
US5335240A (en) * 1992-12-22 1994-08-02 Iowa State University Research Foundation, Inc. Periodic dielectric structure for production of photonic band gap and devices incorporating the same
US5851826A (en) * 1995-07-26 1998-12-22 Children's Medical Center Corporation Helper virus-free herpesvirus vector packaging system
US6396617B1 (en) * 1999-05-17 2002-05-28 Michael Scalora Photonic band gap device and method using a periodicity defect region doped with a gain medium to increase photonic signal delay
US6597851B2 (en) * 2000-08-09 2003-07-22 Massachusetts Institute Of Technology Periodic dielectric structure having a complete three-dimensional photonic band gap
US6392787B1 (en) * 2000-09-01 2002-05-21 Agere Systems Guardian Corp. Process for fabricating article comprising photonic band gap material
JP2004188513A (ja) * 2002-12-09 2004-07-08 Fuji Xerox Co Ltd ３次元構造体の製造方法およびその製造用部品
JP4187096B2 (ja) * 2003-01-15 2008-11-26 独立行政法人科学技術振興機構 ３次元フォトニック結晶製造方法
JP3886937B2 (ja) * 2003-06-19 2007-02-28 株式会社東芝 レーザ装置
JP2005157336A (ja) * 2003-11-07 2005-06-16 Canon Inc 光素子の作製方法、３次元積層構造を有する光素子
WO2005064373A1 (en) * 2003-12-26 2005-07-14 Canon Kabushiki Kaisha Photonic crystal optical element and manufacturing method therefor
US7418161B2 (en) * 2004-06-22 2008-08-26 Micron Technology, Inc. Photonic crystal-based optical elements for integrated circuits and methods therefor
JP4636916B2 (ja) * 2005-03-25 2011-02-23 キヤノン株式会社 ３次元フォトニック結晶の作製方法
US7483466B2 (en) * 2005-04-28 2009-01-27 Canon Kabushiki Kaisha Vertical cavity surface emitting laser device
JP5300344B2 (ja) * 2007-07-06 2013-09-25 キヤノン株式会社 光検出素子及び撮像素子、光検出方法及び撮像方法

Also Published As

Publication number Publication date
US7463814B2 (en) 2008-12-09
US20070025682A1 (en) 2007-02-01
JP2006267898A (ja) 2006-10-05
US7680382B2 (en) 2010-03-16
US20090092368A1 (en) 2009-04-09

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