JP2006313267A5 - - Google Patents
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- Publication number
- JP2006313267A5 JP2006313267A5 JP2005136282A JP2005136282A JP2006313267A5 JP 2006313267 A5 JP2006313267 A5 JP 2006313267A5 JP 2005136282 A JP2005136282 A JP 2005136282A JP 2005136282 A JP2005136282 A JP 2005136282A JP 2006313267 A5 JP2006313267 A5 JP 2006313267A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- refractive index
- photonic crystal
- columnar structures
- dimensional photonic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004038 photonic crystal Substances 0.000 claims description 110
- 230000000737 periodic effect Effects 0.000 claims description 93
- 238000004519 manufacturing process Methods 0.000 claims description 61
- 238000013461 design Methods 0.000 claims description 59
- 230000007547 defect Effects 0.000 claims description 13
- 238000010030 laminating Methods 0.000 claims description 6
- 239000013078 crystal Substances 0.000 claims description 5
- 230000005284 excitation Effects 0.000 claims 1
- 238000000034 method Methods 0.000 description 31
- 238000005530 etching Methods 0.000 description 20
- 230000003287 optical effect Effects 0.000 description 20
- 239000000758 substrate Substances 0.000 description 18
- 238000000411 transmission spectrum Methods 0.000 description 18
- 239000010409 thin film Substances 0.000 description 12
- 238000005498 polishing Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 230000001747 exhibiting effect Effects 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 238000002679 ablation Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 230000004927 fusion Effects 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000007500 overflow downdraw method Methods 0.000 description 2
- 230000007261 regionalization Effects 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000009740 moulding (composite fabrication) Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005136282A JP4677276B2 (ja) | 2005-05-09 | 2005-05-09 | ３次元フォトニック結晶の作製方法 |
| US11/404,282 US7308181B2 (en) | 2005-05-09 | 2006-04-13 | Method for manufacturing three-dimensional photonic crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005136282A JP4677276B2 (ja) | 2005-05-09 | 2005-05-09 | ３次元フォトニック結晶の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006313267A JP2006313267A (ja) | 2006-11-16 |
| JP2006313267A5 true JP2006313267A5 (enExample) | 2008-06-19 |
| JP4677276B2 JP4677276B2 (ja) | 2011-04-27 |
Family
ID=37394118
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005136282A Expired - Fee Related JP4677276B2 (ja) | 2005-05-09 | 2005-05-09 | ３次元フォトニック結晶の作製方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7308181B2 (enExample) |
| JP (1) | JP4677276B2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4603847B2 (ja) * | 2004-10-15 | 2010-12-22 | キヤノン株式会社 | 共振器および発光素子および波長変換素子 |
| JP4769658B2 (ja) * | 2006-07-31 | 2011-09-07 | キヤノン株式会社 | 共振器 |
| JP5038218B2 (ja) * | 2007-05-15 | 2012-10-03 | キヤノン株式会社 | ３次元フォトニック結晶の製造方法 |
| JP2011504616A (ja) * | 2007-11-22 | 2011-02-10 | エージェンシー フォー サイエンス，テクノロジー アンド リサーチ | エッチングされ平坦化されたフォトニック結晶構造体の形成 |
| JP5322453B2 (ja) * | 2008-02-07 | 2013-10-23 | キヤノン株式会社 | ３次元フォトニック結晶発光素子 |
| JP2009267263A (ja) * | 2008-04-28 | 2009-11-12 | Kyocera Corp | 発光装置およびその製造方法 |
| KR100999713B1 (ko) * | 2009-03-17 | 2010-12-08 | 엘지이노텍 주식회사 | 발광소자 및 그 제조방법 |
| JP5578829B2 (ja) * | 2009-10-14 | 2014-08-27 | キヤノン株式会社 | ３次元フォトニック結晶の作製方法および機能素子 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5406573A (en) * | 1992-12-22 | 1995-04-11 | Iowa State University Research Foundation | Periodic dielectric structure for production of photonic band gap and method for fabricating the same |
| US5335240A (en) * | 1992-12-22 | 1994-08-02 | Iowa State University Research Foundation, Inc. | Periodic dielectric structure for production of photonic band gap and devices incorporating the same |
| US5600483A (en) * | 1994-05-10 | 1997-02-04 | Massachusetts Institute Of Technology | Three-dimensional periodic dielectric structures having photonic bandgaps |
| DE19743296C1 (de) * | 1997-09-30 | 1998-11-12 | Siemens Ag | Verfahren zur Herstellung einer offenen Form |
| US5998298A (en) * | 1998-04-28 | 1999-12-07 | Sandia Corporation | Use of chemical-mechanical polishing for fabricating photonic bandgap structures |
| US6134043A (en) * | 1998-08-11 | 2000-10-17 | Massachusetts Institute Of Technology | Composite photonic crystals |
| US6358854B1 (en) * | 1999-04-21 | 2002-03-19 | Sandia Corporation | Method to fabricate layered material compositions |
| IL131037A (en) * | 1999-07-22 | 2004-06-20 | Israel Atomic Energy Comm | Method for making threedimensional photonic band-gap crystals |
| JP2001209189A (ja) * | 2000-01-28 | 2001-08-03 | Univ Tohoku | 積層構造体 |
| WO2002012933A2 (en) * | 2000-08-09 | 2002-02-14 | Massachusetts Institute Of Technology | Periodic dielectric structure having a complete three-dimensional photonic band gap |
| US6392787B1 (en) * | 2000-09-01 | 2002-05-21 | Agere Systems Guardian Corp. | Process for fabricating article comprising photonic band gap material |
| US6690876B2 (en) * | 2001-06-27 | 2004-02-10 | Agilent Technologies, Inc. | Three-dimensional photonic crystal waveguide apparatus |
| US6947215B2 (en) * | 2001-12-27 | 2005-09-20 | Canon Kabushiki Kaisha | Optical element, optical functional device, polarization conversion device, image display apparatus, and image display system |
| JP2004188513A (ja) * | 2002-12-09 | 2004-07-08 | Fuji Xerox Co Ltd | ３次元構造体の製造方法およびその製造用部品 |
| JP4187096B2 (ja) * | 2003-01-15 | 2008-11-26 | 独立行政法人科学技術振興機構 | ３次元フォトニック結晶製造方法 |
| JP3886937B2 (ja) * | 2003-06-19 | 2007-02-28 | 株式会社東芝 | レーザ装置 |
| JP2005157336A (ja) * | 2003-11-07 | 2005-06-16 | Canon Inc | 光素子の作製方法、３次元積層構造を有する光素子 |
| US7231123B2 (en) * | 2003-12-26 | 2007-06-12 | Canon Kabushiki Kaisha | Photonic crystal optical element and manufacturing method therefor |
| US7255805B2 (en) * | 2004-01-12 | 2007-08-14 | Hewlett-Packard Development Company, L.P. | Photonic structures, devices, and methods |
| JP4612844B2 (ja) * | 2004-02-23 | 2011-01-12 | キヤノン株式会社 | ３次元周期構造及びそれを有する機能素子 |
| JP5188009B2 (ja) * | 2004-03-08 | 2013-04-24 | キヤノン株式会社 | ３次元周期構造及びそれを有する機能素子および発光素子 |
| JP4921038B2 (ja) * | 2005-06-07 | 2012-04-18 | キヤノン株式会社 | 共振器及びこれを用いた発光素子 |
-
2005
- 2005-05-09 JP JP2005136282A patent/JP4677276B2/ja not_active Expired - Fee Related
-
2006
- 2006-04-13 US US11/404,282 patent/US7308181B2/en not_active Expired - Fee Related
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