JP2006267898A5 - - Google Patents

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Publication number
JP2006267898A5
JP2006267898A5 JP2005089181A JP2005089181A JP2006267898A5 JP 2006267898 A5 JP2006267898 A5 JP 2006267898A5 JP 2005089181 A JP2005089181 A JP 2005089181A JP 2005089181 A JP2005089181 A JP 2005089181A JP 2006267898 A5 JP2006267898 A5 JP 2006267898A5
Authority
JP
Japan
Prior art keywords
photonic crystal
unit
dimensional photonic
layer thickness
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005089181A
Other languages
English (en)
Japanese (ja)
Other versions
JP4636916B2 (ja
JP2006267898A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005089181A priority Critical patent/JP4636916B2/ja
Priority claimed from JP2005089181A external-priority patent/JP4636916B2/ja
Priority to US11/376,985 priority patent/US7463814B2/en
Publication of JP2006267898A publication Critical patent/JP2006267898A/ja
Publication of JP2006267898A5 publication Critical patent/JP2006267898A5/ja
Priority to US12/330,432 priority patent/US7680382B2/en
Application granted granted Critical
Publication of JP4636916B2 publication Critical patent/JP4636916B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005089181A 2005-03-25 2005-03-25 ３次元フォトニック結晶の作製方法 Expired - Fee Related JP4636916B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2005089181A JP4636916B2 (ja) 2005-03-25 2005-03-25 ３次元フォトニック結晶の作製方法
US11/376,985 US7463814B2 (en) 2005-03-25 2006-03-15 Method for fabricating three-dimensional photonic crystal
US12/330,432 US7680382B2 (en) 2005-03-25 2008-12-08 Method for fabricating three-dimensional photonic crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005089181A JP4636916B2 (ja) 2005-03-25 2005-03-25 ３次元フォトニック結晶の作製方法

Publications (3)

Publication Number Publication Date
JP2006267898A JP2006267898A (ja) 2006-10-05
JP2006267898A5 true JP2006267898A5 (enExample) 2008-05-08
JP4636916B2 JP4636916B2 (ja) 2011-02-23

Family

ID=37203903

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005089181A Expired - Fee Related JP4636916B2 (ja) 2005-03-25 2005-03-25 ３次元フォトニック結晶の作製方法

Country Status (2)

Country Link
US (2) US7463814B2 (enExample)
JP (1) JP4636916B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4341296B2 (ja) * 2003-05-21 2009-10-07 富士ゼロックス株式会社 フォトニック結晶３次元構造体の製造方法
DE102004022140B4 (de) * 2004-05-05 2007-03-08 Atmel Germany Gmbh Verfahren zur Herstellung einer Photonic-Band-Gap-Struktur und Bauelement mit einer derartig hergestellten Photonic-Band-Gap-Struktur
JP4603847B2 (ja) * 2004-10-15 2010-12-22 キヤノン株式会社 共振器および発光素子および波長変換素子
JP4636916B2 (ja) * 2005-03-25 2011-02-23 キヤノン株式会社 ３次元フォトニック結晶の作製方法
JP4378352B2 (ja) * 2005-04-28 2009-12-02 キヤノン株式会社 周期構造体の製造方法
TWI380136B (en) * 2008-02-29 2012-12-21 Nanya Technology Corp Exposing system, mask and design method thereof
CN112226713A (zh) * 2020-09-07 2021-01-15 潘涛 一种金属板材镀锌装置及其加工方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5406573A (en) * 1992-12-22 1995-04-11 Iowa State University Research Foundation Periodic dielectric structure for production of photonic band gap and method for fabricating the same
US5335240A (en) * 1992-12-22 1994-08-02 Iowa State University Research Foundation, Inc. Periodic dielectric structure for production of photonic band gap and devices incorporating the same
US5851826A (en) * 1995-07-26 1998-12-22 Children's Medical Center Corporation Helper virus-free herpesvirus vector packaging system
US6396617B1 (en) * 1999-05-17 2002-05-28 Michael Scalora Photonic band gap device and method using a periodicity defect region doped with a gain medium to increase photonic signal delay
US6597851B2 (en) * 2000-08-09 2003-07-22 Massachusetts Institute Of Technology Periodic dielectric structure having a complete three-dimensional photonic band gap
US6392787B1 (en) * 2000-09-01 2002-05-21 Agere Systems Guardian Corp. Process for fabricating article comprising photonic band gap material
JP2004188513A (ja) * 2002-12-09 2004-07-08 Fuji Xerox Co Ltd ３次元構造体の製造方法およびその製造用部品
JP4187096B2 (ja) * 2003-01-15 2008-11-26 独立行政法人科学技術振興機構 ３次元フォトニック結晶製造方法
JP3886937B2 (ja) * 2003-06-19 2007-02-28 株式会社東芝 レーザ装置
JP2005157336A (ja) * 2003-11-07 2005-06-16 Canon Inc 光素子の作製方法、３次元積層構造を有する光素子
WO2005064373A1 (en) * 2003-12-26 2005-07-14 Canon Kabushiki Kaisha Photonic crystal optical element and manufacturing method therefor
US7418161B2 (en) * 2004-06-22 2008-08-26 Micron Technology, Inc. Photonic crystal-based optical elements for integrated circuits and methods therefor
JP4636916B2 (ja) * 2005-03-25 2011-02-23 キヤノン株式会社 ３次元フォトニック結晶の作製方法
US7483466B2 (en) * 2005-04-28 2009-01-27 Canon Kabushiki Kaisha Vertical cavity surface emitting laser device
JP5300344B2 (ja) * 2007-07-06 2013-09-25 キヤノン株式会社 光検出素子及び撮像素子、光検出方法及び撮像方法

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