JP5578829B2 - ３次元フォトニック結晶の作製方法および機能素子 - Google Patents

３次元フォトニック結晶の作製方法および機能素子 Download PDF

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JP5578829B2
JP5578829B2 JP2009237659A JP2009237659A JP5578829B2 JP 5578829 B2 JP5578829 B2 JP 5578829B2 JP 2009237659 A JP2009237659 A JP 2009237659A JP 2009237659 A JP2009237659 A JP 2009237659A JP 5578829 B2 JP5578829 B2 JP 5578829B2
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layer
film
medium
photonic crystal
thickness
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JP2011085708A5 (enExample
JP2011085708A (ja
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和哉 野林
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Canon Inc
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Canon Inc
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JP2009237659A 2009-10-14 2009-10-14 ３次元フォトニック結晶の作製方法および機能素子 Expired - Fee Related JP5578829B2 (ja)

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JP2009237659A JP5578829B2 (ja) 2009-10-14 2009-10-14 ３次元フォトニック結晶の作製方法および機能素子

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JP2011085708A JP2011085708A (ja) 2011-04-28
JP2011085708A5 JP2011085708A5 (enExample) 2012-10-18
JP5578829B2 true JP5578829B2 (ja) 2014-08-27

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6126570B2 (ja) * 2013-12-13 2017-05-10 富士フイルム株式会社 パターン形成方法、電子デバイスの製造方法
JP6625134B2 (ja) * 2015-11-10 2019-12-25 武藤工業株式会社 造形物の製造方法及び造形物
JP6526839B2 (ja) * 2016-01-25 2019-06-05 武藤工業株式会社 三次元造形装置、及びその制御方法、並びにその造形物
JP7193377B2 (ja) * 2019-02-25 2022-12-20 三菱重工業株式会社 接合部材

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* Cited by examiner, † Cited by third party
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JP2004287248A (ja) * 2003-03-24 2004-10-14 Univ Hiroshima 屈折率膜の積層方法およびパターン化積層体
JP4677276B2 (ja) * 2005-05-09 2011-04-27 キヤノン株式会社 ３次元フォトニック結晶の作製方法
JP5038218B2 (ja) * 2007-05-15 2012-10-03 キヤノン株式会社 ３次元フォトニック結晶の製造方法

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