JP4677276B2 - ３次元フォトニック結晶の作製方法 - Google Patents

３次元フォトニック結晶の作製方法 Download PDF

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Publication number
JP4677276B2
JP4677276B2 JP2005136282A JP2005136282A JP4677276B2 JP 4677276 B2 JP4677276 B2 JP 4677276B2 JP 2005136282 A JP2005136282 A JP 2005136282A JP 2005136282 A JP2005136282 A JP 2005136282A JP 4677276 B2 JP4677276 B2 JP 4677276B2
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JP
Japan
Prior art keywords
layer
refractive index
photonic crystal
columnar structures
periodic structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005136282A
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English (en)
Japanese (ja)
Other versions
JP2006313267A (ja
JP2006313267A5 (enExample
Inventor
和哉 野林
章成 高木
光 星
聖雄 池本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005136282A priority Critical patent/JP4677276B2/ja
Priority to US11/404,282 priority patent/US7308181B2/en
Publication of JP2006313267A publication Critical patent/JP2006313267A/ja
Publication of JP2006313267A5 publication Critical patent/JP2006313267A5/ja
Application granted granted Critical
Publication of JP4677276B2 publication Critical patent/JP4677276B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1225—Basic optical elements, e.g. light-guiding paths comprising photonic band-gap structures or photonic lattices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biophysics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Integrated Circuits (AREA)
  • Optical Filters (AREA)
  • Semiconductor Lasers (AREA)
JP2005136282A 2005-05-09 2005-05-09 ３次元フォトニック結晶の作製方法 Expired - Fee Related JP4677276B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005136282A JP4677276B2 (ja) 2005-05-09 2005-05-09 ３次元フォトニック結晶の作製方法
US11/404,282 US7308181B2 (en) 2005-05-09 2006-04-13 Method for manufacturing three-dimensional photonic crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005136282A JP4677276B2 (ja) 2005-05-09 2005-05-09 ３次元フォトニック結晶の作製方法

Publications (3)

Publication Number Publication Date
JP2006313267A JP2006313267A (ja) 2006-11-16
JP2006313267A5 JP2006313267A5 (enExample) 2008-06-19
JP4677276B2 true JP4677276B2 (ja) 2011-04-27

Family

ID=37394118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005136282A Expired - Fee Related JP4677276B2 (ja) 2005-05-09 2005-05-09 ３次元フォトニック結晶の作製方法

Country Status (2)

Country Link
US (1) US7308181B2 (enExample)
JP (1) JP4677276B2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4603847B2 (ja) * 2004-10-15 2010-12-22 キヤノン株式会社 共振器および発光素子および波長変換素子
JP4769658B2 (ja) * 2006-07-31 2011-09-07 キヤノン株式会社 共振器
JP5038218B2 (ja) * 2007-05-15 2012-10-03 キヤノン株式会社 ３次元フォトニック結晶の製造方法
JP2011504616A (ja) * 2007-11-22 2011-02-10 エージェンシー フォー サイエンス，テクノロジー アンド リサーチ エッチングされ平坦化されたフォトニック結晶構造体の形成
JP5322453B2 (ja) * 2008-02-07 2013-10-23 キヤノン株式会社 ３次元フォトニック結晶発光素子
JP2009267263A (ja) * 2008-04-28 2009-11-12 Kyocera Corp 発光装置およびその製造方法
KR100999713B1 (ko) * 2009-03-17 2010-12-08 엘지이노텍 주식회사 발광소자 및 그 제조방법
JP5578829B2 (ja) * 2009-10-14 2014-08-27 キヤノン株式会社 ３次元フォトニック結晶の作製方法および機能素子

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5335240A (en) * 1992-12-22 1994-08-02 Iowa State University Research Foundation, Inc. Periodic dielectric structure for production of photonic band gap and devices incorporating the same
US5406573A (en) * 1992-12-22 1995-04-11 Iowa State University Research Foundation Periodic dielectric structure for production of photonic band gap and method for fabricating the same
US5600483A (en) * 1994-05-10 1997-02-04 Massachusetts Institute Of Technology Three-dimensional periodic dielectric structures having photonic bandgaps
DE19743296C1 (de) * 1997-09-30 1998-11-12 Siemens Ag Verfahren zur Herstellung einer offenen Form
US5998298A (en) * 1998-04-28 1999-12-07 Sandia Corporation Use of chemical-mechanical polishing for fabricating photonic bandgap structures
US6134043A (en) * 1998-08-11 2000-10-17 Massachusetts Institute Of Technology Composite photonic crystals
US6358854B1 (en) * 1999-04-21 2002-03-19 Sandia Corporation Method to fabricate layered material compositions
IL131037A (en) * 1999-07-22 2004-06-20 Israel Atomic Energy Comm Method for making threedimensional photonic band-gap crystals
JP2001209189A (ja) * 2000-01-28 2001-08-03 Univ Tohoku 積層構造体
US6597851B2 (en) * 2000-08-09 2003-07-22 Massachusetts Institute Of Technology Periodic dielectric structure having a complete three-dimensional photonic band gap
US6392787B1 (en) * 2000-09-01 2002-05-21 Agere Systems Guardian Corp. Process for fabricating article comprising photonic band gap material
US6690876B2 (en) * 2001-06-27 2004-02-10 Agilent Technologies, Inc. Three-dimensional photonic crystal waveguide apparatus
US6947215B2 (en) * 2001-12-27 2005-09-20 Canon Kabushiki Kaisha Optical element, optical functional device, polarization conversion device, image display apparatus, and image display system
JP2004188513A (ja) * 2002-12-09 2004-07-08 Fuji Xerox Co Ltd ３次元構造体の製造方法およびその製造用部品
JP4187096B2 (ja) * 2003-01-15 2008-11-26 独立行政法人科学技術振興機構 ３次元フォトニック結晶製造方法
JP3886937B2 (ja) * 2003-06-19 2007-02-28 株式会社東芝 レーザ装置
JP2005157336A (ja) * 2003-11-07 2005-06-16 Canon Inc 光素子の作製方法、３次元積層構造を有する光素子
US7231123B2 (en) * 2003-12-26 2007-06-12 Canon Kabushiki Kaisha Photonic crystal optical element and manufacturing method therefor
US7255805B2 (en) * 2004-01-12 2007-08-14 Hewlett-Packard Development Company, L.P. Photonic structures, devices, and methods
JP4612844B2 (ja) * 2004-02-23 2011-01-12 キヤノン株式会社 ３次元周期構造及びそれを有する機能素子
JP5188009B2 (ja) * 2004-03-08 2013-04-24 キヤノン株式会社 ３次元周期構造及びそれを有する機能素子および発光素子
JP4921038B2 (ja) * 2005-06-07 2012-04-18 キヤノン株式会社 共振器及びこれを用いた発光素子

Also Published As

Publication number Publication date
US7308181B2 (en) 2007-12-11
JP2006313267A (ja) 2006-11-16
US20060251372A1 (en) 2006-11-09

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