JP2011085708A5 - - Google Patents
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- Publication number
- JP2011085708A5 JP2011085708A5 JP2009237659A JP2009237659A JP2011085708A5 JP 2011085708 A5 JP2011085708 A5 JP 2011085708A5 JP 2009237659 A JP2009237659 A JP 2009237659A JP 2009237659 A JP2009237659 A JP 2009237659A JP 2011085708 A5 JP2011085708 A5 JP 2011085708A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- thickness
- medium
- photonic crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000010408 film Substances 0.000 description 65
- 239000004038 photonic crystal Substances 0.000 description 50
- 238000004519 manufacturing process Methods 0.000 description 42
- 238000000034 method Methods 0.000 description 31
- 230000000737 periodic effect Effects 0.000 description 28
- 230000007547 defect Effects 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 11
- 239000000758 substrate Substances 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000005304 joining Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- -1 TiO 2 or ZnO Chemical class 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009237659A JP5578829B2 (ja) | 2009-10-14 | 2009-10-14 | ３次元フォトニック結晶の作製方法および機能素子 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009237659A JP5578829B2 (ja) | 2009-10-14 | 2009-10-14 | ３次元フォトニック結晶の作製方法および機能素子 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011085708A JP2011085708A (ja) | 2011-04-28 |
| JP2011085708A5 true JP2011085708A5 (enExample) | 2012-10-18 |
| JP5578829B2 JP5578829B2 (ja) | 2014-08-27 |
Family
ID=44078709
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009237659A Expired - Fee Related JP5578829B2 (ja) | 2009-10-14 | 2009-10-14 | ３次元フォトニック結晶の作製方法および機能素子 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5578829B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6126570B2 (ja) * | 2013-12-13 | 2017-05-10 | 富士フイルム株式会社 | パターン形成方法、電子デバイスの製造方法 |
| WO2017082207A1 (ja) * | 2015-11-10 | 2017-05-18 | 武藤工業株式会社 | 造形物の製造方法及び造形物 |
| US20190030822A1 (en) * | 2016-01-25 | 2019-01-31 | Mutoh Industries Ltd. | Three-dimensional molding device, method for controlling same, and article molded by same |
| JP7193377B2 (ja) * | 2019-02-25 | 2022-12-20 | 三菱重工業株式会社 | 接合部材 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004287248A (ja) * | 2003-03-24 | 2004-10-14 | Univ Hiroshima | 屈折率膜の積層方法およびパターン化積層体 |
| JP4677276B2 (ja) * | 2005-05-09 | 2011-04-27 | キヤノン株式会社 | ３次元フォトニック結晶の作製方法 |
| JP5038218B2 (ja) * | 2007-05-15 | 2012-10-03 | キヤノン株式会社 | ３次元フォトニック結晶の製造方法 |
-
2009
- 2009-10-14 JP JP2009237659A patent/JP5578829B2/ja not_active Expired - Fee Related
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